TWI828353B - Display device - Google Patents

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TWI828353B
TWI828353B TW111138091A TW111138091A TWI828353B TW I828353 B TWI828353 B TW I828353B TW 111138091 A TW111138091 A TW 111138091A TW 111138091 A TW111138091 A TW 111138091A TW I828353 B TWI828353 B TW I828353B
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metasurface
metasurface structure
display device
layer
structure layer
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TW202305465A (en
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郭家瑋
呂紹平
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友達光電股份有限公司
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Abstract

A display device includes a device array substrate, a first meta-surface structure layer and a second meta-surface structure layer. The first meta-surface structure layer is disposed at one side of the device array substrate and includes a plurality of first meta-surface structure sets. The second meta-surface structure layer is disposed between the first meta-surface structure layer and the device array substrate and includes a plurality of second meta-surface structure sets. The pattern of the first meta-surface structure set is complementary to that of the second meta-surface structure set.

Description

顯示裝置display device

本發明是有關於一種顯示裝置，且特別是有關於一種能夠提高5G毫米波覆蓋率同時保持良好顯示品質的顯示裝置。The present invention relates to a display device, and in particular, to a display device that can improve 5G millimeter wave coverage while maintaining good display quality.

隨著第五代行動通訊技術（5G）的商業化，遠距醫療、VR直播、4K畫質直播、智慧家庭等等應用都有了新的發展契機。由於5G具有高資料速率、減少延遲、節省能源、降低成本、提高系統容量和大規模裝置連接等效能，不同領域的業者還可進行跨界結盟，共同打造新一代的5G生態鏈。With the commercialization of fifth-generation mobile communication technology (5G), applications such as telemedicine, VR live broadcast, 4K image quality live broadcast, smart home, etc. have new development opportunities. Because 5G has high data rates, reduced delays, energy savings, cost reductions, increased system capacity, and large-scale device connections, players in different fields can also form cross-border alliances to jointly create a new generation of 5G ecological chain.

為了提高5G毫米波的覆蓋率，可以藉由在顯示裝置中設置超表面結構（Meta-surface structure）來延伸電磁波的可傳輸距離。然而，由於超表面結構與顯示裝置中的顯示單元皆具有結構周期性，直接將超表面結構組合於顯示裝置中將產生所謂的疊紋效應（Moire Effect），導致顯示裝置的顯示品質降低。In order to improve the coverage of 5G millimeter waves, a meta-surface structure can be provided in the display device to extend the transmittable distance of electromagnetic waves. However, since both the metasurface structure and the display units in the display device have structural periodicity, directly combining the metasurface structure into the display device will produce a so-called moire effect, resulting in a reduction in the display quality of the display device.

本發明提供一種顯示裝置，能夠提高5G毫米波的覆蓋率，同時保持良好的顯示品質。The present invention provides a display device that can improve the coverage of 5G millimeter waves while maintaining good display quality.

本發明的一個實施例提出一種顯示裝置，包括：元件陣列基板；第一超表面結構層，位於元件陣列基板的一側，且包括多組第一超表面結構組；以及第二超表面結構層，位於第一超表面結構層與元件陣列基板之間，且包括多組第二超表面結構組，其中，第一超表面結構組與第二超表面結構組的圖案互補。One embodiment of the present invention provides a display device, including: an element array substrate; a first metasurface structure layer located on one side of the element array substrate and including a plurality of first metasurface structure groups; and a second metasurface structure layer , is located between the first metasurface structure layer and the element array substrate, and includes a plurality of second metasurface structure groups, wherein the patterns of the first metasurface structure group and the second metasurface structure group are complementary.

在本發明的一實施例中，還包括顯示元件層，位於第二超表面結構層與元件陣列基板之間。In an embodiment of the present invention, a display element layer is further included, located between the second metasurface structure layer and the element array substrate.

在本發明的一實施例中，還包括濾光基板，其中第一超表面結構層位於濾光基板與第二超表面結構層之間。In an embodiment of the present invention, a filter substrate is further included, wherein the first metasurface structure layer is located between the filter substrate and the second metasurface structure layer.

在本發明的一實施例中，還包括濾光基板，其中濾光基板位於第一超表面結構層與第二超表面結構層之間。In an embodiment of the present invention, a filter substrate is further included, wherein the filter substrate is located between the first metasurface structure layer and the second metasurface structure layer.

在本發明的一實施例中，還包括濾光基板，其中第二超表面結構層位於濾光基板與第一超表面結構層之間。In an embodiment of the present invention, a filter substrate is further included, wherein the second metasurface structure layer is located between the filter substrate and the first metasurface structure layer.

在本發明的一實施例中，上述的多組第一超表面結構組或多組第二超表面結構組彼此相同或不同。In an embodiment of the present invention, the above-mentioned plurality of first metasurface structure groups or plurality of second metasurface structure groups are the same as or different from each other.

在本發明的一實施例中，上述的第一超表面結構組及第二超表面結構組分別包括多個超表面結構，且多個超表面結構具有彼此相同的形狀及彼此不同的尺寸、間距或方位。In an embodiment of the present invention, the above-mentioned first metasurface structure group and the second metasurface structure group respectively include a plurality of metasurface structures, and the plurality of metasurface structures have the same shape and different sizes and spacings. or orientation.

在本發明的一實施例中，上述的第一超表面結構組包括多個第一超表面結構，第二超表面結構組包括多個第二超表面結構，且第二超表面結構具有對應第一超表面結構的開口，其中第一超表面結構的長度與對應的第二超表面結構的開口的長度之比介於0.99-1.01。In an embodiment of the present invention, the first metasurface structure group includes a plurality of first metasurface structures, the second metasurface structure group includes a plurality of second metasurface structures, and the second metasurface structure has a structure corresponding to the first metasurface structure. An opening of a metasurface structure, wherein the ratio of the length of the first metasurface structure to the length of the corresponding opening of the second metasurface structure is between 0.99-1.01.

在本發明的一實施例中，上述的第一超表面結構組包括多個第一超表面結構，第二超表面結構組包括多個第二超表面結構，且第二超表面結構具有對應第一超表面結構的開口，其中第一超表面結構之間的間距與對應的第二超表面結構的開口之間的間距之比介於0.99-1.01。In an embodiment of the present invention, the first metasurface structure group includes a plurality of first metasurface structures, the second metasurface structure group includes a plurality of second metasurface structures, and the second metasurface structure has a structure corresponding to the first metasurface structure. The openings of a metasurface structure, wherein the ratio of the spacing between the first metasurface structures and the spacing between the corresponding openings of the second metasurface structure is between 0.99-1.01.

在本發明的一實施例中，上述的第一超表面結構組及第二超表面結構組包括透明導電材料。In an embodiment of the present invention, the first metasurface structure group and the second metasurface structure group include transparent conductive materials.

本發明的一個實施例提出一種顯示裝置，包括：元件陣列基板；第一超表面結構層，位於元件陣列基板的一側，且包括多組第一超表面結構組；以及第二超表面結構層，位於第一超表面結構層與元件陣列基板之間，且包括多組第二超表面結構組，其中，第二超表面結構組的面積大於第一超表面結構組的面積。One embodiment of the present invention provides a display device, including: an element array substrate; a first metasurface structure layer located on one side of the element array substrate and including a plurality of first metasurface structure groups; and a second metasurface structure layer , is located between the first metasurface structure layer and the element array substrate, and includes a plurality of second metasurface structure groups, wherein the area of the second metasurface structure group is larger than the area of the first metasurface structure group.

在本發明的一實施例中，上述的第二超表面結構組接地。In an embodiment of the present invention, the above-mentioned second metasurface structure group is grounded.

在本發明的一實施例中，上述的第一超表面結構組於元件陣列基板的正投影重疊第二超表面結構組於元件陣列基板的正投影。In an embodiment of the present invention, the orthographic projection of the above-mentioned first metasurface structure group on the device array substrate overlaps the orthographic projection of the second metasurface structure group on the device array substrate.

在本發明的一實施例中，上述的第二超表面結構組位於元件陣列基板中。In an embodiment of the present invention, the above-mentioned second metasurface structure group is located in the element array substrate.

在本發明的一實施例中，還包括顯示元件層，位於第一超表面結構層與第二超表面結構層之間。In an embodiment of the present invention, a display element layer is further included, located between the first metasurface structure layer and the second metasurface structure layer.

在本發明的一實施例中，上述的第一超表面結構組及第二超表面結構組包括不透明導電材料。In an embodiment of the present invention, the first metasurface structure group and the second metasurface structure group include opaque conductive materials.

為讓本發明的上述特徵和優點能更明顯易懂，下文特舉實施例，並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more obvious and easy to understand, embodiments are given below and described in detail with reference to the accompanying drawings.

圖1A是依照本發明一實施例的顯示裝置10的局部剖面示意圖。圖1B是圖1A的顯示裝置10的超表面結構層120的局部平面示意圖。圖1C是圖1A的顯示裝置10的超表面結構層130的局部平面示意圖。FIG. 1A is a partial cross-sectional schematic diagram of a display device 10 according to an embodiment of the present invention. FIG. 1B is a partial plan view of the metasurface structure layer 120 of the display device 10 of FIG. 1A . FIG. 1C is a partial plan view of the metasurface structure layer 130 of the display device 10 of FIG. 1A .

請同時參照圖1A至圖1C，顯示裝置10包括：元件陣列基板110；超表面結構層120，位於元件陣列基板110的一側，且包括多組超表面結構組MS1；以及超表面結構層130，位於超表面結構層120與元件陣列基板110之間，且包括多組超表面結構組MS2，其中，超表面結構組MS1與超表面結構組MS2的圖案互補。Please refer to FIGS. 1A to 1C at the same time. The display device 10 includes: an element array substrate 110; a metasurface structure layer 120, which is located on one side of the element array substrate 110 and includes a plurality of metasurface structure groups MS1; and a metasurface structure layer 130. , is located between the metasurface structure layer 120 and the element array substrate 110, and includes multiple sets of metasurface structure groups MS2, wherein the patterns of the metasurface structure group MS1 and the metasurface structure group MS2 are complementary.

在本發明的一實施例的顯示裝置10中，藉由設置超表面結構組MS1、130來控制電磁波的相位延遲，可實現電磁波的波束轉向（beam steering），使得顯示裝置10有助於延伸電磁波的可傳輸距離，進而提高5G毫米波的覆蓋率。另外，藉由使超表面結構組MS1與超表面結構組MS2具有互補的圖案，能夠彌補穿透率不均及防止疊紋效應，從而保持良好的顯示品質。In the display device 10 according to an embodiment of the present invention, beam steering of the electromagnetic waves can be achieved by setting the metasurface structure groups MS1 and 130 to control the phase delay of the electromagnetic waves, so that the display device 10 helps to extend the electromagnetic waves. The transmittable distance can be improved, thereby improving the coverage of 5G millimeter wave. In addition, by having the metasurface structure group MS1 and the metasurface structure group MS2 have complementary patterns, uneven transmittance can be compensated and mosaic effects can be prevented, thereby maintaining good display quality.

以下，配合圖式，繼續說明顯示裝置10的各個元件的實施方式。請參照圖1A，顯示裝置10的元件陣列基板110可以包括透明基板或非透明基板，且其材質可以是石英、玻璃、高分子或其他適當的材質，但本發明不以此為限。在本實施例中，元件陣列基板110還可以包括驅動電路層DL，且驅動電路層DL可以包括顯示裝置10需要的線路或元件，例如電源線、驅動訊號線、時序訊號線、檢測訊號線、電流補償線、驅動元件、開關元件、儲存電容等等，而且上述線路或元件可以透過接墊或導線與驅動電路層DL外部的線路或元件電性連接。Below, the implementation of each element of the display device 10 will be continued to be described with reference to the drawings. Referring to FIG. 1A , the element array substrate 110 of the display device 10 may include a transparent substrate or a non-transparent substrate, and its material may be quartz, glass, polymer or other appropriate materials, but the invention is not limited thereto. In this embodiment, the element array substrate 110 may also include a driving circuit layer DL, and the driving circuit layer DL may include lines or elements required by the display device 10, such as power lines, driving signal lines, timing signal lines, detection signal lines, Current compensation lines, driving elements, switching elements, storage capacitors, etc., and the above lines or elements can be electrically connected to lines or elements outside the driving circuit layer DL through pads or wires.

超表面結構層120位於元件陣列基板110上。超表面結構層120的超表面結構組MS1可以包括構成最小重複單元的多個超表面結構。舉例而言，在本實施例中，超表面結構B1、B2、B3構成了最小重複單元，因此，超表面結構組MS1可以包括超表面結構B1、B2、B3。由於尺寸不同的超表面結構B1、B2、B3具有不同的電磁波共振頻率，當特定頻率的電磁波入射於超表面結構B1、B2、B3時，超表面結構B1、B2、B3將產生相位延遲量不同的感應電流，進而改變反射電磁波的相位。如此一來，藉由控制超表面結構B1、B2、B3的尺寸即可控制感應電流的相位延遲量，同時藉由超表面結構B1、B2、B3的尺寸變化能夠控制電磁波的發射角度，從而實現波束轉向的功效。The metasurface structure layer 120 is located on the element array substrate 110 . The metasurface structure group MS1 of the metasurface structure layer 120 may include a plurality of metasurface structures constituting a minimum repeating unit. For example, in this embodiment, the metasurface structures B1, B2, and B3 constitute the smallest repeating unit. Therefore, the metasurface structure group MS1 may include the metasurface structures B1, B2, and B3. Since the metasurface structures B1, B2, and B3 with different sizes have different electromagnetic wave resonance frequencies, when electromagnetic waves of a specific frequency are incident on the metasurface structures B1, B2, and B3, the metasurface structures B1, B2, and B3 will produce different phase delays. The induced current changes the phase of the reflected electromagnetic wave. In this way, the phase delay of the induced current can be controlled by controlling the sizes of the metasurface structures B1, B2, and B3, and the emission angle of the electromagnetic wave can be controlled by the size changes of the metasurface structures B1, B2, and B3, thereby achieving The effectiveness of beam steering.

超表面結構層120的多組超表面結構組MS1可以彼此相同或彼此不同。舉例而言，在本實施例中，超表面結構層120可以包括多組彼此相同的超表面結構組MS1，也就是說，超表面結構組MS1可以具有彼此相同的形狀、尺寸、方位等，但本發明不以此為限。在一些實施例中，超表面結構層120可以包括形狀、尺寸及/或方位等彼此不同的多組超表面結構組。The plurality of metasurface structure groups MS1 of the metasurface structure layer 120 may be the same as each other or different from each other. For example, in this embodiment, the metasurface structure layer 120 may include multiple sets of metasurface structure groups MS1 that are identical to each other. That is to say, the metasurface structure groups MS1 may have the same shape, size, orientation, etc., but The present invention is not limited to this. In some embodiments, the metasurface structure layer 120 may include multiple sets of metasurface structure groups that are different in shape, size, and/or orientation.

超表面結構組MS1可大致以陣列的方式排列。舉例而言，在如圖1B所示的實施例中，六組超表面結構組MS1可大致以2x3的矩陣排列，但不以此為限。在一些實施例中，六組超表面結構組MS1還可以1x6、3x2或6x1的矩陣排列。The metasurface structure group MS1 may be generally arranged in an array. For example, in the embodiment shown in FIG. 1B , the six groups of metasurface structure groups MS1 can be arranged roughly in a 2x3 matrix, but it is not limited to this. In some embodiments, the six groups of metasurface structure groups MS1 can also be arranged in a 1x6, 3x2 or 6x1 matrix.

超表面結構組MS1中的超表面結構B1、B2、B3可以具有彼此相同的形狀、但彼此不同的尺寸。舉例而言，在本實施例中，超表面結構組MS1的超表面結構B1、B2、B3可以皆為十字結構，且超表面結構B1的尺寸大於超表面結構B2的尺寸，超表面結構B2的尺寸大於超表面結構B3的尺寸。也就是說，超表面結構B1、B2、B3的形狀相同但尺寸不同，且超表面結構B1、B2、B3的尺寸呈現遞減的關係。應注意的是，超表面結構B1、B2、B3的形狀並不限於如圖1B所示的十字結構，超表面結構B1、B2、B3的尺寸變化還可就其三維尺寸進行個別變化或組合變化，且個別超表面結構組MS1中的超表面結構B1、B2、B3的形狀、尺寸及方位還可個別進行微調，以實現所需的波束轉向。The metasurface structures B1, B2, and B3 in the metasurface structure group MS1 may have the same shape as each other but different sizes from each other. For example, in this embodiment, the metasurface structures B1, B2, and B3 of the metasurface structure group MS1 may all be cross structures, and the size of the metasurface structure B1 is larger than the size of the metasurface structure B2. The size of the metasurface structure B2 is The size is larger than that of metasurface structure B3. That is to say, the metasurface structures B1, B2, and B3 have the same shape but different sizes, and the sizes of the metasurface structures B1, B2, and B3 show a decreasing relationship. It should be noted that the shapes of the metasurface structures B1, B2, and B3 are not limited to the cross structures shown in Figure 1B. The size changes of the metasurface structures B1, B2, and B3 can also be changed individually or in combination with respect to their three-dimensional dimensions. , and the shape, size and orientation of the metasurface structures B1, B2, and B3 in the individual metasurface structure group MS1 can also be individually fine-tuned to achieve the required beam steering.

超表面結構B1、B2、B3的尺寸可以取決於入射電磁波的波長。舉例而言，在本實施例中，對於毫米波的電磁波而言，超表面結構B1、B2、B3的尺寸可以介於0.01 x 0.01 mm 2至10 x 10 mm 2之間，但不以此為限。此外，在本實施例中，超表面結構B1、B2、B3的材質可以包括透明導電材料，例如銦錫氧化物、鋅鋁氧化物、鋅鎵氧化物、鋅銦氧化物等。 The size of the metasurface structures B1, B2, B3 may depend on the wavelength of the incident electromagnetic wave. For example, in this embodiment, for millimeter-wave electromagnetic waves, the dimensions of the metasurface structures B1, B2, and B3 can be between 0.01 x 0.01 mm 2 and 10 x 10 mm 2 , but this is not considered to be limit. In addition, in this embodiment, the material of the metasurface structures B1, B2, and B3 may include transparent conductive materials, such as indium tin oxide, zinc aluminum oxide, zinc gallium oxide, zinc indium oxide, etc.

超表面結構層130可以包括多組超表面結構組MS2，超表面結構組MS2可以包括超表面結構C1、C2、C3，且超表面結構C1、C2、C3的圖案分別與超表面結構組MS1的超表面結構B1、B2、B3互補。舉例而言，在本實施例中，超表面結構C1、C2、C3可以分別具有開口O1、O2、O3，且開口O1、O2、O3的形狀及尺寸與超表面結構B1、B2、B3的形狀及尺寸可以相同或近似，使得超表面結構層120、130的圖案能夠互補。也就是說，若將超表面結構B1、B2、B3分別置於超表面結構C1、C2、C3的開口O1、O2、O3中，將可形成平板或近似平板的結構。The metasurface structure layer 130 may include multiple sets of metasurface structure groups MS2. The metasurface structure group MS2 may include metasurface structures C1, C2, and C3, and the patterns of the metasurface structures C1, C2, and C3 are respectively the same as those of the metasurface structure group MS1. Metasurface structures B1, B2, and B3 are complementary. For example, in this embodiment, the metasurface structures C1, C2, and C3 may have openings O1, O2, and O3 respectively, and the shapes and sizes of the openings O1, O2, and O3 are the same as the shapes of the metasurface structures B1, B2, and B3. and dimensions may be the same or similar so that the patterns of the metasurface structure layers 120, 130 can be complementary. That is to say, if the metasurface structures B1, B2, and B3 are respectively placed in the openings O1, O2, and O3 of the metasurface structures C1, C2, and C3, a flat or approximately flat structure will be formed.

在本實施例中，超表面結構C1、C2、C3的材質可以包括透明導電材料，例如銦錫氧化物、鋅鋁氧化物、鋅鎵氧化物、鋅銦氧化物等。另外，顯示裝置10還可以包括絕緣層I1、I2以及濾光基板CG，其中超表面結構層120可以位於濾光基板CG與超表面結構層130之間，且超表面結構層120可以位於濾光基板CG與絕緣層I1之間，超表面結構層130可以位於絕緣層I1與絕緣層I2之間，以避免不必要的電性連接。In this embodiment, the material of the metasurface structures C1, C2, and C3 may include transparent conductive materials, such as indium tin oxide, zinc aluminum oxide, zinc gallium oxide, zinc indium oxide, etc. In addition, the display device 10 may also include insulating layers I1 and I2 and a filter substrate CG, wherein the metasurface structure layer 120 may be located between the filter substrate CG and the metasurface structure layer 130, and the metasurface structure layer 120 may be located between the filter substrate CG and the metasurface structure layer 130. Between the substrate CG and the insulating layer I1, the metasurface structure layer 130 may be located between the insulating layer I1 and the insulating layer I2 to avoid unnecessary electrical connections.

在一些實施例中，考量到製程合理性及視覺效果，超表面結構層120的超表面結構組MS1的超表面結構B1、B2、B3與超表面結構層130的超表面結構組MS2的超表面結構C1、C2、C3於元件陣列基板110的正投影可以部分重疊或分開1%，但不以此為限。舉例而言，在一些實施例中，超表面結構層120的超表面結構B1、B2之間的間距W1與超表面結構層130中對應的超表面結構C1、C2的開口O1、O2之間的間距W2之比可以介於0.99-1.01。在一些實施例中，超表面結構層120的超表面結構B3的橫向長度W3與超表面結構層130中對應的超表面結構C3的開口O3的橫向長度W4之比也可以介於0.99-1.01。In some embodiments, considering the rationality of the process and the visual effect, the metasurface structures B1, B2, and B3 of the metasurface structure group MS1 of the metasurface structure layer 120 and the metasurface of the metasurface structure group MS2 of the metasurface structure layer 130 The orthographic projections of the structures C1, C2, and C3 on the element array substrate 110 may partially overlap or be separated by 1%, but are not limited to this. For example, in some embodiments, the spacing W1 between the metasurface structures B1 and B2 of the metasurface structure layer 120 and the spacing W1 between the openings O1 and O2 of the corresponding metasurface structures C1 and C2 in the metasurface structure layer 130 are The ratio of spacing W2 can be between 0.99-1.01. In some embodiments, the ratio of the lateral length W3 of the metasurface structure B3 of the metasurface structure layer 120 to the lateral length W4 of the opening O3 of the corresponding metasurface structure C3 in the metasurface structure layer 130 may also be between 0.99-1.01.

由於超表面結構具有圖案相反時對於電磁波的表現（例如穿透率）也相反的特性，當超表面結構組MS1對於毫米波訊號具有低穿透率時，超表面結構組MS2對於毫米波訊號可具有高穿透率。如此一來，大部分的毫米波訊號將被超表面結構組MS1反射而不會前往下方的超表面結構組MS2，在此情況下，對於毫米波訊號的作用主要來自超表面結構組MS1，而超表面結構組MS2將不會影響毫米波訊號的特性。同時，圖案互補的超表面結構組MS1與超表面結構組MS2將使得顯示裝置10對於可見光具有均勻的穿透率，且可防止疊紋效應。Since the metasurface structure has the characteristic that the electromagnetic wave performance (such as transmittance) is opposite when the pattern is opposite, when the metasurface structure group MS1 has low transmittance for millimeter wave signals, the metasurface structure group MS2 can be used for millimeter wave signals. Has high penetration rate. As a result, most of the millimeter wave signals will be reflected by the metasurface structure group MS1 and will not go to the metasurface structure group MS2 below. In this case, the effect on the millimeter wave signal mainly comes from the metasurface structure group MS1, and The metasurface structure group MS2 will not affect the characteristics of millimeter wave signals. At the same time, the metasurface structure group MS1 and the metasurface structure group MS2 with complementary patterns will enable the display device 10 to have uniform transmittance for visible light and prevent the moire effect.

以下，配合圖2至圖8繼續說明本發明的其他實施例或實施態樣，其中，採用與圖1A至圖1C的實施例相同或近似的元件標號來表示相同或近似的元件，並且省略了相同技術內容的說明。關於省略部分的說明，可參考圖1A至圖1C的實施例，在以下的說明中將不再贅述。Below, other embodiments or implementation aspects of the present invention will be continued to be described with reference to FIGS. 2 to 8 . The same or similar component numbers as those in the embodiment of FIGS. 1A to 1C are used to represent the same or similar components, and omitted. Description of the same technical content. For descriptions of omitted parts, reference may be made to the embodiments of FIGS. 1A to 1C , which will not be described again in the following description.

圖2是依照本發明一實施例的顯示裝置20的局部剖面示意圖。顯示裝置20包括：元件陣列基板110、超表面結構層120、超表面結構層130、濾光基板CG以及絕緣層I2。與圖1A至圖1C所示的顯示裝置10相比，如圖2所示的顯示裝置20的不同之處在於：顯示裝置20還可以包括彩色濾光結構CF及遮光結構BM，且彩色濾光結構CF及遮光結構BM可以取代顯示裝置10的絕緣層I1，而位於超表面結構層120與超表面結構層130之間。也就是說，超表面結構層120、130可以設置於濾光基板CG之內，且超表面結構層120、130可以位於彩色濾光結構CF及遮光結構BM的相對側。FIG. 2 is a partial cross-sectional view of the display device 20 according to an embodiment of the present invention. The display device 20 includes: an element array substrate 110, a metasurface structure layer 120, a metasurface structure layer 130, a filter substrate CG, and an insulating layer I2. Compared with the display device 10 shown in FIGS. 1A to 1C , the difference of the display device 20 shown in FIG. 2 is that the display device 20 may also include a color filter structure CF and a light-shielding structure BM, and the color filter The structure CF and the light-shielding structure BM can replace the insulation layer I1 of the display device 10 and be located between the metasurface structure layer 120 and the metasurface structure layer 130 . That is to say, the metasurface structure layers 120 and 130 may be disposed within the filter substrate CG, and the metasurface structure layers 120 and 130 may be located on opposite sides of the color filter structure CF and the light shielding structure BM.

圖3A是依照本發明一實施例的顯示裝置30的局部剖面示意圖。圖3B是圖3A的顯示裝置30的超表面結構層123的局部平面示意圖。圖3C是圖3A的顯示裝置30的超表面結構層133的局部平面示意圖。顯示裝置30包括：元件陣列基板110、超表面結構層123、超表面結構層133、濾光基板CG以及絕緣層I1、I2。與圖1A至圖1C所示的顯示裝置10相比，如圖3所示的顯示裝置30的不同之處在於：顯示裝置30的超表面結構層123包括如圖1C所示的超表面結構組MS2，且超表面結構層133包括如圖1B所示的超表面結構組MS1。FIG. 3A is a partial cross-sectional schematic diagram of the display device 30 according to an embodiment of the present invention. FIG. 3B is a partial plan view of the metasurface structure layer 123 of the display device 30 of FIG. 3A . FIG. 3C is a partial plan view of the metasurface structure layer 133 of the display device 30 of FIG. 3A . The display device 30 includes: an element array substrate 110, a metasurface structure layer 123, a metasurface structure layer 133, a filter substrate CG, and insulating layers I1 and I2. Compared with the display device 10 shown in FIGS. 1A to 1C , the difference of the display device 30 shown in FIG. 3 is that the metasurface structure layer 123 of the display device 30 includes the metasurface structure group as shown in FIG. 1C MS2, and the metasurface structure layer 133 includes the metasurface structure group MS1 as shown in FIG. 1B.

在本實施例中，由於超表面結構層123的超表面結構組MS2對於毫米波訊號具有高穿透率，且超表面結構層133的超表面結構組MS1對於毫米波訊號具有低穿透率，大部分的毫米波訊號將穿透超表面結構層123的超表面結構組MS2，且隨後被超表面結構層133的超表面結構組MS1反射。在此情況下，對於毫米波訊號的作用主要仍來自超表面結構組MS1，且超表面結構組MS2同樣不會影響毫米波訊號的特性。同樣地，圖案互補的超表面結構組MS1與超表面結構組MS2將使得顯示裝置30對於可見光具有均勻的穿透率，且可防止疊紋效應。In this embodiment, since the metasurface structure group MS2 of the metasurface structure layer 123 has high transmittance for millimeter wave signals, and the metasurface structure group MS1 of the metasurface structure layer 133 has low transmittance for millimeter wave signals, Most of the millimeter wave signals will penetrate the metasurface structure group MS2 of the metasurface structure layer 123 and then be reflected by the metasurface structure group MS1 of the metasurface structure layer 133 . In this case, the main effect on the millimeter wave signal still comes from the metasurface structure group MS1, and the metasurface structure group MS2 will also not affect the characteristics of the millimeter wave signal. Similarly, the metasurface structure group MS1 and the metasurface structure group MS2 with complementary patterns will enable the display device 30 to have uniform transmittance for visible light and prevent the moire effect.

圖4是依照本發明一實施例的顯示裝置40的局部剖面示意圖。顯示裝置40包括：元件陣列基板110、超表面結構層120、超表面結構層130、濾光基板CG、絕緣層I2、彩色濾光結構CF以及遮光結構BM。與圖2所示的顯示裝置20相比，如圖4所示的顯示裝置40的不同之處在於：顯示裝置40還可以包括位於濾光基板CG上的透光蓋板US，且超表面結構層120可以位於蓋板US與濾光基板CG之間，超表面結構層130可以位於彩色濾光結構CF以及遮光結構BM與濾光基板CG之間。也就是說，超表面結構層120可以位於濾光基板CG之外，且超表面結構層130可以位於濾光基板CG之內，使得濾光基板CG可以位於超表面結構層120與超表面結構層130之間。FIG. 4 is a partial cross-sectional view of a display device 40 according to an embodiment of the present invention. The display device 40 includes: an element array substrate 110, a metasurface structure layer 120, a metasurface structure layer 130, a filter substrate CG, an insulating layer I2, a color filter structure CF, and a light shielding structure BM. Compared with the display device 20 shown in FIG. 2 , the difference of the display device 40 shown in FIG. 4 is that the display device 40 may also include a light-transmitting cover US located on the filter substrate CG, and the metasurface structure The layer 120 may be located between the cover plate US and the filter substrate CG, and the metasurface structure layer 130 may be located between the color filter structure CF and the light-shielding structure BM and the filter substrate CG. That is to say, the metasurface structure layer 120 can be located outside the filter substrate CG, and the metasurface structure layer 130 can be located within the filter substrate CG, so that the filter substrate CG can be located between the metasurface structure layer 120 and the metasurface structure layer. Between 130.

圖5是依照本發明一實施例的顯示裝置50的局部剖面示意圖。顯示裝置50包括：元件陣列基板110、超表面結構層120、超表面結構層130、濾光基板CG、絕緣層I2、彩色濾光結構CF、遮光結構BM以及蓋板US。與圖4所示的顯示裝置40相比，如圖5所示的顯示裝置50的不同之處在於：顯示裝置50還可以包括位於超表面結構層120與超表面結構層130之間的絕緣層I1，且超表面結構層120可以位於蓋板US與絕緣層I1之間，超表面結構層130可以位於絕緣層I1與濾光基板CG之間。也就是說，超表面結構層120、130可以皆設置於濾光基板CG之外，且超表面結構層130可以位於濾光基板CG與超表面結構層120之間。FIG. 5 is a partial cross-sectional view of a display device 50 according to an embodiment of the present invention. The display device 50 includes: an element array substrate 110, a metasurface structure layer 120, a metasurface structure layer 130, a filter substrate CG, an insulating layer I2, a color filter structure CF, a light shielding structure BM, and a cover plate US. Compared with the display device 40 shown in FIG. 4 , the difference of the display device 50 shown in FIG. 5 is that the display device 50 may further include an insulating layer located between the metasurface structure layer 120 and the metasurface structure layer 130 I1, and the metasurface structure layer 120 may be located between the cover plate US and the insulating layer I1, and the metasurface structure layer 130 may be located between the insulating layer I1 and the filter substrate CG. That is to say, the metasurface structure layers 120 and 130 can both be disposed outside the filter substrate CG, and the metasurface structure layer 130 can be located between the filter substrate CG and the metasurface structure layer 120 .

圖6是依照本發明一實施例的顯示裝置60的局部剖面示意圖。顯示裝置60包括：元件陣列基板110、超表面結構層120、超表面結構層130、濾光基板CG、絕緣層I2、彩色濾光結構CF以及遮光結構BM。與圖2所示的顯示裝置20相比，如圖6所示的顯示裝置60的不同之處在於：顯示裝置60還可以包括顯示元件層LC（例如液晶層）、共用電極層CM以及偏光層P1、P2。FIG. 6 is a partial cross-sectional view of a display device 60 according to an embodiment of the present invention. The display device 60 includes: an element array substrate 110, a metasurface structure layer 120, a metasurface structure layer 130, a filter substrate CG, an insulating layer I2, a color filter structure CF, and a light shielding structure BM. Compared with the display device 20 shown in FIG. 2 , the difference of the display device 60 shown in FIG. 6 is that the display device 60 may also include a display element layer LC (for example, a liquid crystal layer), a common electrode layer CM, and a polarizing layer. P1, P2.

在本實施例中，顯示裝置60可以是液晶顯示裝置，其中顯示元件層LC位於超表面結構層130與元件陣列基板110之間，共用電極層CM位於超表面結構層130與顯示元件層LC之間，且絕緣層I2位於超表面結構層130與共用電極層CM之間。另外，偏光層P1、P2分別位於顯示裝置60的最下側及最上側，且偏光層P2還可以進一步減少環境光的反射。In this embodiment, the display device 60 may be a liquid crystal display device, in which the display element layer LC is located between the metasurface structure layer 130 and the element array substrate 110, and the common electrode layer CM is located between the metasurface structure layer 130 and the display element layer LC. space, and the insulating layer I2 is located between the metasurface structure layer 130 and the common electrode layer CM. In addition, the polarizing layers P1 and P2 are located at the lowermost side and the uppermost side of the display device 60 respectively, and the polarizing layer P2 can further reduce the reflection of ambient light.

圖7是依照本發明一實施例的顯示裝置70的局部剖面示意圖。顯示裝置70包括：元件陣列基板110、超表面結構層120、超表面結構層130、濾光基板CG、絕緣層I2、彩色濾光結構CF以及遮光結構BM。與圖2所示的顯示裝置20相比，如圖7所示的顯示裝置70的不同之處在於：顯示裝置70還可以包括發光元件層LD。FIG. 7 is a partial cross-sectional view of a display device 70 according to an embodiment of the present invention. The display device 70 includes: an element array substrate 110, a metasurface structure layer 120, a metasurface structure layer 130, a filter substrate CG, an insulating layer I2, a color filter structure CF, and a light shielding structure BM. Compared with the display device 20 shown in FIG. 2 , the display device 70 shown in FIG. 7 is different in that the display device 70 may further include a light emitting element layer LD.

在本實施例中，顯示裝置70的發光元件層LD可以位於絕緣層I2與驅動電路層DL之間，且發光元件層LD可以包括多個發光元件，例如微型發光二極體（Micro-LED）或有機發光二極體（OLED），使得顯示裝置70可以是微型發光二極體或有機發光二極體顯示裝置。In this embodiment, the light-emitting element layer LD of the display device 70 may be located between the insulating layer I2 and the driving circuit layer DL, and the light-emitting element layer LD may include multiple light-emitting elements, such as micro-light emitting diodes (Micro-LEDs). or organic light emitting diode (OLED), so that the display device 70 may be a micro light emitting diode or organic light emitting diode display device.

