TWI714932B - 耐彎折之光學膜用膠 - Google Patents

耐彎折之光學膜用膠 Download PDF

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TWI714932B
TWI714932B TW107146747A TW107146747A TWI714932B TW I714932 B TWI714932 B TW I714932B TW 107146747 A TW107146747 A TW 107146747A TW 107146747 A TW107146747 A TW 107146747A TW I714932 B TWI714932 B TW I714932B
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acrylate
meth
tanδ
measured
bending
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楊雯欣
謝鴻鈞
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明基材料股份有限公司
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Priority to CN201910035663.XA priority patent/CN111349413A/zh
Priority to US16/417,702 priority patent/US11021637B2/en
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Abstract

本發明提供一種耐彎折之光學膜用膠,尤其是一種用於可撓顯示裝置之丙烯酸系壓敏性黏著劑,其在60℃於0.1Hz下測得的剪切儲存模數(G'(60℃/0.1Hz))與在30℃於1Hz下測得的剪切儲存模數(G'(30℃/1Hz))具有關係式(G'(60℃/0.1Hz)-G'(30℃/1Hz))/G'(30℃/1Hz)>-0.29,且在60℃於0.1Hz下測得的損耗因數(tanδ(60℃/0.1Hz))與在30℃於1Hz下測得的損耗因數(tanδ(30℃/1Hz))具有關係式(tanδ(60℃/0.1Hz)-tanδ(30℃/1Hz))/tanδ(30℃/1Hz)<0.2。

Description

耐彎折之光學膜用膠
本發明係有關於一種耐彎折之光學膜用膠,尤其是一種可用於可撓顯示裝置之丙烯酸系壓敏性黏著劑。
隨著顯示技術的進步,顯示器已從早期的陰極射線管(CRT)顯示器逐漸地發展到目前的平面顯示器(Flat Panel Display,FPD)。相較於硬質載板(例如是玻璃基板)所構成的平面顯示器,由於以塑膠基板或金屬薄板所製成的可撓顯示裝置可具有可撓曲及耐衝擊等特性,故可撓顯示裝置在不使用時,可以捲曲或折疊收納,以利於攜帶。此外,可撓顯示裝置亦可較輕易地的裝設在非平面之表面上,以產生不同的視覺感受。因此,可預期可撓顯示裝置將成為未來的市場趨勢。
由於可撓顯示裝置通常為各種薄膜所層疊而成之複合結構,例如:表面處理層、抗反射層、封裝層、顯示層、電極層、基材層等,各異質之膜層間常須採用黏著劑加以層合組裝,但因為各膜層之材料及其模數不盡相同,於同步彎曲折疊過程中所能承受應力程度亦不同,因此,除了各膜層材料本身須克服受力斷裂的問題外,各膜層間之黏著劑 需具備一定的緩釋及吸收應力功效,同時對各膜層材料仍需具備足夠之黏著力與填補性使各膜層受力後不致剝離而造成可撓顯示裝置破壞失效。
此外,對於可撓顯示裝置之應用情境,除了使用者在使用時將可撓顯示裝置從折疊收納狀態展開使用的動態情況外,可撓顯示裝置維持彎曲及折疊收納狀態的靜態存放情況之時間佔比通常更多,對於可撓顯示裝置的考驗也更加嚴苛,因為折疊收納時不管可撓顯示裝置中的各膜層或黏著劑皆處於長時間持續受力的狀態,尤其黏著劑本身並非固態材料,通常採用具黏彈性質之感壓膠,故相對各膜層容易在長時間受力後發生蠕變而無法回復,使可撓顯示裝置形成永久性不可逆之形變而破壞外觀或光學效能。如此當該可撓顯示裝置恢復至理論上平坦狀態時,該可撓顯示裝置表面可能不呈平坦狀態而呈現翹曲狀態或於折疊處產生形變。此外,反覆摺疊或長時間折疊收納一可撓顯示裝置時,該黏著劑若因產生蠕變破壞使黏著力或填補性低於原始設計值,亦可能造成可撓顯示裝置中之膜層間剝離的問題。
因此,需要一種耐彎折之光學膜用膠,尤其是一種用於可撓顯示裝置之丙烯酸系壓敏性黏著劑,其可使可撓顯示裝置於動態折疊展開時提供良好的可撓性,或於靜態長時間折疊存放下,皆兼具良好的耐彎折回復性及黏著性,且不會發生蠕變問題,使可撓顯示裝置在歷經多次摺疊或折疊收 納後仍可恢復至平坦狀態。此外,本發明之用於可撓顯示裝置之黏著劑亦可提供必要之黏著性,以避免膜層間剝離的問題。
為達到上述目的,本發明提供一種耐彎折之光學膜用膠,尤其是一種用於可撓顯示裝置之丙烯酸系壓敏性黏著劑,其可提供良好的可撓性不會發生蠕變問題,且具有優異的黏著力。
本發明提供一種耐彎折之光學膜用膠,尤其是一種用於可撓顯示裝置之丙烯酸系壓敏性黏著劑,其在60℃於0.1Hz下測得的剪切儲存模數(G'(60℃/0.1Hz))與在30℃於1Hz下測得的剪切儲存模數(G'(30℃/1Hz))具有關係式(G'(60℃/0.1Hz)-G'(30℃/1Hz))/G'(30℃/1Hz)>-0.29,且在60℃於0.1Hz下測得的損耗因數(tanδ(60℃/0.1Hz))與在30℃於1Hz下測得的損耗因數(tanδ(30℃/1Hz))具有關係式(tanδ(60℃/0.1Hz)-tanδ(30℃/1Hz))/tanδ(30℃/1Hz)<0.2。
在本發明之一實施例中,前述耐彎折之光學膜用膠在60℃於0.1Hz下測得的剪切儲存模數(G'(60℃/0.1Hz))介於0.05MPa至0.09MPa間,且在30℃於1Hz下測得的剪切儲存模數(G'(30℃/1Hz))介於0.07MPa至0.15MPa間。
在本發明之一實施例中,前述耐彎折之光學膜用膠在60℃於0.1Hz下測得的損耗因數(tanδ(60℃/0.1Hz))介於 0.08至0.15間,在30℃於1Hz下測得的損耗因數(tanδ(30℃/1Hz))介於0.09至0.12間。
在本發明之一實施例中,前述耐彎折之光學膜用膠包含至少一(甲基)丙烯酸酯(共)聚合物、一硬化劑以及至少一矽烷耦合劑。
在本發明之一實施例中,前述(甲基)丙烯酸酯(共)聚合物包含(甲基)丙烯酸烷基酯、含芳香環的(甲基)丙烯酸酯以及含羥基單體。
在本發明之一實施例中,前述耐彎折之光學膜用膠的(甲基)丙烯酸酯(共)聚合物的分子量介於150萬至250萬間且玻璃轉化溫度(Tg)介於-30℃至-35℃間。
在本發明之另一實施例中,前述耐彎折之光學膜用膠可更包含抗靜電劑、UV吸收劑、低分子量聚合物、塑化劑、填充劑、著色劑或顏料等其中之一或其組合。
上述發明內容旨在提供本揭示內容的簡化摘要,以使閱讀者對本揭示內容具備基本的理解。此發明內容並非本揭示內容的完整概述,且其用意並非在指出本發明實施例的重要/關鍵元件或界定本發明的範圍。在參閱下文實施方式後,本發明所屬技術領域中具有通常知識者當可輕易瞭解本發明之基本精神以及本發明所採用之技術手段與實施態樣。
