TWI293480B - - Google Patents
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- Publication number
- TWI293480B TWI293480B TW092105357A TW92105357A TWI293480B TW I293480 B TWI293480 B TW I293480B TW 092105357 A TW092105357 A TW 092105357A TW 92105357 A TW92105357 A TW 92105357A TW I293480 B TWI293480 B TW I293480B
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- plasma
- etching method
- plasma etching
- gas
- Prior art date
Links
- 238000001020 plasma etching Methods 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 26
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 229910052770 Uranium Inorganic materials 0.000 claims description 16
- 150000004767 nitrides Chemical class 0.000 claims description 16
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 claims description 16
- 150000002736 metal compounds Chemical class 0.000 claims description 12
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 8
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 2
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 2
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 2
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 2
- 229910052684 Cerium Inorganic materials 0.000 claims 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 238000005530 etching Methods 0.000 description 37
- 239000007789 gas Substances 0.000 description 36
- 229910004298 SiO 2 Inorganic materials 0.000 description 14
- 239000012212 insulator Substances 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000010301 surface-oxidation reaction Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31144—Etching the insulating layers by chemical or physical means using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
- H01L21/31116—Etching inorganic layers by chemical means by dry-etching
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002082716A JP4176365B2 (ja) | 2002-03-25 | 2002-03-25 | プラズマエッチング方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200305944A TW200305944A (en) | 2003-11-01 |
TWI293480B true TWI293480B (ja) | 2008-02-11 |
Family
ID=28449155
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW092105357A TW200305944A (en) | 2002-03-25 | 2003-03-12 | Plasma etching method |
Country Status (5)
Country | Link |
---|---|
US (1) | US20050161435A1 (ja) |
JP (1) | JP4176365B2 (ja) |
CN (1) | CN100367469C (ja) |
TW (1) | TW200305944A (ja) |
WO (1) | WO2003081655A1 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8129282B2 (en) * | 2006-07-19 | 2012-03-06 | Tokyo Electron Limited | Plasma etching method and computer-readable storage medium |
JP4948278B2 (ja) * | 2006-08-30 | 2012-06-06 | ルネサスエレクトロニクス株式会社 | 半導体装置の製造方法 |
JP5982223B2 (ja) * | 2012-08-27 | 2016-08-31 | 東京エレクトロン株式会社 | プラズマ処理方法、及びプラズマ処理装置 |
JP2014220387A (ja) * | 2013-05-08 | 2014-11-20 | 東京エレクトロン株式会社 | プラズマエッチング方法 |
JP6284786B2 (ja) | 2014-02-27 | 2018-02-28 | 東京エレクトロン株式会社 | プラズマ処理装置のクリーニング方法 |
KR102224847B1 (ko) | 2014-10-10 | 2021-03-08 | 삼성전자주식회사 | 반도체 소자의 제조방법 |
JP6529357B2 (ja) * | 2015-06-23 | 2019-06-12 | 東京エレクトロン株式会社 | エッチング方法 |
CN106356297B (zh) * | 2015-07-16 | 2019-02-22 | 中微半导体设备(上海)有限公司 | 一种氮化钽TaN薄膜的刻蚀方法 |
JP7008474B2 (ja) * | 2016-11-30 | 2022-01-25 | 東京エレクトロン株式会社 | プラズマエッチング方法 |
US10854430B2 (en) | 2016-11-30 | 2020-12-01 | Tokyo Electron Limited | Plasma etching method |
JP6833657B2 (ja) | 2017-11-07 | 2021-02-24 | 東京エレクトロン株式会社 | 基板をプラズマエッチングする方法 |
JP7195113B2 (ja) * | 2018-11-07 | 2022-12-23 | 東京エレクトロン株式会社 | 処理方法及び基板処理装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5300460A (en) * | 1989-10-03 | 1994-04-05 | Applied Materials, Inc. | UHF/VHF plasma for use in forming integrated circuit structures on semiconductor wafers |
US5468339A (en) * | 1992-10-09 | 1995-11-21 | Advanced Micro Devices, Inc. | Plasma etch process |
US5700740A (en) * | 1996-03-25 | 1997-12-23 | Taiwan Semiconductor Manufacturing Company Ltd | Prevention of corrosion of aluminum interconnects by removing corrosion-inducing species |
US5942446A (en) * | 1997-09-12 | 1999-08-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Fluorocarbon polymer layer deposition predominant pre-etch plasma etch method for forming patterned silicon containing dielectric layer |
JPH11340321A (ja) * | 1998-05-27 | 1999-12-10 | Sony Corp | 半導体装置およびその製造方法 |
US6007733A (en) * | 1998-05-29 | 1999-12-28 | Taiwan Semiconductor Manufacturing Company | Hard masking method for forming oxygen containing plasma etchable layer |
US6319822B1 (en) * | 1998-10-01 | 2001-11-20 | Taiwan Semiconductor Manufacturing Company | Process for forming an integrated contact or via |
JP2000150463A (ja) * | 1998-11-16 | 2000-05-30 | Canon Inc | 有機層間絶縁膜のエッチング処理方法 |
JP2001007202A (ja) * | 1999-06-22 | 2001-01-12 | Sony Corp | 半導体装置の製造方法 |
JP4173307B2 (ja) * | 1999-06-24 | 2008-10-29 | 株式会社ルネサステクノロジ | 半導体集積回路の製造方法 |
WO2001037314A1 (en) * | 1999-11-15 | 2001-05-25 | Lam Research Corporation | Materials and gas chemistries for processing systems |
JP3400770B2 (ja) * | 1999-11-16 | 2003-04-28 | 松下電器産業株式会社 | エッチング方法、半導体装置及びその製造方法 |
JP2001274264A (ja) * | 2000-03-24 | 2001-10-05 | Mitsubishi Electric Corp | 半導体装置及びその製造方法 |
US6410424B1 (en) * | 2001-04-19 | 2002-06-25 | Taiwan Semiconductor Manufacturing Company | Process flow to optimize profile of ultra small size photo resist free contact |
-
2002
- 2002-03-25 JP JP2002082716A patent/JP4176365B2/ja not_active Expired - Lifetime
-
2003
- 2003-03-07 US US10/508,006 patent/US20050161435A1/en not_active Abandoned
- 2003-03-07 CN CNB038068966A patent/CN100367469C/zh not_active Expired - Lifetime
- 2003-03-07 WO PCT/JP2003/002749 patent/WO2003081655A1/ja active Application Filing
- 2003-03-12 TW TW092105357A patent/TW200305944A/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW200305944A (en) | 2003-11-01 |
CN1643665A (zh) | 2005-07-20 |
US20050161435A1 (en) | 2005-07-28 |
JP2003282539A (ja) | 2003-10-03 |
JP4176365B2 (ja) | 2008-11-05 |
CN100367469C (zh) | 2008-02-06 |
WO2003081655A1 (fr) | 2003-10-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |