WO1999054254A1 - Hochreine wässrige wasserstoffperoxid-lösungen, verfahren zu ihrer herstellung und ihre verwendung - Google Patents
Hochreine wässrige wasserstoffperoxid-lösungen, verfahren zu ihrer herstellung und ihre verwendung Download PDFInfo
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- WO1999054254A1 WO1999054254A1 PCT/EP1999/002627 EP9902627W WO9954254A1 WO 1999054254 A1 WO1999054254 A1 WO 1999054254A1 EP 9902627 W EP9902627 W EP 9902627W WO 9954254 A1 WO9954254 A1 WO 9954254A1
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- hydrogen peroxide
- ppb
- purity
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- organic
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B15/00—Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
- C01B15/01—Hydrogen peroxide
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B15/00—Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
- C01B15/01—Hydrogen peroxide
- C01B15/013—Separation; Purification; Concentration
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B15/00—Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
- C01B15/01—Hydrogen peroxide
- C01B15/013—Separation; Purification; Concentration
- C01B15/0135—Purification by solid ion-exchangers or solid chelating agents
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B15/00—Peroxides; Peroxyhydrates; Peroxyacids or salts thereof; Superoxides; Ozonides
- C01B15/01—Hydrogen peroxide
- C01B15/029—Preparation from hydrogen and oxygen
Definitions
- the present invention relates to high-purity aqueous hydrogen peroxide solutions which are above all essentially free of organic compounds, a process for their preparation and their use.
- Hydrogen peroxide has many technical areas, such as. B. in chemical synthesis, for the bleaching of paper and pulp, for the treatment of waste water and as a component of chemical polishing fluids found a wide application. Much of the hydrogen peroxide is currently produced using the so-called anthraquinone process.
- An anthraquinone derivative such as. B. a 2-alkylanthraquinone, reduced in a water-immiscible organic solvent mixture on a hydrogenation catalyst to the corresponding alkylanthrahydroquinone.
- the solutions purified in this way can then be concentrated to a hydrogen peroxide content of about 10 to 70% by weight of hydrogen peroxide by evaporation and rectification.
- the quality of the hydrogen peroxide solutions thus obtained is sufficient for a large number of technical applications which do not make high demands on the removal of inorganic and / or organic contaminants, such as, for. B. for wastewater treatment or for bleaching paper and cellulose. 2
- the increasingly progressive downsizing of electronic components requires the provision of increasingly powerful microchips with ever higher degrees of integration.
- a major problem in the manufacture of these highly integrated circuits is contamination of the semiconductor surfaces by inorganic or organic compounds which are contained in the cleaning chemicals. Therefore, extremely high purity requirements are placed on all solutions that come into contact with semiconductor elements.
- the content of ionic impurities should be as low as possible. These solutions should preferably have a total metal content of at most 300 ppt and in some cases less than 10 ppt for individual metal species. Contamination with anions must also be avoided, since some anions complex metal ions and can thus change the targeted doping of the semiconductor.
- a major problem is also contamination of the semiconductor surfaces with organic compounds, the subsequent process steps such. B. the etching, can seriously affect. For this reason, there is a great need for aqueous hydrogen peroxide solutions which are essentially free of organic compounds.
- WO-A 96/39237 describes a process for producing ultra-pure, aqueous hydrogen peroxide for semiconductor production.
- an anion and a cation exchange column an approximately 30% aqueous hydrogen peroxide solution is cleaned of the cations and anions contained therein.
- a disadvantage of this process is that the hydrogen peroxide solutions obtained can still contain up to 20 ppm of organic impurities.
- the content of organic compounds in the hydrogen peroxide solutions is usually referred to as toc (total organic carbon) and is given in ppm, ie parts of impurity per 10 6 parts of substance or ppb (10 9 ) etc.
- toc total organic carbon
- ppm total organic carbon
- the removal of organic contaminants is still unsatisfactory. 3 So fails.
- B. a purely distillative purification of hydrogen peroxide prepared by the anthraquinone process that it contains volatile or steam-volatile organic compounds. With such a distillate, the content of organic compounds in the hydrogen peroxide solution can still be up to 150 mg / l.
- US Pat. No. 5,456,898 describes a process for the enrichment and purification of raw hydrogen peroxide solutions which have been prepared by the anthraquinone process.
- Organic impurities are first adsorbed on a synthetic adsorber resin and the resulting solution is then concentrated by partial evaporation and subsequent fractional distillation. The result is an aqueous hydrogen peroxide solution with a maximum organic impurity content of 50 ppm.
