TWI407246B - 光罩及使用該光罩之曝光方法 - Google Patents
光罩及使用該光罩之曝光方法 Download PDFInfo
- Publication number
- TWI407246B TWI407246B TW095136984A TW95136984A TWI407246B TW I407246 B TWI407246 B TW I407246B TW 095136984 A TW095136984 A TW 095136984A TW 95136984 A TW95136984 A TW 95136984A TW I407246 B TWI407246 B TW I407246B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- mask
- alignment mark
- observation window
- photomask
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005295055A JP5145530B2 (ja) | 2005-10-07 | 2005-10-07 | フォトマスク及びそれを用いた露光方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200728905A TW200728905A (en) | 2007-08-01 |
TWI407246B true TWI407246B (zh) | 2013-09-01 |
Family
ID=37942574
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095136984A TWI407246B (zh) | 2005-10-07 | 2006-10-05 | 光罩及使用該光罩之曝光方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5145530B2 (ja) |
KR (1) | KR101205521B1 (ja) |
CN (1) | CN101273302B (ja) |
TW (1) | TWI407246B (ja) |
WO (1) | WO2007043323A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101661218B (zh) * | 2008-08-28 | 2012-06-13 | 富葵精密组件(深圳)有限公司 | 透明光掩模的制备方法 |
JP5633021B2 (ja) * | 2009-06-29 | 2014-12-03 | 株式会社ブイ・テクノロジー | アライメント方法、アライメント装置及び露光装置 |
JP5843191B2 (ja) * | 2011-08-03 | 2016-01-13 | 株式会社ブイ・テクノロジー | フォトマスク |
KR20140017767A (ko) | 2012-07-31 | 2014-02-12 | 삼성디스플레이 주식회사 | 증착용 마스크 및 이의 정렬 방법 |
CN104503203A (zh) * | 2015-01-15 | 2015-04-08 | 京东方科技集团股份有限公司 | 掩膜板及其制备方法和显示面板中封框胶的固化方法 |
CN107300836B (zh) * | 2017-08-16 | 2020-03-10 | 深圳市华星光电技术有限公司 | 曝光方法和曝光装置 |
JP6940873B2 (ja) * | 2017-12-08 | 2021-09-29 | 株式会社ブイ・テクノロジー | 露光装置および露光方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5568257A (en) * | 1991-07-09 | 1996-10-22 | Nikon Corporation | Adjusting device for an alignment apparatus |
JP2001057337A (ja) * | 1999-06-25 | 2001-02-27 | Svg Lithography Syst Inc | 波面情報検出装置および検出方法 |
TW200405426A (en) * | 2002-07-26 | 2004-04-01 | Nippon Kogaku Kk | Diffractive optical device, illuminating optical apparatus, exposure apparatus and exposure method |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61185929A (ja) * | 1985-02-13 | 1986-08-19 | Nec Corp | X線露光マスク |
JPH0196655A (ja) * | 1987-10-08 | 1989-04-14 | Toshiba Corp | ガラスマスク |
JP2668834B2 (ja) * | 1989-03-31 | 1997-10-27 | ウシオ電機株式会社 | 露光装置 |
JPH09274323A (ja) * | 1996-04-04 | 1997-10-21 | Toppan Printing Co Ltd | パターン露光方法 |
JP3740847B2 (ja) * | 1998-06-29 | 2006-02-01 | 株式会社村田製作所 | 半導体装置の製造方法およびフォトマスクの位置合わせ方法 |
JP2000031015A (ja) * | 1998-07-13 | 2000-01-28 | Nikon Corp | 位置検出方法、位置調整方法、走査露光方法及び走査型露光装置並びにデバイス製造方法 |
JP3085292B2 (ja) * | 1998-10-14 | 2000-09-04 | 株式会社ニコン | 走査露光装置 |
JP3884371B2 (ja) * | 2002-11-26 | 2007-02-21 | 株式会社東芝 | レチクル、露光モニタ方法、露光方法、及び半導体装置の製造方法 |
-
2005
- 2005-10-07 JP JP2005295055A patent/JP5145530B2/ja active Active
-
2006
- 2006-09-25 KR KR1020087007850A patent/KR101205521B1/ko active IP Right Grant
- 2006-09-25 WO PCT/JP2006/318952 patent/WO2007043323A1/ja active Application Filing
- 2006-09-25 CN CN200680035418XA patent/CN101273302B/zh active Active
- 2006-10-05 TW TW095136984A patent/TWI407246B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5568257A (en) * | 1991-07-09 | 1996-10-22 | Nikon Corporation | Adjusting device for an alignment apparatus |
JP2001057337A (ja) * | 1999-06-25 | 2001-02-27 | Svg Lithography Syst Inc | 波面情報検出装置および検出方法 |
TW200405426A (en) * | 2002-07-26 | 2004-04-01 | Nippon Kogaku Kk | Diffractive optical device, illuminating optical apparatus, exposure apparatus and exposure method |
Also Published As
Publication number | Publication date |
---|---|
WO2007043323A1 (ja) | 2007-04-19 |
KR101205521B1 (ko) | 2012-11-28 |
JP2007102093A (ja) | 2007-04-19 |
JP5145530B2 (ja) | 2013-02-20 |
CN101273302A (zh) | 2008-09-24 |
TW200728905A (en) | 2007-08-01 |
CN101273302B (zh) | 2012-02-01 |
KR20080053480A (ko) | 2008-06-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI446122B (zh) | 曝光裝置 | |
TWI446124B (zh) | 曝光裝置 | |
TWI407246B (zh) | 光罩及使用該光罩之曝光方法 | |
JP5133239B2 (ja) | 露光方法および露光装置 | |
KR101674131B1 (ko) | 얼라인먼트 방법, 얼라인먼트 장치 및 노광 장치 | |
JP5756813B2 (ja) | 基板露光方法 | |
TWI391796B (zh) | 曝光裝置及被曝光體 | |
JP5235061B2 (ja) | 露光装置 | |
JP4764237B2 (ja) | 露光装置 | |
JP4971835B2 (ja) | 露光方法及び露光装置 | |
TWI525372B (zh) | 配向處理裝置及配向處理方法 | |
TWI472885B (zh) | 校準方法、校準裝置及曝光裝置 | |
KR20120109481A (ko) | 포토마스크 | |
JP5804511B2 (ja) | 露光装置 | |
KR101016577B1 (ko) | 노광 장치 및 방법 | |
JP5499398B2 (ja) | 露光装置及び露光方法 | |
JP2013195468A (ja) | 基板 | |
WO2012073811A1 (ja) | 表示パネル用基板及び基板露光方法 |