TWI613511B - 防塵薄膜組件 - Google Patents

防塵薄膜組件 Download PDF

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Publication number
TWI613511B
TWI613511B TW105109334A TW105109334A TWI613511B TW I613511 B TWI613511 B TW I613511B TW 105109334 A TW105109334 A TW 105109334A TW 105109334 A TW105109334 A TW 105109334A TW I613511 B TWI613511 B TW I613511B
Authority
TW
Taiwan
Prior art keywords
pellicle
vent hole
assembly
filter
frame
Prior art date
Application number
TW105109334A
Other languages
English (en)
Chinese (zh)
Other versions
TW201702735A (zh
Inventor
白崎亨
Original Assignee
信越化學工業股份有限公司
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Publication date
Application filed by 信越化學工業股份有限公司 filed Critical 信越化學工業股份有限公司
Publication of TW201702735A publication Critical patent/TW201702735A/zh
Application granted granted Critical
Publication of TWI613511B publication Critical patent/TWI613511B/zh

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  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW105109334A 2015-03-30 2016-03-25 防塵薄膜組件 TWI613511B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015068360 2015-03-30
JP2015199104A JP6395320B2 (ja) 2015-03-30 2015-10-07 ペリクル

Publications (2)

Publication Number Publication Date
TW201702735A TW201702735A (zh) 2017-01-16
TWI613511B true TWI613511B (zh) 2018-02-01

Family

ID=57246692

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105109334A TWI613511B (zh) 2015-03-30 2016-03-25 防塵薄膜組件

Country Status (2)

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JP (1) JP6395320B2 (ja)
TW (1) TWI613511B (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018200380A (ja) * 2017-05-26 2018-12-20 日本特殊陶業株式会社 ペリクル枠及びその製造方法
JP7357432B2 (ja) * 2017-10-10 2023-10-06 信越化学工業株式会社 Ｅｕｖ用ペリクルフレーム、ペリクル、ペリクル付露光原版、露光方法、及び半導体の製造方法
JP2019070745A (ja) 2017-10-10 2019-05-09 信越化学工業株式会社 ペリクルフレーム及びペリクル
EP3779594B1 (en) 2018-03-27 2023-11-08 Mitsui Chemicals, Inc. Supporting frame for pellicle, pellicle, method for manufacturing same, exposure master using same, and method for manufacturing semiconductor device
EP3809202A4 (en) * 2018-06-12 2022-03-16 Mitsui Chemicals, Inc. FILM SUPPORT FRAME, FILM FILM, METHOD FOR MAKING FILM SUPPORT FRAME, AND ORIGINAL EXPOSURE PLATE AND EXPOSURE DEVICE USING FILM
JP7103252B2 (ja) 2019-02-01 2022-07-20 信越化学工業株式会社 ペリクルフレーム、ペリクル、マスク粘着剤付ペリクルフレーム、ペリクル付露光原版、露光方法及び半導体の製造方法
KR102194012B1 (ko) * 2020-04-10 2020-12-22 숭실대학교산학협력단 탄소나노튜브 박막을 이용한 커패시터형 펠리클 및 이의 제조 방법
CN215986893U (zh) * 2020-05-14 2022-03-08 信越化学工业株式会社 防护薄膜框架、防护薄膜、曝光原版、装置与***、半导体及液晶显示板的制造***
TWM622366U (zh) * 2020-06-04 2022-01-21 日商信越化學工業股份有限公司 防護薄膜框架、防護薄膜、帶防護薄膜的曝光原版、曝光裝置、曝光系統、半導體的製造系統及液晶顯示板的製造系統
KR102236451B1 (ko) * 2020-11-02 2021-04-06 서울엔지니어링(주) Euv 펠리클
TW202326288A (zh) * 2021-08-25 2023-07-01 日商信越化學工業股份有限公司 能夠高速地進行氣壓調整的曝光用防護膜及其製造方法、曝光遮罩、曝光方法與半導體裝置的製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6103427A (en) * 1991-05-17 2000-08-15 Dupont Photomasks, Inc. Pressure relieving pellicle
TW538302B (en) * 2001-07-30 2003-06-21 Asahi Glass Co Ltd Pellicle
US7094505B2 (en) * 2002-10-29 2006-08-22 Toppan Photomasks, Inc. Photomask assembly and method for protecting the same from contaminants generated during a lithography process
TW201100952A (en) * 2009-06-19 2011-01-01 Shinetsu Chemical Co Pellicle

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3445685B2 (ja) * 1994-08-11 2003-09-08 三井化学株式会社 マスク保護装置
JP3575516B2 (ja) * 1997-01-07 2004-10-13 信越化学工業株式会社 気圧調整用孔保護フィルター付きペリクル
JP3331996B2 (ja) * 1998-12-25 2002-10-07 日本電気株式会社 ペリクル
US7205074B2 (en) * 2002-12-31 2007-04-17 Intel Corporation Venting of pellicle cavity for a mask
JP2004258113A (ja) * 2003-02-24 2004-09-16 Nikon Corp マスク保護装置、マスク、ガス置換装置、露光装置、ガス置換方法及び露光方法
JP2004354720A (ja) * 2003-05-29 2004-12-16 Semiconductor Leading Edge Technologies Inc マスク用ペリクル
JP2005250188A (ja) * 2004-03-05 2005-09-15 Asahi Glass Co Ltd ペリクル
JP5304622B2 (ja) * 2009-12-02 2013-10-02 信越化学工業株式会社 リソグラフィ用ペリクル
JP6200669B2 (ja) * 2013-03-27 2017-09-20 日本タングステン株式会社 電気接点材料

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6103427A (en) * 1991-05-17 2000-08-15 Dupont Photomasks, Inc. Pressure relieving pellicle
TW538302B (en) * 2001-07-30 2003-06-21 Asahi Glass Co Ltd Pellicle
US7094505B2 (en) * 2002-10-29 2006-08-22 Toppan Photomasks, Inc. Photomask assembly and method for protecting the same from contaminants generated during a lithography process
TW201100952A (en) * 2009-06-19 2011-01-01 Shinetsu Chemical Co Pellicle

Also Published As

Publication number Publication date
JP6395320B2 (ja) 2018-09-26
JP2016191902A (ja) 2016-11-10
TW201702735A (zh) 2017-01-16

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