- US-A-4, 999, 179 describes a process for the purification of aqueous hydrogen peroxide solutions from metal cations, anions and organic contaminants using a combination of a cation exchanger, an anion exchanger and another halogenated, porous resin, e.g. B. a brominated styrene-divinylbenzene copolymer. Hydrogen peroxide solutions that have been produced by the anthraquinone process can also be used for cleaning. The toc content of the resulting purified solutions is generally at most 5 ppm.
- US Pat. No. 5,342,602 likewise describes a process for reducing the content of organic impurities in aqueous hydrogen peroxide solutions which have been prepared by the anthraquinone process.
- the organic impurities are adsorbed on dealuminized H-Y zeolites or on H-mordenites. These adsorbers can be regenerated by calcining at temperatures up to 1000 ° C. In the exemplary embodiments, a maximum reduction in the toc value to 44 ppm is achieved.
- JP-A-09 100 106 describes a method for separating organic impurities from hydrogen peroxide solutions without an adsorption step.
- a raw hydrogen peroxide solution is gassed with air or an inert gas, with a reduction in the toc value from 34.2 mg / 1 to 10.4 mg / 1.
- JP-A-09 278 416 has a comparable disclosure content.
- JP-A-09 075 605 describes a method for separating organic impurities from hydrogen peroxide solutions by fractional crystallizations. This energy-intensive and technically very complex process enables the toc value to be reduced from 64 to 2.7 ppm. JP-A-09 278 417 has a comparable disclosure content.
- US-A-5, 112, 702 describes a process for the production of hydrogen peroxide by electrochemical reduction of oxygen.
- US-A-5,496,532 describes a process for the production of hydrogen peroxide by catalytic reaction of hydrogen and oxygen in the presence of a catalyst comprising a platinum group metal.
- Electrolytic production from ammonium peroxodisulfate is also known. None of these processes leads to aqueous hydrogen peroxide, which meets today's purity requirements of the electronics industry, in particular their requirements for the greatest possible exclusion of inorganic and organic substances. The known hydrogen peroxide solutions therefore cause too much waste when treating substrates of electronic components.
- the object of the present invention is to provide high-purity aqueous hydrogen peroxide solutions for the treatment of electronic components and a simple process which can be carried out on an industrial scale for the production of such solutions which are essentially free of organic compounds. It should be possible to dispense with purification steps for separating organic compounds after the synthesis.
- aqueous hydrogen peroxide solutions that contain a maximum of 100 ppb toc (total organic carbon), as well as by a process in which hydrogen and oxygen are converted catalytically in an aqueous medium or electrochemically reduced oxygen or electrolysed acidic ammonium sulfate solutions , the reaction being carried out with the exclusion of organic compounds and materials which release them.
- aqueous hydrogen peroxide solutions with a total organic compound content of at most 100 ppb, preferably at most 10 ppb, in particular at most 1 ppb, are obtained.
- the hydrogen peroxide concentration of the solutions is generally in a range from about 2 to 80% by weight, preferably 3 to 75% by weight.
- the process according to the invention for producing high-purity aqueous hydrogen peroxide solutions comprises the following measures:
- high-purity water as reaction medium, high-purity reagents such as hydrogen, oxygen or ammonium sulfate, high-purity catalyst and high-purity device,
- Process steps III) and IV) can, if desired, be carried out one or more times in any order, always taking care to exclude organic compounds.
- process step III) can be dispensed with if inorganic impurities still present can possibly remain in the hydrogen peroxide solution for further use.
- Process step IV) can also be dispensed with if the hydrogen peroxide solution obtained in process step II) already has a sufficient concentration for the intended use.
- the water used for the hydrogen peroxide synthesis is essentially free of organic components.
- Water which contains no organic impurities can be prepared by customary processes known to those skilled in the art.
- US Pat. No. 5,395,522 describes a device for removing organic materials from water, the water being first subjected to photocatalytic oxidation and / or ionization in a reactor and then carbon dioxide, dissolved acids and ionized organic compounds from ion exchange columns the first cleaning step.
- water with a toc content of ⁇ 0 ⁇ o ⁇ ppb, preferably ⁇ 10 ppb, in particular ⁇ 1 ppb and with an electrical resistance> 18 M ⁇ cm is thus obtained and used.
- the hydrogen and oxygen used are essentially free of organic contaminants. This also applies to inert gases which may be used as dilution gases, e.g. B. nitrogen. Methods for purifying these gases are the usual methods known to the person skilled in the art which, for. Described in US-A-5, 558, 844, US-A-4,977,746, US-A-5, 528, 906 and US-A-5, 682, 763, which are incorporated herein by reference in their entirety .
- reaction gas which in addition to hydrogen and oxygen, as described above, can also contain inert gases such as nitrogen or noble gases, generally has a 0 2 : H 2 molar ratio in the ratio
- reaction gas ranges from about 2: 1 to 1,000: 1.
- the molar ratio is particularly preferably in a range from about 5: 1 to 100: 1.
- the oxygen used in the reaction gas can also be added to the reaction gas in the form of air. This is also used in a quality that is essentially free of organic
- the reaction can be carried out both at normal pressure and at pressures up to 300 bar.
- the pressure is at least 2 bar, e.g. B. 10 to 100 bar, in particular 10 to 45 80 bar.
- the reaction temperature can be in the range from 0 to 60 ° C, preferably in the range from 0 to 50 ° C. 7
- catalysts containing precious metals which essentially do not release any organic impurities into the aqueous reaction medium during the production of the hydrogen peroxide. If organic compounds were used in the preparation of the catalysts, e.g. B. as a reducing agent or for degreasing the carrier surface, these are removed before use in the process according to the invention to the extent that essentially no organic compounds are released into the reaction medium.
- the catalyst systems comprising the support and active components / promoters are preferably freed of residues of organic constituents by subsequent thermal treatment (calcining). If shaped catalyst bodies are to be used for the process according to the invention, they can be formed simultaneously during the thermal treatment.
- the thermal aftertreatment can take place in an oxidizing, inert or also in a reducing atmosphere.
- the calcination is preferably carried out in an oxidizing atmosphere to remove organic constituents.
- the direct synthesis is preferably carried out in the presence of a noble metal catalyst which comprises at least one platinum group metal, i.e. H. Ru, Rh, Pd, Os, Ir, Pt, or gold.
- Pd and Pt are preferably used.
- the conversion of hydrogen and oxygen takes place on shaped catalyst bodies which contain palladium as the active component.
- Shaped catalyst bodies are to be understood as meaning catalysts in which the catalytically active component is located on the surface of specially shaped supports.
- Such carriers can be conventional fillers, such as Raschig rings, saddle bodies, Pall® rings, wire spirals or wire mesh rings, which are constructed from different materials which are suitable for coating with the active component.
- the packings provided with the catalytically active component are introduced as a loose bed into the reactor used to produce the hydrogen peroxide.
- Preferred moldings have channels with hydraulic 8th
- shaped catalyst bodies which are built into the reactor in the form of ordered packings and which, owing to a large number of throughflow channels, have a large surface area, based on their volume.
- Such shaped articles are referred to below as catalyst monoliths.
- Suitable reactors are described, for example, in EP-A 068 862, EP-A 201 614 and EP-A 448 884.
- the catalyst monoliths are generally made up of woven fabrics, knitted fabrics, foils, expanded metals and / or sheets, in particular of several layers of corrugated, kinked and / or smooth fabric, which are arranged in such a way that adjacent layers form more or less closed channels.
- the catalyst supports are coated with the catalytically active component by customary methods (see below).
- the coating is generally carried out before further processing to the catalyst monolith. However, it can also be carried out on the preformed carrier.
- the catalytically active component can contain further metals, preferably noble metals and in particular platinum, rhodium, iridium, copper, silver and / or gold as promoters.
- the ratio of palladium / promoter metal is preferably in the range from 100: 1 to 1:10 and in particular in the range from 10: 1 to 1: 1.
- the palladium and any promoter metals which are present generally make up 5 ⁇ 10 -4 to 1% by weight and in particular 10 -3 to 0.15% by weight, based on the total catalyst mass (support + active component) .
- stabilizers preferably mineral acids, such as sulfuric acid, phosphoric acid, hydrochloric acid, hydrobromic acid and mixtures thereof can be added to the reaction medium.
- the acid concentration in the reaction medium of the hydrogen peroxide synthesis is generally at least 10 -4 mol / l, preferably 10 -3 to 10 _1 mol / l.
- Traces of bromide or chloride can also be added to the reaction medium in concentrations of 1 to 1000 ppm, preferably 5 to 300 ppm. In the process according to the invention, these stabilizers are used in the purest quality, practically free of organic compounds.
