TWI740942B - 硬化性組成物、硬化膜、彩色濾光片、遮光膜、固體攝像元件、圖像顯示裝置及硬化膜的製造方法 - Google Patents

硬化性組成物、硬化膜、彩色濾光片、遮光膜、固體攝像元件、圖像顯示裝置及硬化膜的製造方法 Download PDF

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TWI740942B
TWI740942B TW106116203A TW106116203A TWI740942B TW I740942 B TWI740942 B TW I740942B TW 106116203 A TW106116203 A TW 106116203A TW 106116203 A TW106116203 A TW 106116203A TW I740942 B TWI740942 B TW I740942B
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TW201809868A (zh
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森下裕行
浜田大輔
水野明夫
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日商富士軟片股份有限公司
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/04—Polythioethers from mercapto compounds or metallic derivatives thereof
    • C08G75/045—Polythioethers from mercapto compounds or metallic derivatives thereof from mercapto compounds and unsaturated compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013—Fillers, pigments or reinforcing additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/02—Elements
    • C08K3/08—Metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/28—Nitrogen-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/13—Phenols; Phenolates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/32—Compounds containing nitrogen bound to oxygen
    • C08K5/33—Oximes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L81/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur with or without nitrogen, oxygen or carbon only; Compositions of polysulfones; Compositions of derivatives of such polymers
    • C08L81/02—Polythioethers; Polythioether-ethers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
TW106116203A 2016-05-27 2017-05-17 硬化性組成物、硬化膜、彩色濾光片、遮光膜、固體攝像元件、圖像顯示裝置及硬化膜的製造方法 TWI740942B (zh)

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JP2016-106325 2016-05-27
JP2016106325 2016-05-27

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TW201809868A TW201809868A (zh) 2018-03-16
TWI740942B true TWI740942B (zh) 2021-10-01

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TW106116203A TWI740942B (zh) 2016-05-27 2017-05-17 硬化性組成物、硬化膜、彩色濾光片、遮光膜、固體攝像元件、圖像顯示裝置及硬化膜的製造方法

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JP (1) JP6896718B2 (ja)
KR (1) KR102208741B1 (ja)
TW (1) TWI740942B (ja)
WO (1) WO2017203979A1 (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7090628B2 (ja) * 2017-09-20 2022-06-24 富士フイルム株式会社 着色組成物、硬化膜、パターン形成方法、カラーフィルタ、固体撮像素子及び画像表示装置
JPWO2019188652A1 (ja) * 2018-03-26 2021-02-18 富士フイルム株式会社 感光性組成物
CN112601912A (zh) * 2018-09-07 2021-04-02 富士胶片株式会社 车辆用前照灯单元、前照灯用遮光膜、前照灯用遮光膜的制造方法
KR102513131B1 (ko) * 2018-09-18 2023-03-23 후지필름 가부시키가이샤 조성물, 막, 광학 필터, 고체 촬상 소자, 적외선 센서, 광학 필터의 제조 방법, 카메라 모듈, 화합물, 및 분산 조성물
CN112534312A (zh) * 2018-09-20 2021-03-19 富士胶片株式会社 遮光性组合物、固化膜、滤色器、遮光膜、光学元件、固体摄像元件、前照灯单元
WO2020066633A1 (ja) * 2018-09-26 2020-04-02 Jsr株式会社 感光性樹脂組成物、レジストパターンの形成方法、およびメッキ造形物の製造方法
JP7236671B2 (ja) * 2018-12-25 2023-03-10 パナソニックＩｐマネジメント株式会社 発光素子封止用組成物、及び発光装置
JP7469746B2 (ja) 2020-04-20 2024-04-17 日産化学株式会社 光硬化性組成物
KR20220056740A (ko) * 2020-10-28 2022-05-06 덕산네오룩스 주식회사 무기 입자를 포함한 광경화 조성물 및 표시장치
KR20220094479A (ko) * 2020-12-29 2022-07-06 덕산네오룩스 주식회사 수지, 수지 조성물 및 이를 이용한 표시장치

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JPH0387744A (ja) * 1989-08-31 1991-04-12 Asahi Chem Ind Co Ltd 耐光性に優れた感光性樹脂組成物
JP2004198717A (ja) * 2002-12-18 2004-07-15 Showa Denko Kk カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いるカーボンブラック分散液組成物
TW200630745A (en) * 2004-10-26 2006-09-01 Showa Denko Kk Thiol compound and photosensitive composition using the compound
TW200923580A (en) * 2007-10-03 2009-06-01 Nippon Steel Chemical Co Photosensitive resin composition for black resist containing multifunctional thiol compound, black matrix for color filter using the same, and color filter
JP2009244608A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp 重合性組成物、遮光性カラーフィルタ、および固体撮像素子
TW201114849A (en) * 2009-06-15 2011-05-01 Toray Industries Black composite fine particle, black resin composition, color filter substrate and liquid crystal display
TW201540759A (zh) * 2014-04-16 2015-11-01 Mitsubishi Chem Corp 附有遮光材之基板，彩色濾光片及液晶顯示裝置暨用以形成該遮光材之著色樹脂組成物

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Publication number Priority date Publication date Assignee Title
JPH0387744A (ja) * 1989-08-31 1991-04-12 Asahi Chem Ind Co Ltd 耐光性に優れた感光性樹脂組成物
JP2004198717A (ja) * 2002-12-18 2004-07-15 Showa Denko Kk カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いるカーボンブラック分散液組成物
TW200630745A (en) * 2004-10-26 2006-09-01 Showa Denko Kk Thiol compound and photosensitive composition using the compound
TW200923580A (en) * 2007-10-03 2009-06-01 Nippon Steel Chemical Co Photosensitive resin composition for black resist containing multifunctional thiol compound, black matrix for color filter using the same, and color filter
JP2009244608A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp 重合性組成物、遮光性カラーフィルタ、および固体撮像素子
TW201114849A (en) * 2009-06-15 2011-05-01 Toray Industries Black composite fine particle, black resin composition, color filter substrate and liquid crystal display
TW201540759A (zh) * 2014-04-16 2015-11-01 Mitsubishi Chem Corp 附有遮光材之基板，彩色濾光片及液晶顯示裝置暨用以形成該遮光材之著色樹脂組成物

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JPWO2017203979A1 (ja) 2019-04-11
TW201809868A (zh) 2018-03-16
WO2017203979A1 (ja) 2017-11-30
KR102208741B1 (ko) 2021-01-28
JP6896718B2 (ja) 2021-06-30
KR20180135935A (ko) 2018-12-21

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