US20130183890A1 - Processing apparatus - Google Patents
Processing apparatus Download PDFInfo
- Publication number
- US20130183890A1 US20130183890A1 US13/710,928 US201213710928A US2013183890A1 US 20130183890 A1 US20130183890 A1 US 20130183890A1 US 201213710928 A US201213710928 A US 201213710928A US 2013183890 A1 US2013183890 A1 US 2013183890A1
- Authority
- US
- United States
- Prior art keywords
- grinding
- wheel
- mount
- workpiece
- cleaning water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 52
- 238000004140 cleaning Methods 0.000 claims abstract description 50
- 238000005498 polishing Methods 0.000 description 72
- 239000012530 fluid Substances 0.000 description 51
- 239000002699 waste material Substances 0.000 description 40
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000007599 discharging Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/04—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving a rotary work-table
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/02—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
Definitions
- the present invention relates to a processing apparatus having a processing wheel for processing a platelike workpiece by using a processing fluid.
- a grinding apparatus including holding means for holding the workpiece and grinding means for grinding the workpiece held by the holding means, wherein the workpiece is ground by the grinding means as supplying a grinding fluid to the workpiece.
- the grinding means in the grinding apparatus as mentioned above includes a rotating shaft having an axis extending in a vertical direction, a housing for rotatably supporting the rotating shaft, a wheel mount mounted on the lower end of the rotating shaft, and a grinding wheel mounted on the lower portion of the wheel mount (see Japanese Patent Laid-open No. 2011-235388, for example).
- another example of the grinding means known in the art additionally includes a mount cover for covering the wheel mount to prevent a grinding waste generated by the grinding of the workpiece and a grinding fluid containing the grinding waste from sticking to the wheel mount.
- a processing apparatus including holding means having a holding surface for holding a platelike workpiece; and processing means for processing the workpiece held by the holding means; the processing means having a processing wheel opposed to the holding surface of the holding means; a wheel mount having a supporting surface for detachably supporting the processing wheel; a rotating shaft connected to another surface of the wheel mount opposite to the supporting surface; a housing for rotatably supporting the rotating shaft; a mount cover provided on the housing so as to cover the wheel mount with a predetermined gap defined between the mount cover and the wheel mount, the mount cover having a cleaning water inlet communicating with the predetermined gap; and a cleaning water source connected to the cleaning water inlet.
- the processing means of the processing apparatus includes the wheel mount having the supporting surface for detachably supporting the processing wheel, the rotating shaft connected to another surface of the wheel mount opposite to the supporting surface to thereby rotate the processing wheel, the housing for rotatably supporting the rotating shaft, and the mount cover provided on the housing so as to cover the wheel mount.
- the mount cover is formed with the cleaning water inlet for intaking a cleaning water.
- the cleaning water inlet is in communication with the gap defined between the inner surface of the mount cover and the outer surface of the wheel mount.
- the cleaning water is supplied from the cleaning water source through the cleaning water inlet to the gap, thereby preventing a processing waste and a processing fluid containing the processing waste from entering the gap.
- the processing waste and the processing fluid containing the processing waste from sticking to the wheel mount.
- FIG. 1 is a sectional view showing a first preferred embodiment of the processing apparatus according to the present invention
- FIG. 2 is a sectional view showing a second preferred embodiment of the processing apparatus according to the present invention.
- FIG. 3 is a sectional view showing the operation of the first preferred embodiment shown in FIG. 1 ;
- FIG. 4 is a sectional view showing the operation of the second preferred embodiment shown in FIG. 2 .
- the grinding apparatus 1 for grinding a platelike workpiece W as a first preferred embodiment of the processing apparatus according to the present invention.
- the grinding apparatus 1 essentially includes holding means 2 for holding the workpiece W and grinding means 3 for grinding the workpiece W held by the holding means 2 .
- the holding means 2 includes a holding table 20 having a holding surface 20 a for holding the workpiece W thereon and a rotating shaft 21 connected to the lower end of the holding table 20 .
- a motor (not shown) is connected to the rotating shaft 21 . Accordingly, when the holding means 2 is operated, the rotating shaft 21 is rotated to thereby rotate the holding table 20 in the direction shown by an arrow A in FIG. 1 .
- the grinding means 3 includes a grinding wheel 4 for grinding the workpiece W, a wheel mount 30 having a supporting surface (lower surface) 30 a for detachably supporting the grinding wheel 4 , a rotating shaft (spindle) 31 having one end connected to an upper surface 30 b of the wheel mount 30 opposite to the supporting surface 30 a to thereby rotate the grinding wheel 4 , a housing 32 for rotatably supporting the rotating shaft 31 , a mount cover 33 provided outside the housing 32 for covering the wheel mount 30 , and a motor 34 connected to the other end of the rotating shaft 31 .
- a plurality of abrasive members 4 a for grinding the workpiece W are fixed to the lower end of the grinding wheel 4 so as to be annularly arranged.
- the grinding wheel 4 is detachably mounted on the supporting surface 30 a of the wheel mount 30 .
- the wheel mount 30 is formed with a plurality of through holes for insertion of a plurality of bolts 6
- the grinding wheel 4 is also formed with a plurality of tapped holes respectively corresponding to the plural through holes of the wheel mount 30 .
- a grinding fluid passage 9 for supplying a grinding fluid to the workpiece W is formed in the rotating shaft 31 and the wheel mount 30 at their central portions.
- the grinding fluid passage 9 is connected to a grinding fluid source 11 .
- the grinding fluid is supplied from the grinding fluid source 11 through the grinding fluid passage 9 to the workpiece W.
- a nozzle 12 for supplying a grinding fluid to the workpiece W may be provided in the vicinity of the holding means 2 as shown in FIG. 1 . In this case, the grinding fluid passage 9 is not formed.
- the mount cover 33 is provided on the outer circumference of the housing 32 so as to cover the upper surface 30 b and side surface 30 c of the wheel mount 30 . As shown in FIG. 1 , the mount cover 33 is formed with a cleaning water inlet 8 for intaking a cleaning water, and a cleaning water source 10 is connected to the cleaning water inlet 8 . Further, the mount cover 33 is formed at its lower end with a cleaning water outlet 80 for discharging the cleaning water supplied from the cleaning water source 10 to the cleaning water inlet 8 .
- a gap 7 is formed between the inner surface of the mount cover 33 and the upper surface 30 b and side surface 30 c of the wheel mount 30 .
- the gap 7 is in communication with the cleaning water inlet 8 and the cleaning water outlet 80 and functions as a passage for the cleaning water.
- the cleaning water is supplied from the cleaning water source 10 through the cleaning water inlet 8 into the gap 7 and next discharged downward from the cleaning water outlet 80 .
- the grinding wheel 4 mounted on the supporting surface 30 a of the wheel mount 30 can be rotated in the direction of the arrow A. Further, the grinding means 3 can be vertically moved by feeding means (not shown) in the opposite directions shown by arrows B 1 and B 2 in FIG. 1 .
- the polishing apparatus 1 a for polishing a platelike workpiece W as a second preferred embodiment of the processing apparatus according to the present invention.
- the polishing apparatus 1 a essentially includes holding means 2 for holding the workpiece W and polishing means 3 a for polishing the workpiece W held by the holding means 2 .
- the polishing means 3 a of the polishing apparatus 1 a includes a wheel mount 30 having a supporting surface 30 a and a polishing pad 5 detachably mounted on the supporting surface 30 a of the wheel mount 30 by bolts 6 .
- substantially the same parts as those of the grinding apparatus 1 shown in FIG. 1 are denoted by the same reference numerals.
- a polishing fluid passage 13 for supplying a polishing fluid to the workpiece W is formed in the rotating shaft 31 , the wheel mount 30 , and the polishing pad 5 at their central portions.
- the polishing fluid passage 13 is connected to a polishing fluid source 14 .
- the polishing fluid is supplied from the polishing fluid source 14 through the polishing fluid passage 13 to the workpiece W.
- a nozzle 15 for supplying a polishing fluid to the workpiece W may be provided in the vicinity of the holding means 2 as shown in FIG. 2 . In this case, the polishing fluid passage 13 is not formed.
- the polishing pad 5 mounted on the supporting surface 30 a of the wheel mount 30 can be rotated in the direction of the arrow A as shown in FIG. 2 .
- the polishing means 3 a can be vertically moved by feeding means (not shown) in the opposite directions shown by arrows B 1 and B 2 in FIG. 2 .
- the operation of the grinding apparatus 1 and the polishing apparatus 1 a will now be described with reference to FIGS. 3 and 4 .
- First, the operation of the grinding apparatus 1 will be described with reference to FIG. 3 .
- the workpiece W is held on the holding table 20 of the holding means 2 , and the rotating shaft 21 of the holding means 2 is rotated to thereby rotate the holding table 20 in the direction of the arrow A.
- the rotating shaft 31 of the grinding means 3 is rotated to thereby rotate the grinding wheel 4 mounted on the supporting surface 30 a of the wheel mount 30 in the direction of the arrow A, and the grinding means 3 is lowered to thereby lower the grinding wheel 4 toward the workpiece W in the direction of the arrow B 2 until the abrasive members 4 a fixed to the lower end of the grinding wheel 4 come into contact with the workpiece W.
- the grinding wheel 4 being rotated is fed by a predetermined amount to make the abrasive members 4 a press against the workpiece W being rotated, thereby grinding the workpiece W to obtain a desired thickness.
- the grinding fluid is supplied from the grinding fluid source 11 to the workpiece W. That is, the grinding fluid supplied from the grinding fluid source 11 is allowed to downward flow in the grinding fluid passage 9 to the supporting surface 30 a of the wheel mount 30 and then supplied toward the workpiece W. At this time, a grinding waste due to the grinding is generated and the grinding waste thus generated is mixed into the grinding fluid.
- the grinding waste and the grinding fluid containing the grinding waste are entangled with the grinding wheel 4 being rotated to splatter toward the outer circumference of the grinding wheel 4 .
- the grinding waste and the grinding fluid containing the grinding waste thus splattering may rise to the position near the cleaning water outlet 80 and enter the gap 7 .
- the cleaning water is always supplied from the cleaning water source 10 to the cleaning water inlet 8 during the grinding of the workpiece W.
- the cleaning water is allowed to flow through the gap 7 and then discharged from the cleaning water outlet 80 , so that the grinding waste and the grinding fluid containing the grinding waste splattering near the cleaning water outlet 80 can be prevented from entering the gap 7 by the water pressure of the cleaning water directed downward.
- the operation of the polishing apparatus 1 a will now be described with reference to FIG. 4 .
- the workpiece W is held on the holding table 20 of the holding means 2 , and the rotating shaft 21 of the holding means 2 is rotated to thereby rotate the holding table 20 in the direction of the arrow A.
- the rotating shaft 31 of the polishing means 3 a is rotated to thereby rotate the polishing pad 5 mounted on the supporting surface 30 a of the wheel mount 30 in the direction of the arrow A, and the polishing means 3 a is lowered to thereby lower the polishing pad 5 toward the workpiece W in the direction of the arrow B 2 until the polishing pad 5 comes into contact with the workpiece W.
- the polishing pad 5 being rotated slides on the workpiece W being rotated, thereby polishing the workpiece W to obtain a desired polished surface.
- a polishing waste is generated due to the sliding contact of the polishing pad 5 and the workpiece W.
- the polishing fluid is supplied from the polishing fluid source 14 to the workpiece W in order to obtain the desired polished surface of the workpiece W. That is, the polishing fluid supplied from the polishing fluid source 14 is allowed to downward flow in the polishing fluid passage 13 to the sliding contact surface between the polishing pad 5 and the workpiece W. At this time, the polishing waste may be mixed into the polishing fluid supplied to the workpiece W because of rotation of the workpiece W and the polishing pad 5 .
- the polishing waste and the polishing fluid containing the polishing waste are entangled with the polishing pad 5 being rotated to splatter toward the outer circumference of the polishing pad 5 .
- the polishing waste and the polishing fluid containing the polishing waste thus splattering may rise to the position near the cleaning water outlet 80 and enter the gap 7 .
- the cleaning water is always supplied from the cleaning water source 10 to the cleaning water inlet 8 during the polishing of the workpiece W.
- the cleaning water is allowed to flow through the gap 7 and then discharged from the cleaning water outlet 80 , so that the polishing waste and the polishing fluid containing the polishing waste splattering near the cleaning water outlet 80 can be prevented from entering the gap 7 by the water pressure of the cleaning water directed downward. Even if the polishing waste and the polishing fluid containing the polishing waste enter the gap 7 , the cleaning water flowing in the gap 7 can force out the polishing waste and the polishing fluid containing the polishing waste.
- the cleaning water supplied to the cleaning water inlet 8 flows in the gap 7 and is then discharged from the cleaning water outlet 80 , thereby preventing the grinding waste, the grinding fluid containing the grinding waste, the polishing waste, and the polishing fluid containing the polishing waste from entering the gap 7 and also from sticking to the wheel mount 30 .
- the wheel mount 30 it is possible to prevent the wheel mount 30 from becoming dirty, thereby facilitating the replacement of the grinding wheel 4 and the polishing pad 5 .
Abstract
A processing apparatus including a holding unit having a holding surface for holding a platelike workpiece and a processing unit for processing the workpiece held by the holding unit. The processing unit includes a processing wheel opposed to the holding surface of the holding unit, a wheel mount having a supporting surface for detachably supporting the processing wheel, a rotating shaft connected to another surface of the wheel mount opposite to the supporting surface, a housing for rotatably supporting the rotating shaft, a mount cover provided on the housing so as to cover the wheel mount with a predetermined gap defined between the mount cover and the wheel mount, the mount cover having a cleaning water inlet communicating with the predetermined gap, and a cleaning water source connected to the cleaning water inlet.
Description
- 1. Field of the Invention
- The present invention relates to a processing apparatus having a processing wheel for processing a platelike workpiece by using a processing fluid.
- 2. Description of the Related Art
- As an apparatus for grinding a platelike workpiece to obtain a desired thickness, there is a grinding apparatus including holding means for holding the workpiece and grinding means for grinding the workpiece held by the holding means, wherein the workpiece is ground by the grinding means as supplying a grinding fluid to the workpiece.
- The grinding means in the grinding apparatus as mentioned above includes a rotating shaft having an axis extending in a vertical direction, a housing for rotatably supporting the rotating shaft, a wheel mount mounted on the lower end of the rotating shaft, and a grinding wheel mounted on the lower portion of the wheel mount (see Japanese Patent Laid-open No. 2011-235388, for example). Further, another example of the grinding means known in the art additionally includes a mount cover for covering the wheel mount to prevent a grinding waste generated by the grinding of the workpiece and a grinding fluid containing the grinding waste from sticking to the wheel mount.
- In the grinding apparatus as mentioned above, however, there is defined a gap between the wheel mount and the mount cover for covering the wheel mount. Accordingly, there is a possibility that when a platelike workpiece is ground by using such a grinding apparatus, a grinding waste generated by the grinding of the workpiece and a grinding fluid supplied to the workpiece and mixed with the grinding waste may enter the gap defined between the wheel mount being rotated and the mount cover. As a result, there arises a problem such that the grinding waste and the grinding fluid containing the grinding waste may stick to the wheel mount, so that the wheel mount becomes dirty to cause difficulty in replacing the grinding wheel.
- It is therefore an object of the present invention to provide a processing apparatus which can prevent a processing waste and a processing fluid containing the processing waste from sticking to the wheel mount.
- In accordance with an aspect of the present invention, there is provided a processing apparatus including holding means having a holding surface for holding a platelike workpiece; and processing means for processing the workpiece held by the holding means; the processing means having a processing wheel opposed to the holding surface of the holding means; a wheel mount having a supporting surface for detachably supporting the processing wheel; a rotating shaft connected to another surface of the wheel mount opposite to the supporting surface; a housing for rotatably supporting the rotating shaft; a mount cover provided on the housing so as to cover the wheel mount with a predetermined gap defined between the mount cover and the wheel mount, the mount cover having a cleaning water inlet communicating with the predetermined gap; and a cleaning water source connected to the cleaning water inlet.
- As described above, the processing means of the processing apparatus according to the present invention includes the wheel mount having the supporting surface for detachably supporting the processing wheel, the rotating shaft connected to another surface of the wheel mount opposite to the supporting surface to thereby rotate the processing wheel, the housing for rotatably supporting the rotating shaft, and the mount cover provided on the housing so as to cover the wheel mount. The mount cover is formed with the cleaning water inlet for intaking a cleaning water. The cleaning water inlet is in communication with the gap defined between the inner surface of the mount cover and the outer surface of the wheel mount. Accordingly, in processing the workpiece by means of the processing wheel as supplying a processing fluid to the workpiece, the cleaning water is supplied from the cleaning water source through the cleaning water inlet to the gap, thereby preventing a processing waste and a processing fluid containing the processing waste from entering the gap. As a result, it is possible to prevent the processing waste and the processing fluid containing the processing waste from sticking to the wheel mount.
- The above and other objects, features and advantages of the present invention and the manner of realizing them will become more apparent, and the invention itself will best be understood from a study of the following description and appended claims with reference to the attached drawings showing some preferred embodiments of the invention.
-
FIG. 1 is a sectional view showing a first preferred embodiment of the processing apparatus according to the present invention; -
FIG. 2 is a sectional view showing a second preferred embodiment of the processing apparatus according to the present invention; -
FIG. 3 is a sectional view showing the operation of the first preferred embodiment shown inFIG. 1 ; and -
FIG. 4 is a sectional view showing the operation of the second preferred embodiment shown inFIG. 2 . - Referring to
FIG. 1 , there is shown agrinding apparatus 1 for grinding a platelike workpiece W as a first preferred embodiment of the processing apparatus according to the present invention. Thegrinding apparatus 1 essentially includesholding means 2 for holding the workpiece W and grinding means 3 for grinding the workpiece W held by theholding means 2. Theholding means 2 includes a holding table 20 having aholding surface 20 a for holding the workpiece W thereon and a rotatingshaft 21 connected to the lower end of the holding table 20. A motor (not shown) is connected to the rotatingshaft 21. Accordingly, when theholding means 2 is operated, the rotatingshaft 21 is rotated to thereby rotate the holding table 20 in the direction shown by an arrow A inFIG. 1 . - The grinding means 3 includes a