- Suitable materials for reactors for the synthesis process according to the invention are preferably corrosion-resistant steels, e.g. B. Steels with material numbers 1.4571, 1.4439, 1.4539, 1.4462. In general, higher-alloyed, acid-resistant stainless steels and plastics are suitable, which essentially no longer release any organic compounds into the reaction medium.
- These plastics include e.g. B. Per- 5 fluoro-alkoxy polymers, polyvinylidene fluorides, polytetrafluoroethylene and optionally polypropylenes.
- the synthesis plant Before the synthesis plant is put into operation, it is generally cleaned of any organic impurities that may still be present by carefully rinsing it with ultrapure water.
- the concentration of the solutions required by the electronics industry is generally in a range from about 10 to 50% by weight, preferably 20 to 40% by weight, in particular 30 to 40 35% by weight, so that in general both a separation inorganic impurities as well as concentration is required.
- hydrogen peroxide solution which is essentially free of organic compounds, and a concentration in the range of 2 to 20 wt .-% and possibly also inorganic impurities 10, concentrated by distillation to 20 to 70 wt .-%.
- the distillation can be carried out continuously or batchwise, with any non-volatile inorganic impurities which may be present being retained in the bottom and separated off, while water and hydrogen peroxide evaporate.
- concentration and the removal of any volatile inorganic impurities that may still be present can then be carried out by removing a pre-fraction that essentially contains water and any inorganic impurities that may still be present.
- a second, separate distillation step is also suitable. Suitable devices for this second distillation step are distillation columns with a sufficient number of plates, e.g. B. up to 30 separation stages, or evaporators.
- the aqueous hydrogen peroxide solution which is essentially free of organic impurities, is worked up continuously.
- the hydrogen peroxide solution is continuously introduced into an evaporator, generally under reduced pressure.
- a steam is obtained which, in addition to water and hydrogen peroxide, may also contain volatile inorganic compounds. These include e.g. B. hydrogen halides, as may be used for stabilization in the preparation of the hydrogen peroxide solutions. If applicable,
- Non-volatile inorganic compounds under the process conditions are retained in the sump.
- the steam produced is subjected to partial condensation, so that on the one hand a condensate with a higher hydrogen peroxide concentration and on the other hand a steam with a lower concentration is formed.
- the condensation temperature becomes generally chosen so that a 10 to 35% strength by weight solution of hydrogen peroxide is obtained Partial condensation process for working up hydrogen peroxide which still contains organic impurities, for example from the anthraquinone process
- the removal of inorganic impurities and the concentration is carried out by continuous partial evaporation.
- continuous partial evaporation in a first process step essentially water and lighter weight are initially obtained
- this rectification column has a number of plates of at most 30 plates, preferably at most 10 plates.
- the bottom product 5 corresponds holds the concentrated hydrogen peroxide solution, while the separated water is preferably withdrawn at a hydrogen peroxide concentration of less than 1 wt .-% at the column head.
- the rectification is generally carried out at pressures in the range from about 20 to 100 mbar.
- Another object of the invention is the use of the hydrogen peroxide solutions according to the invention with a total organic compound content of at most 100 ppb in the electronics industry, for the treatment of substrates of electronic components, in particular for the treatment of semiconductor components, but also in medicine .
- cleaning solutions containing H 2 S0 4 / H 2 0 2 , NH 4 OH / H 2 0 2 or NH 4 OH / H 2 0 2 / H 2 0 are usually used for the removal of organic compounds, those containing HC1 / H 2 0 2 / H0, for the removal of metallic impurities, and buffered hydrogen fluoride or dilute hydrogen fluoride solutions for removing oxide films.
- These treatments are mainly carried out in the so-called immersion treatment, in which the semiconductor substrate is immersed in the cleaning solution.
- microparticles with a size of 100 nm or smaller or contamination by organic compounds and metal ions negatively affect the properties of the device.
- the microparticles or organic contaminants are deposited on the semiconductor substrate and can e.g. B. cause pattern defects in lithography or an abnormal thickness of the oxide film in oxygen diffusion, or generally lead to widely different diffusion.
- the influence of organic contaminants on the removal of metallic compounds is particularly serious. Due to the organic impurities from the hydrogen peroxide, small amounts of cations can remain on the substrate and thereby reduce the recombination lifetime of the semiconductor.
- the cations were determined by means of ICP-MS (inductive coupling mass spectrometry), the anions by means of ion chromatography. Unless stated otherwise, all chemicals used were used in the quality "for analysis”.
- V4A metal fabric (1.4571) was wound by winding a corrugated and a smooth mesh onto a monolith in the form of a cylinder, which had an outer diameter and a height of 5 cm. The ends of the net were fixed by a few welding spots.
