TWI552214B - Liquid-transporting pipe device and methods for supplying liquid and stopping liquid supply using the same - Google Patents
Liquid-transporting pipe device and methods for supplying liquid and stopping liquid supply using the same Download PDFInfo
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- TWI552214B TWI552214B TW104114295A TW104114295A TWI552214B TW I552214 B TWI552214 B TW I552214B TW 104114295 A TW104114295 A TW 104114295A TW 104114295 A TW104114295 A TW 104114295A TW I552214 B TWI552214 B TW I552214B
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Description
本發明是關於一種液體傳輸管路裝置及運用該液體傳輸管路裝置之供液方法和停止供液方法，特別是關於一種適用於一製程反應槽的液體傳輸管路裝置及運用該液體傳輸管路裝置之供液方法和停止供液方法。 The present invention relates to a liquid transfer line device and a liquid supply method and a liquid supply stop method using the liquid transfer line device, and more particularly to a liquid transfer line device suitable for use in a process reaction tank and the use of the liquid transfer tube The liquid supply method of the road device and the liquid supply stop method.
請參照第1圖，其顯示一種傳統液體傳輸管路裝置10之管路示意圖。該液體傳輸管路裝置10與一製程反應槽20連通，用於供應第一種製程液體至該製程反應槽20內。該液體傳輸管路裝置10包含：一液體供應單元11用於提供該第一種製程液體，以及一進液管路S連通於該液體供應單元11和該製程反應槽20之間用於將該第一種製程液體輸送至該製程反應槽20。該進液管路S包含一閥門V用於控制該第一種製程液體的流通。 Referring to Figure 1, there is shown a schematic view of a conventional liquid transfer line assembly 10. The liquid transfer line device 10 is in communication with a process reaction tank 20 for supplying a first process liquid to the process reaction tank 20. The liquid transfer line device 10 includes a liquid supply unit 11 for supplying the first process liquid, and an inlet line S communicating between the liquid supply unit 11 and the process reaction tank 20 for The first process liquid is delivered to the process reaction tank 20. The inlet line S includes a valve V for controlling the flow of the first process liquid.
如第1圖所示，該進液管路S包含一第一段P1和一第二段P2，其中該第一段P1位於該液體供應單元11和該閥門V之間，以及該第二段P2位於該閥門V和該製程反應槽20之間。然而當將該閥門V關閉後，即停止 供應該第一種製程液體流通至該製程反應槽20內時，一部分的該第一種製程液體可能會殘留在該進液管路S之該第二段P2中，使得當該製程反應槽20經由另一液體傳輸管路裝置(未圖示)注入第二種製程液體時，該第二段P2中殘留的該第一種製程液體會滴入該製程反應槽20內，因而汙染該製程反應槽20內新注入的該第二種製程液體，使製程產生變異。 As shown in FIG. 1, the liquid inlet pipe S includes a first section P1 and a second section P2, wherein the first section P1 is located between the liquid supply unit 11 and the valve V, and the second section P2 is located between the valve V and the process reaction tank 20. However, when the valve V is closed, it stops. When the first process liquid is supplied to the process reaction tank 20, a portion of the first process liquid may remain in the second stage P2 of the feed line S, so that when the process reaction tank 20 is When the second process liquid is injected through another liquid transfer line device (not shown), the first process liquid remaining in the second stage P2 is dropped into the process reaction tank 20, thereby contaminating the process reaction. The second process liquid newly injected in the tank 20 causes the process to mutate.
舉例來說，當該製程反應槽20係用於半導體製程中的去光阻製程時，該製程反應槽20內主要裝載去光阻液(如EKC)，以及該液體傳輸管路裝置10為用於供給用來清洗該製程反應槽20的清洗液體(如去離子水)。當藉由該液體傳輸管路裝置10將該製程反應槽20清洗完畢後，再藉由另一液體傳輸管路裝置(未圖示)將EKC注入該製程反應槽20。當殘留在該進液管路S之該第二段P2內的去離子水滴入該製程反應槽20時，EKC與水發生反應產生強鹼，因而造成製程變異，例如當製程基板上包含金屬層時，該金屬層會因此產生氧化。 For example, when the process reaction tank 20 is used for the photoresist removal process in the semiconductor process, the process reaction tank 20 is mainly loaded with a photoresist (such as EKC), and the liquid transfer line device 10 is used. A cleaning liquid (such as deionized water) for cleaning the process reaction tank 20 is supplied. After the process reaction tank 20 is cleaned by the liquid transfer line device 10, the EKC is injected into the process reaction tank 20 by another liquid transfer line device (not shown). When the deionized water remaining in the second section P2 of the liquid inlet line S is dropped into the process reaction tank 20, the EKC reacts with water to generate a strong alkali, thereby causing process variation, for example, when the process substrate contains a metal layer. At this time, the metal layer will thus be oxidized.
有鑑於此，有必要提出一種改進的液體傳輸管路裝置，能有效避免當該液體傳輸管路裝置停止供應製程液體時部分製程液體殘留在該液體傳輸管路裝置的管路中所造成的製程變異問題。 In view of the above, it is necessary to provide an improved liquid transfer line device, which can effectively avoid the process caused by the partial process liquid remaining in the pipe of the liquid transfer line device when the liquid transfer line device stops supplying the process liquid. Variation problem.
為解決上述習知技術之問題，本發明之目的在於提供一種液體傳輸管路裝置及運用該液體傳輸管路裝置之供液方法和停止供液方法。藉由該液體傳輸管路裝置可將殘留在該液體傳輸管路裝置之管路中的製程液體排除，因而避免該製程液體殘留的問題。 In order to solve the above problems of the prior art, it is an object of the present invention to provide a liquid transfer line device, a liquid supply method and a liquid supply stop method using the liquid transfer line device. The liquid transfer line device can remove the process liquid remaining in the pipeline of the liquid transfer line device, thereby avoiding the problem of residual liquid in the process.
為達成上述目的，本發明提供一種液體傳輸管路裝置，適用 於一製程反應槽，包含：一液體供應單元，用於提供一製程液體；一進液管路，連通於該液體供應單元和該製程反應槽之間，用於將該製程液體輸送至該製程反應槽，其中該進液管路包含一第一閥門和一第二閥門；以及一排液管路，與該進液管路相互連通，包含一第三閥門，其中該排液管路和該進液管路之連接點位於該第一閥門和該第二閥門之間。 In order to achieve the above object, the present invention provides a liquid transfer line device suitable for use. The process tank includes: a liquid supply unit for providing a process liquid; and an inlet line connected between the liquid supply unit and the process reaction tank for conveying the process liquid to the process a reaction tank, wherein the liquid inlet line comprises a first valve and a second valve; and a drain line communicating with the liquid inlet line, comprising a third valve, wherein the liquid discharge line and the liquid A connection point of the inlet line is between the first valve and the second valve.
於本發明其中之一較佳實施例當中，當該液體供應單元供應該製程液體至該製程反應槽時，該進液管路之該第一閥門和該第二閥門開啟，並且該排液管路之該第三閥門關閉。 In a preferred embodiment of the present invention, when the liquid supply unit supplies the process liquid to the process reaction tank, the first valve and the second valve of the liquid inlet line are opened, and the liquid discharge tube The third valve of the road is closed.
於本發明其中之一較佳實施例當中，當該液體供應單元停止供應該製程液體至該製程反應槽時，該進液管路之該第一閥門和該第二閥門關閉，並且該排液管路之該第三閥門開啟。 In a preferred embodiment of the present invention, when the liquid supply unit stops supplying the process liquid to the process reaction tank, the first valve and the second valve of the liquid inlet line are closed, and the liquid discharge The third valve of the pipeline is opened.
於本發明其中之一較佳實施例當中，該進液管路之該第二閥門接近該液體供應單元，且該第一閥門接近該製程反應槽，當該液體供應單元停止供應該製程液體至該製程反應槽時，該第二閥門最先關閉，接著開啟該排液管路之該第三閥門，並且經過一延遲時間之後關閉該第二閥門。 In a preferred embodiment of the present invention, the second valve of the liquid inlet line is adjacent to the liquid supply unit, and the first valve is close to the process reaction tank, and when the liquid supply unit stops supplying the process liquid to In the process reaction tank, the second valve is first closed, then the third valve of the drain line is opened, and the second valve is closed after a delay time.
本發明還提供一種液體傳輸管路裝置之供液方法，包含：關閉該排液管路之該第三閥門；以及開啟該進液管路之該第一閥門和該第二閥門。 The invention also provides a liquid supply method for a liquid transfer line device, comprising: closing the third valve of the drain line; and opening the first valve and the second valve of the liquid inlet line.
本發明還提供一種液體傳輸管路裝置之停止供液方法，包含：關閉該進液管路之該第二閥門，該第二閥門為接近該液體供應單元者；開啟該排液管路之該第三閥門；以及關閉該進液管路之該第一閥門。 The invention also provides a method for stopping liquid supply of a liquid transfer pipeline device, comprising: closing the second valve of the liquid inlet pipeline, the second valve being close to the liquid supply unit; and opening the drain conduit a third valve; and the first valve closing the intake line.
於本發明其中之一較佳實施例當中，當開啟該排液管路之該 第三閥門後，經過一延遲時間才關閉該進液管路之該第一閥門。 In one of the preferred embodiments of the present invention, when the drain line is opened After the third valve, the first valve of the liquid inlet line is closed after a delay time.
10、100‧‧‧液體傳輸管路裝置 10,100‧‧‧Liquid transfer line device
11、110‧‧‧液體供應單元 11, 110‧‧‧ liquid supply unit
20、200‧‧‧製程反應槽 20,200‧‧‧Processing reaction tank
S‧‧‧進液管路 S‧‧‧Inlet line
P1‧‧‧第一段 P1‧‧‧ first paragraph
P2‧‧‧第二段 P2‧‧‧ second paragraph
D‧‧‧排液管路 D‧‧‧Draining line
V‧‧‧閥門 V‧‧‧ valve
V1‧‧‧第一閥門 V1‧‧‧ first valve
V2‧‧‧第二閥門 V2‧‧‧Second valve
V3‧‧‧第三閥門 V3‧‧‧ third valve
第1圖顯示一種傳統液體傳輸管路裝置之管路示意圖。 Figure 1 shows a schematic view of a pipeline of a conventional liquid transfer line device.
第2圖顯示一種根據本發明之較佳實施例之液體傳輸管路裝置於供液時之管路示意圖。 Fig. 2 is a schematic view showing a piping of a liquid transfer line device according to a preferred embodiment of the present invention at the time of liquid supply.
第3圖顯示一種根據本發明之較佳實施例之液體傳輸管路裝置於停止供液時之管路示意圖。 Fig. 3 is a view showing a piping of a liquid transfer line device according to a preferred embodiment of the present invention when the liquid supply is stopped.
為了讓本發明之上述及其他目的、特徵、優點能更明顯易懂，下文將特舉本發明較佳實施例，並配合所附圖式，作詳細說明如下。 The above and other objects, features and advantages of the present invention will become more <RTIgt;
請參照第2圖所示，其顯示一種根據本發明之較佳實施例之液體傳輸管路裝置100於供液時之管路示意圖。該液體傳輸管路裝置100與一製程反應槽200相互連通，用於供應一製程液體至該製程反應槽200內。該液體傳輸管路裝置100包含：一液體供應單元110、一進液管路S、和一排液管路D。該液體供應單元110用於提供該製程液體。該進液管路S連通於該液體供應單元110和該製程反應槽200之間用於將該製程液體輸送至該製程反應槽200。該進液管路包含一第一閥門V1和一第二閥門V2用於控制該製程液體的流通，其中該第一閥門V1位於靠近該製程反應槽200端，以及該第二閥門V2位於靠近該液體供應單元110端。該排液管路D之一端與該進液管路S相互連通，另一端則連通至一排液端，其中該排液管路D和該進液管路S之連接點位於該第一閥門V1和該第二閥門V2之間。再者，該排液管路D包 含一第三閥門V3，當該第三閥門V3開啟時，管路S內殘留的該製程液體可經由該排液管路D流向該排液端。 Referring to Figure 2, there is shown a schematic view of a conduit for a liquid transfer line assembly 100 in accordance with a preferred embodiment of the present invention. The liquid transfer line device 100 is in communication with a process reaction tank 200 for supplying a process liquid to the process reaction tank 200. The liquid transfer line device 100 includes a liquid supply unit 110, an inlet line S, and a drain line D. The liquid supply unit 110 is for providing the process liquid. The liquid inlet line S is in communication with the liquid supply unit 110 and the process reaction tank 200 for conveying the process liquid to the process reaction tank 200. The liquid inlet line includes a first valve V1 and a second valve V2 for controlling the circulation of the process liquid, wherein the first valve V1 is located near the end of the process reaction tank 200, and the second valve V2 is located adjacent to the Liquid supply unit 110 end. One end of the drain line D communicates with the liquid inlet line S, and the other end is connected to a drain end, wherein the connection point of the drain line D and the inlet line S is located at the first valve Between V1 and the second valve V2. Furthermore, the drain line D package The third valve V3 is included, and when the third valve V3 is opened, the process liquid remaining in the pipeline S can flow to the liquid discharge end through the drain line D.
如第2圖所示，當藉由該液體傳輸管路裝置100將該製程液體供應至該製程反應槽200內時，首先需將該排液管路D之該第三閥門V3關閉以避免該製程液體經由該排液管路D流向該排液端。接著，開啟該進液管路S之該第一閥門V1和該第二閥門V2，使得該製程液體流入該製程反應槽200內。 As shown in FIG. 2, when the process liquid is supplied into the process reaction tank 200 by the liquid transfer line device 100, the third valve V3 of the drain line D is first closed to avoid the Process liquid flows through the drain line D to the drain end. Then, the first valve V1 and the second valve V2 of the liquid inlet pipe S are opened, so that the process liquid flows into the process reaction tank 200.
請參照第3圖所示，其顯示一種根據本發明之較佳實施例之該液體傳輸管路裝置100於停止供液時之示意圖。當停止將該製程液體供應至該製程反應槽200內時，首先需將靠近該液體供應單元110之該第二閥門V2關閉以停止供應該製程液體。接著，開啟該排液管路D之該第三閥門V3以將殘留在該進液管路S中的該製程液體排除。最後，經過一段延遲時間以確保該液體傳輸管路裝置100之管路S中已無殘留該製程液體後再將該進液管路S之靠近該製程反應槽200的該第一閥門V1關閉。 Referring to Figure 3, there is shown a schematic view of the liquid transfer line apparatus 100 in accordance with a preferred embodiment of the present invention when liquid supply is stopped. When the supply of the process liquid to the process reaction tank 200 is stopped, the second valve V2 close to the liquid supply unit 110 is first closed to stop supplying the process liquid. Next, the third valve V3 of the drain line D is opened to exclude the process liquid remaining in the inlet line S. Finally, a delay time is passed to ensure that the process liquid is not left in the line S of the liquid transfer line device 100, and then the first valve V1 of the feed line S close to the process reaction tank 200 is closed.
綜上所述，藉由本發明之該液體傳輸管路裝置100可將殘留在該液體傳輸管路裝置100之管路中的該製程液體排除，因而避免該製程液體殘留的問題。應當注意的是，在本發明中所指的製程液體並非限定在實質上參與製程反應的液體，而是指任何一種需要被注入該製程反應槽200的液體，例如用於清洗該製程反應槽200的液體。另一方面，在本發明的第2圖和第3圖中僅出示一個液體傳輸管路裝置100，但本發明之該液體傳輸管路裝置100的數量不侷限於此，可根據實際需求將單一個該製程反應槽200配置一個以上的該液體傳輸管路裝置100。 In summary, the liquid transfer line device 100 of the present invention can remove the process liquid remaining in the pipeline of the liquid transfer line device 100, thereby avoiding the problem of residual liquid in the process. It should be noted that the process liquid referred to in the present invention is not limited to a liquid that substantially participates in the process reaction, but refers to any liquid that needs to be injected into the process reaction tank 200, for example, for cleaning the process reaction tank 200. Liquid. On the other hand, only one liquid transfer line device 100 is shown in the second and third embodiments of the present invention, but the number of the liquid transfer line device 100 of the present invention is not limited thereto, and may be single according to actual needs. One of the process reaction tanks 200 is provided with more than one of the liquid transfer line devices 100.
雖然本發明已用較佳實施例揭露如上，然其並非用以限定本發明，本發明所屬技術領域中具有通常知識者，在不脫離本發明之精神和範圍內，當可作各種之更動與潤飾，因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 While the invention has been described above in terms of the preferred embodiments, the invention is not intended to limit the invention, and the invention may be practiced without departing from the spirit and scope of the invention. The scope of protection of the present invention is therefore defined by the scope of the appended claims.
100‧‧‧液體傳輸管路裝置 100‧‧‧Liquid transfer line device
110‧‧‧液體供應單元 110‧‧‧Liquid supply unit
200‧‧‧製程反應槽 200‧‧‧Processing reaction tank
S‧‧‧進液管路 S‧‧‧Inlet line
D‧‧‧排液管路 D‧‧‧Draining line
V1‧‧‧第一閥門 V1‧‧‧ first valve
V2‧‧‧第二閥門 V2‧‧‧Second valve
V3‧‧‧第三閥門 V3‧‧‧ third valve
Claims (7)
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| TW104114295A TWI552214B (en) | 2015-05-05 | 2015-05-05 | Liquid-transporting pipe device and methods for supplying liquid and stopping liquid supply using the same |
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| TW104114295A TWI552214B (en) | 2015-05-05 | 2015-05-05 | Liquid-transporting pipe device and methods for supplying liquid and stopping liquid supply using the same |
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| TWI552214B true TWI552214B (en) | 2016-10-01 |
| TW201640574A TW201640574A (en) | 2016-11-16 |
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Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWM443708U (en) * | 2012-07-10 | 2012-12-21 | Haung Chyi Ind Co Ltd | Sludge processing equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWM443708U (en) * | 2012-07-10 | 2012-12-21 | Haung Chyi Ind Co Ltd | Sludge processing equipment |
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