grinding wheel 4 for grinding the workpiece W, awheel mount 30 having a supporting surface (lower surface) 30 a for detachably supporting the grindingwheel 4, a rotating shaft (spindle) 31 having one end connected to anupper surface 30 b of thewheel mount 30 opposite to the supportingsurface 30 a to thereby rotate thegrinding wheel 4, ahousing 32 for rotatably supporting the rotatingshaft 31, amount cover 33 provided outside thehousing 32 for covering thewheel mount 30, and amotor 34 connected to the other end of the rotatingshaft 31. - As shown in
FIG. 1 , a plurality ofabrasive members 4 a for grinding the workpiece W are fixed to the lower end of thegrinding wheel 4 so as to be annularly arranged. The grindingwheel 4 is detachably mounted on the supportingsurface 30 a of thewheel mount 30. More specifically, thewheel mount 30 is formed with a plurality of through holes for insertion of a plurality ofbolts 6, and thegrinding wheel 4 is also formed with a plurality of tapped holes respectively corresponding to the plural through holes of thewheel mount 30. By inserting thebolts 6 through the through holes of thewheel mount 30 and screwing thebolts 6 into the tapped holes of thegrinding wheel 4, thegrinding wheel 4 can be detachably mounted on the supportingsurface 30 a of thewheel mount 30. - A
grinding fluid passage 9 for supplying a grinding fluid to the workpiece W is formed in the rotatingshaft 31 and thewheel mount 30 at their central portions. Thegrinding fluid passage 9 is connected to agrinding fluid source 11. In grinding the workpiece W, the grinding fluid is supplied from thegrinding fluid source 11 through thegrinding fluid passage 9 to the workpiece W. As a modification of thegrinding apparatus 1, anozzle 12 for supplying a grinding fluid to the workpiece W may be provided in the vicinity of theholding means 2 as shown inFIG. 1 . In this case, thegrinding fluid passage 9 is not formed. - The
mount cover 33 is provided on the outer circumference of thehousing 32 so as to cover theupper surface 30 b andside surface 30 c of thewheel mount 30. As shown inFIG. 1 , themount cover 33 is formed with acleaning water inlet 8 for intaking a cleaning water, and acleaning water source 10 is connected to thecleaning water inlet 8. Further, themount cover 33 is formed at its lower end with acleaning water outlet 80 for discharging the cleaning water supplied from thecleaning water source 10 to thecleaning water inlet 8. - A
gap 7 is formed between the inner surface of themount cover 33 and theupper surface 30 b andside surface 30 c of thewheel mount 30. Thegap 7 is in communication with thecleaning water inlet 8 and thecleaning water outlet 80 and functions as a passage for the cleaning water. In grinding the workpiece W, the cleaning water is supplied from thecleaning water source 10 through thecleaning water inlet 8 into thegap 7 and next discharged downward from thecleaning water outlet 80. - When the rotating
shaft 31 is rotated in the direction of the arrow A, thegrinding wheel 4 mounted on the supportingsurface 30 a of thewheel mount 30 can be rotated in the direction of the arrow A. Further, the grinding means 3 can be vertically moved by feeding means (not shown) in the opposite directions shown by arrows B1 and B2 inFIG. 1 . - Referring next to
FIG. 2 , there is shown a polishing apparatus 1 a for polishing a platelike workpiece W as a second preferred embodiment of the processing apparatus according to the present invention. The polishing apparatus 1 a essentially includesholding means 2 for holding the workpiece W and polishing means 3 a for polishing the workpiece W held by theholding means 2. As in thegrinding apparatus 1, the polishing means 3 a of the polishing apparatus 1 a includes awheel mount 30 having a supportingsurface 30 a and apolishing pad 5 detachably mounted on the supportingsurface 30 a of thewheel mount 30 bybolts 6. InFIG. 2 , substantially the same parts as those of thegrinding apparatus 1 shown inFIG. 1 are denoted by the same reference numerals. - In the polishing apparatus 1 a, a
polishing fluid passage 13 for supplying a polishing fluid to the workpiece W is formed in the rotatingshaft 31, thewheel mount 30, and thepolishing pad 5 at their central portions. Thepolishing fluid passage 13 is connected to apolishing fluid source 14. In polishing the workpiece W, the polishing fluid is supplied from thepolishing fluid source 14 through thepolishing fluid passage 13 to the workpiece W. As a modification of the polishing apparatus 1 a, anozzle 15 for supplying a polishing fluid to the workpiece W may be provided in the vicinity of theholding means 2 as shown inFIG. 2 . In this case, thepolishing fluid passage 13 is not formed. - When the rotating
shaft 31 is rotated in the direction of the arrow A in the polishing apparatus 1 a, thepolishing pad 5 mounted on the supportingsurface 30 a of thewheel mount 30 can be rotated in the direction of the arrow A as shown inFIG. 2 . Further, the polishing means 3 a can be vertically moved by feeding means (not shown) in the opposite directions shown by arrows B1 and B2 inFIG. 2 . - The operation of the
grinding apparatus 1 and the polishing apparatus 1 a will now be described with reference toFIGS. 3 and 4 . First, the operation of thegrinding apparatus 1 will be described with reference toFIG. 3 . The workpiece W is held on the holding table 20 of theholding means 2, and therotating shaft 21 of theholding means 2 is rotated to thereby rotate the holding table 20 in the direction of the arrow A. At the same time, therotating shaft 31 of the grinding means 3 is rotated to thereby rotate the grindingwheel 4 mounted on the supportingsurface 30 a of thewheel mount 30 in the direction of the arrow A, and the grinding means 3 is lowered to thereby lower thegrinding wheel 4 toward the workpiece W in the direction of the arrow B2 until theabrasive members 4 a fixed to the lower end of thegrinding wheel 4 come into contact with the workpiece W. Further, thegrinding wheel 4 being rotated is fed by a predetermined amount to make theabrasive members 4 a press against the workpiece W being rotated, thereby grinding the workpiece W to obtain a desired thickness. - During the grinding of the workpiece W, the grinding fluid is supplied from the
grinding fluid source 11 to the workpiece W. That is, the grinding fluid supplied from thegrinding fluid source 11 is allowed to downward flow in thegrinding fluid passage 9 to the supportingsurface 30 a of thewheel mount 30 and then supplied toward the workpiece W. At this time, a grinding waste due to the grinding is generated and the grinding waste thus generated is mixed into the grinding fluid. - The grinding waste and the grinding fluid containing the grinding waste are entangled with the grinding
wheel 4 being rotated to splatter toward the outer circumference of thegrinding wheel 4. The grinding waste and the grinding fluid containing the grinding waste thus splattering may rise to the position near thecleaning water outlet 80 and enter thegap 7. However, in order to prevent the grinding waste and the grinding fluid containing the grinding waste from entering thegap 7, the cleaning water is always supplied from thecleaning water source 10 to thecleaning water inlet 8 during the grinding of the workpiece W. As a result, the cleaning water is allowed to flow through thegap 7 and then discharged from thecleaning water outlet 80, so that the grinding waste and the grinding fluid containing the grinding waste splattering near thecleaning water outlet 80 can be prevented from entering thegap 7 by the water pressure of the cleaning water directed downward. - The operation of the polishing apparatus 1 a will now be described with reference to
FIG. 4 . The workpiece W is held on the holding table 20 of the holding means 2, and therotating shaft 21 of the holding means 2 is rotated to thereby rotate the holding table 20 in the direction of the arrow A. At the same time, the rotatingshaft 31 of the polishing means 3 a is rotated to thereby rotate thepolishing pad 5 mounted on the supportingsurface 30 a of thewheel mount 30 in the direction of the arrow A, and the polishing means 3 a is lowered to thereby lower thepolishing pad 5 toward the workpiece W in the direction of the arrow B2 until thepolishing pad 5 comes into contact with the workpiece W. Accordingly, thepolishing pad 5 being rotated slides on the workpiece W being rotated, thereby polishing the workpiece W to obtain a desired polished surface. During the polishing of the workpiece W, a polishing waste is generated due to the sliding contact of thepolishing pad 5 and the workpiece W. - During the polishing of the workpiece W, the polishing fluid is supplied from the polishing
fluid source 14 to the workpiece W in order to obtain the desired polished surface of the workpiece W. That is, the polishing fluid supplied from the polishingfluid source 14 is allowed to downward flow in the polishingfluid passage 13 to the sliding contact surface between thepolishing pad 5 and the workpiece W. At this time, the polishing waste may be mixed into the polishing fluid supplied to the workpiece W because of rotation of the workpiece W and thepolishing pad 5. - The polishing waste and the polishing fluid containing the polishing waste are entangled with the
polishing pad 5 being rotated to splatter toward the outer circumference of thepolishing pad 5. The polishing waste and the polishing fluid containing the polishing waste thus splattering may rise to the position near the cleaningwater outlet 80 and enter thegap 7. However, in order to prevent the polishing waste and the polishing fluid containing the polishing waste from entering thegap 7, the cleaning water is always supplied from the cleaningwater source 10 to the cleaningwater inlet 8 during the polishing of the workpiece W. As a result, the cleaning water is allowed to flow through thegap 7 and then discharged from the cleaningwater outlet 80, so that the polishing waste and the polishing fluid containing the polishing waste splattering near the cleaningwater outlet 80 can be prevented from entering thegap 7 by the water pressure of the cleaning water directed downward. Even if the polishing waste and the polishing fluid containing the polishing waste enter thegap 7, the cleaning water flowing in thegap 7 can force out the polishing waste and the polishing fluid containing the polishing waste. - As described above, in the
grinding apparatus 1 and the polishing apparatus 1 a, the cleaning water supplied to the cleaningwater inlet 8 flows in thegap 7 and is then discharged from the cleaningwater outlet 80, thereby preventing the grinding waste, the grinding fluid containing the grinding waste, the polishing waste, and the polishing fluid containing the polishing waste from entering thegap 7 and also from sticking to thewheel mount 30. As a result, it is possible to prevent the wheel mount 30 from becoming dirty, thereby facilitating the replacement of thegrinding wheel 4 and thepolishing pad 5. - The present invention is not limited to the details of the above described preferred embodiments. The scope of the invention is defined by the appended claims and all changes and modifications as fall within the equivalence of the scope of the claims are therefore to be embraced by the invention.
Claims (1)
1. A processing apparatus comprising:
holding means having a holding surface for holding a platelike workpiece; and
processing means for processing said workpiece held by said holding means;
said processing means including:
a processing wheel opposed to said holding surface of said holding means;
a wheel mount having a supporting surface for detachably supporting said processing wheel;
a rotating shaft connected to another surface of said wheel mount opposite to said supporting surface;
a housing for rotatably supporting said rotating shaft;
a mount cover provided on said housing so as to cover said wheel mount with a predetermined gap defined between said mount cover and said wheel mount, said mount cover having a cleaning water inlet communicating with said predetermined gap; and
a cleaning water source connected to said cleaning water inlet.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012004067A JP2013141738A (en) | 2012-01-12 | 2012-01-12 | Processing apparatus |
JP2012-004067 | 2012-01-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
US20130183890A1 true US20130183890A1 (en) | 2013-07-18 |
Family
ID=48751202
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/710,928 Abandoned US20130183890A1 (en) | 2012-01-12 | 2012-12-11 | Processing apparatus |
Country Status (4)
Country | Link |
---|---|
US (1) | US20130183890A1 (en) |
JP (1) | JP2013141738A (en) |
KR (1) | KR20130083372A (en) |
CN (1) | CN103203689A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102017215705A1 (en) * | 2017-09-06 | 2019-03-07 | Siltronic Ag | Apparatus and method for double-sided grinding of semiconductor wafers |
US20210039213A1 (en) * | 2019-08-06 | 2021-02-11 | Disco Corporation | Spindle unit |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6353684B2 (en) | 2014-04-04 | 2018-07-04 | 株式会社ディスコ | Grinding wheel and grinding chamber cleaning method |
WO2016151561A1 (en) * | 2015-03-25 | 2016-09-29 | Ancora S.P.A. | Head for polishing ceramic items or natural stones |
JP6486752B2 (en) * | 2015-04-08 | 2019-03-20 | 株式会社ディスコ | Dry polishing machine |
CN105538162B (en) * | 2015-12-28 | 2017-10-27 | 宁波鑫晟工具有限公司 | A kind of sanding machine for being provided with heat abstractor |
JP7396785B2 (en) * | 2018-02-20 | 2023-12-12 | 株式会社ディスコ | grinding equipment |
KR102017013B1 (en) * | 2018-03-14 | 2019-09-02 | 주식회사 싸이텍 | Exchangeable polishing member for polishing device |
KR101994608B1 (en) * | 2019-05-23 | 2019-07-02 | 주식회사 싸이텍 | Exchangeable polishing member for polishing device |
KR20220141903A (en) * | 2020-03-06 | 2022-10-20 | 도쿄엘렉트론가부시키가이샤 | grinding device |
CN113103097A (en) * | 2021-04-14 | 2021-07-13 | 浙江洋丽机械设备有限公司 | Rod-shaped material surface cleaning and end polishing machine |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3148488A (en) * | 1961-12-11 | 1964-09-15 | Sun Tool And Machine Company | Coolant splash shield and support |
US5931725A (en) * | 1996-07-30 | 1999-08-03 | Tokyo Seimitsu Co., Ltd. | Wafer polishing machine |
US6012968A (en) * | 1998-07-31 | 2000-01-11 | International Business Machines Corporation | Apparatus for and method of conditioning chemical mechanical polishing pad during workpiece polishing cycle |
US6059702A (en) * | 1997-05-27 | 2000-05-09 | Chiron-Werke Gmbh & Co. Kg | Machine tool with coolant flushing system |
US6110012A (en) * | 1998-12-24 | 2000-08-29 | Lucent Technologies Inc. | Chemical-mechanical polishing apparatus and method |
US6139406A (en) * | 1997-06-24 | 2000-10-31 | Applied Materials, Inc. | Combined slurry dispenser and rinse arm and method of operation |
US6450869B1 (en) * | 1998-07-23 | 2002-09-17 | Naki Technologies Ltd. | Hand held cutting tool and attachment therefor |
US6722962B1 (en) * | 1997-04-22 | 2004-04-20 | Sony Corporation | Polishing system, polishing method, polishing pad, and method of forming polishing pad |
US20080057836A1 (en) * | 2003-10-24 | 2008-03-06 | Applied Materials, Inc. | Pad conditioning head for cmp process |
US20090017735A1 (en) * | 2004-12-06 | 2009-01-15 | Bernhard Dur | Device for polishing hard surfaces, especially glass surfaces |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2038830U (en) * | 1988-09-08 | 1989-06-07 | 铁道部戚墅堰机车车辆工艺研究所 | Grinding buffing machine |
JPH05309566A (en) * | 1992-04-21 | 1993-11-22 | Sony Corp | Grinding solution feeding structure |
JP3316483B2 (en) * | 1999-05-27 | 2002-08-19 | 三洋電機株式会社 | Fluid removal device |
