USD826300S1 - Rotably mounted thermal plasma burner for thermalspraying - Google Patents

Rotably mounted thermal plasma burner for thermalspraying Download PDF

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Publication number
USD826300S1
USD826300S1 US35/355,031 US35503131F USD826300S US D826300 S1 USD826300 S1 US D826300S1 US 35503131 F US35503131 F US 35503131F US D826300 S USD826300 S US D826300S
Authority
US
United States
Prior art keywords
thermalspraying
thermal plasma
plasma burner
rotably mounted
mounted thermal
Prior art date
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Active
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US35/355,031
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Inventor
Alexander Michla
Martin Stockli
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Metco AG
Original Assignee
Oerlikon Metco Ag, Wohlen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Metco Ag, Wohlen filed Critical Oerlikon Metco Ag, Wohlen
Priority to US35/355,031 priority Critical patent/USD826300S1/en
Application granted granted Critical
Publication of USD826300S1 publication Critical patent/USD826300S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21DWORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21D31/00Other methods for working sheet metal, metal tubes, metal profiles

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)

Description

1. Rotably mounted thermal plasma burner for thermal spraying
1.1 : Top
1.2 : Perspective
1.3 : Front
1.4 : Right
1.5 : Back
1.6 : Left
1.7 : Bottom

Claims (1)

    CLAIM
  1. The ornamental design for a rotably mounted thermal plasma burner for thermal spraying, as shown and described.
US35/355,031 2016-09-30 2016-09-30 Rotably mounted thermal plasma burner for thermalspraying Active USD826300S1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US35/355,031 USD826300S1 (en) 2016-09-30 2016-09-30 Rotably mounted thermal plasma burner for thermalspraying

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US35/355,031 USD826300S1 (en) 2016-09-30 2016-09-30 Rotably mounted thermal plasma burner for thermalspraying

Publications (1)

Publication Number Publication Date
USD826300S1 true USD826300S1 (en) 2018-08-21

Family

ID=63144488

Family Applications (1)

Application Number Title Priority Date Filing Date
US35/355,031 Active USD826300S1 (en) 2016-09-30 2016-09-30 Rotably mounted thermal plasma burner for thermalspraying

Country Status (1)

Country Link
US (1) USD826300S1 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD849228S1 (en) * 2017-12-19 2019-05-21 Systems Spray-Cooled, Inc Burner bump out
USD849227S1 (en) * 2017-12-12 2019-05-21 Systems Spray-Cooled, Inc. Burner bump out
USD851237S1 (en) * 2017-11-01 2019-06-11 Systems Spray-Cooled, Inc Watertight sidewall dustcover
USD851743S1 (en) * 2017-12-19 2019-06-18 Systems Spray-Cooled, Inc Burner bump out

Citations (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4345744A (en) * 1980-05-11 1982-08-24 Trumpf Gmbh & Co. Working machine with flame cutter and cooling unit
US4392927A (en) * 1981-02-21 1983-07-12 Heraeus Elektroden Gmbh Novel electrode
US4423546A (en) * 1981-09-04 1984-01-03 W. A. Whitney Corp. Punch press with automatic tool changer
USD275016S (en) * 1982-03-17 1984-08-07 Mototsugu Matsuo Apparatus for cutting by melting
US4486941A (en) * 1981-09-04 1984-12-11 W. A. Whitney Corp. Punch press with automatic tool changer
US5273957A (en) * 1990-12-04 1993-12-28 Hoechst Aktiengesellschaft Thermally sprayed lead-containing thick layers
USD490450S1 (en) * 2002-05-20 2004-05-25 Tokyo Electron Limited Exhaust ring for semiconductor equipment
USD505963S1 (en) * 2004-01-16 2005-06-07 Thermal Dynamics Corporation Electrode for a plasma arc torch
USD519135S1 (en) * 2004-01-16 2006-04-18 Thermal Dynamics Corporation Tip for a plasma arc torch
US7211177B2 (en) * 2002-01-03 2007-05-01 Bayer Aktiengesellschaft Electrode for electrolysis in acidic media
USD571383S1 (en) * 2005-07-29 2008-06-17 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
USD571831S1 (en) * 2005-07-29 2008-06-24 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
USD571832S1 (en) * 2005-07-29 2008-06-24 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
USD571833S1 (en) * 2005-07-29 2008-06-24 Tokyo Electron Limited Top panel for microwave introduction window of plasma processing apparatus
USD572733S1 (en) * 2005-07-29 2008-07-08 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
USD582949S1 (en) * 2006-12-15 2008-12-16 Tokyo Electron Limited Cover for a heater stage of a plasma processing apparatus
USD583395S1 (en) * 2006-12-15 2008-12-23 Tokyo Electron Limited Cover for a heater stage of a plasma processing apparatus
USD583394S1 (en) * 2006-12-15 2008-12-23 Tokyo Electron Limited Cover for a heater stage of a plasma processing apparatus
USD593585S1 (en) * 2005-07-29 2009-06-02 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
USD594485S1 (en) * 2005-07-29 2009-06-16 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
US7578451B2 (en) * 2005-02-11 2009-08-25 Sulzer Metco Ag Apparatus for thermal spraying
US7892609B2 (en) * 2004-11-02 2011-02-22 Sulzer Metco Ag Thermal spraying apparatus and also a thermal spraying process
USD645486S1 (en) * 2010-03-31 2011-09-20 Tokyo Electron Limited Dielectric window for plasma processing device
USD658692S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658691S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658693S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD672377S1 (en) * 2010-03-31 2012-12-11 Tokyo Electron Limited Dielectric window for plasma processing device
USD694790S1 (en) * 2011-09-20 2013-12-03 Tokyo Electron Limited Baffle plate for manufacturing semiconductor
USD694791S1 (en) * 2011-09-20 2013-12-03 Tokyo Electron Limited Baffle plate for manufacturing semiconductor
US8871010B2 (en) * 2011-03-23 2014-10-28 Malko Gindrat Plasma spray method for the manufacture of an ion conductive membrane
USD721110S1 (en) * 2012-05-10 2015-01-13 Robert F. Savill, Jr. Plasma gun
USD721749S1 (en) * 2012-05-10 2015-01-27 Robert F. Savill, Jr. Plasma gun
USD775249S1 (en) * 2015-04-01 2016-12-27 Koike Sanso Kogyo Co., Ltd. Inner nozzle for plasma torch
USD776177S1 (en) * 2015-10-13 2017-01-10 Lincoln Global, Inc. Air cooled plasma torch electrode
USD776730S1 (en) * 2015-01-30 2017-01-17 Komatsu Ltd. Plasma torch cartridge
USD776731S1 (en) * 2015-01-30 2017-01-17 Komatsu Ltd. Plasma torch cartridge
USD777812S1 (en) * 2015-10-13 2017-01-31 Lincoln Global, Inc. Liquid cooled plasma torch electrode
USD784432S1 (en) * 2015-01-30 2017-04-18 Komatsu Ltd. Plasma torch electrode
USD796562S1 (en) * 2016-04-11 2017-09-05 Applied Materials, Inc. Plasma outlet liner
USD802034S1 (en) * 2015-01-30 2017-11-07 Komatsu Ltd. Plasma torch electrode
USD804436S1 (en) * 2015-06-12 2017-12-05 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus
USD812578S1 (en) * 2016-02-26 2018-03-13 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus

Patent Citations (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4345744A (en) * 1980-05-11 1982-08-24 Trumpf Gmbh & Co. Working machine with flame cutter and cooling unit
US4392927A (en) * 1981-02-21 1983-07-12 Heraeus Elektroden Gmbh Novel electrode
US4423546A (en) * 1981-09-04 1984-01-03 W. A. Whitney Corp. Punch press with automatic tool changer
US4486941A (en) * 1981-09-04 1984-12-11 W. A. Whitney Corp. Punch press with automatic tool changer
USD275016S (en) * 1982-03-17 1984-08-07 Mototsugu Matsuo Apparatus for cutting by melting
US5273957A (en) * 1990-12-04 1993-12-28 Hoechst Aktiengesellschaft Thermally sprayed lead-containing thick layers
US7211177B2 (en) * 2002-01-03 2007-05-01 Bayer Aktiengesellschaft Electrode for electrolysis in acidic media
USD490450S1 (en) * 2002-05-20 2004-05-25 Tokyo Electron Limited Exhaust ring for semiconductor equipment
USD505963S1 (en) * 2004-01-16 2005-06-07 Thermal Dynamics Corporation Electrode for a plasma arc torch
USD519135S1 (en) * 2004-01-16 2006-04-18 Thermal Dynamics Corporation Tip for a plasma arc torch
US7892609B2 (en) * 2004-11-02 2011-02-22 Sulzer Metco Ag Thermal spraying apparatus and also a thermal spraying process
US7578451B2 (en) * 2005-02-11 2009-08-25 Sulzer Metco Ag Apparatus for thermal spraying
USD571383S1 (en) * 2005-07-29 2008-06-17 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
USD594485S1 (en) * 2005-07-29 2009-06-16 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
USD572733S1 (en) * 2005-07-29 2008-07-08 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
USD571833S1 (en) * 2005-07-29 2008-06-24 Tokyo Electron Limited Top panel for microwave introduction window of plasma processing apparatus
USD571831S1 (en) * 2005-07-29 2008-06-24 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
USD571832S1 (en) * 2005-07-29 2008-06-24 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
USD593585S1 (en) * 2005-07-29 2009-06-02 Tokyo Electron Limited Top panel for microwave introduction window of a plasma processing apparatus
USD583395S1 (en) * 2006-12-15 2008-12-23 Tokyo Electron Limited Cover for a heater stage of a plasma processing apparatus
USD583394S1 (en) * 2006-12-15 2008-12-23 Tokyo Electron Limited Cover for a heater stage of a plasma processing apparatus
USD582949S1 (en) * 2006-12-15 2008-12-16 Tokyo Electron Limited Cover for a heater stage of a plasma processing apparatus
USD645486S1 (en) * 2010-03-31 2011-09-20 Tokyo Electron Limited Dielectric window for plasma processing device
USD672377S1 (en) * 2010-03-31 2012-12-11 Tokyo Electron Limited Dielectric window for plasma processing device
US8871010B2 (en) * 2011-03-23 2014-10-28 Malko Gindrat Plasma spray method for the manufacture of an ion conductive membrane
USD658692S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658691S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658693S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD694790S1 (en) * 2011-09-20 2013-12-03 Tokyo Electron Limited Baffle plate for manufacturing semiconductor
USD694791S1 (en) * 2011-09-20 2013-12-03 Tokyo Electron Limited Baffle plate for manufacturing semiconductor
USD721110S1 (en) * 2012-05-10 2015-01-13 Robert F. Savill, Jr. Plasma gun
USD721749S1 (en) * 2012-05-10 2015-01-27 Robert F. Savill, Jr. Plasma gun
USD784432S1 (en) * 2015-01-30 2017-04-18 Komatsu Ltd. Plasma torch electrode
USD802034S1 (en) * 2015-01-30 2017-11-07 Komatsu Ltd. Plasma torch electrode
USD776730S1 (en) * 2015-01-30 2017-01-17 Komatsu Ltd. Plasma torch cartridge
USD776731S1 (en) * 2015-01-30 2017-01-17 Komatsu Ltd. Plasma torch cartridge
USD775249S1 (en) * 2015-04-01 2016-12-27 Koike Sanso Kogyo Co., Ltd. Inner nozzle for plasma torch
USD804436S1 (en) * 2015-06-12 2017-12-05 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus
USD777812S1 (en) * 2015-10-13 2017-01-31 Lincoln Global, Inc. Liquid cooled plasma torch electrode
USD776177S1 (en) * 2015-10-13 2017-01-10 Lincoln Global, Inc. Air cooled plasma torch electrode
USD812578S1 (en) * 2016-02-26 2018-03-13 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus
USD796562S1 (en) * 2016-04-11 2017-09-05 Applied Materials, Inc. Plasma outlet liner

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD851237S1 (en) * 2017-11-01 2019-06-11 Systems Spray-Cooled, Inc Watertight sidewall dustcover
USD849227S1 (en) * 2017-12-12 2019-05-21 Systems Spray-Cooled, Inc. Burner bump out
USD849228S1 (en) * 2017-12-19 2019-05-21 Systems Spray-Cooled, Inc Burner bump out
USD851743S1 (en) * 2017-12-19 2019-06-18 Systems Spray-Cooled, Inc Burner bump out

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