TWI232923B

TWI232923B - Optical real-time measurement method and system with single-axis, 6 degrees of freedom

Info

Publication number: TWI232923B
Application number: TW92137842A
Authority: TW
Inventors: Wen-Yuh Jyme; Chien-Hung Liu; Cheng-Chun Hsu
Original assignee: Univ Nat Formosa
Priority date: 2003-12-31
Filing date: 2003-12-31
Publication date: 2005-05-21
Also published as: TW200521404A

Abstract

The invention is a kind of optical real-time measurement method and system with single-axis, 6 degrees of freedom. The methodology is to emit three or more than three laser beams from the reference stage toward the moving stage, then the laser beams will interfere with each other due to the light beams reflected by the moving stage. Two symmetric beams are partially reflected vertically, then reflected vertically outward, deflected back and reflected vertically. A two-dimensional sensor is used to capture the voltage variations due to the position changes, and to further obtain the displacement, yaw, horizontal, vertical, roll and pitch errors by calculation. By this, the errors in 6-degrees of freedom can be measured at one time accurately, and the amount of measurement time for improving efficiency of mass production is reduced by dividing each device into 2 sections.

Description

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案號五、發明說明（1) 本與系統以上的的雷射稱的雷向反射化所產移、搖誤差、個自由率，及檢測設發明係，尤指雷射光光經該射光束與垂直生的電擺度誤俯仰角度誤差能將各備者。【發明有關於一種一種在基準 ’利用該基移動平台反部份垂直反反射後，以壓改變量，差、水平直度誤差，藉，大幅降低元件簡潔分之技術單軸六座上朝準座上射後的射，再二維位進而計度誤差以一次量測所製成兩領域】自由度移動平所發射干涉作經外向置感測算獲得、垂直精確地需時間個部份光學即台發射之三道用，及垂直反器擷取移動平直度誤量取平，有效而可為時量測方法三道或三道或三道以上其中二個對射、偏移回其因位置變台之移動位差、滾動度台運動之六提昇生產效有效量產的【先前技術】近年來隨工具機、各種產業機械、量測儀器的高精度化，加上超精密加工機、半導體製程裝置、電子資訊機器、原子力顯微鏡等的需要高精密定位技術儀器的發展，不論是在精密機械、半導體產業、微（奈）米科技皆朝微小化、精密化與奈米級的方向前進，因此在精密機械領域之量測設備、製造技術、整合技術的發展，微奈米定位平台與精密定位檢測技術的相關研究是刻不容緩。精密平台運動是多自由度方位變動且影響著各目標產生誤差，實際運動時，會產生六自由度誤差包括三個線性位移誤差△ X、 △ Υ、ΔΖ與三個角位移俯仰、搖擺、滚動誤差，由於運動平台是經由線性元件、旋轉平台及其他元件經設計組裝而Case No. 5. Description of the invention (1) The laser beam reflection and displacement produced by this and above systems are referred to as the displacement, shake error, freedom rate, and detection system, especially the laser light passing through the beam and The vertical tilt error of the electric pendulum can be used to prepare each person. [Invention relates to a technology that uses the base's mobile platform to reverse the vertical reflection of the base part, and then uses the pressure to change the amount, the difference, and the horizontal straightness error. After shooting from the base, the two-dimensional position is then measured and the error is measured by two measurements. The two fields are made by one measurement.] The interference emitted by the DOF is measured by outward sensing. The vertical and precise time is required. The three uses of the station launch, and the vertical inverter to capture the flatness of the mobile, and the error is flattened, which is effective and can be a time measurement method. Three or three or more of the two are shot and shifted back to their causes. Position shifting table ’s moving disparity, rolling table movement # 6 to improve production efficiency and effective mass production [Prior technology] In recent years, with the high precision of machine tools, various industrial machinery, measuring instruments, plus ultra-precision processing machines, The development of semiconductor process equipment, electronic information equipment, atomic force microscopes and other instruments that require high-precision positioning technology, whether in the precision machinery, semiconductor industry, micro- Nanometer technology is progressing towards miniaturization, precision and nanometer level. Therefore, the development of measurement equipment, manufacturing technology and integration technology in the field of precision machinery, micronano positioning platform and precision positioning detection technology related research It is urgent. The precision platform movement is a multi-degree-of-freedom azimuth change and affects each target to produce errors. In actual movement, a six-degree-of-freedom error is generated, including three linear displacement errors △ X, △ Υ, ΔZ and three angular displacements. Dynamic error, because the motion platform is designed and assembled through linear components, rotating platforms and other components

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具有多自由度運動，機器中之各種運動整台機器的精度與加工產品的品f，被加工』;二：影響精密零件的安裝及目標物體在空間的運動位置和# = H 要多至六個自由度的量測與調整或控㈣。因此對；自乂？的檢測需提出更高要求，都希望能同時量測元件 = 或目標物體在空間的多自由度。而在檢測線性平台與χ°、γ 運動平台的量測儀器上，大部分的量測儀器如雷射干涉儀、光學尺、自動視準儀或電子水平儀等，其一次量取只能量取一個或兩個自由度誤差，無法同時一次量測六自由度誤差’以HP干涉儀而言’其一次只能量取一項幾何誤差’因此在量測所有誤差時需安裝和參考軸的對準亦須個別的實際量測路徑並無法與前次誤差，量測耗時而且增加量測需要許多校正儀器，使用這些架設，更重要地，實際作校正工作天，而一般操作人員要熟作是件困難之事，而自動視準度，但整體太重不適宜安裝在的發展上近年來結合光柵繞射與二維光柵製造的技術發展，位且精度可達奈米級，雖然二但只能提供二維訊號’對於精同時提供，若每次僅能檢測一差量測完畢，需花的時間越長With multi-degree-of-freedom movement, the accuracy of the whole machine in various movements of the machine and the quality of the processed product are processed "; two: affect the installation of precision parts and the position of the target object in space, and # = H should be as many as six Measurement and adjustment or control of each degree of freedom. So right; arrogant? The detection needs to put forward higher requirements, and it is desirable to be able to measure the element = or the multiple degrees of freedom of the target object in space at the same time. For measuring instruments that detect linear platforms and χ ° and γ motion platforms, most of the measuring instruments such as laser interferometers, optical rulers, automatic collimators, or electronic levels can only measure one at a time. Or two degrees of freedom error, it is not possible to measure six degrees of freedom error at the same time. In the case of HP interferometers, it can only measure one geometric error at a time. The individual actual measurement path cannot be inaccurate from the previous one. The measurement is time-consuming and the measurement requires many calibration instruments. Using these setups, more importantly, the actual calibration work day, and the general operator should be familiar with it. Difficult things, and automatic collimation, but the overall is too heavy to be installed. In recent years, the technology development of grating diffraction and two-dimensional grating manufacturing has been combined, and the accuracy can reach nanometer level. Provide two-dimensional signal 'For precise simultaneous supply, if only one differential measurement can be completed each time, the longer it takes

