TWI732764B - 暫時接著劑、接著膜、接著性支持體、積層體及接著劑套組 - Google Patents

暫時接著劑、接著膜、接著性支持體、積層體及接著劑套組 Download PDF

Info

Publication number
TWI732764B
TWI732764B TW105116944A TW105116944A TWI732764B TW I732764 B TWI732764 B TW I732764B TW 105116944 A TW105116944 A TW 105116944A TW 105116944 A TW105116944 A TW 105116944A TW I732764 B TWI732764 B TW I732764B
Authority
TW
Taiwan
Prior art keywords
adhesive
mass
adhesive layer
support
elastomer
Prior art date
Application number
TW105116944A
Other languages
English (en)
Chinese (zh)
Other versions
TW201643230A (zh
Inventor
岩井悠
加持義貴
Original Assignee
日商富士軟片股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商富士軟片股份有限公司 filed Critical 日商富士軟片股份有限公司
Publication of TW201643230A publication Critical patent/TW201643230A/zh
Application granted granted Critical
Publication of TWI732764B publication Critical patent/TWI732764B/zh

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J125/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Adhesives based on derivatives of such polymers
    • C09J125/02Homopolymers or copolymers of hydrocarbons
    • C09J125/04Homopolymers or copolymers of styrene
    • C09J125/08Copolymers of styrene
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/08Macromolecular additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J153/00Adhesives based on block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Adhesives based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J183/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
    • C09J183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Laminated Bodies (AREA)
  • Adhesive Tapes (AREA)
TW105116944A 2015-06-01 2016-05-31 暫時接著劑、接著膜、接著性支持體、積層體及接著劑套組 TWI732764B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015111125 2015-06-01
JP2015-111125 2015-06-01

Publications (2)

Publication Number Publication Date
TW201643230A TW201643230A (zh) 2016-12-16
TWI732764B true TWI732764B (zh) 2021-07-11

Family

ID=57440671

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105116944A TWI732764B (zh) 2015-06-01 2016-05-31 暫時接著劑、接著膜、接著性支持體、積層體及接著劑套組

Country Status (4)

Country Link
JP (1) JP6588094B2 (ko)
KR (1) KR102045770B1 (ko)
TW (1) TWI732764B (ko)
WO (1) WO2016194917A1 (ko)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017092138A (ja) * 2015-11-05 2017-05-25 Jsr株式会社 基材の処理方法、積層体、半導体装置およびその製造方法、ならびに仮固定用組成物
JP2018145365A (ja) * 2017-03-09 2018-09-20 東レフィルム加工株式会社 表面保護フィルム
JPWO2019124417A1 (ja) * 2017-12-20 2021-01-14 ダウ・東レ株式会社 シリコーン系接着シート、それを含む積層体、半導体装置の製造方法
KR102146997B1 (ko) * 2017-12-29 2020-08-21 삼성에스디아이 주식회사 반도체 소자 밀봉용 에폭시 수지 조성물 및 이를 이용하여 밀봉된 반도체 소자
JPWO2020017269A1 (ja) * 2018-07-20 2021-08-02 東洋紡株式会社 ポリオレフィン系接着剤組成物
JP7074879B2 (ja) * 2018-10-18 2022-05-24 富士フイルム株式会社 仮接着用組成物、キットおよび積層体
CN111724676B (zh) * 2019-03-21 2022-09-02 昆山工研院新型平板显示技术中心有限公司 可拉伸导线及其制作方法和显示装置
JP7470411B2 (ja) 2020-09-30 2024-04-18 フジコピアン株式会社 ウェーハ加工用積層体、それを用いた薄型ウェーハの製造方法及び薄型ウェーハ個片化の製造方法
JP2023174600A (ja) * 2022-05-27 2023-12-07 花王株式会社 接着剤用洗浄剤組成物
JP2023184483A (ja) * 2022-06-17 2023-12-28 花王株式会社 半導体基板の製造方法
WO2023243661A1 (ja) * 2022-06-17 2023-12-21 花王株式会社 接着剤用洗浄剤組成物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1622279A (zh) * 2003-03-25 2005-06-01 株式会社巴川制纸所 半导体器件制造用粘接片及用此粘接片的半导体器件和制法
JP2014037458A (ja) * 2012-08-13 2014-02-27 Tokyo Ohka Kogyo Co Ltd 接着剤組成物、接着フィルムおよび貼付方法
TW201544562A (zh) * 2014-04-22 2015-12-01 Tokyo Ohka Kogyo Co Ltd 接著劑組成物、層合體及剝離方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04320473A (ja) * 1991-04-20 1992-11-11 Daiabondo Kogyo Kk 非粘着型ホットメルト接着剤もしくはホットメルトシーリング材
JPH07188631A (ja) * 1993-12-28 1995-07-25 Toyo Ink Mfg Co Ltd 再剥離型粘着剤組成物
JP2001323227A (ja) * 2000-05-16 2001-11-22 Dainippon Ink & Chem Inc 耐衝撃性に優れる遮光性粘着テープ
JP5348341B1 (ja) 2012-04-27 2013-11-20 Jsr株式会社 基材の処理方法、仮固定用組成物および半導体装置
JP6216575B2 (ja) * 2012-10-25 2017-10-18 東京応化工業株式会社 接着剤組成物及び接着フィルム
JP6323690B2 (ja) * 2013-04-11 2018-05-16 東洋紡株式会社 自己粘着性表面保護フィルム
JP6182491B2 (ja) 2013-08-30 2017-08-16 富士フイルム株式会社 積層体およびその応用

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1622279A (zh) * 2003-03-25 2005-06-01 株式会社巴川制纸所 半导体器件制造用粘接片及用此粘接片的半导体器件和制法
JP2014037458A (ja) * 2012-08-13 2014-02-27 Tokyo Ohka Kogyo Co Ltd 接着剤組成物、接着フィルムおよび貼付方法
TW201544562A (zh) * 2014-04-22 2015-12-01 Tokyo Ohka Kogyo Co Ltd 接著劑組成物、層合體及剝離方法

Also Published As

Publication number Publication date
JPWO2016194917A1 (ja) 2018-04-26
JP6588094B2 (ja) 2019-10-09
KR20170139609A (ko) 2017-12-19
KR102045770B1 (ko) 2019-11-18
TW201643230A (zh) 2016-12-16
WO2016194917A1 (ja) 2016-12-08

Similar Documents

Publication Publication Date Title
TWI732764B (zh) 暫時接著劑、接著膜、接著性支持體、積層體及接著劑套組
JP6424221B2 (ja) 仮止め接着剤、接着フィルム、接着性支持体、積層体およびキット
US10442961B2 (en) Composition, process for producing sheet, sheet, laminate, and laminate with device wafer
TWI661935B (zh) 暫時接著用積層體、暫時接著用積層體的製造方法以及帶有元件晶圓的積層體
JP6437108B2 (ja) 仮止め接着剤、接着フィルム、接着性支持体および積層体
TWI701149B (zh) 積層體的製造方法、半導體元件的製造方法
JP6473462B2 (ja) 仮接着膜の製造方法、仮接着膜、積層体、デバイスウエハ付き積層体、仮接着用組成物
JP6646726B2 (ja) 仮接着用組成物および積層体
WO2015190478A1 (ja) 仮接着用積層体、仮接着用積層体の製造方法およびデバイスウエハ付き積層体
KR101930721B1 (ko) 가접착용 적층체, 적층체 및 키트
JP6490825B2 (ja) 半導体素子の製造方法および積層体の製造方法
TWI682428B (zh) 積層體