為了使本發明揭示內容的敘述更加詳盡與完備,下文針對了本發明的實施態樣與具體實施例提出了說明性的描述;但這並非實施或運用本發明具體實施例的唯一形式。以下所揭露的各實施例,在有益的情形下可相互組合或取代,也可在一實施例中附加其他的實施例,而無須進一步的記載或說明。
本發明之一目的係提供一種耐彎折之光學膜用膠,尤其是一種用於可撓顯示裝置之丙烯酸系壓敏性黏著劑,其可提供良好的可撓性且具有優異的黏著力。
一般測定具有黏著劑之可撓顯示裝置之可撓性方式,為採用在室溫下固定摺疊頻率之動態摺疊測試,但此方式並無法真實反映可撓顯示裝置經過靜態長時間折疊存放後之回復性,故本發明藉由分別量測具有黏著劑之複合膜層於動態摺疊測試及靜態摺疊測試後之形變翹曲高度,並同時量測黏著劑於30℃、1Hz摺疊頻率下,以及60℃、0.1Hz摺疊頻率下之流變特性,以獲得可同時符合動態摺疊及靜態折疊存放之可撓顯示裝置之黏著劑。因丙烯酸系壓敏性黏著劑屬於高分子材料,其於較低溫度及較高頻率下,可獲得等效於快速動態摺疊之力學現象,並可於較高溫度及較低頻率下,獲得等效於長時間靜態摺疊存放之高分子蠕變行為。故本發明提供一種耐彎折之光學膜用膠,尤其是用於可撓顯示裝置之丙烯酸系壓敏性黏著劑,其適用於可撓性基材的貼合,且 在可撓性基材貼合後於20萬次彎折後,仍能保持良好的貼合性。本發明之丙烯酸系壓敏性黏著劑在60℃於0.1Hz下測得的剪切儲存模數(G'(60℃/0.1Hz))與在30℃於1Hz下測得的剪切儲存模數(G'(30℃/1Hz))具有關係式(G'(60℃/0.1Hz)-G'(30℃/1Hz))/G'(30℃/1Hz)>-0.29,且在60℃於0.1Hz下測得的損耗因數(tanδ(60℃/0.1Hz))與在30℃於1Hz下測得的損耗因數(tanδ(30℃/1Hz))具有關係式(tanδ(60℃/0.1Hz)-tanδ(30℃/1Hz))/tanδ(30℃/1Hz)<0.2,當剪切儲存模數之變化率以及損耗因數之變化率滿足上述之關係式時,本發明之丙烯酸系壓敏性黏著劑在應用於可撓性基材中時可同時具有於動態摺疊及靜態摺疊存放皆優良之特性。
在本發明之一實施例中,丙烯酸系壓敏性黏著劑在60℃於0.1Hz下測得的剪切儲存模數(G'(60℃/0.1Hz))介於0.05MPa至0.09MPa間,且在30℃於1Hz下測得的剪切儲存模數(G'(30℃/1Hz))介於0.07MPa至0.15MPa間。
在本發明之一實施例中,丙烯酸系壓敏性黏著劑在60℃於0.1Hz下測得的損耗因數(tanδ(60℃/0.1Hz))介於0.08至0.15間,且在30℃於1Hz下測得的損耗因數(tanδ(30℃/1Hz))介於0.09至0.12間。
在本發明之一實施例中,本發明之丙烯酸系壓敏性黏著劑可包含至少一(甲基)丙烯酸酯(共)聚合物、一硬化劑以及至少一矽烷耦合劑。
在本發明之一實施例中,相對於每百重量份之(甲基)丙烯酸酯(共)聚合物,硬化劑可為0.05至0.6重量份,且矽烷耦合劑可為0.05至1.1重量份。藉由硬化劑提供交聯強度,矽烷耦合劑調整延展性,以同時符合動態摺疊及及靜態摺疊存放的要求。
適合用於本發明之丙烯酸系壓敏性黏著劑的(甲基)丙烯酸酯(共)聚合物可包含(甲基)丙烯酸烷基酯、含芳香環的(甲基)丙烯酸酯以及含羥基單體。
適合用於本發明之丙烯酸系壓敏性黏著劑的(甲基)丙烯酸烷基酯可包含具有1至14個碳原子之烷基的(甲基)丙烯酸烷酯單體,其可以例如是但不限於(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丙酯、(甲基)丙烯酸異丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸第二丁酯、(甲基)丙烯酸戊酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸月桂酯以及(甲基)丙烯酸十四酯之至少之一或其組合。
適合用於本發明之丙烯酸系壓敏性黏著劑的含芳香環的(甲基)丙烯酸酯是其結構中包含芳香環結構且包含(甲基)丙烯醯基的化合物。芳香環可例如包含苯環、萘環或聯苯基環。適合之含芳香環的(甲基)丙烯酸酯可以例如是(甲基)丙烯酸苯基酯、(甲基)丙烯酸苯氧基酯、(甲基)丙烯酸2-苯氧 基乙基酯、(甲基)丙烯酸苯氧基丙基酯、苯氧基二乙二醇(甲基)丙烯酸酯、(甲基)丙烯酸2-羥基-3-苯氧基丙基酯、(甲基)丙烯酸甲苯基酯以及聚苯乙烯基(甲基)丙烯酸酯之至少之一或其組合。
適合用於本發明之丙烯酸系壓敏性黏著劑的含羥基單體可以例如是(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸2-羥基乙二醇酯以及(甲基)丙烯酸2-羥基丙二醇酯之至少之一或其組合,但不限於此。
本發明之丙烯酸系壓敏性黏著劑的(甲基)丙烯酸酯(共)聚合物的分子量可介於150萬至250萬間,較佳為介於170萬至230萬間,且玻璃轉化溫度(Tg)可介於-25℃至-45℃間,尤以介於-30℃至-35℃間為宜。
適合用於本發明之丙烯酸系壓敏性黏著劑的硬化劑可以例如是甲苯二異氰酸酯(TDI)-三羥甲基丙烷(TMP)加成物、甲苯二異氰酸酯三聚體(TDI trimer)、金屬螯合化合物如以鋁、鐵、錫、鈦、鎳等為金屬成分與乙炔、乙醯乙酸甲酯、乳酸乙酯為螯合成者以及環氧化合物如N,N,N',N'-四縮水甘油基間苯二甲胺或1,3-雙(N,N’-二縮水甘油基胺基甲基)環乙烷之至少之一或其組合。
適合用於本發明之丙烯酸系壓敏性黏著劑的矽烷耦合劑可以例如是3-氫硫丙基三甲氧基矽烷 (3-mercaptopropyltrimethoxysilan)、3-環氧丙氧丙基三甲氧基矽烷(3-glycidoxypropyltrimethoxysilane)及3-(甲基丙烯醯氧)丙基三甲氧基矽烷(3-methacryloxypropyltrimethoxysilane)之至少之一或其組合。
在本發明之另一實施例中,前述丙烯酸系壓敏性黏著劑可更包含起始劑、抗靜電劑、UV吸收劑、低分子量聚合物、塑化劑、填充劑、著色劑或顏料等其中之一或其組合。
在本發明之另一實施例中,用於丙烯酸系壓敏性黏著劑之抗靜電劑可以例如是離子液體,例如鹼金屬鹽及/或有機陽離子-陰離子鹽,在本發明之一實施例中,抗靜電劑可以例如雙-三氟甲磺醯亞胺鋰(lithium bis-trifluoromethanesulfonimide)、三-正丁基甲基銨雙-(三氟甲基磺醯基)醯亞胺(tri-n-butyl methylammonium bis-(trifluoromethylsulfonyl)imide)等,且相對於每百重量份之(甲基)丙烯酸酯(共)聚合物,抗靜電劑之添加量可為0.05至0.5重量份。
下述實施例係用來進一步說明本發明,但本發明之內容並不受其限制。
實施例
實施例1
將84重量份之丙烯酸正丁酯(n-BA)、1重量份之甲基丙烯酸2-羥基乙酯(HEMA)、15重量份之丙烯酸2-苯氧 基乙基酯(PHEA)、200重量份之溶劑乙酸乙酯及0.1重量份之2,2’-偶氮二異丁腈(AIBN)放入四口反應容器內,以氮氣置換反應容器內的空氣後,在氮氣環境中攪拌,將反應溶液升溫至55℃,反應8小時。
接著,將100重量份之前述反應產物、0.1重量份之甲苯二異氰酸酯三聚體(DESMODUR IL1451 BA,購於Covestro AG)、0.5重量份之金屬螯合化合物(CA-190T,購於I-TAI CHEMICALS)及1.0重量份之3-氫硫丙基三甲氧基矽烷均勻混合,製得一丙烯酸系黏著劑溶液。
此黏著劑溶液依後文性質測定的方法進行剪切儲存模數、耗損因數及黏著力量測,結果列於表1。
將製得之黏著劑溶液塗佈於聚對苯二甲酸乙二酯膜(PET)表面上,於100℃下乾燥5分鐘以得一厚度5微米(μm)之黏著劑層。將此黏著劑層轉貼至38微米(μm)之聚醯亞胺膜上,並貼合另一38微米(μm)之聚醯亞胺膜。此測試樣品於30℃下熟成5天後,進行黏著性、靜態彎折測試及動態彎折測試。測試結果列於表2。
實施例2
將84重量份之丙烯酸正丁酯(n-BA)、1重量份之甲基丙烯酸2-羥基乙酯(HEMA)、15重量份之丙烯酸2-苯氧基乙基酯(PHEA)、200重量份之溶劑乙酸乙酯及0.1重量份之2,2’-偶氮二異丁腈(AIBN)放入四口反應容器內,以氮氣置換 反應容器內的空氣後,在氮氣環境中攪拌,將反應溶液升溫至55℃,反應8小時。
接著,將100重量份之前述反應產物、0.15重量份之甲苯二異氰酸酯三聚體(DESMODUR IL1451 BA,購於Covestro AG)以及1.0重量份之3-氫硫丙基三甲氧基矽烷均勻混合,以得一丙烯酸系黏著劑溶液。
此黏著劑溶液依後文性質測定的方法進行剪切儲存模數、耗損因數及黏著力量測,結果列於表1。
將製得之黏著劑溶液塗佈於聚對苯二甲酸乙二酯膜(PET)表面上,於100℃下乾燥5分鐘以得一厚度5微米(μm)之黏著劑層。將此黏著劑層轉貼至38微米(μm)之聚醯亞胺膜上,並貼合另一38微米(μm)之聚醯亞胺膜。此測試樣品於30℃下熟成5天後,進行黏著性、靜態彎折測試及動態彎折測試。測試結果列於表2。
實施例3
將84重量份之丙烯酸正丁酯(n-BA)、1重量份之甲基丙烯酸2-羥基乙酯(HEMA)、15重量份之丙烯酸2-苯氧基乙基酯(PHEA)、200重量份之溶劑乙酸乙酯及0.1重量份之2,2’-偶氮二異丁腈(AIBN)放入四口反應容器內,以氮氣置換反應容器內的空氣後,在氮氣環境中攪拌,將反應溶液升溫至55℃,反應8小時。
接著,將100重量份之前述反應產物、0.1重量份之甲苯二異氰酸酯三聚體(DESMODUR IL1451 BA,購於Covestro AG)、0.2重量份之金屬螯合化合物(CA-190T,購於I-TAI CHEMICALS)以及1.0重量份之3-氫硫丙基三甲氧基矽烷均勻混合,以得一丙烯酸系黏著劑溶液。
此黏著劑溶液依後文性質測定的方法進行剪切儲存模數、耗損因數及黏著力量測,結果列於表1。
將製得之黏著劑溶液塗佈於聚對苯二甲酸乙二酯膜(PET)表面上,於100℃下乾燥5分鐘以得一厚度5微米(μm)之黏著劑層。將此黏著劑層轉貼至38微米(μm)之聚醯亞胺膜上,並貼合另一38微米(μm)之聚醯亞胺膜。此測試樣品於30℃下熟成5天後,進行黏著性、靜態彎折測試及動態彎折測試。測試結果列於表2。
性質測定
儲能模數(G')及損耗因數測量
將前述實施例製得之黏著劑模塑成5mm厚的1cm x 0.8cm大小以做為測定樣品。在頻率為0.1/1Hz,溫度範圍為20~80℃,升溫速率為3℃/分鐘的條件下,使用由UBM公司製造的Rheogel-E4000測量測定樣品之動態黏彈性測試,根據測試結果讀取30℃及60℃儲存模數(G')及損耗因數(tanδ)。
黏著力測試
將塗佈黏著劑的PET黏合片轉貼至聚醯亞胺膜上,並裁切成25mm x 150mm的長條型試片,將試片上的PET膜撕除後,經2kg輾壓滾輪使試片黏著面黏貼於無鹼玻璃表面上,於50℃環境下施加約3kg/cm2的壓力1分鐘,使聚醯亞胺膜與玻璃間不會存在氣泡與雜質。於溫度23+1℃和相對濕度50+2% RH環境下靜置20鐘,利用拉力機(Dachang,廣錸儀器製造)以拉升速率300mm/min量測樣品對玻璃之180度黏著力。
靜態彎折測試
將貼合後之二聚醯亞胺膜裁成10mm×120mm之長方形樣品,利用膠帶分別固定樣品之短邊側,將樣品安裝於無張力U形折疊試驗機(儀器名DLDMLH-FS,Yuasa System公司製造),設定試驗機彎曲部之外徑(Φ)為4mm,半徑(R)為2mm,將樣品對折,於室溫下靜置1/3/5/7天,進行靜態彎折試驗。測試完成後,將樣品兩端放置在平面下,測量彎曲部的翹曲高度並記錄之(單位mm)。
動態彎折測試
將貼合後之二聚醯亞胺膜裁成10mm×120mm之長方形樣品,利用膠帶分別固定樣品之短邊側,將樣品安裝於無張力U形折疊試驗機(儀器名DLDMLH-FS,Yuasa System公司製造),設定試驗機彎曲部之外徑(Φ)為4mm,半徑(R)為2mm,將樣品對折,進行20萬次180°的動態彎折試驗,檢查 是否於彎曲部產生破裂或裂痕,若彎曲部未產生破裂或裂痕,則評價為(○),若彎曲部產生破裂或裂痕,則評價為(×)。
Figure 107146747-A0101-12-0014-2
Figure 107146747-A0101-12-0014-3
由表1及表2的結果顯示,本發明提出之丙烯酸系壓敏性黏著劑經靜態彎折及動態彎折測試皆呈現良好的黏著性,靜態彎折測試後亦皆可回復至低形變之翹曲值,且不易隨時間增加而形變程度加劇,而呈現穩定之回復性,故可應用至需具彎折功能的電子產品上。
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。

Claims (5)

  1. 一種耐彎折之光學膜用膠,其係為丙烯酸系壓敏性黏著劑,包含至少一(甲基)丙烯酸酯(共)聚合物、一硬化劑以及至少一矽烷耦合劑,其中該(甲基)丙烯酸酯(共)聚合物包含(甲基)丙烯酸烷基酯、含芳香環的(甲基)丙烯酸酯以及含羥基單體,且相對於每百重量份之(甲基)丙烯酸酯(共)聚合物,硬化劑為0.05至0.6重量份,矽烷耦合劑為0.05至1.1重量份,其在60℃於0.1Hz下測得的剪切儲存模數(G'(60℃/0.1Hz))與在30℃於1Hz下測得的剪切儲存模數(G'(30℃/1Hz))具有關係式(G'(60℃/0.1Hz)-G'(30℃/1Hz))/G'(30℃/1Hz)>-0.29,且在60℃於0.1Hz下測得的損耗因數(tanδ(60℃/0.1Hz))與在30℃於1Hz下測得的損耗因數(tanδ(30℃/1Hz))具有關係式(tanδ(60℃/0.1Hz)-tanδ(30℃/1Hz))/tanδ(30℃/1Hz)<0.2。
  2. 如申請專利範圍第1項所述之耐彎折之光學膜用膠,其在60℃於0.1Hz下測得的剪切儲存模數(G'(60℃/0.1Hz))介於0.05MPa至0.09MPa間,在30℃於1Hz下測得的剪切儲存模數(G'(30℃/1Hz))介於0.07MPa至0.15MPa間。
  3. 如申請專利範圍第1項所述之耐彎折之光學膜用膠,其在60℃於0.1Hz下測得的損耗因數(tanδ(60℃/0.1Hz))介於0.08至0.15間,在30℃於1Hz下測得的損耗因數(tanδ(30℃/1Hz))介於0.09至0.12間。
  4. 如申請專利範圍第1項所述之耐彎折之光學膜用膠,其中該(甲基)丙烯酸酯(共)聚合物的分子量介於150萬至250萬間,且玻璃轉化溫度(Tg)介於-30℃至-35℃間。
  5. 如申請專利範圍第1項所述之耐彎折之光學膜用膠,其更包含抗靜電劑、UV吸收劑、低分子量聚合物、塑化劑、填充劑、著色劑或顏料其中之一或其組合。
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* Cited by examiner, † Cited by third party
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