更換不同量測架構，儀器的校正，每次重新校正所量取路徑相同，多次校正亦產生不確定度，因此完整之校正不同之儀器不僅耗時又不易時所需的時間更長達一、二悉相當多不同儀器架設及操儀對轉動角度雖具有高解析機器上作線上量測，光學尺與干涉原理及電子分割技術目前已有光學尺提供二維定維光學尺架設容易精度高’ 密平台之多自由度誤差無法或兩項誤差，則要將全部誤環境變化愈來難測，量測Replacement of different measurement architectures, instrument calibration, the same measurement path for each recalibration, and multiple calibrations also produce uncertainty, so complete calibration of different instruments is not only time consuming but also difficult. There are quite a few different instruments to set up and manipulators. Although the rotation angle has high-resolution machines for online measurement, the optical ruler and interference principle and electronic segmentation technology already exist. Optical rulers provide two-dimensional fixed-dimensional optical rulers for easy installation and high accuracy. '' As many degrees of freedom error of the dense platform cannot have two errors, it is necessary to make all the changes in the false environment more difficult to measure.

1232923 ___麵92137842__年月 π 倏正五、發明說明（3) " 不確定度隨時間增加，因此若能發展離線或線上量測系統可同時量取六自由度誤差，則對於精密運動平台的精度校正將提供莫大助益，此外近一步整合於平台内將可作為線上定位置測，提供及時定位誤差補償訊號，以達到精確控制的目標。目别¥知誤差篁測的技術很多，如S 〇 m m a r g r e η於1 9 8 g 提出使用一雙雷射干涉儀，美國公告第4,859,〇66號發明專利前案，用於量測晶圓平台（Wa f e r s tage)的二個定位誤差及一個偏搖度，Nakamura於1993提出一採用四個干涉儀與一個角偶反射鏡（Corner Cube)的新方法，如美國公告第5,258,8 22號與第5,260,770號等發明專利案，用於量測顯微掃描平台（Microscopic Scanning Stage)的三維座標位置’但限制小行程量測，台灣大學范光照教授發展一雙轴線上六自由度量測系統如台灣公告第3 7 6 4 4 6號專利案’其係可同時獲得運動平台任一方向六自由度誤差，惟其設計會使元件擴大或是部份元件需要過於分離，以致無法供有效製成篁化與精質的商品。精密平台的校正與定位技術不管在於離線誤差檢測與線上定位量測，目前工業界尚未具有可同時里測六個自由度之商品化量測設備，因此發展多自由度誤差Ϊ測糸統’將可提供精密定位平/Λ再· 造與定位控制莫大助益。疋/十。再製【發明内容】本發明之主要目的，在於提供一種可一次精確量取平台運動之六個自由度誤差，大幅降低量測所需時間，及有效提昇生產效率之方法與系統；本發明技術特徵係在基準1232923 ___ 面 92137842__ 年月 π 倏 5. Explanation of the invention (3) " Uncertainty increases with time, so if you can develop offline or online measurement system can measure six degrees of freedom error at the same time, for precision motion The accuracy correction of the platform will provide great help. In addition, the integration in the platform will be used as an on-line position measurement to provide timely positioning error compensation signals to achieve the goal of accurate control. There are many techniques for predicting errors. For example, Sommargre η proposed to use a double laser interferometer at 198 g. U.S. Gazette No. 4,859, 〇66 pre-patent for invention patent is used to measure wafer platforms. (Wa fers tage) two positioning errors and one deflection, Nakamura proposed in 1993 a new method using four interferometers and a Corner Cube, such as US Publication No. 5,258,8 22 and Invention patents such as No. 5,260,770 are used to measure the three-dimensional coordinate position of the Microscopic Scanning Stage. However, small-stroke measurement is limited. Professor Fan Guangguang of Taiwan University developed a six-axis free-form measurement system such as Taiwan Announcement Patent No. 3 7 6 4 4 6 'It can obtain six degrees of freedom error in either direction of the moving platform at the same time, but its design will enlarge the component or some components need to be separated too much, so that it cannot be made effectively. And refined goods. Regardless of the precision platform's calibration and positioning technology, whether it is offline error detection or online positioning measurement, the industry currently does not have commercial measurement equipment that can simultaneously measure six degrees of freedom, so the development of a multi-degree-of-freedom error measurement system will Can provide precise positioning level / Λ reconstruction and positioning control.疋 / ten. [Summary of the Invention] The main purpose of the present invention is to provide a method and system that can accurately measure the six degrees of freedom errors of the platform movement at one time, greatly reduce the time required for measurement, and effectively improve production efficiency; the technical features of the present invention Tied to the benchmark

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:士朝移動平台發射三道或三道以上的雷射光，利用該基準座上所㈣之三道或三道以± #冑射光經該移動平台反射後的干涉作肖，及其中二個對稱的雷射光束部份垂直反射’再經外向垂直反射、偏移回向反射與垂直反射後，以一維位置感測為擷取其因位置變化所產生的電壓改變量，進而計算獲得移動平台之移動位#、搖擺度誤差、水平直度誤差、垂直直度誤差、滾動度誤差、俯仰角度誤差。【實施方式】，請配合參看第一至四圖所示，本發明之單軸六自由度光子即時里測方法，主要係在基準座上朝移動平台發射三道或三道以上的雷射光，利用該基準座上所發射之三道或三道以上的雷射光經該移動平台反射後的干涉作用，及其中一個對稱的雷射光束部份垂直反射，再經外向垂直反射、偏移回向反射與垂直反射後，以二維位置感測器擷取其因位置變化所產生的電壓改變量，進而計算獲得移動平台之移動位移、搖擺度誤差、水平直度誤差、垂直直度誤差、滚動度誤差、俯仰角度誤差。请參看第一圖所示，本發明之系統，主要包含有：一個雙雷射光束之雷射干涉儀（丨0 ); 一個單雷射光束之雷射干涉儀（丨i; 兩個分光鏡（12)(120)，每一分光鏡（12)(120)供雙雷射光束之雷射干涉儀（10)所發射的一雷射光（B10)(B20) — 部份形成穿透雷射光（B11)(B21)，另一部份垂直反射形成反射雷射光（B12)(B22); 二個第一反射鏡（13 )(130)，每一個第一反射鏡用: Shi fires three or more laser beams towards the mobile platform, and uses three or three laser beams on the reference base to reflect the interference of the reflected light from the mobile platform with ± # 胄 as a shaw, and two of them are symmetrical. Part of the laser beam ’s vertical reflection, and then after the outward vertical reflection, offset retroreflection and vertical reflection, one-dimensional position sensing is used to capture the voltage change caused by the position change, and then calculate and obtain the mobile platform The moving position #, the roll error, the horizontal straightness error, the vertical straightness error, the roll error, and the pitch angle error. [Embodiment] Please refer to the first to the fourth figures. The method of instant single-axis six-degree-of-freedom photon in-situ measurement of the present invention mainly emits three or more laser beams on a reference base toward a mobile platform. The interference effect of three or more laser beams emitted from the reference base after being reflected by the mobile platform and a symmetrical laser beam partially vertically reflected, and then outwardly reflected vertically and offset back. After reflection and vertical reflection, the two-dimensional position sensor is used to capture the voltage change amount caused by the position change, and then calculate the movement displacement, sway error, horizontal straightness error, vertical straightness error, roll of the mobile platform. Motion error, pitch angle error. As shown in the first figure, the system of the present invention mainly includes: a laser interferometer with dual laser beams (丨 0); a laser interferometer with single laser beams (丨 i; two beamsplitters) (12) (120), each beam splitter (12) (120) is a laser light (B10) (B20) emitted by the laser interferometer (10) of the double laser beam-partly forms a penetrating laser light (B11) (B21), the other part is vertically reflected to form reflected laser light (B12) (B22); two first mirrors (13) (130), each of which is used for the first mirror

1232923 _案號92137842_年月日__修正 _ 五、發明說明（5) ' (13) (130)以對來自相對應之一個分光鏡（12) (120)之反射 ' 雷射光做垂直反射；一平面鏡（20)，用以反射來自該雙雷射光束之雷射干涉儀（10)之穿透雷射光（B11)(B21)與來自該單雷射光束之雷射干涉儀（11 )的雷射光（B 3 0 ); 兩個角偶反射鏡（21)(210)，每一角偶反射鏡（21) (2 1 0 )用以偏移並反射來自相對應之一個第一反射鏡（丨3 ) (130)之反射雷射光（B13)(B23); 二個第二反射鏡（14)(1 40)，每一個第二反射鏡用 (14) (140)以對來自相對應之一個角偶反射鏡（2 1)(210)之鲁反射雷射光（B14)(B24)做垂直反射；兩個二維位置感測器（1 5 )，每一個位置感測器（1 5 ) (150)用以接收來自相對應之一個第二反射鏡（14) (140)之反射雷射光（B15)(B25); 基準座（16)，供該雙雷射光束之雷射干涉儀（1〇)、該單雷射光束之雷射干涉儀（11)、該第一反射鏡（13) (130)、該第二反射鏡（1 4) ( 140)及該二維位置感測器（1 5) (150)固定；移動平台（22)，供該平面鏡（20)與該角偶反射鏡（21) φ (210)固定；及訊號擷取裝置（圖中未示），用以擷取該雙雷射光束之雷射干涉儀（10)、該單雷射光束之雷射干涉儀（11)及該二維位置感測器（1 5 )( 1 5 0 )所測得之訊號。請參看第一、•二圖所示，本發明一種較佳實施例中，其中一個該第一直角反射鏡（13)(130)與其中一個第二直1232923 _Case No. 92137842_Year_Month__ Amendment__ 5. Description of the invention (5) '(13) (130) uses vertical reflection of laser light from the corresponding beam splitter (12) (120)' A plane mirror (20) for reflecting the penetrating laser light (B11) (B21) from the laser interferometer (10) of the double laser beam and the laser interferometer (11) from the single laser beam Laser light (B 3 0); two corner-coupled mirrors (21) (210), each corner-coupled mirror (21) (2 1 0) is used to shift and reflect from a corresponding first mirror (丨 3) (130) reflected laser light (B13) (B23); two second mirrors (14) (1 40), each second mirror uses (14) (140) to correspond to One corner-coupled mirror (2 1) (210) and Lu reflected laser light (B14) (B24) for vertical reflection; two two-dimensional position sensors (1 5), each position sensor (1 5 ) (150) is used to receive reflected laser light (B15) (B25) from a corresponding second mirror (14) (140); reference base (16) for the laser interferometer of the double laser beam (10) Laser interferometer for the single laser beam (11) The first reflecting mirror (13) (130), the second reflecting mirror (1 4) (140), and the two-dimensional position sensor (1 5) (150) are fixed; the mobile platform (22) For the plane mirror (20) and the angle-coupled mirror (21) φ (210) to be fixed; and a signal acquisition device (not shown) for capturing the laser interferometer (10) of the dual laser beam ), The signals measured by the laser interferometer (11) of the single laser beam and the two-dimensional position sensor (1 5) (150). Please refer to the first and second figures. In a preferred embodiment of the present invention, one of the first corner reflector (13) (130) and one of the second

第9頁 1232923 ___案號92137842 年月日修正五、發明說明（6) 角反射鏡（14)(140)可固定在一座體（131)(141)上而合為一单體’便於裝配。其中，本發明一種較佳實施例，該二維位置感測器 (15) (150)可為雷射四象限位置感測器（Qua(jrant Detector )，用以接收光的位置變化，而產生電壓改變量，並能藉訊號擷取裝置之類比訊號轉數位訊號（A/D)卡轉成數位訊號傳至電腦，藉此獲得位置變化。Page 9 1232923 ___ Case No. 92137842 Amended on May. 5, V. Description of the invention (6) The corner reflector (14) (140) can be fixed on a base (131) (141) and integrated into a single unit, which is easy to assemble . Among them, in a preferred embodiment of the present invention, the two-dimensional position sensor (15) (150) may be a laser four-quadrant position sensor (Qua (jrant Detector)) for receiving a change in the position of light, and The amount of voltage change can be converted to a digital signal (A / D) card by an analog signal from a signal capture device and transferred to a computer to obtain the position change.

請參看第一至四圖所示，本發明系統中所包含有上述元件，可分成為兩個部分，一部分係包含有一平面鏡（2〇 ) 與兩個對稱之角偶反射鏡（21)(21〇)，此部分架設在移動平台（22)上，而另一部分則包含有一雙雷射光束之雷射干 /V儀（10) 單雷射光束之雷射干涉儀（11)、兩個分光鏡 (12)(120)、四個直角反射鏡（13)(13〇)(14)(14〇)與兩個位置感測器（15) (1 50)，此部分係固定不動在一基準座 (16) 上:當移動平台（22)移動時，便可由雙雷射光束之雷射干V儀（1 0 )得到分別$測得兩個位移，因此可測得移動位移，搖擺度誤差；其誤差計算公式如下：移誤差量測方式係雙雷兩道光程差之和除以二Please refer to the first to fourth figures, the above-mentioned elements included in the system of the present invention can be divided into two parts, and one part includes a plane mirror (20) and two symmetrical angle-coupled mirrors (21) (21 〇), this part is erected on the mobile platform (22), and the other part contains a laser interferometer (10) with a double laser beam, a laser interferometer (11) with a single laser beam, two beam splitters (12) (120), four right-angle mirrors (13) (13〇) (14) (14〇) and two position sensors (15) (150), this part is fixed on a reference base (16) Top: When the mobile platform (22) moves, two displacements can be measured by the laser dry V instrument (1 0) of the double laser beam, so the displacement and swing error can be measured; The error calculation formula is as follows: The shift error measurement method is the sum of the two optical path differences of the double mine divided by two.

移動位移（L) = 一·(該移動位射光束之雷射干涉儀所量測得到的而計算得到誤差值）。 L1 程差。為雙雷射光束之雷射干涉儀-光束B10所量的光 L2 程差。為雙雷射光束之雷射干涉儀一光束B2〇所量的光Moving displacement (L) = 1 (the error value calculated by the laser interferometer measured by the moving beam). L1 range is poor. The L2 path difference measured by the laser interferometer-beam B10 of the double laser beam. Light measured by a laser beam B2 of a double laser beam interferometer

第10頁 1232923 ---案號 92137842------—年月 r_修正______ 五、發明說明（7) (A-A) 搖擺度誤差汍）=^ (該搖擺度誤差量測方式係雙雷射光束之雷射干涉儀所量測得到的兩道光程之和除以兩雷射光束之平行距離計算得到誤差值）。 d 1 :雙雷射光束之雷射干涉儀所發射之兩雷射光束 BIO、B20的平行距離。當移動平台（2 2 )移動時使得兩個角偶反射鏡（2 j) (210)移動，兩道雷射光經角偶反射鏡（21)(21〇)反射後，兩道雷射光經角偶反射鏡（2 1)(210)反射後入射至兩個二維位置感測裔（1 5 )(1 5 0 )，因為移動平台（2 2 )的水平與垂直誤差使得經由角偶反射鏡（21 )(210)的雷射光有位移的變化’可經由入射至二維位置感測器（丨5 )(丨5 〇 )上位移變化可得水平直度誤差# = (該水平直度誤差量測方式係兩個一維位置感測器輸（1 5 )( 1 5 0 )出X軸座標值之和除以四計算得到誤差值）。垂直直度誤差& 4 (該垂直直度誤差量測方式係兩個二維位置感測器（1 5 )(1 5 0)輸出y轴座標值之和除以四計算得到誤差值）。 (wJ和(w2) 分別為兩個位置感測器（15)(15〇)輸出座標值。滾動度誤差可經由兩個位置感測器（丨5)(丨5 〇 )所輸出y 方向座標值比較獲得。Page 10 1232923 --- Case No. 92137842 ------- year and month r_correction ______ V. Description of the invention (7) (AA) Sway error 汍) = ^ (The sway error measurement system is The error value is calculated by dividing the sum of the two optical paths measured by the laser interferometer of the double laser beam by the parallel distance of the two laser beams). d 1: the parallel distance between the two laser beams BIO and B20 emitted by the laser interferometer with double laser beams. When the mobile platform (2 2) is moved, the two angle-coupled mirrors (2 j) (210) are moved. After the two laser beams are reflected by the angle-coupled mirrors (21) (21〇), the two laser beams pass through the angle. The even mirror (2 1) (210) reflects and enters the two two-dimensional position sensing family (1 5) (1 50), because the horizontal and vertical errors of the mobile platform (2 2) cause the angle mirror to pass through (21) (210) The laser light has a change in displacement. 'The horizontal straightness error can be obtained by the change in the incident on the two-dimensional position sensor (丨 5) (丨 5 〇). # = (The horizontal straightness error The measurement method is calculated by dividing the sum of the X-axis coordinate values of two one-dimensional position sensor inputs (1 5) (1 50) by four to calculate the error value). Vertical straightness error & 4 (This vertical straightness error measurement method is the sum of the two y-axis coordinate values of two two-dimensional position sensors (1 5) (1 50)) divided by four to calculate the error value). (wJ and (w2) are the coordinate values output by the two position sensors (15) (15〇). The roll error can be measured by the y-direction coordinates output by the two position sensors (丨 5) (丨 5 〇). Value comparison obtained.

第11頁 1232923 __銮號92137842_年月日_修正五、發明說明（8) 2_ 2_ 火2 -少1 則滾動度誤差=名 =ld2 。（該滾動度誤差量測方式係兩個二維位置感測器（1 5 )(1 5 0 )輸出y軸座標值之差值除以二倍之兩組角偶反射鏡（2 1 ) (21 0 )中心軸Xi、X2的距離計算得到誤差值）。 d 2為兩組角偶反射鏡（2 1) ( 2 1 0 )之中心軸乂丨、X2的距離 (請配合參看第二圖所示）。而俯仰角度誤差可經由上下兩個反射鏡的位移差除以兩光束間距離獲得。即該俯仰角度誤差量測方式係單光束雷射干涉儀所量測光程差與雙光束雷射干涉儀兩道光束平均光程差之差值除以單雷射光束之雷射干涉儀與雙雷射光束之雷射干涉儀之兩雷射光所構成平面之距離而計算獲得誤差值。Page 11 1232923 __ 銮号 92137842_ year month day _ amendment V. Description of the invention (8) 2_ 2_ fire 2-less 1 then the roll error = name = ld2. (This rolling error measurement method is the difference between the two y-axis coordinate values of two two-dimensional position sensors (1 5) (1 50)) divided by two sets of two angle-coupled mirrors (2 1) ( 21 0) The error values are calculated from the distances between the central axes Xi and X2). d 2 is the distance between the central axes 乂丨 and X2 of the two sets of angle-coupled mirrors (2 1) (2 1 0) (please see Figure 2 for cooperation). The pitch angle error can be obtained by dividing the difference between the upper and lower mirrors by the distance between the two beams. That is, the pitch angle error measurement method is the difference between the optical path difference measured by the single-beam laser interferometer and the average optical path difference of the two beams of the dual-beam laser interferometer divided by the laser interferometer and The error value is obtained by calculating the distance between the planes formed by the two laser beams of the laser interferometer of the double laser beam.

- L 因而俯仰角度誤差=。 ·為早雷射光束之雷射干涉儀（11)所量得光程差。 L :為雙雷射光束之雷射干涉儀（丨〇 )所量得平均光程差。 4 :為單雷射光束之雷射干涉儀（1 1 )所發射之雷射光束與雙雷射光束之雷射干涉儀（10)所發射之兩雷射光束所構成的平面之距離（請配合參看第三圖所示）。如第二圖所示，雙雷射光束之雷射干涉儀（10)所產生兩道雷射光（B10)(B20)，入射至分光鏡（12)(12〇)產生穿透光（B11)垂直射至反射鏡（2〇)反射回去雙雷射光束之雷-L thus pitch angle error =. Optical path difference measured by laser interferometer (11) for early laser beam. L: average optical path difference measured by a laser interferometer (丨〇) of a double laser beam. 4: The distance of the plane formed by the laser beam emitted by the single laser beam interferometer (1 1) and the two laser beams emitted by the double laser beam interferometer (10) (please See Figure 3 for cooperation). As shown in the second figure, the two laser beams (B10) (B20) generated by the laser interferometer (10) of the double laser beam are incident on the beam splitter (12) (12) to generate transmitted light (B11). Light that strikes the mirror (20) perpendicularly and reflects back to the double laser beam

第12頁 1232923 _篆號92137842 年月日修正五、發明說明（9) 射干涉儀（1 0 )作干涉，藉以量測雙雷射光束之雷射干涉儀 (10) 之雷射光束的光程差，分光鏡（12)(12〇)的反射光 (812)(322)打至第一直角反射鏡（13)(13〇)產生反射雷射光（B1 3) (B23)打至角偶反射鏡（2 1)(210)產生反射雷射光 (B14)(B24)打至第二直角反射鏡（14)(14〇)產生反射雷射光（B15)(B25)打至二維位置感測器（15)(150)，而單雷射光束之雷射干涉儀（11)產生雷射光（B30)垂直打至反射鏡 (20 )反射回去作干涉，進求得單雷射光束之雷射干涉儀 (11) 之雷射光束的光程差。本發明所採元件的特點如下： 1·雙雷射光束之雷射干涉儀（Dual-beam Laser Interferometer)雙雷射光束之雷射干涉儀採用的光源是 H e - N e雷射’將分光後的兩道雷射光束作疊加干涉，利用兩道雷射光束的相位不同，可以精準計算出移動的距離以及偏轉角度。雷射干涉兩光束在空間疊力時，疊加區域内出現的穩定強度重新分佈現象。 2·平面反射鏡（Plane Mi rro r )使得入射光以兩倍入射角反射出反射光。 3·角偶反射鏡（Corner Cube)内部由三垂面反射鏡構成的反射鏡，光束照射在這樣的反光鏡上時，光線就會按原來的方向平行回射。 4·分光鏡（Beam Splitter)使入射光束產生兩道分光光束，分別為穿透光束與反射光束，其中兩道光強度總和為百分之一百。〜 5.二維位置感測器可為四象限位置感測器（QuadrantPage 12 1232923 _ 篆 No. 92137842 Rev. 5th, 5. Description of the invention (9) Interferometer (10) interfering to measure the light of laser beam of laser interferometer (10) of double laser beam Path difference, the reflected light (812) (322) of the beam splitter (12) (12) hits the first corner mirror (13) (13) to produce reflected laser light (B1 3) (B23) hits the corner pair Reflector (2 1) (210) generates reflected laser light (B14) (B24) to the second right-angle mirror (14) (14) to generate reflected laser light (B15) (B25) to two-dimensional position sensing (15) (150), and the single laser beam laser interferometer (11) generates laser light (B30) hits the reflector (20) and reflects back to interfere, and obtains the laser of single laser beam Optical path difference of the laser beam of the interferometer (11). The characteristics of the components adopted by the present invention are as follows: 1. Dual-beam Laser Interferometer (Dual-beam Laser Interferometer) The light source used by the dual-beam laser interferometer is He-Ne laser. The next two laser beams are used for superimposed interference. By using the different phases of the two laser beams, the moving distance and the deflection angle can be accurately calculated. When the two laser beams interfere with each other in space, the stable intensity redistribution occurs in the overlap area. 2. Plane mirror (Plane Mirr) makes the incident light reflect the reflected light at twice the incident angle. 3. Inside the corner cube (Corner Cube) is a mirror composed of three vertical mirrors. When the beam is irradiated on such a mirror, the light will be reflected in parallel in the original direction. 4. Beam Splitter generates two split beams of the incident beam, a penetrating beam and a reflected beam. The sum of the intensity of the two beams is 100%. ~ 5. The two-dimensional position sensor can be a four-quadrant position sensor (Quadrant

第13頁 1232923 __案號 92137842_年月日_^_____ 五、發明說明（10) D e t e c t 〇 r )，其四象限位置感測器會根據雷射光點在四個象限上的雷射光分佈比例輸出一失焦訊號，這個失焦訊號經過運算放大及補償處理可計算出兩維度的相對位移值。本發明所能量測的誤差（請配合參閱第四圖所示）如下： (1 ).線性誤差 a·線性定位誤差（Linear Positioning Error)。 b. 水平直度誤差（Side-to-side StraightnessPage 13 1232923 __Case No. 92137842_Year Month Day _ ^ _____ V. Description of the invention (10) Detect 〇r), its four-quadrant position sensor will be based on the laser light distribution in the four quadrants according to the laser point An out-of-focus signal is output proportionally, and the out-of-focus signal can be calculated in two dimensions to calculate the relative displacement value after operation amplification and compensation processing. The error measured by the present invention (please refer to Figure 4 for cooperation) is as follows: (1). Linear error a. Linear Positioning Error. b. Side-to-side Straightness

Error)。 c. 垂直直度誤差（Up-to-down Straightness Error )。 (2乂角度誤差 a·俯仰度誤差（Pitch Error)。 b·偏搖度誤差（Yaw Error)。 c·橫轉度誤差（Roll Error)。須陳明者，以上所述乃是本發明較佳具體的實施例，若依本發明之構想所作之改變，其產生之功能作用，仍未超出說明書與圖示所涵蓋之精神時，均應在本發明之範圍内，合予陳明。已符合發明專利要件’謹請釣局依法核予專利綜上所述，本發明具有一次精確地量取平台運動之六個自由度誤差，大幅降低量測所需時間，有效提昇生產效率及架構具體而可供確實且有效地商品化等功效，本發明 :具體界定於申請專利範圍之技術特徵，纟見於同心術 :具新難，且較習知技術具進步性’並能供產業充份利Error). c. Up-to-down Straightness Error. (2 乂 Angle error a · Pitch Error. B · Yaw Error. C · Roll Error. It should be noted that the above is a comparison of the present invention. In the case of a specific embodiment, if the changes made according to the concept of the present invention and the functional effects thereof do not exceed the spirit covered by the description and the drawings, they should all be brought together within the scope of the present invention. Comply with the requirements of the invention patent 'I would like to request the Fishing Bureau to verify the patent according to the law. As mentioned above, the invention has an accurate measurement of the six degrees of freedom error of the platform movement, which greatly reduces the time required for measurement, effectively improves production efficiency and the specific structure For the purpose of real and effective commercialization and other effects, the present invention: the technical features specifically defined in the scope of patent application, seen in Concentric Techniques: new and difficult, and more advanced than the conventional technology 'and can be fully profitable for the industry

第14頁 1232923 __案號 92137842 圖式簡單說明年月日_ (一）圖式部份：第一圖係本發明系統之立體簡示圖。苐一圖係本發明俯視簡示圖。第三圖係本發明側視簡示圖。第四圖係本發明所欲量测之各自由度誤差示意圖。 (二）圖號部份： (10) 雙雷射光束之雷射干涉儀 (11) 單雷射光束之雷射干涉儀 (12) (120)分光鏡（13)(130)第一反射鏡 (131)(141)座體（14)(140)第二反射鏡 (1 5 )(1 5 0 )二維位置感測器（1 6 )基準座 (20)平面鏡（21)(210)角偶反射鏡 (22)移動平台（B10)(B20)(B30)雷射光 (B11)(B21)穿透雷射光 (B12)(B22)(B13)(B23)(B14)(B2 4)(B15)(B25)反射雷射光Page 14 1232923 __Case No. 92137842 Schematic description of the date _ (1) Schematic part: The first diagram is a three-dimensional schematic diagram of the system of the present invention. The first figure is a schematic top view of the present invention. The third figure is a schematic side view of the present invention. The fourth figure is a schematic diagram of the respective degree of freedom errors to be measured by the present invention. (II) Part number: (10) Laser interferometer with double laser beam (11) Laser interferometer with single laser beam (12) (120) Beamsplitter (13) (130) First reflector (131) (141) Base (14) (140) Second reflector (1 5) (1 5 0) Two-dimensional position sensor (1 6) Reference base (20) Plane mirror (21) (210) Angle Even mirror (22) Mobile platform (B10) (B20) (B30) Laser light (B11) (B21) Penetrating laser light (B12) (B22) (B13) (B23) (B14) (B2 4) (B15 ) (B25) Reflected laser light

Claims

1232923 修正曰 ---- 案號敗六、申請專利範圍座上1如:Ϊ單轴六自由度光學即時量測方法，其係在基準朝移動平台發射三道或三道以上的雷射光，利用誃 =上所發射之二道或二道以上的雷射光經該移動平二；i 射後的干涉作用，及其中二個對稱的雷射光束部份垂；J 射，再經外向垂直反射、偏移回向反射與垂直反射後，二維位，感測器擷取其因位置變化所產生的電壓改變量，進2计异獲得移動平台之移動位移、搖擺度誤差、水平度誤差、垂直直度誤差、滾動度誤差、俯仰角度誤，其中，該移動位移誤差量測方式係雙雷射光束之雷射干涉所量測得到的兩道光程差之和除以二而計算得到誤差值；' 該搖擺度誤差量測方式係雙雷射光束之雷射干涉儀所量測得到的兩道光程之和除以兩雷射光束之平行距離計得到誤差值； σ 该水平直度誤差量測方式係兩個二維位置感測器輸出 X軸座標值之和除以四計算得到誤差值；該垂直直度誤差量測方式係兩個二維位置感測器輸出 y轴座標值之和除以四計算得到誤差值；1232923 Amendment ---- Case No. 6: Patent application scope seat 1 For example: ΪSingle-axis six-degree-of-freedom optical real-time measurement method, which emits three or more laser beams toward the mobile platform at the reference. Use two or more laser beams emitted from 誃 = to pass through the moving plane; the interference effect of i, and the two symmetrical laser beams in it are partially vertical; J beam, and then outwardly and vertically reflected After offset retroreflection and vertical reflection, the two-dimensional bit, the sensor captures the amount of voltage change caused by the position change, and calculates the movement displacement, swing error, level error, The vertical straightness error, the roll error, and the pitch angle error. The measurement method of the movement displacement error is an error value calculated by dividing the sum of two optical path length differences measured by laser interference of a double laser beam by two. ; 'The swing error measurement method is the sum of the two optical paths measured by the laser interferometer of the double laser beam divided by the parallel distance of the two laser beams to obtain the error value; σ The horizontal straightness error amount Test method The sum of the X-axis coordinate values of the two two-dimensional position sensors is divided by four to calculate the error value. The vertical straightness error measurement method is the sum of the y-axis coordinate values of the two two-dimensional position sensors and divided by four. Calculated error value;

該滚動度誤差量測方式係兩個二維位置感測器輸出y 轴座標值之差值除以二倍之兩組角偶反射鏡之中心軸的距離計算得到誤差值；該俯仰角度誤差量測方式係單雷射光束之雷射干涉儀所量測光程差與雙雷射光束之雷射干涉儀兩道雷射光束平均光程差之差值除以該單雷射光束之雷射干涉儀與該雙雷The rolling error measurement method is obtained by dividing the difference between the two y-axis coordinate values of two two-dimensional position sensors by the distance of the center axis of two sets of angle-coupled mirrors; the error of the pitch angle The measurement method is the difference between the optical path difference measured by the single laser beam interferometer and the average optical path difference of the two laser beams of the dual laser beam interferometer divided by the single laser beam. Interferometer and the double mine

第16頁 1232923 __t號92HL842__支月日啟$ _ 六、申請專利範圍射光束之雷射干涉儀之兩雷射光所構成平面之距離而計算獲得誤差值。 2 · —種單轴六自由度光學即時量測系統，其係包含有：一個雙雷射光束之雷射干涉儀；一個單雷射光束之雷射干涉儀；兩個分光鏡，每一分光鏡供該雙雷射光束之雷射干涉儀所發射的一雷射光一部份形成穿透雷射光，另一部份垂直反射形成反射雷射光；二個第一直角反射鏡，每一個第一直角反射鏡用以對來自相對應之一個該分光鏡之反射雷射光做垂直反射；一平面鏡，用以反射來自該雙雷射光束之雷射干涉儀之穿透雷射光與來自該單雷射光束之雷射干涉儀的雷射光；兩個角偶反射鏡’每一角偶反射鏡用以偏移並反射來自相對應之一個該第一反射鏡之反射雷射光；二個第二直角反射鏡，每一個第二直角反射鏡用以對來自相對應之一個該角偶反射鏡之反射雷射光做垂直反射；兩個二維位置感測器，每一個二維位置感測器用以接收來自相對應之一個該第^一直角反射鏡之反射Μ射光，基準座，供該雙雷射光束之電射干涉儀、該單光束雷射干涉儀、該第一直角反射鏡、該第直角一反射鏡及該一維位置感測器固定；Page 16 1232923 __t No. 92HL842__ branch month day start $ _ VI. Patent application scope The distance between the planes formed by the two laser beams of the laser interferometer of the light beam is calculated to obtain the error value. 2 · A single-axis six-degree-of-freedom optical instant measurement system, which includes: a laser interferometer with a double laser beam; a laser interferometer with a single laser beam; two beam splitters, each beam A part of the laser light emitted by the laser interferometer of the double laser beam forms a penetrating laser light, and the other part reflects vertically to form a reflected laser light; two first-angle mirrors, each first A right-angle mirror is used to vertically reflect the reflected laser light from a corresponding one of the beam splitters; a plane mirror is used to reflect the penetrating laser light from the laser interferometer from the double laser beam and from the single laser The laser light of the laser interferometer of the beam; two corner-coupled mirrors, each corner-coupled mirror is used to shift and reflect the reflected laser light from a corresponding one of the first mirrors; two second right-angle mirrors , Each second right-angle mirror is used to vertically reflect the reflected laser light from a corresponding one of the corner couplers; two two-dimensional position sensors, each two-dimensional position sensor is used for receiving The reflected M-ray light from the corresponding one of the first right-angle mirrors, the reference base, is the radio interference interferometer for the double laser beam, the single-beam laser interferometer, the first right-angle mirror, and the first right angle. A reflector and the one-dimensional position sensor are fixed;

第17頁銮號 92137842 年Page 17 銮 92137842

1232923 六、申請專利範圍移動平台供該平面鏡與該角偶反射鏡固定；及訊號擷取裝置，用以擷取該雙雷射光束之雷射干涉儀、該單雷射光束之雷射干涉儀及該二維位置^測器=測得之訊號。 3. 如申請專利範圍第2項所述之單軸六自由度光學即時量測系統，其中，該第一直角反射鏡與該第二直角反身鏡可固定在一座體上而合為一體。 4. 如申請專利範圍第2項所述之單輛六自由度光學即時量測系統，其中，該雷射干涉儀可為麥克森 (Michelson)雷射干涉儀。 5. 如申請專利範圍第2項所述之單輛六自由度光學即時量測系統，其中，該雷射干涉儀可為外差雷射干涉儀。 6. 如申請專利範圍第2項所述之單輛六自由度光學即時量測系統，其中，該雷射干涉儀可為都卜勒雷射位移計0 7·如申請專利範圍第2項所述之單袖六自由度光學即時量測系統，其中，該雷射干涉儀可為半導體雷射干涉儀。 8 ·如申请專利範圍第2項所述之單軸六自由度光學即時量測系統，其中，該平面反射鏡可採用能反射該雷射干涉儀產生的雷射光束且反射率達百分之五十以上的反射鏡。 9·如申請專利範圍第2項所述之單軸六自由度光學即時量測系統，其中，該角偶反射鏡可採用能反射該雷射干1232923 VI. Patent application mobile platform for fixing the plane mirror and the corner coupler mirror; and a signal acquisition device for capturing the laser interferometer for the double laser beam and the laser interferometer for the single laser beam And the two-dimensional position ^ tester = measured signal. 3. The single-axis six-degree-of-freedom optical instant measurement system according to item 2 of the scope of patent application, wherein the first right-angle reflector and the second right-angle reflector can be fixed on a single body and integrated. 4. The single-degree-of-freedom optical instant measurement system described in item 2 of the scope of the patent application, wherein the laser interferometer may be a Michelson laser interferometer. 5. The single 6-degree-of-freedom optical instant measurement system described in item 2 of the scope of patent application, wherein the laser interferometer may be a heterodyne laser interferometer. 6. The single six-degree-of-freedom optical instant measurement system described in item 2 of the scope of patent application, wherein the laser interferometer can be a Doppler laser displacement meter 0 7 The single-sleeve six-degree-of-freedom optical instant measurement system described above, wherein the laser interferometer can be a semiconductor laser interferometer. 8 · The single-axis six-degree-of-freedom optical real-time measurement system according to item 2 of the scope of the patent application, wherein the plane mirror can reflect the laser beam generated by the laser interferometer with a reflectance of up to 100% More than fifty mirrors. 9. The single-axis, six-degree-of-freedom optical instant measurement system as described in item 2 of the scope of the patent application, wherein the angle-coupled mirror can be configured to reflect the laser beam.

第18頁案號 9213784? 1232923Page 18 Case No. 9213784? 1232923

六、申請專利範圍涉儀產生的雷射光的角偶反射鏡。 1 0 ·如申請專利範圍第2項所述之單軸時量測系統，㊣中，該分光鏡可採用二自2先學即所產生的雷射光的兩道分光的分光鏡。產生❹射干涉儀時旦1二如统申請範圍第2項所述之單轴六自*度光學即 2 二維位置感測器可採用能接收該雷射干涉儀所產生的雷射光並轉換成相對應二四象限位置感測器。卞曰12、如申请專利範圍第2項所述之單軸六自由度光學即 f里’則系統’其中，訊號擷取裝置可為類比訊號轉數位訊號U/D)卡’用以將所擷取的成數位訊號並傳至電腦。6. Scope of patent application Angle-coupled mirror of laser light generated by the instrument. 1 0 · According to the single-axis time measurement system described in item 2 of the scope of patent application, in this case, the beam splitter can be a two-beam two-beam splitter that generates laser light. When generating a radon interferometer, the single-axis six-self-definition optics as described in item 2 of the unified application scope, namely, the two-dimensional position sensor can use the laser light generated by the laser interferometer and convert it. Corresponds to two-four quadrant position sensors.卞 12. The single-axis six-degree-of-freedom optics as described in item 2 of the scope of patent application, ie, the “system”, where the signal acquisition device can be an analog signal to digital signal U / D) card. The captured digital signal is transmitted to the computer.

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