TWI632426B - 著色感光性樹脂組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件、以及圖像顯示裝置 - Google Patents

著色感光性樹脂組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件、以及圖像顯示裝置 Download PDF

Info

Publication number
TWI632426B
TWI632426B TW103128006A TW103128006A TWI632426B TW I632426 B TWI632426 B TW I632426B TW 103128006 A TW103128006 A TW 103128006A TW 103128006 A TW103128006 A TW 103128006A TW I632426 B TWI632426 B TW I632426B
Authority
TW
Taiwan
Prior art keywords
group
pigment
substituent
carbon atoms
formula
Prior art date
Application number
TW103128006A
Other languages
English (en)
Chinese (zh)
Other versions
TW201508416A (zh
Inventor
尾田和也
稲部陽樹
Original Assignee
日商富士軟片股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商富士軟片股份有限公司 filed Critical 日商富士軟片股份有限公司
Publication of TW201508416A publication Critical patent/TW201508416A/zh
Application granted granted Critical
Publication of TWI632426B publication Critical patent/TWI632426B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B1/00—Dyes with anthracene nucleus not condensed with any other ring
    • C09B1/16—Amino-anthraquinones
    • C09B1/20—Preparation from starting materials already containing the anthracene nucleus
    • C09B1/206—Dyes with amino groups substituted by heterocyclic radicals
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B25/00—Quinophthalones
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B29/00—Monoazo dyes prepared by diazotising and coupling
    • C09B29/32—Monoazo dyes prepared by diazotising and coupling from coupling components containing a reactive methylene group
    • C09B29/33—Aceto- or benzoylacetylarylides
    • C09B29/335—Aceto- or benzoylacetylarylides free of acid groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B48/00—Quinacridones
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Optical Filters (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW103128006A 2013-08-28 2014-08-15 著色感光性樹脂組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件、以及圖像顯示裝置 TWI632426B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013176780A JP6147143B2 (ja) 2013-08-28 2013-08-28 着色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、および画像表示装置
JP2013-176780 2013-08-28

Publications (2)

Publication Number Publication Date
TW201508416A TW201508416A (zh) 2015-03-01
TWI632426B true TWI632426B (zh) 2018-08-11

Family

ID=52586218

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103128006A TWI632426B (zh) 2013-08-28 2014-08-15 著色感光性樹脂組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件、以及圖像顯示裝置

Country Status (4)

Country Link
JP (1) JP6147143B2 (ja)
KR (2) KR20160022900A (ja)
TW (1) TWI632426B (ja)
WO (1) WO2015029643A1 (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230008222A (ko) * 2014-08-11 2023-01-13 제이에스알 가부시끼가이샤 착색 조성물, 착색 경화막 및 고체 촬상 소자
KR102279575B1 (ko) * 2015-03-26 2021-07-20 동우 화인켐 주식회사 착색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 화상 표시 장치
JP6663677B2 (ja) * 2015-10-06 2020-03-13 東京応化工業株式会社 レジスト組成物及びレジストパターン形成方法、並びに、化合物及び酸拡散制御剤
WO2017110893A1 (ja) * 2015-12-24 2017-06-29 三菱化学株式会社 感光性着色組成物、硬化物、着色スペーサー、画像表示装置
JP6778138B2 (ja) * 2016-03-23 2020-10-28 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． 赤色感光性樹脂組成物、これを用いて製造されたカラーフィルタおよび前記カラーフィルタを含むディスプレイ素子
KR102572680B1 (ko) * 2016-03-23 2023-08-31 동우 화인켐 주식회사 적색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 상기 컬러필터를 포함하는 디스플레이 소자
CN110226129A (zh) * 2017-02-23 2019-09-10 富士胶片株式会社 感光性组合物、固化膜、滤色器、固体摄像元件及图像显示装置
KR102582198B1 (ko) * 2017-06-30 2023-09-22 미쯔비시 케미컬 주식회사 감광성 착색 조성물, 경화물, 착색 스페이서, 및 화상 표시 장치
WO2019058859A1 (ja) * 2017-09-20 2019-03-28 富士フイルム株式会社 着色組成物、硬化膜、パターン形成方法、カラーフィルタ、固体撮像素子及び画像表示装置
JP7095091B2 (ja) * 2018-06-27 2022-07-04 富士フイルム株式会社 感光性組成物、膜、カラーフィルタ、固体撮像素子及び画像表示装置
WO2020040043A1 (ja) * 2018-08-22 2020-02-27 富士フイルム株式会社 着色組成物、硬化膜、パターン形成方法、カラーフィルタ、固体撮像素子および画像表示装置
KR20200114469A (ko) 2019-03-28 2020-10-07 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이를 포함하는 컬러필터 및 고체 촬상 소자
JP7344370B2 (ja) * 2020-03-16 2023-09-13 富士フイルム株式会社 樹脂組成物、膜、光学フィルタ、固体撮像素子、及び、画像表示装置
TW202204521A (zh) * 2020-07-29 2022-02-01 日商富士軟片股份有限公司 樹脂組成物、膜、濾光器、固體攝像元件及圖像顯示裝置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012208374A (ja) * 2011-03-30 2012-10-25 Fujifilm Corp 感放射線性組成物、パターン形成方法、カラーフィルタ及びその製造方法、並びに、固体撮像素子

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0733485B2 (ja) * 1987-06-05 1995-04-12 東洋インキ製造株式会社 顔料分散剤
JPH10115709A (ja) * 1996-08-21 1998-05-06 Toray Ind Inc カラーフィルター用赤ペースト、および、それを使用したカラーフィルター、液晶表示装置
JPH10171118A (ja) * 1996-12-06 1998-06-26 Nippon Shokubai Co Ltd カラーフィルターの製造方法
JPH11310715A (ja) * 1998-04-28 1999-11-09 Hitachi Chem Co Ltd 赤色樹脂組成物、感光性赤色樹脂組成物、赤色画像形成用感光液、着色画像の製造法及びカラーフィルターの製造法
JP3940535B2 (ja) * 1998-11-30 2007-07-04 Ｊｓｒ株式会社 ブラックレジスト用感放射線性組成物
KR20000035753A (ko) * 1998-11-30 2000-06-26 마쯔모또 에이찌 블랙 레지스트용 감방사선성 조성물
JP4538220B2 (ja) * 2003-12-16 2010-09-08 東洋インキ製造株式会社 カラーフィルタ用赤色着色組成物およびカラーフィルタ
JP2010145857A (ja) * 2008-12-19 2010-07-01 Mitsubishi Chemicals Corp カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌディスプレイ
JP5210286B2 (ja) 2009-10-30 2013-06-12 東洋インキＳｃホールディングス株式会社 カラーフィルタ用赤色着色組成物およびカラーフィルタ
JP2012208266A (ja) * 2011-03-29 2012-10-25 Mitsubishi Chemicals Corp 着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機ｅｌ表示装置
JP2013064993A (ja) * 2011-08-31 2013-04-11 Fujifilm Corp カラーフィルタの製造方法、カラーフィルタ、及び固体撮像素子
JP7033485B2 (ja) * 2018-04-17 2022-03-10 株式会社ディスコ 切削ブレードの整形方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012208374A (ja) * 2011-03-30 2012-10-25 Fujifilm Corp 感放射線性組成物、パターン形成方法、カラーフィルタ及びその製造方法、並びに、固体撮像素子

Also Published As

Publication number Publication date
KR20160022900A (ko) 2016-03-02
JP6147143B2 (ja) 2017-06-14
TW201508416A (zh) 2015-03-01
WO2015029643A1 (ja) 2015-03-05
KR20170132339A (ko) 2017-12-01
JP2015045736A (ja) 2015-03-12
KR101943339B1 (ko) 2019-01-29

Similar Documents

Publication Publication Date Title
TWI632426B (zh) 著色感光性樹脂組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件、以及圖像顯示裝置
TWI611264B (zh) 感光性著色組成物、彩色濾光片、彩色濾光片的製造方法、有機ｅｌ液晶顯示裝置、彩色濾光片形成用套組
TWI541603B (zh) 著色感放射線性組成物、著色硬化膜、彩色濾光片、圖案形成方法、彩色濾光片的製造方法、固體攝影元件以及影像顯示裝置
KR101938600B1 (ko) 착색 조성물, 경화막, 컬러 필터, 컬러 필터의 제조 방법, 고체 촬상 소자, 및 화상 표시 장치
TWI623593B (zh) 著色組成物、著色硬化膜、彩色濾光片、固體攝像元件及圖像顯示裝置
TWI632204B (zh) 著色組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件及圖像顯示裝置
WO2016121194A1 (ja) 着色組成物、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子、および、画像表示装置
TWI609240B (zh) 著色感光性樹脂組成物、硬化膜、圖案、彩色濾光片、彩色濾光片的製造方法、固體攝像元件及圖像顯示裝置
TWI604018B (zh) 紅色感光性樹脂組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件及圖像顯示裝置
TWI611257B (zh) 著色感光性樹脂組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件及圖像顯示裝置
TWI632202B (zh) 著色組成物、硬化膜、彩色濾光片的製造方法、彩色濾光片、固體攝像元件及圖像顯示裝置
JP6147135B2 (ja) 着色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、および画像表示装置
TWI615673B (zh) 著色組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件及圖像顯示裝置
JP6837988B2 (ja) 着色組成物、カラーフィルタ、パターン形成方法、固体撮像素子、画像表示装置および色素多量体
JP2015151530A (ja) 複合体およびその製造方法、着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置、ならびに、積層体よび積層体
WO2016072259A1 (ja) 着色硬化性組成物、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子、および、画像表示装置
TWI592752B (zh) 著色感光性樹脂組成物及其製造方法、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件及圖像顯示裝置
TW201533535A (zh) 感放射線性組成物及其製造方法、硬化膜、彩色濾光片及其製造方法、圖案形成方法、固體攝像元件及圖像顯示裝置
JP6225254B2 (ja) 着色組成物、着色組成物の製造方法、カラーフィルタ、有機エレクトロルミネッセンス表示素子