US6731431B2 - Optical unit having plural optical elements - Google Patents

Optical unit having plural optical elements Download PDF

Info

Publication number
US6731431B2
US6731431B2 US09/411,632 US41163299A US6731431B2 US 6731431 B2 US6731431 B2 US 6731431B2 US 41163299 A US41163299 A US 41163299A US 6731431 B2 US6731431 B2 US 6731431B2
Authority
US
United States
Prior art keywords
protrusion
recess
diffractive optical
optical element
diffraction grating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
US09/411,632
Other languages
English (en)
Other versions
US20030043462A1 (en
Inventor
Yoshiyuki Sekine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Assigned to CANON KABUSHIKI KAISHA reassignment CANON KABUSHIKI KAISHA ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SEKINE, YOSHIYUKI
Publication of US20030043462A1 publication Critical patent/US20030043462A1/en
Application granted granted Critical
Publication of US6731431B2 publication Critical patent/US6731431B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/08—Simple or compound lenses with non-spherical faces with discontinuous faces, e.g. Fresnel lens
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/021—Mountings, adjusting means, or light-tight connections, for optical elements for lenses for more than one lens
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Definitions

  • This invention relates to an optical unit having an optical element such as a diffractive optical element, for example, and, more particularly, to an optical unit suitably usable in manufacture of a microdevice such as an IC or LSI, for example.
  • a plurality of optical elements each being such as a diffraction element (diffractive optical element) to be used for correction of chromatic aberration, for example, are used in an exposure apparatus.
  • the optical performance may be deteriorated unless they are relatively positioned with good precision.
  • an optical unit comprising: a first optical element; and a second optical element; wherein said first optical element has a protrusion while said second optical element has a recess; and wherein the relative alignment between said first and second optical elements is accomplished by engagement of the protrusion and the recess.
  • Each of the first and second optical elements may comprise a diffractive element for diffracting a light ray incident thereon, at a predetermined deflection angle.
  • the diffractive element may comprise a diffraction grating (binary grating) having a step-like shape along an optical axis direction or a diffraction grating of Kinoform shape.
  • an optical unit comprising: a first diffractive element; and a second diffractive element; wherein said first diffractive element has a protrusion while said second diffractive element has a recess; wherein the relative alignment between said first and second diffractive elements is accomplished by engagement of the protrusion and the recess; and wherein each of said first and second diffractive elements comprises a diffraction grating having a step-like shape along an optical axis direction or a diffraction grating of blazed shape.
  • the protrusion and the recess are formed at diffraction grating surfaces of said first and second diffractive elements.
  • the protrusion and the recess may be formed outside diffraction grating surfaces of said first and second diffractive elements.
  • the protrusion and the recess may be formed at centers of said first and second diffractive elements, respectively.
  • the first and second diffractive elements may have a plurality of protrusions and a plurality of recesses formed at positions corresponding to the protrusions.
  • the first and second optical elements may be bonded with each other with a predetermined spacing maintained therebetween, wherein, with respect to the spacing, the difference between an optical path length of a light ray passing through the protrusion and an optical path length of a light ray passing through a portion other than the protrusion may correspond to a multiple, by an integral number, of the wavelength of the light ray.
  • the first and second diffractive elements may be made of different mediums, wherein a space may be defined between a free end of the protrusion and a bottom of the recess, and wherein an optical path length as defined by a structure of the space, the protrusion and the recess may correspond to a multiple, by an integral number, of the wavelength of a light ray passing therethrough.
  • a method of manufacturing an optical unit comprising the steps of: selectively removing a predetermined region on a first substrate to produce a step-like shape on the surface of the first substrate, while forming at least one recess upon the surface thereof; selectively removing a predetermined region on a second substrate to produce a step-like shape on the surface of the second substrate, while forming a protrusion upon the surface thereof; and engaging the recess and the protrusion so as to relatively position the first and second substrates, and adhering the first and second substrates with each other.
  • the first and second substrates are made of different mediums, wherein the height of the protrusion is smaller than the depth of the recess.
  • an optical system which comprises an optical unit as recited above, and a lens.
  • an exposure apparatus having an optical system as above, for projecting and printing a mask pattern onto a surface to be exposed.
  • a device manufacturing method comprising the steps of: exposing a workpiece having a photosensitive material applied thereto, with a device pattern and by use of an exposure apparatus as recited above; and developing the exposed workpiece.
  • FIG. 1 is a schematic view of a general structure of a stepper according to a first embodiment of the present invention.
  • FIG. 2 is a schematic and sectional view of a portion of a reduction optical system according to the first embodiment of the present invention.
  • FIG. 3 is an exploded and perspective view of an optical unit according to the first embodiment of the present invention.
  • FIGS. 4A and 4B are schematic and sectional views of an optical unit according to the first embodiment of the present invention.
  • FIG. 5 is a sectional view for explaining an engagement portion of diffractive optical elements, constituting an optical unit according to the first embodiment of the present invention.
  • FIG. 6 is a schematic and sectional view for explaining details of a diffractive optical element according to the first embodiment of the present invention.