JP4131898B2 (en) * | 2000-08-21 | 2008-08-13 | 三菱電機株式会社 | Semiconductor manufacturing apparatus and manufacturing method thereof |
JP5405727B2 (en) * | 2006-08-31 | 2014-02-05 | 株式会社ニデック | Grinding water treatment device for peripheral processing of eyeglass lenses |
JP2010188433A (en) * | 2009-02-16 | 2010-09-02 | Disco Abrasive Syst Ltd | Machining device with rotary tool |
-
2012
- 2012-01-12 JP JP2012004067A patent/JP2013141738A/en active Pending
- 2012-12-11 US US13/710,928 patent/US20130183890A1/en not_active Abandoned
- 2012-12-17 KR KR1020120147553A patent/KR20130083372A/en not_active Application Discontinuation
- 2012-12-21 CN CN201210559973XA patent/CN103203689A/en active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3148488A (en) * | 1961-12-11 | 1964-09-15 | Sun Tool And Machine Company | Coolant splash shield and support |
US5931725A (en) * | 1996-07-30 | 1999-08-03 | Tokyo Seimitsu Co., Ltd. | Wafer polishing machine |
US6722962B1 (en) * | 1997-04-22 | 2004-04-20 | Sony Corporation | Polishing system, polishing method, polishing pad, and method of forming polishing pad |
US6059702A (en) * | 1997-05-27 | 2000-05-09 | Chiron-Werke Gmbh & Co. Kg | Machine tool with coolant flushing system |
US6139406A (en) * | 1997-06-24 | 2000-10-31 | Applied Materials, Inc. | Combined slurry dispenser and rinse arm and method of operation |
US6450869B1 (en) * | 1998-07-23 | 2002-09-17 | Naki Technologies Ltd. | Hand held cutting tool and attachment therefor |
US6012968A (en) * | 1998-07-31 | 2000-01-11 | International Business Machines Corporation | Apparatus for and method of conditioning chemical mechanical polishing pad during workpiece polishing cycle |
US6110012A (en) * | 1998-12-24 | 2000-08-29 | Lucent Technologies Inc. | Chemical-mechanical polishing apparatus and method |
US20080057836A1 (en) * | 2003-10-24 | 2008-03-06 | Applied Materials, Inc. | Pad conditioning head for cmp process |
US20090017735A1 (en) * | 2004-12-06 | 2009-01-15 | Bernhard Dur | Device for polishing hard surfaces, especially glass surfaces |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102017215705A1 (en) * | 2017-09-06 | 2019-03-07 | Siltronic Ag | Apparatus and method for double-sided grinding of semiconductor wafers |
US20210039213A1 (en) * | 2019-08-06 | 2021-02-11 | Disco Corporation | Spindle unit |
US11673219B2 (en) * | 2019-08-06 | 2023-06-13 | Disco Corporation | Spindle unit |
Also Published As
Publication number | Publication date |
---|---|
CN103203689A (en) | 2013-07-17 |
KR20130083372A (en) | 2013-07-22 |
JP2013141738A (en) | 2013-07-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US20130183890A1 (en) | Processing apparatus | |
JP6844970B2 (en) | Polishing equipment | |
CN109202690B (en) | Grinding device | |
JP6454599B2 (en) | Polishing equipment | |
US20200284700A1 (en) | Planar grinder | |
CN105364719A (en) | Slurry supply device and polishing apparatus including the same | |
CN103506958A (en) | Water injection type electric tool | |
JP5263657B2 (en) | Polishing equipment | |
CN211332778U (en) | A feeding device for chemical machinery burnishing machine polishing solution | |
US20190210187A1 (en) | Polishing head for face-up type polishing apparatus, polishing apparatus including the polishing head, and polishing method using the polishing apparatus | |
JP5301629B2 (en) | Liquid supply structure in a grinding machine using a cup-shaped grinding wheel | |
CN102615583A (en) | Grinding device | |
JP6858543B2 (en) | Method of forming a holding surface of a holding table | |
JP2011093029A (en) | Grinding device | |
TWI602654B (en) | Spindle bore taper grinding machine | |
TWM555271U (en) | Grinding head of main bore taper grinding machine | |
JP3860901B2 (en) | Coolant supply device for 2 head finishing machine | |
KR101841402B1 (en) | Lapping device for cylinder block | |
JP4598095B2 (en) | Polishing equipment | |
KR20130084184A (en) | Coolant saturatate preventing device of spindlebearing of a machine tool | |
KR101236163B1 (en) | Pad conditioning disk and pad conditioner and pad conditioning method | |
JPH02124269A (en) | Feeding unit for grinding liquid | |
JP6920079B2 (en) | Chuck table | |
JP2009214280A (en) | Machine tool | |
JP2017196725A (en) | Wrapping polishing surface plate and device using the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: DISCO CORPORATION, JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:AKAHANE, ATSUNORI;REEL/FRAME:029445/0910 Effective date: 20121126 |
|
STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |