US20170298935A1 - Vacuum-generating pumping system and pumping method using this pumping system - Google Patents

Vacuum-generating pumping system and pumping method using this pumping system Download PDF

Info

Publication number
US20170298935A1
US20170298935A1 US15/512,883 US201415512883A US2017298935A1 US 20170298935 A1 US20170298935 A1 US 20170298935A1 US 201415512883 A US201415512883 A US 201415512883A US 2017298935 A1 US2017298935 A1 US 2017298935A1
Authority
US
United States
Prior art keywords
vacuum pump
pump
pumping system
auxiliary
main
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US15/512,883
Other languages
English (en)
Inventor
Didier Müller
Jean-Eric Larcher
Théodore Iltchev
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ateliers Busch SA
Original Assignee
Ateliers Busch SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=51627293&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=US20170298935(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ateliers Busch SA filed Critical Ateliers Busch SA
Assigned to ATELIERS BUSCH SA reassignment ATELIERS BUSCH SA ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ILTCHEV, Théodore, LARCHER, JEAN-ERIC, MÜLLER, Didier
Publication of US20170298935A1 publication Critical patent/US20170298935A1/en
Abandoned legal-status Critical Current

Links

Images

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C11/00—Combinations of two or more machines or pumps, each being of rotary-piston or oscillating-piston type; Pumping installations
    • F04C11/001—Combinations of two or more machines or pumps, each being of rotary-piston or oscillating-piston type; Pumping installations of similar working principle
    • F04C11/003—Combinations of two or more machines or pumps, each being of rotary-piston or oscillating-piston type; Pumping installations of similar working principle having complementary function
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
    • F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C15/00—Component parts, details or accessories of machines, pumps or pumping installations, not provided for in groups F04C2/00 - F04C14/00
    • F04C15/06—Arrangements for admission or discharge of the working fluid, e.g. constructional features of the inlet or outlet
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
    • F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
    • F04C18/14—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons
    • F04C18/16—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons with helical teeth, e.g. chevron-shaped, screw type
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2/00—Rotary-piston machines or pumps
    • F04C2/08—Rotary-piston machines or pumps of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
    • F04C2/12—Rotary-piston machines or pumps of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
    • F04C2/14—Rotary-piston machines or pumps of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons
    • F04C2/16—Rotary-piston machines or pumps of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with toothed rotary pistons with helical teeth, e.g. chevron-shaped, screw type
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
    • F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
    • F04C28/02—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for several pumps connected in series or in parallel
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/10—Vacuum
    • F04C2220/12—Dry running
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C28/00—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids
    • F04C28/06—Control of, monitoring of, or safety arrangements for, pumps or pumping installations specially adapted for elastic fluids specially adapted for stopping, starting, idling or no-load operation

Definitions

  • the present invention relates to the field of vacuum technology. More precisely, it concerns a pumping system comprising a dry screw pump as well as a pumping method by means of this pumping system.
  • the speed of rotation of the pump plays a very important role by defining the operation of the pump during the different successive phases in the course of evacuation of the vacuum chamber.
  • the necessary electrical power in the first pumping phases when the pressure at the suction end is between atmospheric pressure and about 100 mbar, that is to say during strong mass flow rate operation, will be very high if the speed of rotation of the pump cannot be reduced.
  • the common solution is to use a variable speed drive which makes possible reduction or increase of the speed and consequently of the power as a function of different criteria of the type pressure, maximal current, limit torque, temperature, etc.
  • the state of the art concerning the pumping systems which aim to improve the final vacuum and to increase the flow rate also comprise booster pumps of Roots type arranged upstream from main dry pumps.
  • This type of systems is bulky, operates either with by-pass valves presenting problems of reliability or by employing means of measurement, control, adjustment or servo-control.
  • these means of control, adjustment or servo-control must be controlled in an active way, which necessarily results in an increase in the number of components of the system, its complexity and its cost.
  • the present invention has as object to permit a better vacuum to be obtained (on the order of 0.0001 mbar) than that which a single dry vacuum pump of screw type is able to generate in a vacuum chamber.
  • the present invention also has as object obtaining a draining or evacuation rate which is greater at low pressure than that which can be obtained with the aid of a single dry vacuum pump of screw type during a pumping to achieve a vacuum in a vacuum chamber.
  • the present invention likewise has as object to permit a reduction of the electrical energy necessary for the evacuation of a vacuum chamber and for maintaining the vacuum as well as to achieve a decrease in the temperature of the exit gas.
  • a pumping system for generating a vacuum comprising a main vacuum pump which is a dry screw pump having a gas suction inlet connected to a vacuum chamber and gas discharge outlet leading into a gas evacuation conduit in the direction of a gas exhaust outlet outside the pumping system.
  • the pumping system further comprises
  • the auxiliary vacuum pump can be of the type dry screw pump, claw pump, multi-stage Roots pump, diaphragm pump, dry rotary vane pump, lubricated rotary vane pump.
  • the invention likewise has as subject matter a pumping method by means of a pumping system such as previously defined. This method comprises steps in which:
  • the auxiliary pump is operated continuously all the while that the main vacuum pump of dry screw type evacuates the vacuum chamber, but also all the while that the main dry screw vacuum pump maintains a defined pressure (for example the final vacuum) in the chamber by evacuating the gases through its discharge end.
  • the coupling of the main vacuum pump of dry screw type and of the auxiliary pump can be carried out without requiring specific measures or apparatuses (for example sensors for pressure, temperature, current, etc.), nor servo-controls, nor data management and without calculation. Consequently the pumping system suitable for implementing the pumping method according to the present invention can comprise only a minimal number of components, can have great simplicity and can cost considerably less compared with existing systems.
  • the main vacuum pump of dry screw type can operate at a single constant speed, that of the power grid, or turn at variable speeds in accordance with its own mode of operation. Consequently, the complexity and the cost of the pumping system suitable for implementing the pumping method according to the present invention can be reduced even more.
  • the auxiliary pump integrated in the pumping system can always operate according to the pumping method of the invention without damage. Its dimensioning is conditioned by a minimal energy consumption for the operation of the device. Its nominal flow rate is selected as a function of the volume of the evacuation conduit between the main dry screw vacuum pump and the non-return valve. This flow rate can be advantageously from 1/500 to 1/20 of the nominal flow rate of the main dry screw vacuum pump, but can also be less than or greater than these values, in particular from 1/500 to 1/10 or even from 1/500 to 1 ⁇ 5 of the nominal flow rate of the main vacuum pump.
  • the non-return valve placed in the conduit downstream from the main dry screw vacuum pump, can be a standard commercially available element. It is dimensioned according to the nominal flow rate of the main dry screw vacuum pump. In particular, it is foreseen that the non-return valve closes when the pressure at the suction end of the main dry screw vacuum pump is between 500 mbar absolute and the final vacuum (for example 100 mbar).
  • the auxiliary pump can have high chemical resistance to substances and gases commonly used in the semiconductor industry.
  • the auxiliary pump is preferably of small size.
  • the auxiliary vacuum pump always pumps in the volume between the gas discharge outlet of the main vacuum pump and the non-return valve.
  • the actuation of the auxiliary vacuum pump is controlled in an “all or nothing” way.
  • the control consists in measuring one or more parameters and following certain rules to actuate the auxiliary vacuum pump or to stop it.
  • the parameters provided by suitable sensors, are, for example, the current of the motor of the main dry screw vacuum pump, the temperature or the pressure of the gases at its exhaust end, i.e. in the space upstream from the non-return valve in the evacuation conduit, or a combination of these parameters.
  • the dimensioning of the auxiliary vacuum pump aims to achieve a minimal energy consumption of its motor. Its nominal flow rate is selected as a function of the flow rate of the main dry screw vacuum pump, but also taking into account the volume which the gas evacuation conduit delimits between the main vacuum pump and the non-return valve. This flow rate can be from 1/500 to 1/20 of the nominal flow rate of the main dry screw vacuum pump, but can also be less than or greater than these values.
  • the pressure there is high for example equal to the atmospheric pressure.
  • the pressure of the gases discharged at its exit is higher than the atmospheric pressure (if the gases at the exit of the main pump are discharged directly into the atmosphere) or higher than the pressure at the inlet of another apparatus connected downstream. This causes the opening of the non-return valve.
  • FIG. 1 represents in a diagrammatic way a pumping system suitable for implementation of a pumping method according to a first embodiment of the present invention
  • FIG. 2 represents in a diagrammatic way a pumping system suitable for implementation of a pumping method according to a second embodiment of the present invention.
  • FIG. 1 represents a pumping system SP for generating a vacuum, which is suitable for implementing a pumping method according to a first embodiment of the present invention.
  • This pumping system SP comprises a chamber 1 , which is connected to the suction end 2 of a main vacuum pump constituted by a dry screw pump 3 .
  • the gas discharge outlet of the main dry screw vacuum pump 3 is connected to an evacuation conduit 5 .
  • a non-return discharge valve 6 is placed in the evacuation conduit 5 , which, after this non-return valve, continues into the gas exit conduit 8 .
  • the non-return valve 6 when it is closed, permits the formation of a volume 4 , contained between the gas discharge outlet of the main vacuum pump 3 and itself.
  • the pumping system SP also comprises the auxiliary vacuum pump 7 , connected in parallel to the non-return valve 6 .
  • the suction end of the auxiliary vacuum pump is connected to the space 4 of the evacuation conduit 5 and its discharge end is connected to the conduit 8 .
  • the auxiliary vacuum pump 7 is itself actuated.
  • the main dry screw vacuum pump 3 suctions the gases in the chamber 1 through the conduit 2 connected at its inlet and compresses them in order to discharge them subsequently at its exit in the evacuation conduit 5 through the non-return valve 6 .
  • the closure pressure for the non-return valve 6 When the closure pressure for the non-return valve 6 is reached, it closes.
  • the pumping of the auxiliary vacuum pump 7 makes the pressure in the space 4 drop progressively to the value of its pressure limit.
  • the power consumed by the main dry screw vacuum pump 3 decreases progressively. This takes place in a short time period, for example for a certain cycle in 5 to 10 seconds.
  • the auxiliary vacuum pump 7 is itself a dry screw pump.
  • the main pump and the auxiliary pump can be of the same type, which simplifies the operation and the handling.
  • this combination of pumps permits the pumping system SP to be used for all the applications where only a dry screw pump can be used.
  • the auxiliary vacuum pump 7 is a claw pump, a multi-stage Roots pump, a diaphragm pump, a dry rotary vane pump or a lubricated rotary vane pump. All these combinations of pumps have the advantages connected with the specific properties of each type of individual pumps.
  • FIG. 2 represents a pumping system SPP suitable for implementation of a pumping method according to a second embodiment of the present invention.
  • the system shown in FIG. 2 represents the controlled pumping system SPP, further comprising suitable sensors 11 , 12 , 13 which check either the current of the motor (sensor 11 ) of the main dry screw vacuum pump 3 , or the pressure (sensor 13 ) of the gases in the space of the exit conduit of the main dry screw vacuum pump, limited by the non-return valve 6 , or the temperature (sensor 12 ) of the gases in the space of the exit conduit at the exit of the main dry screw vacuum pump, limited by the non-return valve 6 , or a combination of these parameters.
  • the main dry screw vacuum pump 3 begins to pump the gases of the vacuum chamber 1 , the parameters such as the current of its motor, the temperature and the pressure of the gases in the space of the exit conduit 4 begin to change and reach threshold values detected by the sensors. After a time lag, this causes the startup of the auxiliary vacuum pump 7 . When these parameters return to the initial ranges (outside the set values), with a time lag the auxiliary vacuum pump is stopped.
  • the auxiliary vacuum pump can be of type dry screw, claw, multi-stage Roots, diaphragm, dry rotary vane or lubricated rotary vane, as in the first embodiment of the invention of FIG. 1 .

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Reciprocating Pumps (AREA)
US15/512,883 2014-09-26 2014-09-26 Vacuum-generating pumping system and pumping method using this pumping system Abandoned US20170298935A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2014/070691 WO2016045753A1 (fr) 2014-09-26 2014-09-26 Système de pompage pour générer un vide et procédé de pompage au moyen de ce système de pompage

Publications (1)

Publication Number Publication Date
US20170298935A1 true US20170298935A1 (en) 2017-10-19

Family

ID=51627293

Family Applications (1)

Application Number Title Priority Date Filing Date
US15/512,883 Abandoned US20170298935A1 (en) 2014-09-26 2014-09-26 Vacuum-generating pumping system and pumping method using this pumping system

Country Status (15)

Country Link
US (1) US20170298935A1 (fr)
EP (1) EP3198148B1 (fr)
JP (1) JP2017531125A (fr)
KR (2) KR20170063839A (fr)
CN (1) CN107002680A (fr)
AU (1) AU2014406724B2 (fr)
BR (1) BR112017005927B1 (fr)
CA (1) CA2961977A1 (fr)
DK (1) DK3198148T3 (fr)
ES (1) ES2780873T3 (fr)
PL (1) PL3198148T3 (fr)
PT (1) PT3198148T (fr)
RU (1) RU2670640C9 (fr)
TW (1) TWI725943B (fr)
WO (1) WO2016045753A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT201800021148A1 (it) * 2018-12-27 2020-06-27 D V P Vacuum Tech S P A Pompa ausiliaria volumetrica per la generazione del vuoto.
WO2021122360A1 (fr) * 2019-12-19 2021-06-24 Leybold France S.A.S. Pompe à vide étanche au lubrifiant, filtre à lubrifiant et procédé

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE1027005B9 (nl) 2019-01-30 2020-10-19 Atlas Copco Airpower Nv Werkwijze voor de sturing van een compressor naar een onbelaste toestand
FR3094762B1 (fr) 2019-04-05 2021-04-09 Pfeiffer Vacuum Pompe à vide de type sèche et installation de pompage

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE8816875U1 (de) * 1987-12-21 1991-04-11 Werner Rietschle Maschinen- Und Apparatebau Gmbh, 7860 Schopfheim Vakuumpumpstand
US6589023B2 (en) * 2001-10-09 2003-07-08 Applied Materials, Inc. Device and method for reducing vacuum pump energy consumption
US20040261792A1 (en) * 2001-07-02 2004-12-30 Boehringer Ingelheim Pharma Gmbh & Co. Kg Control unit for flow regulation
US20120219443A1 (en) * 2009-11-18 2012-08-30 Adixen Vacuum Products Method And Device For Pumping With Reduced Power Use
US20150308461A1 (en) * 2012-12-21 2015-10-29 Xerex Ab Vacuum Ejector With Multi-Nozzle Drive Stage And Booster

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3842886A1 (de) * 1987-12-21 1989-07-06 Rietschle Masch App Vakuumpumpstand
FR2647853A1 (fr) * 1989-06-05 1990-12-07 Cit Alcatel Pompe primaire seche a deux etages
JP3723987B2 (ja) * 1992-09-03 2005-12-07 松下電器産業株式会社 真空排気装置及び方法
FR2822200B1 (fr) * 2001-03-19 2003-09-26 Cit Alcatel Systeme de pompage pour gaz a faible conductivite thermique
JP4045362B2 (ja) * 2001-09-06 2008-02-13 株式会社アルバック 多段式容積移送型ドライ真空ポンプ
KR100876318B1 (ko) 2001-09-06 2008-12-31 가부시키가이샤 아루박 진공배기장치 및 진공배기장치의 운전방법
JP3992176B2 (ja) 2001-10-26 2007-10-17 株式会社アルバック 真空排気方法および真空排気装置
JP4365059B2 (ja) * 2001-10-31 2009-11-18 株式会社アルバック 真空排気装置の運転方法
JP4745779B2 (ja) * 2005-10-03 2011-08-10 神港精機株式会社 真空装置
JP5438279B2 (ja) * 2008-03-24 2014-03-12 アネスト岩田株式会社 多段真空ポンプ及びその運転方法
TWI467092B (zh) * 2008-09-10 2015-01-01 Ulvac Inc 真空排氣裝置
GB201007814D0 (en) * 2010-05-11 2010-06-23 Edwards Ltd Vacuum pumping system
FR2993614B1 (fr) * 2012-07-19 2018-06-15 Pfeiffer Vacuum Procede et dispositif de pompage d'une chambre de procedes

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE8816875U1 (de) * 1987-12-21 1991-04-11 Werner Rietschle Maschinen- Und Apparatebau Gmbh, 7860 Schopfheim Vakuumpumpstand
US20040261792A1 (en) * 2001-07-02 2004-12-30 Boehringer Ingelheim Pharma Gmbh & Co. Kg Control unit for flow regulation
US6589023B2 (en) * 2001-10-09 2003-07-08 Applied Materials, Inc. Device and method for reducing vacuum pump energy consumption
US20120219443A1 (en) * 2009-11-18 2012-08-30 Adixen Vacuum Products Method And Device For Pumping With Reduced Power Use
US20150308461A1 (en) * 2012-12-21 2015-10-29 Xerex Ab Vacuum Ejector With Multi-Nozzle Drive Stage And Booster

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT201800021148A1 (it) * 2018-12-27 2020-06-27 D V P Vacuum Tech S P A Pompa ausiliaria volumetrica per la generazione del vuoto.
EP3674555A1 (fr) * 2018-12-27 2020-07-01 D.V.P. Vacuum Technology S.p.A. Pompe volumétrique auxiliaire pour générer un vide
WO2021122360A1 (fr) * 2019-12-19 2021-06-24 Leybold France S.A.S. Pompe à vide étanche au lubrifiant, filtre à lubrifiant et procédé
CN114787517A (zh) * 2019-12-19 2022-07-22 莱宝法国有限责任公司 润滑剂密封真空泵、润滑剂过滤器和方法

Also Published As

Publication number Publication date
AU2014406724B2 (en) 2019-09-19
PL3198148T3 (pl) 2020-08-10
TWI725943B (zh) 2021-05-01
AU2014406724A1 (en) 2017-04-13
CA2961977A1 (fr) 2016-03-31
ES2780873T3 (es) 2020-08-27
RU2670640C9 (ru) 2018-12-04
BR112017005927B1 (pt) 2022-07-12
JP2017531125A (ja) 2017-10-19
EP3198148B1 (fr) 2020-02-26
EP3198148A1 (fr) 2017-08-02
TW201623801A (zh) 2016-07-01
RU2670640C1 (ru) 2018-10-24
PT3198148T (pt) 2020-04-02
KR20210102478A (ko) 2021-08-19
WO2016045753A1 (fr) 2016-03-31
CN107002680A (zh) 2017-08-01
DK3198148T3 (da) 2020-04-06
KR20170063839A (ko) 2017-06-08
BR112017005927A2 (pt) 2017-12-19

Similar Documents

Publication Publication Date Title
US10808730B2 (en) Pumping system for generating a vacuum and method for pumping by means of this pumping system
US11725662B2 (en) Method of pumping in a system of vacuum pumps and system of vacuum pumps
AU2014406724B2 (en) Vacuum-generating pumping system and pumping method using this pumping system
AU2014392229B2 (en) Method of pumping in a pumping system and vacuum pump system
US10260502B2 (en) Pumping method in a system of vacuum pumps and system of vacuum pumps

Legal Events

Date Code Title Description
AS Assignment

Owner name: ATELIERS BUSCH SA, SWITZERLAND

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:MUELLER, DIDIER;LARCHER, JEAN-ERIC;ILTCHEV, THEODORE;SIGNING DATES FROM 20170426 TO 20170502;REEL/FRAME:042733/0921

STPP Information on status: patent application and granting procedure in general

Free format text: NON FINAL ACTION MAILED

STPP Information on status: patent application and granting procedure in general

Free format text: RESPONSE TO NON-FINAL OFFICE ACTION ENTERED AND FORWARDED TO EXAMINER

STPP Information on status: patent application and granting procedure in general

Free format text: FINAL REJECTION MAILED

STPP Information on status: patent application and granting procedure in general

Free format text: RESPONSE AFTER FINAL ACTION FORWARDED TO EXAMINER

STPP Information on status: patent application and granting procedure in general

Free format text: ADVISORY ACTION MAILED

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION