TWI258059B - Substrate processing method and substrate processing apparatus - Google Patents
Substrate processing method and substrate processing apparatus Download PDFInfo
- Publication number
- TWI258059B TWI258059B TW91137198A TW91137198A TWI258059B TW I258059 B TWI258059 B TW I258059B TW 91137198 A TW91137198 A TW 91137198A TW 91137198 A TW91137198 A TW 91137198A TW I258059 B TWI258059 B TW I258059B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- processing
- film
- resist
- substrate processing
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001391286 | 2001-12-25 | ||
JP2002001394 | 2002-01-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200301849A TW200301849A (en) | 2003-07-16 |
TWI258059B true TWI258059B (en) | 2006-07-11 |
Family
ID=26625241
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW91137198A TWI258059B (en) | 2001-12-25 | 2002-12-24 | Substrate processing method and substrate processing apparatus |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU2002357620A1 (fr) |
TW (1) | TWI258059B (fr) |
WO (1) | WO2003056610A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI448848B (zh) * | 2009-12-28 | 2014-08-11 | Hitachi Int Electric Inc | 基板處理裝置、基板處理裝置的異常顯示方法及搬運控制方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6611652B2 (ja) * | 2016-03-30 | 2019-11-27 | 東京エレクトロン株式会社 | 基板処理装置の管理方法、及び基板処理システム |
JP2021132183A (ja) * | 2020-02-21 | 2021-09-09 | 東京エレクトロン株式会社 | 情報処理装置、情報処理方法及びコンピュータ読み取り可能な記録媒体 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0315849A (ja) * | 1989-06-14 | 1991-01-24 | Hitachi Ltd | パターン形成方法 |
JPH08111370A (ja) * | 1994-10-12 | 1996-04-30 | Mitsubishi Electric Corp | 微細レジストパターンの形成方法およびポストエキスポージャーベーク装置 |
US6221787B1 (en) * | 1998-04-20 | 2001-04-24 | Tokyo Electron Limited | Apparatus and method of forming resist film |
JP2000252179A (ja) * | 1999-03-04 | 2000-09-14 | Hitachi Ltd | 半導体製造プロセス安定化支援システム |
US6368975B1 (en) * | 1999-07-07 | 2002-04-09 | Applied Materials, Inc. | Method and apparatus for monitoring a process by employing principal component analysis |
-
2002
- 2002-12-19 WO PCT/JP2002/013320 patent/WO2003056610A1/fr active Application Filing
- 2002-12-19 AU AU2002357620A patent/AU2002357620A1/en not_active Abandoned
- 2002-12-24 TW TW91137198A patent/TWI258059B/zh not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI448848B (zh) * | 2009-12-28 | 2014-08-11 | Hitachi Int Electric Inc | 基板處理裝置、基板處理裝置的異常顯示方法及搬運控制方法 |
Also Published As
Publication number | Publication date |
---|---|
AU2002357620A1 (en) | 2003-07-15 |
TW200301849A (en) | 2003-07-16 |
WO2003056610A1 (fr) | 2003-07-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |