TWI738645B - 熔射用材料、熔射被膜及附熔射被膜之構件 - Google Patents
熔射用材料、熔射被膜及附熔射被膜之構件 Download PDFInfo
- Publication number
- TWI738645B TWI738645B TW105110773A TW105110773A TWI738645B TW I738645 B TWI738645 B TW I738645B TW 105110773 A TW105110773 A TW 105110773A TW 105110773 A TW105110773 A TW 105110773A TW I738645 B TWI738645 B TW I738645B
- Authority
- TW
- Taiwan
- Prior art keywords
- rare earth
- earth element
- particles
- spray coating
- plasma
- Prior art date
Links
Images
Landscapes
- Coating By Spraying Or Casting (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015-095517 | 2015-05-08 | ||
JP2015095517 | 2015-05-08 | ||
JP2016043941A JP6722006B2 (ja) | 2015-05-08 | 2016-03-07 | 溶射用材料、溶射皮膜および溶射皮膜付部材 |
JP2016-043941 | 2016-03-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201639979A TW201639979A (zh) | 2016-11-16 |
TWI738645B true TWI738645B (zh) | 2021-09-11 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW105110773A TWI738645B (zh) | 2015-05-08 | 2016-04-06 | 熔射用材料、熔射被膜及附熔射被膜之構件 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP6722006B2 (ja) |
TW (1) | TWI738645B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018083854A1 (ja) | 2016-11-02 | 2018-05-11 | 日本イットリウム株式会社 | 成膜用材料及び皮膜 |
WO2018217062A1 (ko) * | 2017-05-26 | 2018-11-29 | 아이원스 주식회사 | 플로라이드화 이트륨 옥사이드 코팅막의 형성 방법 및 이에 따른 플로라이드화 이트륨 옥사이드 코팅막 |
WO2019132550A1 (ko) * | 2017-12-29 | 2019-07-04 | 아이원스 주식회사 | 코팅막의 형성 방법 및 이에 따른 코팅막 |
KR20210135225A (ko) * | 2019-03-07 | 2021-11-12 | 닛폰 이트륨 가부시키가이샤 | 소결체 |
WO2024101367A1 (ja) * | 2022-11-11 | 2024-05-16 | Agc株式会社 | イットリウム質保護膜およびその製造方法ならびに部材 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014002580A1 (ja) * | 2012-06-27 | 2014-01-03 | 日本イットリウム株式会社 | 溶射材料及びその製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4160224B2 (ja) * | 1998-12-21 | 2008-10-01 | 信越化学工業株式会社 | オキシハロゲン化物系部材 |
US9017765B2 (en) * | 2008-11-12 | 2015-04-28 | Applied Materials, Inc. | Protective coatings resistant to reactive plasma processing |
US20130115418A1 (en) * | 2011-11-03 | 2013-05-09 | Coorstek, Inc. | Multilayer rare-earth oxide coatings and methods of making |
JP5939084B2 (ja) * | 2012-08-22 | 2016-06-22 | 信越化学工業株式会社 | 希土類元素オキシフッ化物粉末溶射材料の製造方法 |
JP5636573B2 (ja) * | 2013-01-18 | 2014-12-10 | 日本イットリウム株式会社 | 溶射材料 |
US20150307715A1 (en) * | 2013-08-08 | 2015-10-29 | Nippon Yttrium Co., Ltd. | Slurry for thermal spraying |
JP5911036B1 (ja) * | 2014-11-21 | 2016-04-27 | 日本イットリウム株式会社 | 焼結体 |
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2016
- 2016-03-07 JP JP2016043941A patent/JP6722006B2/ja active Active
- 2016-04-06 TW TW105110773A patent/TWI738645B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014002580A1 (ja) * | 2012-06-27 | 2014-01-03 | 日本イットリウム株式会社 | 溶射材料及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2016211072A (ja) | 2016-12-15 |
TW201639979A (zh) | 2016-11-16 |
JP6722006B2 (ja) | 2020-07-15 |
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