用以實施發明之形態 本發明係關於一種更詳言之係關於一種可製造彩色濾光片之光敏樹脂組成物，其藉由包含光致發光量子點粒子、光聚合性化合物、於0.001莫耳濃度下365nm波長之UV吸光度為0.1以下之光聚合起始劑、鹼可溶性樹脂及溶劑，以顯著改善亮度及色彩重現性。 以下詳細說明有關本發明。 ＜光敏樹脂組成物＞ 一種光敏樹脂組成物，其包含量子點粒子、光聚合性化合物、光聚合起始劑、鹼可溶性樹脂及溶劑。 光致發光量子點粒子 本發明之光敏樹脂組成物包含光致發光量子點粒子。 量子點為奈米尺寸之半導體物質。原子組成分子，分子構成所謂叢集之小分子集合體，組成奈米粒子，特別於該類各奈米粒子帶有半導體特性時，稱之為量子點。 量子點若從外部被加以能量而成為浮動狀態時，自身會釋出與該能帶隙相應之能量。 本發明之光敏樹脂組成物包含該類光致發光量子點粒子，從其製造之彩色濾光片可藉由光照射而發光(光致發光)。 於包括彩色濾光片之圖像顯示裝置，藉由白色光穿透彩色濾光片來具體呈現彩色，但該過程中，由於光的一部分被彩色濾光片吸收，因此光效率降低。 然而，包括從本發明之光敏樹脂組成物製造之彩色濾光片時，由於彩色濾光片藉由光源的光而自發光，因此可實現更良好的光效率。 又，由於發出具有色相的光，因此色彩重現性更優秀，由於藉由光致發光，往所有方向發出光，因此亦可改善視角。 本發明之量子點粒子若是可藉由光刺激而發光之量子點粒子均可，未特別限定，可從例如II‒VI族半導體化合物、III‒V族半導體化合物、IV‒VI族半導體化合物、IV族元素或包含該元素之化合物、及該等之組合所組成的群組中選擇。該等可單獨使用，或混合兩種以上使用。 前述II‒VI族半導體化合物可從以下化合物所組成的群組中選擇：從CdS、CdSe、CdTe、ZnS、ZnSe、ZnTe、ZnO、HgS、HgSe、HgTe、及該等之混合物所組成的群組中選擇之2元素化合物；從CdSeS、CdSeTe、CdSTe、ZnSeS、ZnSeTe、ZnSTe、HgSeS、HgSeTe、HgSTe、CdZnS、CdZnSe、CdZnTe、CdHgS、CdHgSe、CdHgTe、HgZnS、HgZnSe、HgZnTe及該等之混合物所組成的群組中選擇之3元素化合物；及從CdZnSeS、CdZnSeTe、CdZnSTe、CdHgSeS、CdHgSeTe、CdHgSTe、HgZnSeS、HgZnSeTe、HgZnSTe、及該等之混合物所組成的群組中選擇之4元素化合物；前述III‒V族半導體化合物可從以下化合物所組成的群組中選擇：從GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb、及該等之混合物所組成的群組中選擇之2元素化合物；從GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP、及該等之混合物所組成的群組中選擇之3元素化合物；及從GaAlNAs、GaAlNSb、GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、InAlPAs、InAlPSb、及該等之混合物所組成的群組中選擇之4元素化合物；前述IV‒VI族半導體化合物可從以下化合物所組成的群組中選擇：從SnS、SnSe、SnTe、PbS、PbSe、PbTe、及該等之混合物所組成的群組中選擇之2元素化合物；從SnSeS、SnSeTe、SnSTe、PbSeS、PbSeTe、PbSTe、SnPbS、SnPbSe、SnPbTe、及該等之混合物所組成的群組中選擇之3元素化合物；及從SnPbSSe、SnPbSeTe、SnPbSTe、及該等之混合物所組成的群組中選擇之4元素化合物；前述IV族元素或包含該元素之化合物可從以下化合物所組成的群組中選擇：從Si、Ge、及該等之混合物所組成的群組中選擇之元素化合物；及SiC、SiGe、及該等之混合物所組成的群組中選擇之2元素化合物。 量子點粒子可為均質(homogeneous)之單一構造，核體‒殼體(core‒shell)、漸變(gradient)構造等類之雙重構造，或該等之混合構造。 就核體‒殼體(core‒shell)雙重構造而言，分別構成核體(core)與殼體(shell)之物質可由前述提到、各自不同的半導體化合物組成。例如前述殼體可包含從CdSe、CdS、ZnS、ZnSe、CdTe、CdSeTe、CdZnS、PbSe、AgInZnS及ZnO所組成的群組中選擇之一種以上的物質，但不限定於此。前述殼體可包含從CdSe、ZnSe、ZnS、ZnTe、CdTe、PbS、TiO、SrSe及HgSe所組成的群組中選擇之一種以上的物質，但不限定於此。 本發明之量子點粒子之直徑並未特別限定，例如平均粒徑可為1～40nm。然後，於核體‒殼體(core‒shell)雙重構造的情況下，核體之平均粒徑可為0.5～10nm，殼體之平均厚度可為0.5～30nm。平均粒徑及厚度為前述範圍內時，組成物內可具有優秀的分散性，可藉由光照射具體呈現色彩，用於製造彩色濾光片。 如同一般的彩色濾光片製造所用之著色光敏樹脂組成物，為了具體呈現色相而包含紅、綠、藍著色劑，光致發光量子點粒子亦可分類為紅量子點粒子、綠量子點粒子及藍量子點粒子，本發明之量子點粒子可為紅量子點粒子、綠量子點粒子或藍量子點粒子。 前述紅、綠及藍量子點粒子可依粒徑來分類，粒徑依紅、綠、藍色順序變小。具體而言，紅量子點粒子之粒徑為5nm以上～10nm以下，綠量子點粒子可超過3nm～5nm以下，藍量子點粒子可為1nm以上～3nm以下。 於光照射時，紅量子點粒子發出紅色光，綠量子點粒子發出綠色光，藍量子點粒子發出藍色光。 量子點粒子可藉由濕式化學製程(wet chemical process)、有機金屬化學蒸鍍製程或分子束磊晶製程來合成。濕式化學製程係於有機溶劑放入前驅物物質以使粒子生長的方法。由於結晶生長時，有機溶劑會自然配位於量子點結晶的表面，發揮分散劑的功能，從而調節結晶生長，因此比起諸如有基金屬化學蒸鍍(MOCVD，metal organic chemical vapor deposition)或分子束磊晶(MBE，molecular beam epitaxy)之氣相蒸鍍法，可容易透過低廉的製程來控制奈米粒子生長。 本發明之量子點粒子之含量並未特別限定，例如光敏樹脂組成物之固形物總重量中，可含3～80重量%，更宜含5～70重量%。若含量小於3重量%，發光效率容易變得微不足道，若超過80重量%，其他組成的含量相對不足，具有難以形成像素圖型的問題點。 光聚合性化合物 本發明之光聚合性化合物係可藉由後述之光聚合起始劑的作用來聚合之化合物，可舉出單官能單體、二官能單體、其他多官能單體等。該等光聚合性化合物可單獨使用，或混合兩種以上使用。 單官能性單體之具體例可舉出壬基苯基丙烯酸卡必酯、2-羥基-3-苯氧丙烯酸丙酯、2-乙基己基丙烯酸卡必酯、2-羥基丙烯酸乙酯、N-乙烯基砒喀烷酮等。 二官能性單體之具體例可舉出1,6–己二醯二(甲基)丙烯酸酯、乙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、雙酚A之雙(丙烯醯氧乙基)醚、3-甲基戊烷二醇(甲基)丙烯酸酯等。 其他多官能單體之具體例可舉出三羥甲基丙烷三(甲基)丙烯酸酯、乙氧基化(乙氧化)三羥甲基丙烷三(甲基)丙烯酸酯、丙氧基化(丙氧化)三羥甲基丙烷三(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、乙氧基化二季戊四醇六(甲基)丙烯酸酯、丙氧基化二季戊四醇六(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、如下述化學式1具有羥價之二季戊四醇(聚)丙烯酸酯等。 [化學式1](式中之R為氫原子或碳數2～6之丙烯醯基)。 本發明之光聚合性化合物之含量並未特別限定，例如光敏樹脂組成物之固形物總重量中，可含5～70重量%，更宜含10～60重量%。若含量小於5重量%，光硬化度降低，可能難以形成像素圖型，若超過70重量%，圖型可能剝離。 光聚合起始劑 本發明之光聚合起始劑係於0.001莫耳濃度下365nm波長之UV吸光度為0～0.1以下。若於0.001莫耳濃度下，365nm波長之UV吸光度超過0.1，則難以形成微圖型，以本發明之組成物形成之彩色濾光片之光致發光的強度降低，無法實現具有充分亮度之顯示裝置。 然而，由於本發明包含0.001莫耳濃度下365nm波長之UV吸光度為0.1以下之光聚合起始劑，因此可容易形成微圖型，可使光致發光量子點粒子之光致發光強度極大化，顯著改善亮度。判斷此係由於若UV吸光度超過0.1，光聚合起始劑會與光致發光量子點粒子競相吸收UV，光致發光量子點粒子之UV吸光量減少，發光效率降低，若為0.1以下，光致發光量子點粒子吸收遠比光聚合起始劑多量的UV光，發光效率受到改善。 具體而言，由於就光致發光量子點粒子之發光效率面而言，光聚合起始劑0.001莫耳濃度下，365nm波長之UV吸光度越接近0越佳，就微圖型形成面而言，吸光度越接近0.1越佳，因此本發明之光聚合起始劑係於0.001莫耳濃度下，365nm波長之UV吸光度得為0以上～0.1以下。 本發明之光聚合起始劑若具有前述範圍之吸光度均可，並未特別限定，可舉出例如具有前述範圍之吸光度之苯乙酮系化合物、多官能硫醇系化合物、聯咪唑系化合物、肟酯系化合物、三嗪系化合物等。該等化合物可單獨使用，或混合兩種以上使用。 作為於0.001莫耳濃度下，365nm波長之UV吸光度為0.1以下之光聚合起始劑之具體例，可舉出2‒甲基-1-[(4-(甲基硫)苯基]-2-啉丙烷‒1‒酮、4‒甲氧基‒3,3'‒二甲基二苯甲酮、2,2‒二甲氧基‒1,2‒二苯基乙烷‒1‒酮、1‒羥基‒環己基‒苯基‒酮、1‒[4‒(2‒羥乙氧基)‒苯基]‒2‒羥基‒2‒甲基‒1‒丙烷‒1‒酮、2‒羥基‒1‒1{4‒[4‒(2‒羥基‒2‒甲基‒丙醯基)‒苄基]‒苯基}‒2‒甲基‒丙烷‒1‒酮、三羥甲基丙烷三(3‒巰基丙酸酯)、2‒二甲胺‒2‒(4‒甲基‒苄基)‒1‒(4‒啉‒4‒基‒苯基)‒丁烷‒1‒酮，及下述化學式2～12所示化合物等。 [化學式2][化學式3][化學式4][化學式5][化學式6][化學式7][化學式8][化學式9][化學式10][化學式11][化學式12]又，本發明之光敏樹脂組成物亦可在不損及本發明目的之範圍內，追加併用該領域一般會使用的其他光聚合起始劑等。可舉出例如苯并系化合物、二苯甲酮系化合物、噻吨酮系化合物、蒽系化合物等。該等化合物可單獨使用，或混合兩種以上使用。 苯并系化合物可舉出例如安息香、苯并甲醚、苯并***、苯并異丙醚、苯并異丁醚等。 二苯甲酮系化合物可舉出例如二苯甲酮、鄰苯甲醯基苯酸甲基、4–苯基二苯甲酮、4–苯醯–4’–甲基二苯基硫化物、3,3’,4,4’–四(三級丁基過氧羧基)二苯甲酮、2,4,6–三甲基二苯甲酮、4,4’–二(N,N’‒二甲胺)‒二苯甲酮等。 噻吨酮系化合物可舉出例如2-異丙基噻噸酮、2,4–二乙基噻噸酮、2,4-二氯噻噸酮、1-氯-4-丙氧噻噸酮等。 蒽系化合物可舉出例如9,10‒二甲氧蒽、2‒乙基‒9,10‒二甲氧蒽、9,10‒二乙氧蒽、2‒乙基‒9,10‒二乙氧蒽等。 此外，可進一步例示2,4,6–三甲基苯并環氧苯膦、10‒丁基‒2‒氯吖啶酮、2‒乙基蒽醌、苄基、9,10‒菲醌、樟腦醌、苯基乙醛酸甲基、二茂鈦化合物等。 又，本發明之光敏樹脂組成物可進一步包含光聚合起使助劑。該情況下，可將組成物更加高感度化。 光聚合起使助劑可舉出例如胺化合物、羧酸化合物等。該等可單獨使用，或混合兩種以上使用。 胺化合物之具體例可舉出三乙基醇胺、甲基二乙醇胺、三異丙醇胺等脂肪族胺化合物、4-二甲基胺基苯甲酸甲基、4-二甲基胺基苯甲酸乙基、4-二甲基胺基苯甲酸異戊基、4-二甲基胺基苯甲酸2-乙基己基、苯甲酸2-二甲基胺基乙基、N,N-二甲基對甲苯胺、4,4’-雙(二甲基胺基)二苯甲酮(通稱：米其勒酮)、4,4’-雙(二乙基胺基)二苯甲酮等芳族胺化合物，較宜為芳族胺化合物。 羧酸化合物之具體例可舉出苯硫醋酸、甲基苯硫醋酸、乙基苯硫醋酸、甲基乙基苯硫醋酸、二甲基苯硫醋酸、甲氧苯硫醋酸、二甲氧苯硫醋酸、氯苯硫醋酸、二氯苯硫醋酸、N-苯甘胺酸、苯氧醋酸、萘硫醋酸、N-萘甘胺酸、萘氧醋酸等芳族雜醋酸類。 本發明之光聚合起始劑之含量並未特別限定，例如光敏樹脂組成物之固形物總重量中，可含0.1～20重量%，更宜含0.5～15重量%。含量在0.1～20重量%範圍內時，組成物被高感度化，容易形成微像素圖型。 鹼可溶性樹脂 鹼可溶性樹脂(A)包含具有羧基之乙烯性不飽和單體而聚合。此係對於形成圖型時之顯影處理步驟所利用之鹼顯影液，賦予可溶性的成分。 作為具有羧基之乙烯性不飽和單體並未特別限定，可舉出例如：丙烯酸、甲基丙烯酸、巴豆酸等單羧酸類；反丁烯二酸、中康酸、衣康酸等二羧酸類及該等二羧酸之酐；ω-羧酸聚己內酯單(甲基)丙烯酸酯等兩末端具有羧基及羥基之聚合物之單(甲基)丙烯酸酯類等，較宜為丙烯酸及甲基丙烯酸。該等可單獨使用，或混合兩種以上使用。 本發明之鹼可溶性樹脂亦可進一步包含可與前述單體聚合之至少一種其他單體而聚合。可舉出例如苯乙烯、乙烯基甲苯、甲基苯乙烯、對氯苯乙烯、鄰甲氧苯乙烯、間甲氧苯乙烯、對甲氧苯乙烯、鄰甲氧苯乙烯、鄰乙烯基苯甲醚、間乙烯基苯甲醚、對乙烯基苯甲醚、鄰乙烯基苯環氧丙基醚、間乙烯基苯環氧丙基醚、對乙烯基苯環氧丙基醚等芳族乙烯基化合物；N-環己基順丁烯二醯亞胺、N-苄基順丁烯二醯亞胺、N-苯基順丁烯二醯亞胺、N-鄰羥基苯基順丁烯二醯亞胺、N-間羥基苯基順丁烯二醯亞胺、N-對羥基苯基順丁烯二醯亞胺、N-鄰甲基苯基順丁烯二醯亞胺、N-間甲基苯基順丁烯二醯亞胺、N-對甲基苯基順丁烯二醯亞胺、N-鄰甲氧基苯基順丁烯二醯亞胺、N-間甲氧基苯基順丁烯二醯亞胺、N-對甲氧基苯基順丁烯二醯亞胺等N-取代順丁烯二醯亞胺系化合物；(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、正(甲基)丙烯酸丙酯、異(甲基)丙烯酸丙酯、正(甲基)丙烯酸丁酯、異(甲基)丙烯酸丁酯、二級(甲基)丙烯酸丁酯或三級(甲基)丙烯酸丁酯等(甲基)丙烯酸烷酯類；環(甲基)丙烯酸苄酯、環(甲基)丙烯酸己酯、2-甲基環(甲基)丙烯酸己酯、三環[5.2.1.02,6]癸烷-8-基(甲基)丙烯酸酯、2-二環吩坦尼氧(甲基)丙烯酸乙酯或(甲基)丙烯酸異冰片酯等脂環族(甲基)丙烯酸酯類；(甲基)丙烯酸苯酯或(甲基)丙烯酸苄酯等(甲基)丙烯酸芳酯類；3-(甲基丙烯醯氧甲基)氧雜環丁烷、3-(甲基丙烯醯氧乙基)-3-乙基氧雜環丁烷、3-(甲基丙烯醯氧乙基)-2-三氟甲基氧雜環丁烷、3-(甲基丙烯醯氧乙基)-2-苯基氧雜環丁烷、2-(甲基丙烯醯氧乙基)氧雜環丁烷、2-(甲基丙烯醯氧乙基)-4-三氟甲基氧雜環丁烷等不飽和氧雜環丁烷化合物等。該等可單獨使用，或混合兩種以上使用。 於本說明書，(甲基)丙烯酸酯意味丙烯酸酯或甲基丙烯酸酯。 本發明之鹼可溶性樹脂之含量並未特別限定，例如光敏樹脂組成物之固形物總重量中，可含5～80重量%，更宜含10～70重量%。鹼可溶性樹脂之含量在5～80重量%範圍內時，對顯影液之溶解性充分，容易形成圖型，防止顯影時，曝光部之像素部分之膜減少，非像素部分之脫落性提升。 溶劑 本發明之溶劑並未特別限定，可為該領域一般會使用的有機溶劑。 具體例可舉出：如乙二醇單甲醚、乙二醇單***、乙二醇單丙醚及乙二醇單丁醚之乙二醇單烷醚類；二乙二醇二甲醚、二乙二醇二***、二乙二醇二丙醚、二乙二醇二丁醚等二乙二醇二烷醚類；甲基賽路蘇乙酸酯、乙基賽路蘇乙酸酯等乙二醇烷醚乙酸酯類；丙二醇單甲醚等丙二醇二烷醚類；丙二醇單甲醚乙酸酯、丙二醇單***乙酸酯、丙二醇單丙醚乙酸酯、甲氧丁基乙酸酯、甲氧苄基乙酸酯等亞烷基二醇烷醚乙酸酯類；苯、甲苯、二甲苯、三甲苯等芳族碳化氫類；甲基乙酮、丙酮、甲基胺酮、甲基異丁酮、環己酮等酮類；乙醇、丙醇、丁醇、己醇、環己醇、乙二醇、甘油等醇類；3-丙氧丙酸乙基、3-甲氧丙酸甲基等酯類；及g-丁內酯等環狀酯類等。該等可單獨使用，或混合兩種以上使用。 本發明之溶劑含量並未特別限定，例如光敏樹脂組成物之固形物總重量中，可含60～90重量%，更宜含70～85重量%。溶劑含量為60～90重量%範圍內時，塗布性可提升。 ＜彩色濾光片＞ 又，提供一種從本發明之前述光敏樹脂組成物製造之彩色濾光片。 本發明之彩色濾光片適用於圖像顯示裝置時，由於藉由顯示裝置光源的光發光，因此可實現更佳的光效率。又，由於發出具有色相的光，因此色彩重現性更優秀，由於藉由光致發光，往所有方向發出光，因此亦可改善視角。 彩色濾光片包含基板及形成於前述基板上部之圖型層。 基板為彩色濾光片本身，或彩色濾光片位於顯示器裝置等之部位均可，並未特別限制。前述基板亦可為矽(Si)、矽氧化物(SiOx
)或高分子基板，前述高分子基板可為聚醚碸(polyethersulphone，PES)或聚碳酸酯(polycarbonate，PC)等。 圖型層係包含本發明之光敏樹脂組成物的層，可為塗布前述光敏樹脂組成物，以預定圖型曝光、顯影及熱硬化而形成的層。 以前述光敏樹脂組成物形成之圖型層可具備：含有紅量子點粒子之紅色圖型層、含有綠量子點粒子之綠色圖型層、及含有藍色量子點粒子之藍色圖型層。於光照射時，紅色圖型層發出紅色光，綠色圖型層發出綠色光，藍色圖型層發出藍色光。 該情況下，適用於圖像顯示裝置時之光源的發出光並未特別限定，但從更優秀的亮度及色彩重現性面來看，較宜使用發出藍色光之光源。 依據本發明之其他一具體呈現例，前述圖型層具備：含有紅量子點粒子之紅色圖型層、含有綠量子點粒子之綠色圖型層、及不含有量子點粒子之透明圖型層。該情況下，作為包含該圖型層之圖像顯示裝置之光源，可使用發出藍色光之光源。此時，紅色圖型層發出紅色光，綠色圖型層發出綠色光，透明圖型層係藍色光直接穿透而顯示藍色。 包含如前述之基板及圖型層之彩色濾光片，可進一步包含形成於各圖型間之隔牆，亦可進一步包含黑矩陣。又，亦可進一步包含形成於彩色濾光片之圖型層上部之保護膜。 ＜圖型顯示裝置＞ 又，本發明提供一種包含前述彩色濾光片之圖像顯示裝置。 本發明之彩色濾光片不僅可適用於一般的液晶顯示裝置，還可適用於場發光顯示裝置、電漿顯示裝置、場發射顯示裝置等各種圖像顯示裝置。 本發明之圖像顯示裝置可具備一種彩色濾光片，其包含：含有紅量子點粒子之紅色圖型層、含有綠量子點粒子之綠色圖型層、及含有藍色量子點粒子之藍色圖型層。該情況下，適用於圖像顯示裝置時之光源的發出光並未特別限定，但從更優秀的色彩重現性面來看，較宜使用發出藍色光之光源。 依據本發明之其他一具體呈現例，本發明之圖像顯示裝置可具備一種彩色濾光片，其包含紅色圖型層、綠色圖型層、及不含有量子點粒子之透明圖型層。 此時，作為光源可使用發出藍色光之光源。此時，紅色量子點粒子發出紅色光，綠色量子點粒子發出綠色光，透明圖型層係藍色光直接穿透而顯示藍色。 本發明之圖像顯示裝置之光效率優良，顯示高亮度，色彩重現性優秀，具有廣視角。 以下，為了有助於理解本發明而提示較佳實施例，但該等實施例僅止於例示本發明，不限制所附的申請專利範圍，對同業者而言，顯然可於本發明之範疇及技術思想範圍內，對於實施例施以各種變更及修正，該類變形及修正當然隸屬於所附的申請專利範圍。 製造例1.CdSe(核體)/ZnS(殼體)構造之光致發光綠量子點粒子A‒1之合成 將CdO(0.4mmol)與乙酸鋅(Zincacetate)(4mmol)、油酸(Oleicacid)(5.5mL)，與1‒十八烯(1‒Octadecene)(20mL)一同放入反應器，加熱至150℃使其反應。其後，加施310℃的熱，得到透明的混合物後，將其維持310℃達20分鐘後，將使得0.4mmol之Se粉末及2.3mmol之S粉末溶解於3mL之三辛基膦(trioctylphosphine)而得之Se及S溶液，迅速注入於裝有Cd(OA)2
及Zn(OA)2
溶液之反應器。使由其所得之混合物，以310℃生長5分鐘後，利用冰水槽(icebath)使生長中斷。其後以乙醇使其沈澱，利用離心分離機分離量子點，利用氯仿(chloroform)及乙醇洗掉多餘的雜質，藉此取得以油酸安定化、分布有核體與殼體厚度之合計為3～5nm之粒子之CdSe(核體)/ZnS(殼體)構造之量子點粒子A‒1。 製造例2.鹼可溶性樹脂之合成 準備具備攪拌器、溫度計回流冷卻管、滴下管及氮導入管之燒瓶，另，作為單體滴下管，投入N‒苄基順丁烯二醯亞胺45重量部、甲基丙烯酸45重量部、三環癸基甲基丙烯酸酯10重量部、三級過氧化丁基-2-己酸乙酯 重量部、丙二醇單甲醚乙酸酯(以下作PGMEA)40重量部後，予以攪拌混合，準備單體滴下管，放入正十二硫醇6重量部、PGMEA24重量部，予以攪拌混合，準備鏈轉移劑滴下管。之後，於燒瓶導入PGMEA395重量部，使燒瓶內之氣氛從空氣變成氮後，一面攪拌，一面將燒瓶內之溫度升溫至90℃。接著，從滴下管滴下單體及鏈轉移劑。滴下係一面維持90℃，一面分別進行2小時，於1小時後，升溫至110℃，維持3小時後，令玻璃導入管導入，開始氧/氮=5/95(v/v)混合氣體之起泡。接下來，於燒瓶內投入甲基丙烯酸縮水甘油酯10重量部、2,2’‒亞甲基雙(4‒甲基‒6‒三級丁基苯酚)0.4重量部、三乙胺0.8重量部，以110℃繼續反應8小時，其後冷卻至室溫，同時得到固形物29.1重量%、重量平均分子量32,000、酸價為114mgKOH/g之鹼可溶性樹脂。實施例及比較例 (1) 光敏樹脂 組成物之製造
添加下述表1所記載的組成(重量部)，以丙二醇單甲醚乙酸酯稀釋，使得固形物成為18重量%後，予以攪拌，製造光敏樹脂組成物。 [表1] (2) 彩色濾光片之製造
以旋轉塗布法，於玻璃基板上塗布實施例及比較例之光敏樹脂組成物後，載置於加熱板上，以100℃的溫度維持3分鐘，形成薄膜。於前述薄膜上，載置具有20mm´20mm正方形之穿透圖型及1～100mm之線/間距圖型之試驗光罩，設定與試驗光罩的間隔為100mm，照射紫外線。 此時，紫外線之光源為USHIO電機之超高壓水銀燈(USH‒250D)，於大氣氣氛下，以200mJ/cm2
之曝光量(365nm)照射光，不使用光學濾光片。接著，將前述薄膜浸泡於pH10.5之KOH水溶液80秒鐘而顯影。 以蒸餾水洗淨後，吹送氮氣予以乾燥，以150℃之烤箱加熱10分鐘，製造彩色濾光片。製造之彩色圖型之厚度為3.0μm。實驗例 (1) 光聚合起始劑之吸光度測定
以丙二醇單甲醚乙酸酯，稀釋前述實施例及比較例所用之各光聚合起始劑，使濃度成為0.01莫耳/公升後，以吸光度測定機(UV‒2550，島津)，測定365nm時之吸光度，於下述表2表示其結果。(2) 微圖型形成可否評估
於從前述實施例及比較例之組成物製造之彩色濾光片，以OM裝備(ECLIPSELV 100POL，NIKON)測定透過開口部寬100μm之線/間距圖罩所得圖型之寬度，求出圖罩之開口部寬與圖型寬度之差距，表示於以下表2。 圖罩之開口部寬與圖型寬度之差距越少，表示越可形成更微細的圖型。 其差距之絕對值若為20μm以上，難以具體呈現微像素，顯示負值時，唯恐引起製程瑕疵。(3) 發光強度測定
於從前述實施例及比較例之組成物製造之彩色濾光片，在20mm´20mm之圖型部，以365nmTube型4WUV照射器(VL‒4LC，VILBERLOURMAT)照射光，以光譜儀(Ocean Optics)測定藉由光致發光而發出之波長(紅量子點為640nm，綠量子點為545nm)區之光強度(intensity)，表示於下述表2。 測定到之光強度越強，可判斷發揮越優秀的光致發光特性。 [表2]
參考前述表2，包含0.001莫耳濃度時，365nm波長之UV吸光度為0.1以下之光聚合起始劑之實施例1～8的組成物，其圖罩之開口部寬與圖型寬度之差距小，可形成非常微細的圖型。然後，確認光致發光之強度非常優秀，顯示高亮度。 然而，比較例1～5之組成物不能形成微圖型，或光致發光強度降低。This invention relates to a more detailed description of a photosensitive resin composition capable of manufacturing a color filter. The photosensitive resin composition includes photoluminescent quantum dot particles, a photopolymerizable compound, and 0.001 mol. A photopolymerization initiator, alkali-soluble resin and solvent with a UV absorbance of 0.1 or less at a wavelength of 365 nm at a concentration to significantly improve brightness and color reproducibility. The present invention will be described in detail below. <Photosensitive resin composition> A photosensitive resin composition including quantum dot particles, a photopolymerizable compound, a photopolymerization initiator, an alkali-soluble resin, and a solvent. Photoluminescent quantum dot particles The photosensitive resin composition of the present invention includes photoluminescent quantum dot particles. Quantum dots are nanometer-sized semiconductor materials. Atoms make up molecules. The molecules make up the so-called cluster of small molecules, which make up nano particles. Especially when these nano particles have semiconductor characteristics, they are called quantum dots. When a quantum dot is energized from the outside to become a floating state, it will release energy corresponding to the band gap. The photosensitive resin composition of the present invention contains such photoluminescent quantum dot particles, and a color filter manufactured therefrom can emit light by photoirradiation (photoluminescence). In an image display device including a color filter, the color is specifically expressed by white light penetrating the color filter. However, in the process, a part of the light is absorbed by the color filter, so the light efficiency is reduced. However, when including a color filter manufactured from the photosensitive resin composition of the present invention, since the color filter emits light by light from a light source, a better light efficiency can be achieved. In addition, since light having a hue is emitted, color reproducibility is excellent, and light is emitted in all directions by photoluminescence, so that the viewing angle can also be improved. The quantum dot particles of the present invention may be any quantum dot particles that can emit light by light stimulation, and are not particularly limited, and may be, for example, II‒VI semiconductor compounds, III‒V semiconductor compounds, IV‒VI semiconductor compounds, IV A group element or a compound containing the element, and a group consisting of these are selected. These can be used alone or in combination of two or more. The aforementioned II‒VI semiconductor compounds may be selected from the group consisting of the following compounds: from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof Two-element compound selected from: CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, and HgZnTe 3-element compounds selected from the group consisting of; and 4-element compounds selected from the group consisting of CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, and mixtures thereof; the aforementioned III‒ Group V semiconductor compounds can be selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof 2 element compounds selected from the group; from GaNP, GaAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, and a mixture of these 3-element compounds selected from the group consisting of; and a mixture of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, and mixtures thereof 4 element compounds selected from the group; the aforementioned IV‒VI semiconductor compounds can be selected from the group consisting of: SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof 2-element compounds selected from the group; 3-element compounds selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof; and SnPbSSe, SnPbSeTe, The 4-element compound selected from the group consisting of SnPbSTe, and mixtures thereof; the aforementioned Group IV element or a compound containing the element can be selected from the group consisting of: Si, Ge, and the like An elemental compound selected from the group consisting of mixtures; and a 2-element compound selected from the group consisting of SiC, SiGe, and mixtures thereof. The quantum dot particles can be a homogeneous single structure, a dual structure such as a core‒shell, a gradient structure, or the like, or a mixture of these structures. As far as the dual structure of the core and shell is concerned, the substances respectively constituting the core and the shell can be composed of the aforementioned semiconductor compounds, which are different from each other. For example, the case may include one or more substances selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but is not limited thereto. The case may include one or more substances selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto. The diameter of the quantum dot particles of the present invention is not particularly limited, and for example, the average particle diameter may be 1 to 40 nm. Then, in the case of a dual structure of a core and a shell, the average particle diameter of the core may be 0.5 to 10 nm, and the average thickness of the shell may be 0.5 to 30 nm. When the average particle diameter and thickness are within the foregoing ranges, the composition can have excellent dispersibility, and can specifically show color by light irradiation, and is used for manufacturing a color filter. The colored photosensitive resin composition used in the manufacture of general color filters includes red, green, and blue colorants in order to specifically express the hue. Photoluminescent quantum dot particles can also be classified into red quantum dot particles, green quantum dot particles, and Blue quantum dot particles. The quantum dot particles of the present invention may be red quantum dot particles, green quantum dot particles, or blue quantum dot particles. The red, green, and blue quantum dot particles can be classified according to their particle diameters, and the particle diameters become smaller in the order of red, green, and blue. Specifically, the particle size of the red quantum dot particles is 5 nm to 10 nm, the green quantum dot particles may be more than 3 nm to 5 nm, and the blue quantum dot particles may be 1 nm to 3 nm. Upon light irradiation, red quantum dot particles emit red light, green quantum dot particles emit green light, and blue quantum dot particles emit blue light. Quantum dot particles can be synthesized by a wet chemical process, an organic metal chemical vapor deposition process, or a molecular beam epitaxy process. The wet chemical process is a method in which a precursor substance is placed in an organic solvent to grow particles. As crystals grow, organic solvents are naturally located on the surface of the quantum dot crystals, and they function as dispersants to regulate the crystal growth. Therefore, compared to metal organic chemical vapor deposition (MOCVD) or molecular beams, Epitaxial (MBE, molecular beam epitaxy) vapor deposition method can easily control the growth of nano particles through an inexpensive process. The content of the quantum dot particles in the present invention is not particularly limited. For example, the total weight of the solid content of the photosensitive resin composition may be 3 to 80% by weight, and more preferably 5 to 70% by weight. If the content is less than 3% by weight, the luminous efficiency tends to be insignificant. If it exceeds 80% by weight, the content of other components is relatively insufficient, and it has a problem that it is difficult to form a pixel pattern. Photopolymerizable compound The photopolymerizable compound of the present invention is a compound that can be polymerized by the action of a photopolymerization initiator described later, and examples thereof include monofunctional monomers, difunctional monomers, and other polyfunctional monomers. These photopolymerizable compounds can be used alone or in combination of two or more. Specific examples of the monofunctional monomer include carbyl nonylphenyl acrylate, propyl 2-hydroxy-3-phenoxyacrylate, carbyl 2-ethylhexyl acrylate, ethyl 2-hydroxyacrylate, N -Vinyl acetolone and the like. Specific examples of the difunctional monomer include 1,6-hexamethylene di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and Ethylene glycol di (meth) acrylate, bis (acryloxyethyl) ether of bisphenol A, 3-methylpentanediol (meth) acrylate, and the like. Specific examples of other polyfunctional monomers include trimethylolpropane tri (meth) acrylate, ethoxylated (ethoxylated) trimethylolpropane tri (meth) acrylate, and propoxylated ( (Propoxy) trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, ethoxylated dipentaerythritol Hexa (meth) acrylate, propoxylated dipentaerythritol hexa (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol (poly) acrylate having a hydroxyl value as shown in the following chemical formula 1, and the like. [Chemical Formula 1] (Wherein R is a hydrogen atom or a propylene fluorenyl group having 2 to 6 carbon atoms). The content of the photopolymerizable compound of the present invention is not particularly limited. For example, the total weight of the solid content of the photosensitive resin composition may be 5 to 70% by weight, and more preferably 10 to 60% by weight. If the content is less than 5% by weight, the degree of light hardening is reduced, and it may be difficult to form a pixel pattern. If it exceeds 70% by weight, the pattern may peel off. Photopolymerization initiator The photopolymerization initiator of the present invention has a UV absorbance of 0 to 0.1 at a wavelength of 365nm at a concentration of 0.001 mole. If the UV absorbance at a wavelength of 365 nm exceeds 0.1 at a concentration of 0.001 mol, it is difficult to form a micropattern. The intensity of the photoluminescence of the color filter formed with the composition of the present invention is reduced, and a display with sufficient brightness cannot be achieved. Device. However, since the present invention contains a photopolymerization initiator with a UV absorbance of 0.1 or less at a wavelength of 365 nm at a concentration of 0.001 mol, the micropattern can be easily formed, and the photoluminescence intensity of the photoluminescent quantum dot particles can be maximized. Significantly improves brightness. It is judged that if the UV absorbance exceeds 0.1, the photopolymerization initiator will compete with the photoluminescent quantum dot particles to absorb UV, the UV absorption of the photoluminescent quantum dot particles will decrease, and the luminous efficiency will decrease. If it is less than 0.1, the photoinduced The luminescent quantum dot particles absorb far more UV light than the photopolymerization initiator, and the luminous efficiency is improved. Specifically, as far as the luminous efficiency of the photoluminescent quantum dot particles is concerned, at a concentration of 0.001 mol of the photopolymerization initiator, the UV absorbance at a wavelength