  • FIG. 7 is a schematic and sectional view of another example of an optical unit according to the first embodiment of the present invention.
  • FIG. 8 is an exploded and perspective view of an optical unit according to a second embodiment of the present invention.
  • FIGS. 9A and 9B are schematic and sectional views of an optical unit according to the second embodiment of the present invention.
  • FIG. 10 is a sectional view of an engagement portion of diffractive optical elements, constituting an optical unit according to the second embodiment of the present invention.
  • FIG. 11 is a schematic and sectional view of an optical unit according to a third embodiment of the present invention.
  • FIG. 12 is a flow chart of semiconductor device manufacturing processes using a stepper according to an embodiment of the present invention.
  • FIG. 13 is a flow chart for explaining details of a wafer process included in the procedure of FIG. 12 .
  • FIG. 14 is a schematic and sectional view of a television camera according to an embodiment of the present invention.
  • FIG. 1 is a schematic view of a general structure of a stepper (reduction projection exposure apparatus) having an optical unit according to a first embodiment of the present invention.
  • FIG. 2 is a schematic and sectional view of a portion of a projection optical system in the stepper of FIG. 1 .
  • FIG. 3 is an exploded and perspective view of an optical unit in the optical system of FIG. 2 .
  • FIGS. 4A and 4B are schematic and sectional views of the optical unit in the optical system of FIG. 2, in a section containing the optical axis.
  • FIG. 1 is a schematic view which shows a major structure of the stepper of the first embodiment.
  • the stepper comprises an illumination optical system 10 for projecting an illumination light to a reticle 11 having a circuit pattern formed thereon, and a projection optical system 12 for projecting the pattern of the reticle 11 onto the surface of a wafer 13 in a reduced scale, by use of the light passing through the reticle 11 .
  • the stepper further comprises a wafer chuck 14 on which the wafer 13 is placed and held fixed, and a wafer stage 15 on which the wafer chuck 14 is fixedly mounted.
  • the optical system described above comprises a light source 1 for emitting illumination light of short-wavelength, such as ultraviolet light or deep ultraviolet light (in this embodiment, high-luminance ArF excimer laser light), and beam shape changing means 2 for transforming the illumination light from the light source 1 into a desired beam shape. It further comprises an optical integrator 3 having a plurality of cylindrical lenses or small lenses disposed two-dimensionally, and a stop member 4 having interchangeable stops which can be selectively interchanged by using interchanging means (not shown), and being disposed adjacent to the position of secondary light sources as produced by the optical integrator 3 .
  • illumination light of short-wavelength such as ultraviolet light or deep ultraviolet light (in this embodiment, high-luminance ArF excimer laser light)
  • beam shape changing means 2 for transforming the illumination light from the light source 1 into a desired beam shape.
  • It further comprises an optical integrator 3 having a plurality of cylindrical lenses or small lenses disposed two-dimensionally, and a stop member 4 having interchangeable stops which can be selectively interchanged by using interchanging means
  • the optical system further comprises a condenser lens 5 for collecting the illumination light passed through the stop member 4 , and a blind 7 having four movable blades, for example, and being disposed at a conjugate plane of the reticle 11 to determine a desired illumination range on the reticle 11 surface. It further comprises an imaging lens 8 for projecting the illumination light having been determined by the blind 7 into a predetermined shape, and a deflection mirror 9 for reflecting the illumination light, from the imaging lens 9 , toward the reticle 11 direction.
  • the illumination light emitted from the light source 1 is transformed by the beam shape changing means 2 into a predetermined shape and, after this, it is projected onto the optical integrator 3 .
  • a plurality of secondary light sources are produced adjacent to the light exit surface of the integrator.
  • the illumination light from these secondary light sources pass through the stop member 4 and are collected by the condenser lens 5 .
  • the light is transmitted through the imaging lens 8 and is reflected by the deflection mirror 9 .
  • the light passes the pattern of the reticle 11 and it enters the projection optical system 12 .
  • the light passes through the projection optical system 12 , by which the reticle pattern is projected upon the surface of the wafer 11 while being reduced to a predetermined size. The wafer exposure is thus performed.
  • FIG. 2 is a sectional view of a portion of the projection optical system 12 of FIG. 1 .
  • the optical unit 22 comprises a unit having a function equivalent to a combination of plural lenses, and it serves to reduce aberration of the projection optical system 12 , particularly, chromatic aberration thereof.
  • FIG. 3 is an exploded perspective view of the optical unit 22 .
  • the optical unit 22 comprises a first diffractive optical element 25 and a second diffractive optical element 26 .
  • a diffraction grating surface 25 b or 26 b is formed.
  • the first and second diffractive optical elements are disposed so that their diffraction grating surfaces 25 a and 26 a face each other.
  • Each of the first and second diffractive optical elements 25 and 26 comprises a binary type optical element with a diffraction grating surface 25 b or 26 b which can be produced by forming small surface steps (level differences) upon a raw material substrate, mainly containing quartz. Through the function of these small surface steps, the diffractive optical element operates to diffract a light beam incident thereon, at a desired deflection angle.
  • the first and second diffractive optical elements 25 and 26 can be produced by microprocessing a raw material substrate, mainly consisting of quartz, on the basis of a photolithographic process and a dry etching process, used in the semiconductor manufacturing procedure. It is formed into such shape that an idealistic element shape (blazed shape or Kinoform) as depicted by broken lines in FIG. 6 is approximated by a step-like shape.
  • an idealistic element shape blazed shape or Kinoform
  • the height (level difference) of each individual step in the step-like section is about 40-60 nm.
  • a diffraction pattern on the diffraction grating surface 25 b or 26 b can be produced by patterning the surface of a disk-like substrate on the basis of photolithography and dry etching.
  • a number of patterning operations corresponding to the number of surface steps are necessary.
  • two patterning operations are necessary.
  • the element surface may be divided concentrically into plural zones, and two patterning operations may be performed with respect to each of the zones.
  • FIGS. 4E and 4D are sectional views of the first and second diffractive optical elements 25 and 26 , along a section containing an optical axis.
  • the optical unit of the first embodiment comprises first and second diffractive optical elements 25 ands 26 (FIG. 4A) which are bonded with each other with their diffraction grating surfaces 25 a and 26 a opposed to each other (FIG. 4 B).
  • the function of the optical unit 22 can be divided into those of the diffraction grating surfaces 25 b and 26 b of the first and second diffractive optical elements 25 and 26 . Therefore, the pitches of the diffraction grating surfaces 25 b and 26 b can be made relatively coarse and, thus, their shape can be simplified. This enables a reduction in the number of etching operations required, for example, and it accomplishes simplification of the manufacturing procedure.
  • FIGS. 3, 4 A and 4 B there is a recess 25 a formed on the diffraction grating surface 25 b of the first diffractive optical element 25 at the central optical axis position, and also there is a protrusion 26 a formed on the diffraction grating surface 26 b of the second diffractive optical element 26 at the central optical axis position.
  • the recess 25 a and protrusion 26 a are formed with a width (diameter) of about 10 microns. Also, they are so formed that the depth of the recess 25 a and the height (protruded quantity) of the protrusion 26 a are equal to each other.
  • FIG. 5 is a sectional view, illustrating in enlargement the state of engagement between the recess 25 a and the protrusion 26 a .
  • the diffraction grating surfaces 25 b and 26 b of the first and second diffractive optical elements 25 and 26 are each formed revolutionally symmetrically with respect to the optical axis. Therefore, with the provision of the recess 25 a and the protrusion 26 a each at a single location on the optical axis position, the positioning with respect to a direction perpendicular to the optical axis can be effected stably.
  • the first and second diffractive optical elements 25 and 26 are made of the same medium having the same refractive index.
  • the depth of the recess 25 a and the height of the protrusion 26 a equal to each other, when the recess 25 a and the protrusion 26 a are engaged as shown in FIG. 5, the bottom 25 c of the recess 25 a contacts the top face 26 c of the protrusion 26 a .
  • the recess 25 a and the protrusion 26 b can be made into a completely integral structure of the same medium.
  • the recess 25 a and the protrusion 26 a are formed in a very small shape of a width of about 10 microns, substantially no adverse influence is applied to light rays passing through this portion of the diffractive optical element.
  • the recess 25 a and the protrusion 26 a can be formed simultaneously with the formation of the diffraction grating surfaces 25 b and 26 b . Therefore, the relative position between the diffraction pattern on the diffraction grating surface 25 b or 26 b and the recess 25 a or the protrusion 26 a can be determined with very high precision.
  • the recess 25 a and the protrusion 26 a can be formed simultaneously with the diffraction grating surfaces 25 b and 26 b , there is no necessity of adding a specific process or processes for forming them.
  • the protrusion 25 a may be formed by deposition, for example, an ordinary CVD (Chemical Vapor Deposition) process used in the semiconductor device manufacturing processes.
  • an adhesive agent may be applied to peripheral portions 25 d and 26 d , for example, and they are bonded with each other. By this bonding, they are connected into an integral structure.
  • the surface precision of the surfaces at the peripheral portions 25 d and 26 d of the first and second diffractive optical elements 25 and 26 may be refined, and then they are brought into intimate contact with each other. Thus, they can be bonded to each other through optical contact.
  • the recess 25 a and the protrusion 26 a are formed at the centers or optical axis positions on the first and second diffractive optical elements 25 and 26 , respectively, as described above, they may he used as a reference for alignment or registration with respect to the apparatus, during a process wherein the diffraction grating surfaces 25 b and 26 b are to be formed upon the first and second diffractive optical elements 25 and 26 or during any other process.
  • the depth of the recess 25 a may be set to be equal to a multiple, by an integral number, of the wavelength ⁇ of light passing through the optical unit 22 .
  • the optical unit 22 is formed of first and second diffractive optical elements 25 and 26 , and, when they are bonded to each other, the recess 25 a formed on the first diffractive optical element 25 and the protrusion 26 a formed on the second diffractive optical element 26 are engaged with each other to complete their positioning.
  • any relative positional deviation between the first and second diffractive optical elements 25 and 26 in a direction perpendicular to the optical axis can be prevented. Therefore, any deterioration of the optical performance when they are bonded with each other into an integral optical unit 22 can be kept to a minimum.
  • an optical unit having a desired performance can be accomplished.
  • the function of the optical unit 22 can be divided into those of the diffraction grating surfaces 25 b and 26 b of the first and second diffractive optical elements 25 and 26 . Therefore, the pitches of the diffraction grating surfaces 25 b and 26 b can be made relatively coarse and, thus, their shape can be simplified. This enables a reduction in the number of etching operations required, for example, and accomplishes simplification of the manufacturing procedure.
  • the recess 25 a and the protrusion 26 a can be formed simultaneously with the process for forming the diffraction grating surfaces 25 b and 26 b , they can be produced together with the diffraction patterns of the diffraction grating surfaces 25 b and 26 b without complicating the procedure.
  • a gas may be sealingly introduced into the space between the first and second diffractive optical elements 25 and 26 .
  • a gas may be sealingly introduced into the space between the first and second diffractive optical elements 25 and 26 .
  • an inert gas such as neon (Ne) or nitrogen (N 2 ), for example, may be selected in accordance with the wavelength of light from the light source 1 .
  • additional recesses 25 A and protrusions 26 A may be provided at the peripheral edge portions of the first and second diffractive optical elements 25 and 26 such as shown in FIG. 7 .
  • Such recesses and protrusions can thus be formed without adverse influence to the performance of the optical unit.
  • FIGS. 8-10 which illustrate the second embodiment, the components substantially corresponding to those of the first embodiment are denoted with like numerals.
  • the optical unit 22 of the second embodiment comprises, as in the first embodiment, two diffractive optical elements bonded to each other.
  • the second embodiment differs from the first embodiment in that these two diffractive optical elements are made of different mediums, and that there are plural recesses and protrusions for the positioning, which are formed at plural locations.
  • FIG. 8 is an exploded perspective view of the optical unit 22 .
  • the optical unit 22 is provided with a first diffractive optical element 25 and a second diffractive optical element 26 .
  • a diffraction grating surface 25 b or 26 b is formed. These diffraction grating surfaces 25 b and 26 b are disposed to be opposed to each other.
  • FIGS. 9A and 9B are sectional views of the first and second diffractive optical elements 25 and 26 of the second embodiment, along a section containing the optical axis.
  • the optical unit 22 is produced by bonding the first and second diffractive optical elements 25 and 26 (FIG. 9A) to each other while putting their diffraction grating surfaces 25 a and 26 b face to face with each other (FIG. 9 B).
  • the first and second diffractive optical elements 25 and 26 of the second embodiment are each formed revolutionally asymmetrically with respect to the optical axis.
  • the first diffractive optical element 25 of the second embodiment is provided with a plurality of recesses 25 a , 25 a ′ and 25 a ′′.
  • the second diffractive optical element 26 is provided with protrusions 26 a , 26 a ′ and 26 a ′′ at predetermined positions thereon corresponding to the positions of the recesses 25 a , 25 a ′ and 25 a ′′, respectively.
  • recesses 25 a , 25 a ′ and 25 a ′′ engage with the protrusions 26 a , 26 a ′ and 26 ′′, respectively.
  • the diffractive optical elements can be aligned with each other exactly even though the diffraction patterns formed on the diffraction grating surfaces 25 b and 26 b are not revolutionally symmetric with respect to the optical axis.
  • first and second diffractive optical elements 25 and 26 of the second embodiment are binary type diffractive optical elements
  • a portion of each of the diffraction grating surfaces 25 b and 26 b will be formed flat.
  • Such flat surface portion may be used, and the recesses 25 a , 25 a ′ and 25 a ′′ or the protrusions 26 a , 26 a ′ and 26 a ′′ may be formed upon the diffraction grating surface 25 b or 26 b other than the optical axis position.
  • the position range for forming the recesses 25 a , 25 a ′ and 25 a ′′ or the protrusions 26 a , 26 a ′ and 26 a ′′ can be enlarged.
  • the number and positions of the recesses 25 a , 25 a ′ and 25 a ′′ and of the protrusions 26 a , 26 a ′ and 26 a ′′ may be set appropriately, in accordance with the optical performance as required for the optical unit 22 .
  • the second diffractive optical element 26 of the second embodiment is made of a medium different from that of the first diffractive optical element 25 .
  • the first and second diffractive optical elements 25 and 26 show different refractive indices.
  • the function of the optical unit 22 can be dispersed into the first and second diffractive optical elements 25 and 26 more effectively.
  • the tolerance range for the optical performance of the optical unit 22 can be enlarged, and further improvement of the optical performance of the optical unit 22 is accomplished.
  • FIG. 10 is a sectional view, showing in enlargement the state of engagement between a recess 25 a and a protrusion 26 a when the first and second diffractive optical elements 25 and 26 are bonded to each other.
  • the recess 25 a and the protrusion 26 a are formed in a very small shape of a width of about 10 microns or less, only a very small influence is applied to light rays passing through this portion of the diffractive optical element.
  • the depth of the recess 25 a and the height (protruded amount) of the protrusion 26 a may be so set that a clearance is produced between the bottom 25 c of the recess 25 a and the top face 26 c of the protrusion 26 a.
  • n 1 ⁇ d 1 ⁇ n 2 ⁇ d 2 +n 3 ⁇ ( d 1 ⁇ d 2 ) ⁇ m ⁇
  • n 1 is the refractive index of the first diffractive optical element 25
  • n 2 is the refractive index of the second diffractive optical element 26
  • n 3 is the refractive index of the medium which occupies the clearance between the recess 25 a and the protrusion 26 a
  • d 1 is the depth of the recess 25 a
  • d 2 is the height (protruded amount) of the protrusion 26 a
  • ⁇ is the center wavelength being used
  • m is an integer.
  • the optical function of the optical unit 22 can be dispersed into the first and second diffractive optical elements 25 and 26 more effectively. As a result, the optical performance of the optical unit 22 can be improved.
  • some of the plural recesses and protrusions may be formed outside the diffraction grating surfaces 25 b and 26 b . This enables further reduction of the influence of the recess or protrusion on the optical performance of the optical unit 22 .
  • the optical unit 22 of the third embodiment comprises, as in the first embodiment, two diffractive optical elements, that is, a first diffractive optical element 25 and a second diffractive optical element 26 .
  • FIG. 11 is a sectional view of the first and second diffractive optical elements 25 and 26 in the second embodiment, along a section containing the optical axis.
  • the third embodiment has a feature that the first and second diffractive optical elements 25 and 26 which form the optical unit 22 are spaced from each other by a predetermined distance.
  • the positioning of the first and second diffractive optical elements 25 and 26 is accomplished by engagement between recesses 25 a , 25 a ′ and 25 a ′′ formed on the first diffractive optical element 25 and free ends of shaft portions 26 e , 26 f and 26 g , which are formed integrally with the second diffractive optical element 26 .
  • the shaft portions 26 e , 26 f and 26 g may be formed by processing the same raw material of the second diffractive optical element 26 , or alternatively, they may be formed as separate elements which may then be fixed integrally with the second diffractive optical element 26 .
  • the spacing between the first and second diffractive optical elements 25 and 26 may desirably be set so that the optical path length corresponds to a multiple (m ⁇ ), by an integer, of the wavelength of the light passing therethrough. More specifically, where n is the refractive index of the first and second diffractive optical elements 25 and 26 and n′ is the refractive index of the medium occupying the space between them, the spacing should be equal to m ⁇ /(n ⁇ n′).
  • the first and second diffractive optical elements 25 and 26 are held spaced from each other by a predetermined distance. With this arrangement, the optical performance selection range of the optical unit 22 can be expanded. Thus, an optical unit 22 of a desired performance can be accomplished.
  • the recess 25 a and the protrusion 26 a are formed at the optical axis position.
  • stable positioning can be attained by means of a recess or recesses and a protrusion or protrusions formed in other portions, it is not always necessary to provide them at the optical axis position.
  • first and second diffractive optical elements 25 and 26 have diffraction grating surfaces 25 b and 26 b each being formed on one side of the corresponding optical element, both sides of the optical element may be provided with such grating surfaces.
  • FIG. 12 is a flow chart of a procedure for manufacture of microdevices, such as semiconductor chips (e.g. ICs or LSIs), liquid crystal panels, or CCDs, for example.
  • semiconductor chips e.g. ICs or LSIs
  • liquid crystal panels e.g. LCDs
  • CCDs complementary metal-oxide-semiconductors
  • Step 1 is a design process for designing a circuit of a semiconductor device.
  • Step 2 is a process for making a mask on the basis of the circuit pattern design.
  • Step 3 is a process for preparing a wafer by using a material such as silicon.
  • Step 4 is a wafer process (called a pre-process) wherein, by using the so-prepared mask and wafer, circuits are practically formed on the wafer through lithography.
  • Step 5 subsequent to this is an assembling step (called a post-process) wherein the wafer having been processed in step 4 is formed into semiconductor chips.
  • This step includes an assembling (dicing and bonding) process and a packaging (chip sealing) process.
  • Step 6 is an inspection step wherein an operation check, a durability check and so on for the semiconductor devices provided by step 5 are carried out. With these processes, semiconductor devices are completed and they are shipped (step 7 ).
  • FIG. 13 is a flow chart showing details of the wafer process.
  • Step 11 is an oxidation process for oxidizing the surface of a wafer.
  • Step 12 is a CVD process for forming an insulating film on the wafer surface.
  • Step 13 is an electrode forming process for forming electrodes upon the wafer by vapor deposition.
  • Step 14 is an ion implanting process for implanting ions in the wafer.
  • Step 15 is a resist process for applying a resist (photosensitive material) to the wafer.
  • Step 16 is an exposure process for printing, by exposure, the circuit pattern of the mask on the wafer through the exposure apparatus described above.
  • Step 17 is a developing process for developing the exposed wafer.
  • Step 18 is an etching process for removing portions other than the developed resist image.
  • Step 19 is a resist separation process for separating the resist material remaining on the wafer after being subjected to the etching process. By repeating these processes, circuit patterns are superposedly formed on the wafer.
  • step 16 uniform illumination light having various optical aberrations corrected can be projected to the wafer surface, with use of the stepper according to this embodiment of the present invention and with a large latitude. Therefore, a large-integration semiconductor device can be produced easily and stably.
  • this manufacturing method may be used for the diffractive optical element 25 itself, not only for production of a semiconductor device.
  • an optical unit may be used in a portion of lenses constituting a television camera.
  • lens groups 102 - 105 before a photoelectric converting element (CCD) 101 that is, on the target or object side.
  • denoted at 102 is a focusing lens group
  • denoted at 103 is a variation lens group
  • Denoted at 104 is a compensator lens group
  • denoted at 105 is a relay lens group.
  • the focusing lens group 102 is held by a focusing lens barrel, and it can be moved along the optical axis direction. With this movement of the focusing lens group, the focusing operation is performed. Also, through movements of the variation lens group 103 and the compensator lens group 104 , the zooming operation is performed. An image of a subject to be photographed is imaged on the photoelectric converting element 101 after the relay lens group 105 , by which a video image is produced.
  • the optical unit 22 according to the present invention is fixedly mounted in front of the compensator lens group 104 .
  • This enables a portion of a lens group, which should otherwise be required for suppressing the production of aberration, to be substituted with the optical unit 22 .
  • the optical unit 22 By incorporating the optical unit 22 into the optical system of the television camera, the total number of lenses of the optical system as a whole can be reduced. This achieves a TV camera of smaller size and with a simple structure. Also, the manufacturing cost can be lowered significantly.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
US09/411,632 1998-10-02 1999-10-01 Optical unit having plural optical elements Expired - Fee Related US6731431B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP10-281295 1998-10-02
JP28129598A JP3290631B2 (ja) 1998-10-02 1998-10-02 光学ユニット、光学ユニットの製造方法、光学ユニットを用いた光学系、光学ユニットを用いた露光装置及びこの露光装置を用いたデバイスの製造方法