- the monolith was degreased by treatment with acetone and subsequent rinsing with ultrapure water and then dried.
- a solution of 25% by weight of highly pure hydrochloric acid and 75% by weight of ultrapure water it was treated at a temperature of 60 ° C. for 5 minutes, then removed from the acid bath and rinsed several times with ultrapure water in order to remove residues of the acid.
- the degreased and dried monolith was placed in 200 ml of ultrapure water.
- a Pd / Pt-coated V4A network produced according to Example 1, was placed in a 270 ml autoclave with a stirrer, thermostatting 14 and pressure maintenance of 50 bar installed. After deducting the volumes for the stirrer, catalyst and other internals, an effective reactor volume of 208 ml was available. High-purity water was mixed with sulfuric acid, phosphoric acid and hydrobromic acid, so that a reaction medium with a content of 4,000 ppm sulfate, 1,000 ppm phosphate and 120 ppm bromide was formed. This solution was examined for the content of organic compounds (toc content). The solution contained ⁇ 10 ppb toc. A flow of 60.0 g / h of this reaction medium,
- the concentration of the produced hydrogen peroxide solution was 8.9 wt .-%
- the space-time yield, based on the cylinder-shaped, enclosed by the catalyst monolith volume was 60 g hydrogen peroxide l _1 _1 h.
- a metal monolith (1.4539) was wound by winding a corrugated and a smooth mesh onto a monolith in the form of a cylinder, which had an outer diameter and a height of 5 cm. The ends of the net were fixed by a few welding spots.
- the monolith was degreased by treatment with the purest acetone and subsequent rinsing with ultrapure water and then dried.
- a solution of concentrated high-purity hydrochloric acid it was treated at a temperature of 60 ° C for 2 hours, then removed from the acid bath and rinsed several times with ultrapure water to remove the residues of the acid.
- the dried monolith was placed in 350 ml of ultrapure water.
- the high-purity reaction medium according to Example 2 was used. Its organic compound content (toc content) was ⁇ 10 ppb toc.
- a stream of 57.0 g / h of this reaction medium, 291.6 1 / h of oxygen and 32.4 1 / h of hydrogen (gases based on normal conditions) was fed into the reactor from below.
- the product / gas mixture was removed continuously from the reactor cover. At a temperature of 20 ° C and a speed of 1,500 rpm, a conversion of 17% (based on hydrogen) with a selectivity of 84% (based on hydrogen) could be obtained.
- the concentration of the hydrogen peroxide solution produced was 11.1% by weight, the space-time yield, based on the cylindrical volume enclosed by the catalyst monolith, was 78 g of hydrogen peroxide 1 ⁇ h -1 .
- the discharge containing hydrogen peroxide contained less than 10 ppb toc.
- the hydrogen peroxide solution (62 g / h) obtained according to Example 5 was subjected to the continuous evaporation described in Example 3.
- the condensate obtained was 28.9 g / h of a 23.5% by weight hydrogen peroxide solution.
- This hydrogen peroxide solution was examined for the content of organic and inorganic compounds.
- the remaining steam was subjected to a total condensation at 5 ° C. The results of the investigation are shown in Table 2.
- the effective reactor volume was 208 ml.
- High-purity water was mixed with sulfuric acid, phosphoric acid and hydrochloric acid, so that a reaction medium with a content of 4,000 ppm of sulfate, 1,000 ppm of phosphate and 600 ppm of chloride was formed. Its organic compound content (toc content) was ⁇ 10 ppb 5 toc.
- a stream of 264 g / h of this reaction medium, 291.6 1 / h of oxygen and 32.4 1 / h of hydrogen (gases based on normal conditions) was fed into the reactor from below.
- the product / gas mixture was removed continuously from the reactor cover. At a temperature of 21 ° C and a speed of 1 500 rpm one could be used.
- Semiconductor substrates were coated with photoresist to simulate organic contamination and subjected to the usual rinsing and cleaning steps (treatment with H 2 S0 / H 2 0 2 and buffered hydrogen fluoride solution, each interrupted by rinsing phases with ultrapure water).
- a hydrogen peroxide of the usual semiconductor quality with 15 ppm toc was used in the cleaning steps.
- the recombination lifetime of the deficit charge carriers was determined to assess the semiconductor. The recombination lifetime was 60 microseconds and was therefore significantly reduced compared to a pure reference substrate (recombination lifetime 100 microseconds).
- Example 9 Cleaning a semiconductor substrate using hydrogen peroxide according to the invention with a low toc content ( ⁇ 100 ppb)
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Abstract
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Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/673,247 US6592840B1 (en) | 1998-04-21 | 1999-04-19 | Highly pure aqueous hydrogen peroxide solutions, method for producing same and their use |
AU38189/99A AU763221B2 (en) | 1998-04-21 | 1999-04-19 | Highly pure aqueous hydrogen peroxide solutions, method for producing same and their use |
JP2000544602A JP2002512168A (ja) | 1998-04-21 | 1999-04-19 | 高純度精製過酸化水素水溶液、その製法及び使用 |
KR1020007011629A KR20010042857A (ko) | 1998-04-21 | 1999-04-19 | 고순도 과산화수소 수용액과 그 용액의 제조 방법 및 사용방법 |
CA002328952A CA2328952A1 (en) | 1998-04-21 | 1999-04-19 | Highly pure aqueous hydrogen peroxide solutions, method for producing same and their use |
EP99920708A EP1080036A1 (de) | 1998-04-21 | 1999-04-19 | Hochreine wässrige wasserstoffperoxid-lösungen, verfahren zu ihrer herstellung und ihre verwendung |
BR9909820-2A BR9909820A (pt) | 1998-04-21 | 1999-04-19 | Solução aquosa de peróxido de hidrogênio de alta pureza, processo para a preparação da mesma, e, uso da mesma |
NO20005281A NO20005281L (no) | 1998-04-21 | 2000-10-20 | Meget rene vandige hydrogenperoksidopplösninger, fremgangsmåte for fremstilling derav samt anvendelse av opplösningene |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE19817794A DE19817794A1 (de) | 1998-04-21 | 1998-04-21 | Hochreine wässrige Wasserstoffperoxid-Lösungen, Verfahren zu ihrer Herstellung und ihre Verwendung |
DE19817794.1 | 1998-04-21 |
Publications (1)
Publication Number | Publication Date |
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WO1999054254A1 true WO1999054254A1 (de) | 1999-10-28 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/EP1999/002627 WO1999054254A1 (de) | 1998-04-21 | 1999-04-19 | Hochreine wässrige wasserstoffperoxid-lösungen, verfahren zu ihrer herstellung und ihre verwendung |
Country Status (12)
Country | Link |
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US (1) | US6592840B1 (de) |
EP (1) | EP1080036A1 (de) |
JP (1) | JP2002512168A (de) |
KR (1) | KR20010042857A (de) |
CN (1) | CN1306495A (de) |
AU (1) | AU763221B2 (de) |
BR (1) | BR9909820A (de) |
CA (1) | CA2328952A1 (de) |
DE (1) | DE19817794A1 (de) |
NO (1) | NO20005281L (de) |
WO (1) | WO1999054254A1 (de) |
ZA (1) | ZA200007009B (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
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DE10144013A1 (de) * | 2001-09-07 | 2003-03-27 | Basf Ag | Verfahren zur Aufarbeitung einer wässrigen Wasserstoffperoxid-Lösung aus einer Direktsynthese |
US7722847B2 (en) * | 2002-09-30 | 2010-05-25 | Evonik Degussa Gmbh | Aqueous hydrogen peroxide solutions and method of making same |
EP1520839A1 (de) * | 2003-10-02 | 2005-04-06 | SOLVAY (Société Anonyme) | Verfahren zur Gewinnung von wässrigen Peroxidlösungen, nach diesem Verfahren hergestellte Lösungen, sowie ihre Verwendung |
IT1395127B1 (it) * | 2009-07-30 | 2012-09-05 | Saipem Spa | Procedimento per il recupero di ammoniaca da una corrente gassosa |
US8459275B2 (en) * | 2009-09-23 | 2013-06-11 | Ecolab Usa Inc. | In-situ cleaning system |
US8937037B2 (en) | 2011-03-02 | 2015-01-20 | Ecolab Usa Inc. | Electrochemical enhancement of detergent alkalinity |
CN109205572B (zh) * | 2017-06-30 | 2021-03-05 | 中国石油化工股份有限公司 | 一种纯化双氧水的方法 |
CN107482081B (zh) * | 2017-07-20 | 2020-06-12 | 东莞南玻光伏科技有限公司 | 太阳能电池片及其制备方法和太阳能电池 |
CN113620255B (zh) * | 2021-08-18 | 2022-09-20 | 华中科技大学 | 一种光催化***及其应用 |
EP4163252A1 (de) * | 2021-10-06 | 2023-04-12 | Solvay SA | Verfahren zur reinigung einer wässrigen wasserstoffperoxidlösung |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0132294A1 (de) * | 1983-06-22 | 1985-01-30 | E.I. Du Pont De Nemours And Company | Verfahren zur katalytischen Herstellung von Wasserstoffperoxid aus Sauerstoff und Wasserstoff |
US4999179A (en) * | 1988-12-26 | 1991-03-12 | Mitsubishi Gas Chemical Company, Inc. | Method for purifying impure aqueous hydrogen peroxide solution |
US5496532A (en) * | 1992-11-20 | 1996-03-05 | Showa Denko K. K. | Process for producing hydrogen peroxide |
JPH0975605A (ja) * | 1995-09-20 | 1997-03-25 | Mitsubishi Gas Chem Co Inc | 過酸化水素水溶液中の有機不純物の除去方法 |
US5621847A (en) * | 1995-05-25 | 1997-04-15 | Texas Instruments Incorporation | Dynamic vacuum evaporation system |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3152052A (en) | 1961-08-04 | 1964-10-06 | Fmc Corp | Distillation of hydrogen peroxide |
JPS514097A (en) * | 1974-07-02 | 1976-01-13 | Tokuyama Soda Kk | Kasankasuisono seizohoho |
CA1146148A (en) | 1981-06-30 | 1983-05-10 | James Den Hartog | Ordered bed packing module |
US4471014A (en) | 1981-06-30 | 1984-09-11 | Atomic Energy Of Canada Limited | Ordered bed packing module |
EP0201614B1 (de) | 1985-05-14 | 1989-12-27 | GebràDer Sulzer Aktiengesellschaft | Reaktor zum Durchführen von heterogenen, katalysierten chemischen Reaktionen |
JPH0672740B2 (ja) | 1989-01-20 | 1994-09-14 | ル・エール・リクイツド・ソシエテ・アノニム・プール・ル・エチユド・エ・ル・エクスプルワテション・デ・プロセデ・ジエオルジエ・クロード | 空気分離及び超高純度酸素製造方法並びに装置 |
US5112702A (en) * | 1990-03-19 | 1992-05-12 | E. I. Du Pont De Nemours And Company | Electrochemical synthesis of H2 O2 |
DE69019731T2 (de) | 1990-03-30 | 1996-01-18 | Koch Eng Co Inc | Struktur und Verfahren zum katalytischen Reagieren von Fluidströmen in einem Stoffaustauschapparat. |
BE1005198A3 (fr) | 1991-08-27 | 1993-05-25 | Solvay Interox | Procede pour l'obtention de solutions aqueuses epurees de peroxyde d'hydrogene. |
IT1270875B (it) * | 1993-04-29 | 1997-05-13 | Getters Spa | Procedimento di purificazione dell'idrogeno e purificatore relativo |
DE4240370C1 (de) | 1992-12-01 | 1994-05-11 | Degussa | Verfahren zur Verringerung des Kohlenstoffgehalts wäßriger Wasserstoffperoxidlösungen |
US5395522A (en) * | 1993-02-23 | 1995-03-07 | Anatel Corporation | Apparatus for removal of organic material from water |
TW305821B (de) | 1993-09-13 | 1997-05-21 | Mitsubishi Gas Chemical Co | |
FI97538C (fi) | 1995-02-15 | 1997-01-10 | Kemira Chemicals Oy | Menetelmä vetyperoksidin oleellisesti puhtaan vesiliuoksen valmistamiseksi |
JP2002514968A (ja) * | 1995-06-05 | 2002-05-21 | スターテック・ベンチャーズ・インコーポレーテッド | 半導体プロセス用超高純度過酸化水素のオンサイト生成 |
US5528906A (en) * | 1995-06-26 | 1996-06-25 | The Boc Group, Inc. | Method and apparatus for producing ultra-high purity oxygen |
JPH09100106A (ja) | 1995-10-02 | 1997-04-15 | Mitsubishi Gas Chem Co Inc | 過酸化水素中の有機質不純物除去方法 |
JP3715371B2 (ja) * | 1996-04-08 | 2005-11-09 | 三菱化学株式会社 | 過酸化水素水の精製方法 |
JPH09278416A (ja) | 1996-04-15 | 1997-10-28 | Mitsubishi Gas Chem Co Inc | 高純度過酸化水素水溶液の製造法 |
JPH09278417A (ja) | 1996-04-15 | 1997-10-28 | Mitsubishi Gas Chem Co Inc | 高純度過酸化水素水溶液の製造法 |
US5682763A (en) | 1996-10-25 | 1997-11-04 | Air Products And Chemicals, Inc. | Ultra high purity oxygen distillation unit integrated with ultra high purity nitrogen purifier |
-
1998
- 1998-04-21 DE DE19817794A patent/DE19817794A1/de not_active Withdrawn
-
1999
- 1999-04-19 JP JP2000544602A patent/JP2002512168A/ja not_active Withdrawn
- 1999-04-19 CN CN99807654A patent/CN1306495A/zh active Pending
- 1999-04-19 EP EP99920708A patent/EP1080036A1/de not_active Withdrawn
- 1999-04-19 BR BR9909820-2A patent/BR9909820A/pt not_active Application Discontinuation
- 1999-04-19 WO PCT/EP1999/002627 patent/WO1999054254A1/de not_active Application Discontinuation
- 1999-04-19 KR KR1020007011629A patent/KR20010042857A/ko not_active Application Discontinuation
- 1999-04-19 CA CA002328952A patent/CA2328952A1/en not_active Abandoned
- 1999-04-19 US US09/673,247 patent/US6592840B1/en not_active Expired - Fee Related
- 1999-04-19 AU AU38189/99A patent/AU763221B2/en not_active Ceased
-
2000
- 2000-10-20 NO NO20005281A patent/NO20005281L/no not_active Application Discontinuation
- 2000-11-29 ZA ZA200007009A patent/ZA200007009B/en unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0132294A1 (de) * | 1983-06-22 | 1985-01-30 | E.I. Du Pont De Nemours And Company | Verfahren zur katalytischen Herstellung von Wasserstoffperoxid aus Sauerstoff und Wasserstoff |
US4999179A (en) * | 1988-12-26 | 1991-03-12 | Mitsubishi Gas Chemical Company, Inc. | Method for purifying impure aqueous hydrogen peroxide solution |
US5496532A (en) * | 1992-11-20 | 1996-03-05 | Showa Denko K. K. | Process for producing hydrogen peroxide |
US5621847A (en) * | 1995-05-25 | 1997-04-15 | Texas Instruments Incorporation | Dynamic vacuum evaporation system |
JPH0975605A (ja) * | 1995-09-20 | 1997-03-25 | Mitsubishi Gas Chem Co Inc | 過酸化水素水溶液中の有機不純物の除去方法 |
Non-Patent Citations (4)
Title |
---|
CHEMICAL ABSTRACTS, vol. 118, no. 8, 1993, Columbus, Ohio, US; abstract no. 71097, KIMURA, K.; OGATA, Y.; TANAKA, F.; IMAOKA, T.; TAKANO, J.; ISAGAWA, T.;: "Study on an influence of TOC in hydrogen peroxide for advanced" XP002111344 * |
DATABASE WPI Section Ch Week 9722, Derwent World Patents Index; Class E36, AN 97-239755, XP002111345 * |
KIMURA, K.; OGATA, Y.; TANAKA, F.; IMAOKA, T.; TAKANO, J.; ISAGAWA, T.;: "Study on an influence of ***TOC*** in hydrogen peroxide for advanced", PROC. - ELECTROCHEM. SOC. (1992), 92-21(CONTAM. CONTROL DEFECT REDUCT., vol. 92-21, 1992, pages 347 - 360 * |
KOGURE, M.; FUTATSUKI, T.; TAKANO, J.; ISAGAWA, T.; KIMURA, K.; OGATA, Y.;: "Influence of organic impurities in hydrogen peroxide for advanced wet chemical processing", J. ELECTROCHEM. SOC., vol. 140, no. 11, 1993, pages 3321 - 3326, XP002111342 * |
Also Published As
Publication number | Publication date |
---|---|
CA2328952A1 (en) | 1999-10-28 |
BR9909820A (pt) | 2000-12-19 |
ZA200007009B (en) | 2004-11-17 |
NO20005281D0 (no) | 2000-10-20 |
JP2002512168A (ja) | 2002-04-23 |
US6592840B1 (en) | 2003-07-15 |
AU763221B2 (en) | 2003-07-17 |
DE19817794A1 (de) | 1999-10-28 |
AU3818999A (en) | 1999-11-08 |
CN1306495A (zh) | 2001-08-01 |
KR20010042857A (ko) | 2001-05-25 |
EP1080036A1 (de) | 2001-03-07 |
NO20005281L (no) | 2000-11-13 |
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