of 365 nm is closer to 0, and the better, as far as the micropattern formation surface is concerned, The closer the absorbance is to 0.1, the better the photopolymerization initiator of the present invention is at a concentration of 0.001 mol. The UV absorbance at a wavelength of 365 nm is from 0 to 0.1. The photopolymerization initiator of the present invention is not particularly limited as long as it has the absorbance in the aforementioned range, and examples thereof include acetophenone-based compounds, polyfunctional thiol-based compounds, biimidazole-based compounds, and Oxime ester compounds, triazine compounds, and the like. These compounds may be used alone or in combination of two or more. As a specific example of a photopolymerization initiator having a UV absorbance of 0.1 or less at a wavelength of 365 nm at a concentration of 0.001 mole, 2‒methyl-1-[(4- (methylthio) phenyl] -2 - Porphyrin propane, 1 ketone, 4 methoxy, 3, 3 'dimethyl benzophenone, 2, 2 bis dimethoxy, 1,2, diphenylethane, 1 ketone, 1 ‒Hydroxy‒cyclohexyl‒phenyl 己 one, 1‒ [4‒ (2‒hydroxyethoxy) ‒phenyl] ‒2‒hydroxy‒2‒methyl‒1‒propane‒1‒one, 2‒hydroxy‒ 1‒1 {4‒ [4‒ (2‒hydroxy‒2‒methyl‒propyl 醯) ‒benzyl] ‒phenyl} ‒2‒methyl‒propane‒1‒one, trimethylolpropane tri ( 3‒mercaptopropionate), 2‒dimethylamine‒2‒ (4‒methyl‒benzyl) ‒1‒ (4‒ Phosphonium fluorene 4 fluorenyl phenyl) fluorene butane fluorene 1 fluorenone, and compounds represented by the following chemical formulas 2 to 12, and the like. [Chemical Formula 2] [Chemical Formula 3] [Chemical Formula 4] [Chemical Formula 5] [Chemical Formula 6] [Chemical Formula 7] [Chemical Formula 8] [Chemical Formula 9] [Chemical Formula 10] [Chemical Formula 11] [Chemical Formula 12] The photosensitive resin composition of the present invention may be used in combination with other photopolymerization initiators and the like generally used in the field, as long as the object of the present invention is not impaired. Examples include benzo-based compounds, benzophenone-based compounds, thioxanthone-based compounds, and anthracene-based compounds. These compounds may be used alone or in combination of two or more. Examples of the benzo-based compound include benzoin, benzoyl ether, benzoethyl ether, benzoisopropyl ether, and benzoisobutyl ether. Examples of the benzophenone-based compound include benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzophenone-4'-methyldiphenylsulfide, 3,3 ', 4,4'-tetrakis (tri-butylperoxycarboxy) benzophenone, 2,4,6-trimethylbenzophenone, 4,4'-bis (N, N' (Dimethylamine) benzophenone and the like. Examples of the thioxanthone-based compound include 2-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, and 1-chloro-4-propoxythioxanthone Wait. Examples of the anthracene-based compound include 9,10‒dimethoxyanthracene, 2‒ethyl‒9,10‒dimethoxyanthracene, 9,10‒diethoxyanthracene, 2‒ethyl‒9,10‒diethyl Oxanthracene and the like. In addition, 2,4,6-trimethylbenzoepoxyphosphine, 10‒butyl‒2‒chloroacridone, 2‒ethylanthraquinone, benzyl, 9,10‒phenanthrenequinone, Camphorquinone, methyl phenylglyoxylate, titanocene compound, etc. The photosensitive resin composition of the present invention may further include a photopolymerization initiation aid. In this case, the composition can be made more sensitive. Examples of the photopolymerization initiation aid include amine compounds and carboxylic acid compounds. These can be used alone or in combination of two or more. Specific examples of the amine compound include aliphatic amine compounds such as triethyl alcoholamine, methyldiethanolamine, and triisopropanolamine, methyl 4-dimethylaminobenzoate, and 4-dimethylaminobenzene Ethyl formate, 4-dimethylaminobenzoic acid isoamyl, 4-dimethylaminobenzoic acid 2-ethylhexyl, benzoic acid 2-dimethylaminoethyl, N, N-dimethyl P-toluidine, 4,4'-bis (dimethylamino) benzophenone (commonly known as Michelin), 4,4'-bis (diethylamino) benzophenone and other aromatic compounds The group amine compound is preferably an aromatic amine compound. Specific examples of the carboxylic acid compound include phenylthioacetic acid, methylbenzenethioacetic acid, ethylbenzenethioacetic acid, methylethylbenzenethioacetic acid, dimethylbenzenethioacetic acid, methoxyphenylthioacetic acid, and dimethoxybenzene Aromatic heteroacetic acids such as thioacetic acid, chlorophenylthioacetic acid, dichlorobenzenethioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthalenethioacetic acid, N-naphthylglycolic acid, and naphthaleneoxyacetic acid. The content of the photopolymerization initiator of the present invention is not particularly limited. For example, the total weight of the solid content of the photosensitive resin composition may be 0.1 to 20% by weight, and more preferably 0.5 to 15% by weight. When the content is in the range of 0.1 to 20% by weight, the composition is highly sensitive, and a micro-pixel pattern is easily formed. Alkali-soluble resin The alkali-soluble resin (A) is polymerized by containing an ethylenically unsaturated monomer having a carboxyl group. This is a component that imparts solubility to the alkali developing solution used in the developing process step when forming a pattern. The ethylenically unsaturated monomer having a carboxyl group is not particularly limited, and examples thereof include monocarboxylic acids such as acrylic acid, methacrylic acid, and crotonic acid; and dicarboxylic acids such as fumaric acid, mesaconic acid, and itaconic acid. And the anhydrides of these dicarboxylic acids; mono (meth) acrylates of polymers having carboxyl and hydroxyl groups at both ends, such as ω-carboxylic acid polycaprolactone mono (meth) acrylate, etc., which are preferably acrylic acid and Methacrylate. These can be used alone or in combination of two or more. The alkali-soluble resin of the present invention may further be polymerized by including at least one other monomer polymerizable with the aforementioned monomer. Examples include styrene, vinyltoluene, methylstyrene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, o-methoxystyrene, o-vinylbenzene Aromatic vinyl such as ether, m-vinylanisole, p-vinylanisole, o-vinylphenylepoxypropyl ether, m-vinylphenylepoxypropyl ether, p-vinylphenylepoxypropyl ether Compounds; N-cyclohexyl-cis-butene-diimide, N-benzyl-cis-butene-diimide, N-phenyl-cis-butene-diimide, N-o-hydroxyphenyl-cis-butene-diimide Amine, N-m-hydroxyphenyl-cis-butenedifluoreneimine, N-p-hydroxyphenyl-cis-butenedifluoreneimine, N-o-methylphenyl-cis-butenediimine, N-m-methyl Phenyl-cis-butene difluorene imine, N-p-methylphenyl-cis-butene difluorene imine, N-o-methoxyphenylcis-butene difluorene imine, N-m-methoxyphenylcis N-substituted maleimide compounds such as butene difluorene imide, N-p-methoxyphenyl maleimide diimide; methyl (meth) acrylate, ethyl (meth) acrylate Ester, propyl n (meth) acrylate, propyl iso (meth) acrylate, n ( Alkyl) (meth) acrylates such as butyl acrylate, iso (meth) acrylate, butyl (meth) acrylate, or butyl (meth) acrylate; cyclic (meth) acrylic acid Benzyl ester, hexyl cyclic (meth) acrylate, 2-hexyl cyclic (meth) acrylate, tricyclic [5.2.1.02,6] decane-8-yl (meth) acrylate, 2-di Aliphatic (meth) acrylates such as cyclophentanyloxy (meth) acrylate or isobornyl (meth) acrylate; phenyl (meth) acrylate or benzyl (meth) acrylate ( Aryl meth) acrylates; 3- (methacrylic oxomethyl) oxetane, 3- (methacrylic oxoethyl) -3-ethyloxetane, 3- ( Methacryloxyethyl) -2-trifluoromethyloxetane, 3- (methacryloxyethyl) -2-phenyloxetane, 2- (methacryl) Unsaturated oxetane compounds such as oxyethyl) oxetane and 2- (methacryloxyethyl) -4-trifluoromethyloxetane, and the like. These can be used alone or in combination of two or more. In this specification, (meth) acrylate means acrylate or methacrylate. The content of the alkali-soluble resin of the present invention is not particularly limited. For example, the total weight of the solid content of the photosensitive resin composition may be 5 to 80% by weight, and more preferably 10 to 70% by weight. When the content of the alkali-soluble resin is in the range of 5 to 80% by weight, the solubility in the developing solution is sufficient, and a pattern is easily formed, which prevents the film of the pixel portion of the exposed portion from being reduced and the exfoliation of the non-pixel portion is improved during development. Solvent The solvent of the present invention is not particularly limited, and may be an organic solvent generally used in this field. Specific examples include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether; diethylene glycol dimethyl ether, Diethylene glycol dialkyl ethers such as diethylene glycol diethyl ether, diethylene glycol dipropyl ether, and diethylene glycol dibutyl ether; methyl celex acetate, ethyl celex acetate, etc. Glycol alkyl ether acetates; propylene glycol dialkyl ethers such as propylene glycol monomethyl ether; propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, methoxybutyl acetate , Alkylene glycol alkyl ether acetates such as methoxybenzyl acetate; aromatic hydrocarbons such as benzene, toluene, xylene, xylene; methyl ethyl ketone, acetone, methylamine ketone, methyl Ketones such as isobutanone, cyclohexanone; alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, glycerol; ethyl 3-propoxypropionate, 3-methoxypropionic acid Esters such as methyl; and cyclic esters such as g-butyrolactone. These can be used alone or in combination of two or more. The solvent content of the present invention is not particularly limited. For example, the total weight of the solid content of the photosensitive resin composition may be 60 to 90% by weight, and more preferably 70 to 85% by weight. When the solvent content is in the range of 60 to 90% by weight, the coatability can be improved. <Color filter> In addition, a color filter manufactured from the aforementioned photosensitive resin composition of the present invention is provided. When the color filter of the present invention is applied to an image display device, since light is emitted from the light source of the display device, better light efficiency can be achieved. In addition, since light having a hue is emitted, color reproducibility is excellent, and light is emitted in all directions by photoluminescence, so that the viewing angle can also be improved. The color filter includes a substrate and a pattern layer formed on the upper portion of the substrate. The substrate may be a color filter itself, or the color filter may be located at a position such as a display device, and is not particularly limited. The substrate may