Publications (2)

Publication Number Publication Date
US20030043462A1 US20030043462A1 (en) 2003-03-06
US6731431B2 true US6731431B2 (en) 2004-05-04

Family

ID=17637085

Family Applications (1)

Application Number Title Priority Date Filing Date
US09/411,632 Expired - Fee Related US6731431B2 (en) 1998-10-02 1999-10-01 Optical unit having plural optical elements

Country Status (2)

Country Link
US (1) US6731431B2 (ja)
JP (1) JP3290631B2 (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010026399A1 (en) * 1998-09-24 2001-10-04 Masaaki Nakabayashi Diffractive optical element and method of manufacture of the same
US20050072899A1 (en) * 2002-06-06 2005-04-07 Jouji Anzai Inclination detector, optical head, optical information processor computer, video recorder, video reproducer, and car navigation system
US20050264887A1 (en) * 2000-06-07 2005-12-01 Canon Kabushiki Kaisha Diffractive optical element
US20080055727A1 (en) * 2006-09-04 2008-03-06 Canon Kabushiki Kaisha Diffractive optical element and optical system having the same
US7593305B1 (en) 2005-09-09 2009-09-22 Seagate Technology Llc Removing spherical aberrations for two photon recording
US9977153B2 (en) 2014-02-07 2018-05-22 Heptagon Micro Optics Pte. Ltd. Stacks of arrays of beam shaping elements including stacking, self-alignment and/or self-centering features
US10371954B2 (en) 2014-06-10 2019-08-06 Ams Sensors Singapore Pte. Ltd. Optoelectronic modules including hybrid arrangements of beam shaping elements, and imaging devices incorporating the same
US10439166B2 (en) * 2016-07-01 2019-10-08 Samsung Display Co., Ltd. Display device and method for manufacturing the same

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4590082B2 (ja) * 2000-10-02 2010-12-01 キヤノン株式会社 回折光学素子及びそれを用いた光学系
DE10151919B4 (de) * 2001-10-20 2007-02-01 Carl Zeiss Smt Ag Belichtungsobjektiv in der Halbleiterlithographie
US6951392B2 (en) * 2003-07-09 2005-10-04 3M Innovative Properties Company Lens having at least one lens centration mark and methods of making and using same
DE102006045075A1 (de) 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Steuerbares optisches Element
JP6561840B2 (ja) * 2013-12-14 2019-08-21 コニカミノルタ株式会社 積層型レンズアレイユニット及び撮像装置
JP6695629B2 (ja) * 2015-05-28 2020-05-20 株式会社ミツトヨ テレセントリック光学装置
US10520710B2 (en) 2015-05-28 2019-12-31 Mitutoyo Corporation Telecentric optical apparatus
JP7418079B2 (ja) * 2019-09-30 2024-01-19 キヤノン株式会社 回折光学素子、光学機器、撮像装置

Citations (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58157317A (ja) 1982-03-12 1983-09-19 住友特殊金属株式会社 融雪用複合磁性体リングの製造方法
US4426131A (en) * 1982-01-13 1984-01-17 The United States Of America As Represented By The Secretary Of The Air Force Replaceable diffraction gratings for cooled laser optics
JPS63172204A (ja) 1987-01-12 1988-07-15 Olympus Optical Co Ltd レンズの鏡枠組付け方法及びその装置
JPH0278901A (ja) 1988-09-14 1990-03-19 Chuo Denshi Kk 円柱体の外径の測定方法及び測定装置
JPH02143201A (ja) 1988-11-25 1990-06-01 Ricoh Co Ltd ２重回折格子
US4966447A (en) * 1989-04-28 1990-10-30 At&T Bell Laboratories Integration of free-space planar optical components
JPH03250437A (ja) 1989-08-04 1991-11-08 Ricoh Co Ltd 光情報記録再生装置及び二重回折格子
US5101389A (en) 1989-08-04 1992-03-31 Ricoh Company, Ltd. Optical information recording/reproducing apparatus
US5117306A (en) 1990-07-17 1992-05-26 Cohen Allen L Diffraction bifocal with adjusted chromaticity
US5149181A (en) * 1990-11-02 1992-09-22 Pilkington Visioncare, Inc. Lens wafer, laminate lens and method of fabrication thereof
US5152788A (en) * 1989-12-27 1992-10-06 Minnesota Mining And Manufacturing Company Multifocal diffractive ophthalmic lens and method of manufacture
US5208700A (en) 1991-12-23 1993-05-04 Xerox Corporation Lens cover assembly for binary diffractive optic lenses
US5229797A (en) * 1990-08-08 1993-07-20 Minnesota Mining And Manufacturing Company Multifocal diffractive ophthalmic lenses
US5496616A (en) 1994-12-27 1996-03-05 Xerox Corporation Optical element for correcting non-uniform diffraction efficiency in a binary diffractive optical element
US5629804A (en) 1993-01-18 1997-05-13 Canon Kabushiki Kaisha Diffraction grating
JPH09127322A (ja) 1995-08-29 1997-05-16 Olympus Optical Co Ltd 回折光学素子
JPH10123388A (ja) 1996-10-17 1998-05-15 Sony Corp 複合レンズ及び複合レンズを備えた光学系
JPH10133149A (ja) 1996-11-01 1998-05-22 Canon Inc 回折光学素子及びそれを用いた光学系
US5771218A (en) * 1996-09-27 1998-06-23 Digital Optics Corporation Passively aligned integrated optical head including light source, detector, and optical element and methods of forming same
US5811790A (en) 1996-02-22 1998-09-22 Canon Kabushiki Kaisha Photoelectric conversion device having thermal conductive member
US5838703A (en) * 1996-09-30 1998-11-17 Motorola, Inc. Semiconductor laser package with power monitoring system and optical element
US5847877A (en) 1994-09-12 1998-12-08 Olympus Optical Co., Ltd. Diffractive optical element
US5850276A (en) * 1995-11-06 1998-12-15 Sony Corporation Method of making LCD device having alignment mark made of same material and formed at same time as microlenses
US5867266A (en) * 1996-04-17 1999-02-02 Cornell Research Foundation, Inc. Multiple optical channels for chemical analysis
JPH1144810A (ja) 1997-07-28 1999-02-16 Canon Inc 回折光学素子及びそれを用いた光学系
JPH11111606A (ja) * 1997-09-30 1999-04-23 Canon Inc 露光装置及びデバイスの製造方法
US5902997A (en) * 1994-05-20 1999-05-11 Siemens Aktiengesellschaft Device for spacing at least one lens from an optoelectronic component
WO1999038046A1 (en) * 1998-01-23 1999-07-29 Burger Robert J Lenslet array systems and methods
US5973844A (en) * 1996-01-26 1999-10-26 Proxemics Lenslet array systems and methods
EP1001301A2 (en) * 1998-11-09 2000-05-17 Canon Kabushiki Kaisha Optical element with alignment mark, and optical system having such optical element
US6096155A (en) * 1996-09-27 2000-08-01 Digital Optics Corporation Method of dicing wafer level integrated multiple optical elements
US6157488A (en) * 1995-08-29 2000-12-05 Olympus Optical Company Ltd. Diffractive optical element
JP3250437B2 (ja) 1995-11-28 2002-01-28 株式会社イトーキクレビオ 棚のブレース取付構造
US6649008B2 (en) * 1996-09-27 2003-11-18 Digital Optics Corp. Method of mass producing and packaging integrated subsystems

Patent Citations (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4426131A (en) * 1982-01-13 1984-01-17 The United States Of America As Represented By The Secretary Of The Air Force Replaceable diffraction gratings for cooled laser optics
JPS58157317A (ja) 1982-03-12 1983-09-19 住友特殊金属株式会社 融雪用複合磁性体リングの製造方法
JPS63172204A (ja) 1987-01-12 1988-07-15 Olympus Optical Co Ltd レンズの鏡枠組付け方法及びその装置
JPH0278901A (ja) 1988-09-14 1990-03-19 Chuo Denshi Kk 円柱体の外径の測定方法及び測定装置
JPH02143201A (ja) 1988-11-25 1990-06-01 Ricoh Co Ltd ２重回折格子
US4966447A (en) * 1989-04-28 1990-10-30 At&T Bell Laboratories Integration of free-space planar optical components
JPH03250437A (ja) 1989-08-04 1991-11-08 Ricoh Co Ltd 光情報記録再生装置及び二重回折格子
US5101389A (en) 1989-08-04 1992-03-31 Ricoh Company, Ltd. Optical information recording/reproducing apparatus
US5152788A (en) * 1989-12-27 1992-10-06 Minnesota Mining And Manufacturing Company Multifocal diffractive ophthalmic lens and method of manufacture
US5117306A (en) 1990-07-17 1992-05-26 Cohen Allen L Diffraction bifocal with adjusted chromaticity
US5229797A (en) * 1990-08-08 1993-07-20 Minnesota Mining And Manufacturing Company Multifocal diffractive ophthalmic lenses
US5149181A (en) * 1990-11-02 1992-09-22 Pilkington Visioncare, Inc. Lens wafer, laminate lens and method of fabrication thereof
US5208700A (en) 1991-12-23 1993-05-04 Xerox Corporation Lens cover assembly for binary diffractive optic lenses
US5629804A (en) 1993-01-18 1997-05-13 Canon Kabushiki Kaisha Diffraction grating
US5902997A (en) * 1994-05-20 1999-05-11 Siemens Aktiengesellschaft Device for spacing at least one lens from an optoelectronic component
US5847877A (en) 1994-09-12 1998-12-08 Olympus Optical Co., Ltd. Diffractive optical element
US5496616A (en) 1994-12-27 1996-03-05 Xerox Corporation Optical element for correcting non-uniform diffraction efficiency in a binary diffractive optical element
JPH09127322A (ja) 1995-08-29 1997-05-16 Olympus Optical Co Ltd 回折光学素子
US6157488A (en) * 1995-08-29 2000-12-05 Olympus Optical Company Ltd. Diffractive optical element
US5850276A (en) * 1995-11-06 1998-12-15 Sony Corporation Method of making LCD device having alignment mark made of same material and formed at same time as microlenses
JP3250437B2 (ja) 1995-11-28 2002-01-28 株式会社イトーキクレビオ 棚のブレース取付構造
US5973844A (en) * 1996-01-26 1999-10-26 Proxemics Lenslet array systems and methods
US5811790A (en) 1996-02-22 1998-09-22 Canon Kabushiki Kaisha Photoelectric conversion device having thermal conductive member
US5867266A (en) * 1996-04-17 1999-02-02 Cornell Research Foundation, Inc. Multiple optical channels for chemical analysis
US6649008B2 (en) * 1996-09-27 2003-11-18 Digital Optics Corp. Method of mass producing and packaging integrated subsystems
US5771218A (en) * 1996-09-27 1998-06-23 Digital Optics Corporation Passively aligned integrated optical head including light source, detector, and optical element and methods of forming same
US6096155A (en) * 1996-09-27 2000-08-01 Digital Optics Corporation Method of dicing wafer level integrated multiple optical elements
US5838703A (en) * 1996-09-30 1998-11-17 Motorola, Inc. Semiconductor laser package with power monitoring system and optical element
JPH10123388A (ja) 1996-10-17 1998-05-15 Sony Corp 複合レンズ及び複合レンズを備えた光学系
JPH10133149A (ja) 1996-11-01 1998-05-22 Canon Inc 回折光学素子及びそれを用いた光学系
JPH1144810A (ja) 1997-07-28 1999-02-16 Canon Inc 回折光学素子及びそれを用いた光学系
JPH11111606A (ja) * 1997-09-30 1999-04-23 Canon Inc 露光装置及びデバイスの製造方法
WO1999038046A1 (en) * 1998-01-23 1999-07-29 Burger Robert J Lenslet array systems and methods
EP1001301A2 (en) * 1998-11-09 2000-05-17 Canon Kabushiki Kaisha Optical element with alignment mark, and optical system having such optical element

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
International Lens Design Conference, Proceedings, International Society for Optical Engineering, vol. 1354, pp. 24-37, Jun. 11-14, 1990, Monterey, California.

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010026399A1 (en) * 1998-09-24 2001-10-04 Masaaki Nakabayashi Diffractive optical element and method of manufacture of the same
US20050237614A1 (en) * 1998-09-24 2005-10-27 Canon Kabushiki Kaisha Diffractive optical element and method of manufacture of the same
US20050264887A1 (en) * 2000-06-07 2005-12-01 Canon Kabushiki Kaisha Diffractive optical element
US20050072899A1 (en) * 2002-06-06 2005-04-07 Jouji Anzai Inclination detector, optical head, optical information processor computer, video recorder, video reproducer, and car navigation system
US7593305B1 (en) 2005-09-09 2009-09-22 Seagate Technology Llc Removing spherical aberrations for two photon recording
US20080055727A1 (en) * 2006-09-04 2008-03-06 Canon Kabushiki Kaisha Diffractive optical element and optical system having the same
US7710650B2 (en) 2006-09-04 2010-05-04 Canon Kabushiki Kaisha Diffractive optical element and optical system having the same
US9977153B2 (en) 2014-02-07 2018-05-22 Heptagon Micro Optics Pte. Ltd. Stacks of arrays of beam shaping elements including stacking, self-alignment and/or self-centering features
US10371954B2 (en) 2014-06-10 2019-08-06 Ams Sensors Singapore Pte. Ltd. Optoelectronic modules including hybrid arrangements of beam shaping elements, and imaging devices incorporating the same
US10439166B2 (en) * 2016-07-01 2019-10-08 Samsung Display Co., Ltd. Display device and method for manufacturing the same
US10892444B2 (en) 2016-07-01 2021-01-12 Samsung Display Co., Ltd. Display device and method for manufacturing the same

Also Published As

Publication number Publication date
US20030043462A1 (en) 2003-03-06
JP3290631B2 (ja) 2002-06-10
JP2000114143A (ja) 2000-04-21

Similar Documents

Publication Publication Date Title
US6120950A (en) Optical element manufacturing method
US6731431B2 (en) Optical unit having plural optical elements
EP0969327B1 (en) Multiple exposure apparatus and method
US7079220B2 (en) Illumination optical system and method, and exposure apparatus
EP1022589B1 (en) Diffractive optical element
US6008942A (en) Diffractive optical element and optical instrument having the same
US20060176461A1 (en) Projection optical system and exposure apparatus having the same
US6674514B2 (en) Illumination optical system in exposure apparatus
KR20050121711A (ko) 노광 방법 및 장치, 그리고 디바이스 제조 방법
US20060056038A1 (en) Aberration correcting optical system
US5583696A (en) Reflection and refraction optical system and projection exposure apparatus using the same
JP3359123B2 (ja) 収差補正光学系
EP0811865B1 (en) Illumination system and exposure apparatus
US6606195B2 (en) Optical unit and optical instrument having the same
US6493143B2 (en) Diffractive optical element and optical system incorporating the same
EP0863440B1 (en) Projection exposure apparatus and device manufacturing method
JP2005331651A (ja) ３次元構造形成方法および３次元構造形成方法を用いて製造された光学素子、光学系、装置、デバイスおよびデバイス製造方法
JP2000056198A (ja) 光学ユニット、光学ユニットの製造方法、光学ユニットを用いた光学系、光学ユニットを用いた露光装置及びこの露光装置を用いたデバイスの製造方法
JPH1114813A (ja) 回折光学素子の製造方法
JP2009145700A (ja) 反射屈折投影光学系、露光装置およびデバイス製造方法

Legal Events

Date Code Title Description
AS Assignment

Owner name: CANON KABUSHIKI KAISHA, JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:SEKINE, YOSHIYUKI;REEL/FRAME:010504/0780

Effective date: 19991206

CC Certificate of correction
FPAY Fee payment

Year of fee payment: 4

REMI Maintenance fee reminder mailed
LAPS Lapse for failure to pay maintenance fees
STCH Information on status: patent discontinuation

Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362

FP Lapsed due to failure to pay maintenance fee

Effective date: 20120504