圖8是依照本發明一實施例的顯示裝置80的局部剖面示意圖。顯示裝置80包括：元件陣列基板110、超表面結構層128、超表面結構層138、濾光基板CG、絕緣層I2、彩色濾光結構CF、遮光結構BM、顯示元件層LC、共用電極層CM以及偏光層P1、P2。與圖6所示的顯示裝置60相比，如圖8所示的顯示裝置80的不同之處在於：超表面結構層138的超表面結構組的面積大於超表面結構層128的超表面結構組的面積，且顯示元件層LC位於超表面結構層128與超表面結構層138之間。FIG. 8 is a partial cross-sectional view of a display device 80 according to an embodiment of the present invention. The display device 80 includes: an element array substrate 110, a metasurface structure layer 128, a metasurface structure layer 138, a filter substrate CG, an insulating layer I2, a color filter structure CF, a light shielding structure BM, a display element layer LC, and a common electrode layer CM. and polarizing layers P1 and P2. Compared with the display device 60 shown in FIG. 6 , the difference of the display device 80 shown in FIG. 8 is that the area of the metasurface structure group of the metasurface structure layer 138 is larger than the area of the metasurface structure group of the metasurface structure layer 128 area, and the display element layer LC is located between the metasurface structure layer 128 and the metasurface structure layer 138 .

在本實施例中，超表面結構層128可以位於彩色濾光結構CF以及遮光結構BM與濾光基板CG之間，且超表面結構層138可以位於顯示元件層LC與元件陣列基板110之間。在一些實施例中，超表面結構層138的超表面結構組可以是元件陣列基板110的一部分而位於元件陣列基板110中。在一些實施例中，超表面結構層138的超表面結構組還可與元件陣列基板110中的導電層屬於相同膜層且電性分離。In this embodiment, the metasurface structure layer 128 may be located between the color filter structure CF and the light shielding structure BM and the filter substrate CG, and the metasurface structure layer 138 may be located between the display element layer LC and the element array substrate 110 . In some embodiments, the metasurface structure group of the metasurface structure layer 138 may be part of the element array substrate 110 and located in the element array substrate 110 . In some embodiments, the metasurface structure group of the metasurface structure layer 138 may also belong to the same film layer as the conductive layer in the element array substrate 110 and be electrically separated.

在本實施例中，超表面結構層138的超表面結構組可以接地，使得超表面結構層128、138的超表面結構組可以構成貼片天線（Patch antenna）。另外，超表面結構層128的超表面結構組於元件陣列基板110的正投影可以重疊超表面結構層138的超表面結構組於元件陣列基板110的正投影的一部分，使得超表面結構層138的超表面結構組還可充當顯示裝置80的反射電極。此外，超表面結構層128、138的超表面結構組可以包括不透明導電材料，例如具有高反射率的金屬。In this embodiment, the metasurface structure group of the metasurface structure layer 138 can be grounded, so that the metasurface structure group of the metasurface structure layers 128 and 138 can constitute a patch antenna. In addition, the orthographic projection of the metasurface structure group of the metasurface structure layer 128 on the element array substrate 110 can overlap a part of the orthographic projection of the metasurface structure group of the metasurface structure layer 138 on the element array substrate 110 , so that the orthogonal projection of the metasurface structure group of the metasurface structure layer 138 on the element array substrate 110 The set of metasurface structures may also serve as a reflective electrode for display device 80 . Additionally, the set of metasurface structures of metasurface structure layers 128, 138 may include opaque conductive materials, such as metals with high reflectivity.

圖9是可用於本發明實施例的超表面結構的圖樣示意圖。在上述實施例中，超表面結構層120、123、128、130、133、138的超表面結構還可以具有諸如圖9所示的（a）直條、（b）人字、（c）人字錨、（d）十字、（e）萬字、（f）十字環、（g）人字環、（h）圓環、（i）方環、（j）六角環、（k）方塊、（l）六角塊、（m）圓塊、（n）亞字、（o）端折十字環、（p）人字環-三腳架等形狀或上述形狀的組合。Figure 9 is a schematic diagram of a pattern of a metasurface structure that may be used in embodiments of the present invention. In the above embodiments, the metasurface structures of the metasurface structure layers 120, 123, 128, 130, 133, and 138 may also have structures such as (a) straight bars, (b) herringbones, (c) people as shown in Figure 9 Word anchor, (d) cross, (e) ten thousand words, (f) cross ring, (g) chevron ring, (h) circle, (i) square ring, (j) hexagonal ring, (k) square, Shapes such as (l) hexagonal block, (m) round block, (n) sub-word, (o) end-folded cross ring, (p) herringbone ring-tripod or a combination of the above shapes.

圖10A是依照本發明一實施例的超表面結構層129的局部平面示意圖。與圖1B所示的超表面結構層120相比，如圖10A所示的超表面結構層129的不同之處在於：超表面結構層129包括彼此不同的超表面結構組集合129K、129L、129M、129N、129O。FIG. 10A is a partial plan view of the metasurface structure layer 129 according to an embodiment of the present invention. Compared with the metasurface structure layer 120 shown in FIG. 1B , the difference of the metasurface structure layer 129 shown in FIG. 10A is that the metasurface structure layer 129 includes mutually different metasurface structure group sets 129K, 129L, 129M. , 129N, 129O.

舉例而言，在本實施例中，超表面結構組集合129K、129L、129M、129N中的超表面結構具有彼此相同的十字結構形狀、但彼此不同的尺寸、間距及/或方位，且超表面結構組集合129O的超表面結構還可被分別添加移相線。詳細而言，超表面結構組集合129K的超表面結構可以具有不同的尺寸，因此可使入射電磁波產生反射或異常反射（anomalous reflection）。另外，超表面結構組集合129L的超表面結構可以具有不同的間距，因此可使入射電磁波散射而產生散射電磁波。另外，超表面結構組集合129M的超表面結構可以具有不同的方位，因此可對入射電磁波進行頻率偏移、強度調制或偏振態控制，而產生調制電磁波。此外，超表面結構組集合129N的超表面結構可以具有不同的尺寸及間距，因此可使入射電磁波產生聚焦電磁波。藉由在元件陣列基板110上同時具有多種不同型態的超表面結構組集合129K、129L、129M、129N，能夠同時對多種波長或多種入射角度的電磁波實現波束轉向或多方向波束散射，從而達成提升5G訊號覆蓋率的功效。For example, in this embodiment, the metasurface structures in the metasurface structure set 129K, 129L, 129M, 129N have the same cross structure shape but different sizes, spacing and/or orientations, and the metasurface structures The metasurface structures of the structure group set 129O can also be individually added with phase shift lines. In detail, the metasurface structures of the metasurface structure set 129K can have different sizes, thus causing reflection or anomalous reflection of incident electromagnetic waves. In addition, the metasurface structures of the metasurface structure set 129L may have different spacings, thereby scattering incident electromagnetic waves to generate scattered electromagnetic waves. In addition, the metasurface structures of the metasurface structure group set 129M can have different orientations, so the incident electromagnetic waves can be frequency shifted, intensity modulated, or polarized state controlled to generate modulated electromagnetic waves. In addition, the metasurface structures of the metasurface structure set 129N can have different sizes and spacings, so that incident electromagnetic waves can generate focused electromagnetic waves. By simultaneously having a plurality of different types of metasurface structure group sets 129K, 129L, 129M, and 129N on the element array substrate 110, it is possible to achieve beam steering or multi-directional beam scattering for electromagnetic waves of multiple wavelengths or multiple incident angles at the same time, thereby achieving Improve the efficiency of 5G signal coverage.

圖10B是依照本發明一實施例的超表面結構層139的局部平面示意圖。超表面結構層139具有與圖10A所示的超表面結構層129互補的圖案。舉例而言，超表面結構層139可以包括超表面結構組集合139K、139L、139M、139N、139O，且超表面結構組集合139K、139L、139M、139N、139O的圖案分別與超表面結構組集合129K、129L、129M、129N、129O的圖案互補。在一些實施例中，可以使用圖10A所示的超表面結構層129取代圖1A所示的顯示裝置10的超表面結構層120，且使用圖10B所示的超表面結構層139取代圖1A所示的顯示裝置10的超表面結構層130，以提供能夠同時對多種波長或多種入射角度的電磁波實現波束轉向且具有良好顯示品質的顯示裝置。FIG. 10B is a partial plan view of the metasurface structure layer 139 according to an embodiment of the present invention. Metasurface structure layer 139 has a pattern complementary to metasurface structure layer 129 shown in Figure 10A. For example, the metasurface structure layer 139 may include metasurface structure group sets 139K, 139L, 139M, 139N, and 139O, and the patterns of the metasurface structure group sets 139K, 139L, 139M, 139N, and 139O are respectively with the metasurface structure group sets. The patterns of 129K, 129L, 129M, 129N and 129O are complementary. In some embodiments, the metasurface structure layer 129 shown in FIG. 10A can be used to replace the metasurface structure layer 120 of the display device 10 shown in FIG. 1A , and the metasurface structure layer 139 shown in FIG. 10B can be used to replace the metasurface structure layer 139 shown in FIG. 1A . The metasurface structure layer 130 of the display device 10 shown is provided to provide a display device that can achieve beam steering for electromagnetic waves of multiple wavelengths or multiple incident angles at the same time and has good display quality.

綜上所述，本發明的顯示裝置藉由圖案互補的超表面結構來控制電磁波的相位延遲，可有助於延伸電磁波的可傳輸距離而提高5G毫米波的覆蓋率，同時還能夠提供均勻的可見光穿透率及防止疊紋效應，從而保持良好的顯示品質。In summary, the display device of the present invention uses a metasurface structure with complementary patterns to control the phase delay of electromagnetic waves, which can help extend the transmittable distance of electromagnetic waves and improve the coverage of 5G millimeter waves, while also providing uniform Visible light transmittance and prevention of moire effect, thereby maintaining good display quality.

雖然本發明已以實施例揭露如上，然其並非用以限定本發明，任何所屬技術領域中具有通常知識者，在不脫離本發明的精神和範圍內，當可作些許的更動與潤飾，故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed above through embodiments, they are not intended to limit the present invention. Anyone with ordinary knowledge in the technical field may make some modifications and modifications without departing from the spirit and scope of the present invention. Therefore, The protection scope of the present invention shall be determined by the appended patent application scope.

10、20、30、40、50、60、70、80：顯示裝置 110：元件陣列基板 120、123、128、129、130、133、138、139：超表面結構層 129K、129L、129M、129N、129O：超表面結構組集合 139K、139L、139M、139N、139O：超表面結構組集合 B1、B2、B3、C1、C2、C3：超表面結構 BM：遮光結構 CF：彩色濾光結構 CG：濾光基板 CM：共用電極層 DL：驅動電路層 I1、I2：絕緣層 LC：顯示元件層 LD：發光元件層 MS1、MS2：超表面結構組 O1、O2、O3：開口 P1、P2：偏光層 US：蓋板 W1、W2：間距 W3、W4：長度 10, 20, 30, 40, 50, 60, 70, 80: display device 110: Component array substrate 120, 123, 128, 129, 130, 133, 138, 139: metasurface structure layer 129K, 129L, 129M, 129N, 129O: collection of metasurface structure groups 139K, 139L, 139M, 139N, 139O: collection of metasurface structure groups B1, B2, B3, C1, C2, C3: metasurface structure BM: light-shielding structure CF: color filter structure CG: filter substrate CM: Common electrode layer DL: driver circuit layer I1, I2: insulation layer LC: display component layer LD: light emitting element layer MS1, MS2: metasurface structure group O1, O2, O3: opening P1, P2: polarizing layer US: cover W1, W2: spacing W3, W4: length

圖1A是依照本發明一實施例的顯示裝置10的局部剖面示意圖。 圖1B是圖1A的顯示裝置10的超表面結構層120的局部平面示意圖。 圖1C是圖1A的顯示裝置10的超表面結構層130的局部平面示意圖。 圖2是依照本發明一實施例的顯示裝置20的局部剖面示意圖。 圖3A是依照本發明一實施例的顯示裝置30的局部剖面示意圖。 圖3B是圖3A的顯示裝置30的超表面結構層123的局部平面示意圖。 圖3C是圖3A的顯示裝置30的超表面結構層133的局部平面示意圖。 圖4是依照本發明一實施例的顯示裝置40的局部剖面示意圖。 圖5是依照本發明一實施例的顯示裝置50的局部剖面示意圖。 圖6是依照本發明一實施例的顯示裝置60的局部剖面示意圖。 圖7是依照本發明一實施例的顯示裝置70的局部剖面示意圖。 圖8是依照本發明一實施例的顯示裝置80的局部剖面示意圖。 圖9是可用於本發明實施例的超表面結構的圖樣示意圖。 圖10A是依照本發明一實施例的超表面結構層129的局部平面示意圖。 圖10B是依照本發明一實施例的超表面結構層139的局部平面示意圖。 FIG. 1A is a partial cross-sectional schematic diagram of a display device 10 according to an embodiment of the present invention. FIG. 1B is a partial plan view of the metasurface structure layer 120 of the display device 10 of FIG. 1A . FIG. 1C is a partial plan view of the metasurface structure layer 130 of the display device 10 of FIG. 1A . FIG. 2 is a partial cross-sectional view of the display device 20 according to an embodiment of the present invention. FIG. 3A is a partial cross-sectional schematic diagram of the display device 30 according to an embodiment of the present invention. FIG. 3B is a partial plan view of the metasurface structure layer 123 of the display device 30 of FIG. 3A . FIG. 3C is a partial plan view of the metasurface structure layer 133 of the display device 30 of FIG. 3A . FIG. 4 is a partial cross-sectional view of a display device 40 according to an embodiment of the present invention. FIG. 5 is a partial cross-sectional view of a display device 50 according to an embodiment of the present invention. FIG. 6 is a partial cross-sectional view of a display device 60 according to an embodiment of the present invention. FIG. 7 is a partial cross-sectional view of a display device 70 according to an embodiment of the present invention. FIG. 8 is a partial cross-sectional view of a display device 80 according to an embodiment of the present invention. Figure 9 is a schematic diagram of a pattern of a metasurface structure that may be used in embodiments of the present invention. FIG. 10A is a partial plan view of the metasurface structure layer 129 according to an embodiment of the present invention. FIG. 10B is a partial plan view of the metasurface structure layer 139 according to an embodiment of the present invention.

10：顯示裝置 110：元件陣列基板 120、130：超表面結構層 CG：濾光基板 DL：驅動電路層 I1、I2：絕緣層 W1、W2：間距 W3、W4：長度 10: Display device 110: Component array substrate 120, 130: metasurface structure layer CG: filter substrate DL: driver circuit layer I1, I2: insulation layer W1, W2: spacing W3, W4: length

Claims (9)

一種顯示裝置，包括：元件陣列基板；第一超表面結構層，位於所述元件陣列基板的一側，且包括多組第一超表面結構組；第二超表面結構層，位於所述第一超表面結構層與所述元件陣列基板之間，且包括多組第二超表面結構組，其中，所述第二超表面結構組的面積大於所述第一超表面結構組的面積；以及顯示元件層，位於所述第一超表面結構層與所述第二超表面結構層之間，其中所述第二超表面結構組接地。 A display device, including: an element array substrate; a first metasurface structure layer located on one side of the element array substrate and including a plurality of first metasurface structure groups; a second metasurface structure layer located on the first Between the metasurface structure layer and the element array substrate, a plurality of second metasurface structure groups are included, wherein the area of the second metasurface structure group is greater than the area of the first metasurface structure group; and display An element layer is located between the first metasurface structure layer and the second metasurface structure layer, wherein the second metasurface structure group is grounded. 如請求項1所述的顯示裝置，其中所述第一超表面結構組及所述第二超表面結構組構成貼片天線。 The display device according to claim 1, wherein the first metasurface structure group and the second metasurface structure group constitute a patch antenna. 如請求項1所述的顯示裝置，其中所述第一超表面結構組於所述元件陣列基板的正投影重疊所述第二超表面結構組於所述元件陣列基板的正投影。 The display device of claim 1, wherein the orthographic projection of the first metasurface structure group on the element array substrate overlaps the orthographic projection of the second metasurface structure group on the element array substrate. 如請求項1所述的顯示裝置，其中所述第二超表面結構組位於所述元件陣列基板中。 The display device of claim 1, wherein the second metasurface structure group is located in the element array substrate. 如請求項1所述的顯示裝置，其中所述第一超表面結構組及所述第二超表面結構組包括不透明導電材料。 The display device of claim 1, wherein the first metasurface structure group and the second metasurface structure group include opaque conductive materials. 如請求項5所述的顯示裝置，其中所述不透明導電材料包括高反射率金屬。 The display device of claim 5, wherein the opaque conductive material includes a high reflectivity metal. 如請求項1所述的顯示裝置，其中所述多組第一超表面結構組或所述多組第二超表面結構組彼此相同或不同。 The display device according to claim 1, wherein the plurality of first metasurface structure groups or the plurality of second metasurface structure groups are the same as or different from each other. 如請求項1所述的顯示裝置，其中所述第一超表面結構組及所述第二超表面結構組分別包括多個超表面結構，且所述多個超表面結構具有彼此相同的形狀及彼此不同的尺寸、間距或方位。 The display device of claim 1, wherein the first metasurface structure group and the second metasurface structure group respectively include a plurality of metasurface structures, and the plurality of metasurface structures have the same shape and shape as each other. differing in size, spacing, or orientation from each other. 如請求項1所述的顯示裝置，還包括濾光基板，其中所述第一超表面結構層位於所述濾光基板與所述第二超表面結構層之間。 The display device according to claim 1, further comprising a filter substrate, wherein the first metasurface structure layer is located between the filter substrate and the second metasurface structure layer.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102334091A (en) * 2009-02-26 2012-01-25 3M创新有限公司 Touch panel sensor with have a patterned substrate of the little pattern of covering of low visibility
TW201638636A (en) * 2013-11-15 2016-11-01 禾瑞亞科技股份有限公司 Touch display, control unit, and method for driving a plurality of touch driving electrodes of touch display

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU5095601A (en) * 2000-03-24 2001-10-08 Cymbet Corp Thin-film battery having ultra-thin electrolyte and associated method
KR101036213B1 (en) * 2010-01-26 2011-05-20 광주과학기술원 Electronic device with a dual function of light emitting device and solar cell
TW201128967A (en) * 2010-02-09 2011-08-16 Univ Nat Changhua Education High frequency signal emitter
EP2550680A4 (en) * 2010-03-24 2017-08-02 Mina Danesh Integrated photovoltaic cell and radio-frequency antenna
TW201210043A (en) * 2010-08-27 2012-03-01 Univ Shu Te Solar panel with base station antenna
TWI525897B (en) * 2013-10-29 2016-03-11 國立高雄師範大學 Circularly-polarized green antenna integrated with solar cell panel and antenna
TWI528571B (en) * 2013-12-30 2016-04-01 茂迪股份有限公司 Solar cell, solar cell set, solar cell module, and method of assembling the solar cell set
TWI543084B (en) * 2013-12-31 2016-07-21 國立彰化師範大學 Wireless sensor tags based on solar cell
TWI526939B (en) * 2014-01-03 2016-03-21 國立彰化師範大學 Rfid tag and solar cell integration device and integration method thereof
IL292858B2 (en) * 2015-06-15 2023-12-01 Magic Leap Inc Virtual and augmented reality systems and methods
US11231544B2 (en) * 2015-11-06 2022-01-25 Magic Leap, Inc. Metasurfaces for redirecting light and methods for fabricating
CN105846048A (en) * 2016-04-11 2016-08-10 南京邮电大学 Solar energy cell antenna
US10854952B2 (en) * 2016-05-03 2020-12-01 Kymeta Corporation Antenna integrated with photovoltaic cells
CN107394318B (en) * 2017-07-14 2019-11-05 合肥工业大学 A kind of liquid crystal phase-shifting unit for reflective Adjustable Phase-shifter
CN107528121B (en) * 2017-08-29 2020-02-18 京东方科技集团股份有限公司 Antenna structure, operation method thereof and antenna device
US10705391B2 (en) * 2017-08-30 2020-07-07 Wafer Llc Multi-state control of liquid crystals
US10989840B2 (en) * 2017-11-01 2021-04-27 Applied Materials, Inc. Non-absorptive trans-reflective nanostructured RGB filters
CN208818972U (en) * 2018-08-10 2019-05-03 北京京东方传感技术有限公司 Phase shifter and liquid crystal antenna
CN209249695U (en) * 2018-09-12 2019-08-13 北京超材信息科技有限公司 A kind of restructural beam scanning antennas of liquid crystal
US20200135703A1 (en) * 2018-10-31 2020-04-30 Intel Corporation Light field display for head mounted apparatus using metapixels
CN113196569A (en) * 2018-12-12 2021-07-30 夏普株式会社 Scanning antenna and method for manufacturing scanning antenna
US11067884B2 (en) * 2018-12-26 2021-07-20 Apple Inc. Through-display optical transmission, reception, or sensing through micro-optic elements
TWI696315B (en) * 2019-01-30 2020-06-11 友達光電股份有限公司 Antenna device and antenna system
TWI699929B (en) * 2019-01-30 2020-07-21 友達光電股份有限公司 Antenna unit and antenna device
CN111614801A (en) * 2019-02-25 2020-09-01 Oppo广东移动通信有限公司 Display screen assembly and electronic equipment
KR20210007627A (en) * 2019-07-12 2021-01-20 엘지디스플레이 주식회사 Conductive polarizing color filter and display device having thereof
CN111326864B (en) * 2020-03-13 2021-06-18 天津大学 Coupling differential feed double compression mode patch antenna and solar cell integration

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102334091A (en) * 2009-02-26 2012-01-25 3M创新有限公司 Touch panel sensor with have a patterned substrate of the little pattern of covering of low visibility
TW201638636A (en) * 2013-11-15 2016-11-01 禾瑞亞科技股份有限公司 Touch display, control unit, and method for driving a plurality of touch driving electrodes of touch display

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