also be silicon (Si), silicon oxide (SiO x ), or a polymer substrate, and the polymer substrate may be polyethersulphone (PES) or polycarbonate (PC). The pattern layer is a layer containing the photosensitive resin composition of the present invention, and may be a layer formed by coating the photosensitive resin composition and exposing, developing, and thermally curing the pattern in a predetermined pattern. The pattern layer formed of the photosensitive resin composition may include a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a blue pattern layer containing blue quantum dot particles. Upon light irradiation, the red pattern layer emits red light, the green pattern layer emits green light, and the blue pattern layer emits blue light. In this case, the light emitted from the light source when applied to an image display device is not particularly limited, but in terms of more excellent brightness and color reproducibility, it is preferable to use a light source that emits blue light. According to another embodiment of the present invention, the pattern layer includes a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a transparent pattern layer containing no quantum dot particles. In this case, as a light source of the image display device including the pattern layer, a blue light source can be used. At this time, the red pattern layer emits red light, the green pattern layer emits green light, and the transparent pattern layer directly transmits blue light to display blue. The color filter including the aforementioned substrate and pattern layer may further include a partition wall formed between the patterns, and may further include a black matrix. Furthermore, a protective film formed on the pattern layer of the color filter may be further included. <Graphic display device> The present invention also provides an image display device including the aforementioned color filter. The color filter of the present invention is applicable not only to general liquid crystal display devices, but also to various image display devices such as field emission display devices, plasma display devices, and field emission display devices. The image display device of the present invention may include a color filter including a red pattern layer containing red quantum dot particles, a green pattern layer containing green quantum dot particles, and a blue color containing blue quantum dot particles. Pattern layer. In this case, the light emitted from the light source when applied to an image display device is not particularly limited, but in terms of more excellent color reproducibility, it is preferable to use a light source that emits blue light. According to another embodiment of the present invention, the image display device of the present invention may include a color filter including a red pattern layer, a green pattern layer, and a transparent pattern layer that does not contain quantum dot particles. In this case, a light source that emits blue light can be used as the light source. At this time, the red quantum dot particles emit red light, the green quantum dot particles emit green light, and the transparent pattern layer system directly transmits blue light to show blue. The image display device of the present invention has excellent light efficiency, high display brightness, excellent color reproducibility, and a wide viewing angle. In the following, preferred embodiments are suggested in order to help understand the present invention, but these embodiments are only for exemplifying the present invention, and do not limit the scope of the attached patent application. It is obvious to the industry that it is within the scope of the present invention. Within the scope of technical and technical ideas, various changes and amendments are applied to the embodiments, and such deformations and amendments naturally belong to the scope of the attached patent application. Production example 1. Synthesis of photoluminescence green quantum dot particles A‒1 with CdSe (nuclear body) / ZnS (shell) structure CdO (0.4 mmol), zinc acetate (4 mmol), oleic acid (Oleicacid) (5.5 mL) was put into a reactor together with 1 octadecene (20 mL), and heated to 150 ° C. to react. Thereafter, heat was applied at 310 ° C to obtain a transparent mixture. After maintaining the temperature at 310 ° C for 20 minutes, 0.4 mmol of Se powder and 2.3 mmol of S powder were dissolved in 3 mL of trioctylphosphine. The obtained Se and S solutions were quickly injected into a reactor containing Cd (OA) 2 and Zn (OA) 2 solutions. After the resulting mixture was allowed to grow at 310 ° C. for 5 minutes, the growth was stopped by using an icebath. Thereafter, it was precipitated with ethanol, the quantum dots were separated by a centrifugal separator, and excess impurities were washed away with chloroform and ethanol, thereby obtaining a total thickness of 3 with oleic acid stabilizing, the distribution of core bodies and the thickness of the shell Quantum dot particles A‒1 of CdSe (nuclear body) / ZnS (shell) structure of ~ 5nm particles. Production Example 2. Synthesis of alkali-soluble resin Preparation of a flask equipped with a stirrer, a thermometer reflux cooling tube, a dropping tube, and a nitrogen introduction tube. In addition, as a monomer dropping tube, 45 weight of N-benzyl cis butylene diimide was charged. Parts, 45 parts by weight of methacrylic acid, 10 parts by weight of tricyclodecyl methacrylate, parts by weight of ethyl tertiary butyl-2-hexanoate, propylene glycol monomethyl ether acetate (hereinafter referred to as PGMEA) 40 After the weight part, it is stirred and mixed to prepare a monomer dropping tube, and 6 weight parts of n-dodecyl mercaptan and PGMEA 24 weight part are put in and stirred and mixed to prepare a chain transfer agent dropping tube. Thereafter, a weight part of PGMEA395 was introduced into the flask, and the atmosphere in the flask was changed from air to nitrogen, and then the temperature in the flask was raised to 90 ° C while stirring. Next, a monomer and a chain transfer agent are dripped from a drip tube. The dropping system was maintained at 90 ° C for 2 hours, and after 1 hour, the temperature was raised to 110 ° C. After maintaining for 3 hours, the glass introduction tube was introduced to start the oxygen / nitrogen = 5/95 (v / v) mixed gas. Foaming. Next, 10 parts by weight of glycidyl methacrylate, 0.4 parts by weight of 2,2′‒methylenebis (4‒methyl‒6‒tertiary butylphenol), and 0.8 parts by weight of triethylamine were charged into the flask. The reaction was continued at 110 ° C. for 8 hours, and then cooled to room temperature to obtain an alkali-soluble resin having a solid content of 29.1% by weight, a weight average molecular weight of 32,000, and an acid value of 114 mgKOH / g. Examples and Comparative Examples (1) Production of photosensitive resin composition The composition (weight part) described in the following Table 1 was added, diluted with propylene glycol monomethyl ether acetate, and the solid content was 18% by weight, and then stirred, Manufacture of a photosensitive resin composition. [Table 1] (2) Production of color filters After the photosensitive resin compositions of the examples and comparative examples were coated on a glass substrate by a spin coating method, they were placed on a hot plate and maintained at 100 ° C for 3 minutes to form a thin film. On the aforementioned film, a test mask having a transmission pattern of 20 mm´20 mm square and a line / space pattern of 1 to 100 mm was placed, and the interval between the test mask and the test mask was set to 100 mm, and ultraviolet rays were irradiated. At this time, the ultraviolet light source is an ultra-high pressure mercury lamp (USH‒250D) of a USHIO motor, and the light is irradiated with an exposure amount (365 nm) of 200 mJ / cm 2 in an atmospheric atmosphere without using an optical filter. Next, the film was immersed in a KOH aqueous solution at pH 10.5 for 80 seconds to develop. After washing with distilled water, blowing nitrogen to dry it, and heating it in an oven at 150 ° C. for 10 minutes to produce a color filter. The thickness of the manufactured color pattern was 3.0 μm. Experimental example (1) Measurement of absorbance of photopolymerization initiator The propylene glycol monomethyl ether acetate was used to dilute each photopolymerization initiator used in the foregoing examples and comparative examples to a concentration of 0.01 mol / liter, and then the absorbance was measured. A measuring machine (UV‒2550, Shimadzu) measures the absorbance at 365 nm. The results are shown in Table 2 below. (2) Whether micro-pattern formation can be evaluated is obtained from a color filter manufactured from the composition of the foregoing examples and comparative examples, and obtained by measuring a line / space pattern cover having a width of 100 μm through an opening with an OM device (ECLIPSELV 100POL, NIKON). The width of the pattern, the difference between the width of the opening of the pattern cover and the pattern width, is shown in Table 2 below. The smaller the gap between the width of the opening of the figure cover and the width of the pattern, the more detailed the pattern can be formed. If the absolute value of the gap is more than 20 μm, it is difficult to display micro pixels in detail. When a negative value is displayed, it may cause process defects. (3) The luminous intensity was measured on a color filter manufactured from the composition of the foregoing Examples and Comparative Examples. The pattern was 20mm´20mm, and a 365nm Tube 4WUV irradiator (VL‒4LC, VILBERLOURMAT) was used to illuminate the light. A spectrometer (Ocean Optics) measures the light intensity in the wavelength range (red quantum dots: 640 nm, green quantum dots: 545 nm) emitted by photoluminescence, and is shown in Table 2 below. The stronger the measured light intensity, the more excellent the photoluminescence characteristics can be judged. [Table 2] Referring to the aforementioned Table 2, the composition of Examples 1 to 8 containing a photopolymerization initiator having a UV absorbance of 365 nm and a wavelength of 0.1 or less at a concentration of 0.001 mol has a small gap between the width of the opening portion of the mask and the width of the pattern , Can form very fine patterns. Then, it was confirmed that the intensity of the photoluminescence was excellent and the display was high in brightness. However, the compositions of Comparative Examples 1 to 5 could not form a micropattern, or the photoluminescence intensity was reduced.
