TWI620917B - Measuring device for linear motion stage - Google Patents
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Abstract
一種線性運動平台之量測裝置,該線性運動平台包含一個可移動的第一乘載件,及一個可移動的第二乘載件。該量測裝置包含一個設置於該第一乘載件的二維光柵,及一個設置於該第二乘載件的量測單元。該量測單元包括一個光源、一個二維感測器及一個處理模組。該光源用以發射出一個入射光,當該入射光照射至該二維光柵時將轉變為一個反射光。該二維感測器用以接收該反射光,並轉換為一個反射訊號,該處理模組接收該反射訊號就可計算出該線性運動平台的多個動態資訊與誤差。A measuring device for a linear motion platform. The linear motion platform includes a movable first carrier member and a movable second carrier member. The measurement device includes a two-dimensional grating disposed on the first carrier, and a measurement unit disposed on the second carrier. The measurement unit includes a light source, a two-dimensional sensor and a processing module. The light source is used to emit an incident light, which will be converted into a reflected light when the incident light is irradiated to the two-dimensional grating. The two-dimensional sensor is used to receive the reflected light and convert it into a reflected signal. The processing module receives the reflected signal to calculate multiple dynamic information and errors of the linear motion platform.
Description
本發明是有關於一種量測裝置,特別是指一種線性運動平台之量測裝置。 The invention relates to a measuring device, in particular to a measuring device of a linear motion platform.
一個線性運動平台包含一個沿著一個第一路徑移動的第一乘載件,及一個沿著一個第二路徑移動的第二乘載件,於是將一個物品放置在該第一乘載件或該第二乘載件,就能精密地控制該物品移動,因此在現今的產業中,該線性運動平台已廣泛地應用在多種高精密的製程上,例如光電半導體製程、精密加工等。 A linear motion platform includes a first carrier member that moves along a first path, and a second carrier member that moves along a second path, so an article is placed on the first carrier member or the The second carrier can precisely control the movement of the article. Therefore, in today's industry, the linear motion platform has been widely used in a variety of high-precision processes, such as optoelectronic semiconductor processes, precision machining, etc.
一般來說,使用者是希望將該第一路徑是與該第二路徑設計成相互垂直的,例如該第一路徑是沿著直角坐標的x軸方向移動,而該第二路徑是沿著直角坐標的z軸方向移動,但實際上目前還沒有任何一種方式可以將設計至如此理想。舉個簡單的例子,假設該第一路徑不是完美地沿著x軸方向移動,而是與x軸夾了一個 極微小的角度的方向移動,如此一來,隨著該第一乘載件移動距離越遠,該第一乘載件也會越來越越偏離x軸,也就是誤差將越來越大。前述的例子只是多種誤差的其中之一,在真實情況中其實是存在著各種的微小誤差,這些誤差會讓使用者無法精確地控制該物品的移動,這也是目前產業中製程精度難以提高的主要原因之一。 Generally speaking, the user wants to design the first path and the second path to be perpendicular to each other, for example, the first path moves along the x-axis direction of the rectangular coordinate, and the second path is along the right angle The coordinates move in the z-axis direction, but in fact, there is no way to design so ideally. As a simple example, suppose that the first path does not move perfectly along the x-axis direction, but it is sandwiched with the x-axis It moves in the direction of a very small angle. As a result, the farther the first carrier moves, the more the first carrier deviates from the x axis, that is, the error will become larger. The aforementioned example is just one of many errors. In reality, there are various small errors. These errors will prevent users from accurately controlling the movement of the item. This is also the main reason why the process accuracy in the industry is difficult to improve. one of the reasons.
而為了使製程的精度更高,目前產業中的做法是利用一個設置在該線性運動平台的量測裝置。透過該量測裝置不僅能精確地量測出該線性運動平台的多種動態資訊,例如該第一乘載件與該第二乘載件的移動距離等等,還能得到多種誤差的數值。使用者只要參考量測到的誤差的數值,就能慢慢地校正該線性運動平台,使該等誤差的數值減小至可接受的公差內。 In order to make the process more accurate, the current industry practice is to use a measuring device installed on the linear motion platform. The measuring device can not only accurately measure various dynamic information of the linear motion platform, such as the moving distance of the first carrier and the second carrier, etc., but also obtain various error values. As long as the user refers to the measured error value, the linear motion platform can be slowly corrected to reduce the error value to an acceptable tolerance.
現有的量測的裝置如TW-I245878與TW-I220688所揭示的,主要是利用多組雷射光源照射該線性運動平台之量測裝置,再利用多組感測器接收反射回來的雷射光源,並轉換為多個訊號,最後將該等訊號進一步計算後,就能得知該線性運動平台之量測裝置的多種誤差的數值。然而,上述的方法皆須使用多組的雷射光源與感測器,因此有造價昂貴與架設麻煩的缺點,並不適合應用在量產中。 Existing measurement devices as disclosed in TW-I245878 and TW-I220688 mainly use multiple sets of laser light sources to illuminate the measurement device of the linear motion platform, and then use multiple sets of sensors to receive reflected laser light And converted into multiple signals, and finally after further calculation of these signals, you can know the various error values of the measurement device of the linear motion platform. However, the above methods all require the use of multiple sets of laser light sources and sensors, so they have the disadvantages of high cost and troublesome installation, and are not suitable for mass production.
因此,本發明之目的,即在提供一種只需使用一個光源以及一個感測器的線性運動平台之量測裝置。Therefore, the object of the present invention is to provide a measuring device for a linear motion platform using only one light source and one sensor.
於是,本發明線性運動平台之量測裝置,首先定義一個x軸、一個與該x軸相互垂直的y軸,及一個和該x軸與該y軸相互垂直的z軸。該線性運動平台包含一個沿著一個第一路徑移動的第一乘載件,及一個可沿著一個第二路徑移動的第二乘載件,且該第一乘載件沿該第一路徑移動時在xy平面上有一個第一移動分量,在xz平面上有一個第二移動分量。Therefore, the measuring device of the linear motion platform of the present invention first defines an x axis, a y axis perpendicular to the x axis, and a z axis perpendicular to the x axis and the y axis. The linear motion platform includes a first carrier member that moves along a first path, and a second carrier member that can move along a second path, and the first carrier member moves along the first path There is a first movement component in the xy plane and a second movement component in the xz plane.
該量測裝置包含一個設置於該第一乘載件的二維光柵,及一個設置於該第二乘載件的量測單元。該量測單元用以往該二維光柵發射出一個入射光,當該入射光照射至該二維光柵時,將轉變為一個反射光。The measurement device includes a two-dimensional grating disposed on the first carrier, and a measurement unit disposed on the second carrier. The measuring unit emits an incident light using the conventional two-dimensional grating, and when the incident light irradiates the two-dimensional grating, it will be converted into a reflected light.
該量測單元包括一個用以發射出該入射光的光源、一個用以接收該反射光,並轉換為一個反射訊號的二維感測器,及一個用以接收該反射訊號的處理模組。The measuring unit includes a light source for emitting the incident light, a two-dimensional sensor for receiving the reflected light and converting it into a reflected signal, and a processing module for receiving the reflected signal.
該處理模組接收該反射訊號後,將可計算出該第一移動分量、該第二移動分量,以及該第一乘載件以該z軸作為旋轉軸時的旋轉角度。After receiving the reflection signal, the processing module can calculate the first movement component, the second movement component, and the rotation angle of the first carrier when the z-axis is used as the rotation axis.
本發明之功效在於:將該二維光柵與該量測單元分別設置在該第一乘載件與該第二乘載件,藉此使該二維光柵與該量測單元能做兩個不同方向的移動。再利用該光源發射出該入射光,以探測該線性運動平台在空間中的狀態。最後藉由該二維感測器與該處理模組,就能計算出該第一乘載件及該第二乘載件之間的角度誤差、該第一乘載件在xy平面的第一移動分量,以及該第一乘載件在xz平面的第二移動分量。於是就能僅利用一個光源與一個二維感測器,得知該線性運動平台的多個動態資訊與誤差,故確實能達成本發明之目的。The effect of the present invention is that the two-dimensional grating and the measuring unit are respectively disposed on the first carrier and the second carrier, so that the two-dimensional grating and the measuring unit can be made different Direction of movement. The incident light is then emitted by the light source to detect the state of the linear motion platform in space. Finally, by the two-dimensional sensor and the processing module, the angular error between the first carrier and the second carrier can be calculated, and the first of the first carrier in the xy plane The movement component and the second movement component of the first carrier in the xz plane. Therefore, only one light source and one two-dimensional sensor can be used to obtain a plurality of dynamic information and errors of the linear motion platform, so the purpose of the invention can indeed be achieved.
在本發明被詳細描述之前,應當注意在以下的說明內容中,類似的元件是以相同的編號來表示。Before the present invention is described in detail, it should be noted that in the following description, similar elements are denoted by the same number.
本發明線性運動平台之量測裝置的一個第一實施例,其說明內容皆須參閱圖1,並搭配圖2、3以輔助說明。首先定義一個x軸、一個與該x軸相互垂直的y軸,及一個和該x軸與該y軸相互垂直的z軸。該線性運動平台1包含一個沿著一個第一路徑D1移動的第一乘載件11,及一個可沿著一個第二路徑D2移動的第二乘載件12。其中,該第一路徑D1是設計成與該x軸相互平行,而該第二路徑D2則是設計成與該z軸相互平行。另外要特別說明的是,為了要凸顯該第一實施例的誤差,該第一路徑D1雖然是設計成與該x軸相互平行的,但如圖1所示,實質上仍然有一定的角度誤差,且該第一乘載件11沿著該第一路徑D1移動時,除了在xy平面有一個第一移動分量a1,且在xz平面還有一個第二移動分量a2,藉此代表該第一乘載件11移動時的上下震盪。A first embodiment of the measuring device of the linear motion platform of the present invention, the description of which must refer to FIG. 1, together with FIGS. 2 and 3 for auxiliary description. First define an x axis, a y axis perpendicular to the x axis, and a z axis perpendicular to the x axis and the y axis. The linear motion platform 1 includes a first carrier 11 that moves along a first path D1, and a second carrier 12 that can move along a second path D2. Wherein, the first path D1 is designed to be parallel to the x-axis, and the second path D2 is designed to be parallel to the z-axis. In addition, it should be particularly noted that, in order to highlight the error of the first embodiment, although the first path D1 is designed to be parallel to the x axis, as shown in FIG. 1, there is still a certain angle error , And when the first carrier 11 moves along the first path D1, in addition to a first movement component a1 in the xy plane, and a second movement component a2 in the xz plane, thereby representing the first The rider 11 oscillates up and down when moving.
該量測裝置包含一個設置於該第一乘載件11的二維光柵2,及一個設置於該第二乘載件12的量測單元3。該二維光柵2的表面形貌如2所示,且該二維光柵2的輪廓方程式為 其中,A x,z分別為該二維光柵2在該x軸與該z軸的弦波振幅,P x,z分別為該二維光柵2在該x軸與該z軸的弦波波長,並且為了呈現方便,圖2中的二維光柵2之表面形貌是以x軸為旋轉軸並順時針轉動90度的方式呈現。 The measuring device includes a two-dimensional grating 2 disposed on the first carrier 11 and a measuring unit 3 disposed on the second carrier 12. The surface morphology of the two-dimensional grating 2 is shown as 2, and the contour equation of the two-dimensional grating 2 is Where A x, z are the sine wave amplitudes of the two-dimensional grating 2 on the x axis and the z axis , respectively, P x, z are the sine wave wavelengths of the two dimensional grating 2 on the x axis and the z axis, In addition, for the convenience of presentation, the surface appearance of the two-dimensional grating 2 in FIG. 2 is presented with the x-axis as the rotation axis and rotated 90 degrees clockwise.
該量測單元3用以往該二維光柵2發射出一個入射光I,當該入射光I照射至該二維光柵2時,將轉變為一個反射光R。如圖3所示,該量測單元3包括一個用以發射出該入射光I的光源31、一個設置於該光源31前方的第一透鏡32、一個設置於該第一透鏡32前方的分光鏡33、一個設置於該分光鏡33前方的偏振片34、一個設置於該偏振片34前方的第二透鏡35、一個用以接收該反射光R,並轉換為一個反射訊號的二維感測器36、一個位於該二維感測器36與該分光鏡33的光路之間的第三透鏡37,及一個用以接收該反射訊號的處理模組38。其中,該二維感測器36是一個四象限感測器,並由該二維感測器36界定出一個i軸及一個與該i軸垂直的j軸。The measuring unit 3 emits an incident light I using the two-dimensional grating 2 in the past, and when the incident light I irradiates the two-dimensional grating 2, it will be converted into a reflected light R. As shown in FIG. 3, the measurement unit 3 includes a light source 31 for emitting the incident light I, a first lens 32 disposed in front of the light source 31, and a beam splitter disposed in front of the first lens 32 33. A polarizer 34 disposed in front of the beam splitter 33, a second lens 35 disposed in front of the polarizer 34, and a two-dimensional sensor for receiving the reflected light R and converting it into a reflected signal 36. A third lens 37 between the two-dimensional sensor 36 and the beam path of the beam splitter 33, and a processing module 38 for receiving the reflected signal. The two-dimensional sensor 36 is a four-quadrant sensor, and the two-dimensional sensor 36 defines an i-axis and a j-axis perpendicular to the i-axis.
於是,該入射光I將依序經由該第一透鏡32、該分光鏡33、該偏振片34、該第二透鏡35照射至該二維光柵2,進而轉變為該反射光R。接著,該反射光R將依序經由該第二透鏡35、該偏振片34、該分光鏡33、該第三透鏡37照射至該二維感測器36,並轉換為該反射訊號。該處理模組38接收該反射訊號後,將藉由: (1)一個第一公式: ,藉此計算出該第一乘載件11以該z軸作為旋轉軸時的旋轉角度 z。其中,f代表該第三透鏡37之中心與該二維感測器36的距離,d i代表該反射光照射至該二維感測器36時在該i軸的位置。 (2)一個第二公式: ,藉此計算出該第一乘載件11以該x軸作為旋轉軸時的旋轉角度。其中,f代表該第三透鏡37之中心與該二維感測器36的距離,dj代表該反射光照射至該二維感測器36時在該j軸的位置。 Therefore, the incident light I will be sequentially irradiated to the two-dimensional grating 2 through the first lens 32, the beam splitter 33, the polarizing plate 34, and the second lens 35, and then converted into the reflected light R. Then, the reflected light R is sequentially irradiated to the two-dimensional sensor 36 through the second lens 35, the polarizing plate 34, the beam splitter 33, and the third lens 37, and is converted into the reflected signal. After receiving the reflected signal, the processing module 38 will use (1) a first formula: To calculate the rotation angle of the first carrier 11 when the z-axis is used as the rotation axis z . Where, f represents the distance between the center of the third lens 37 and the two-dimensional sensor 36, and d i represents the position of the i-axis when the reflected light irradiates the two-dimensional sensor 36. (2) A second formula: To calculate the rotation angle of the first carrier 11 when the x-axis is used as the rotation axis . Where, f represents the distance between the center of the third lens 37 and the two-dimensional sensor 36, and d j represents the position of the j-axis when the reflected light irradiates the two-dimensional sensor 36.
(3)利用TW-I507663所揭露之方法,計算出該第一乘載件11在xy平面的第一移動分量a1,以及該第一乘載件11在xz平面的第二移動分量a2。要特別說明的是,在該第一實施例中,由於該二維光柵2在該z軸方向的長度較短,因此該第一實施例較適合用於量測該第一乘載件11在該xz平面的移動誤差,但當然可以將該二維光柵2在該z軸方向的長度設計成更長,藉此量測該第一乘載件11在xz平面的移動距離。 (3) Using the method disclosed in TW-I507663, calculate the first movement component a1 of the first carrier 11 in the xy plane and the second movement component a2 of the first carrier 11 in the xz plane. In particular, in the first embodiment, since the length of the two-dimensional grating 2 in the z-axis direction is shorter, the first embodiment is more suitable for measuring the first carrier 11 in The movement error of the xz plane, but of course, the length of the two-dimensional grating 2 in the z-axis direction can be designed to be longer, thereby measuring the movement distance of the first carrier 11 in the xz plane.
於是,該第一實施例與習知的量測裝置不同之處,就在於僅透過一個光源31與一個該二維感測器36,就能得知該第一實施例的多種動態資訊與誤差的數值,藉此省去習知需使用多個光源與多個感測器的設備成本,並能避免架設上的麻煩。 Therefore, the difference between the first embodiment and the conventional measurement device is that through only one light source 31 and one two-dimensional sensor 36, various dynamic information and errors of the first embodiment can be learned The numerical value of this can save the equipment cost of using multiple light sources and multiple sensors, and avoid the trouble of installation.
參閱圖4,本發明線性運動平台之量測裝置的一個第二實施例,與該第一實施例的結構大致相同,不同之處在於:該第二路徑D2是與該y軸相互平行,且依然可經由該第一公式計算出該第一乘載件11以該z軸作為旋轉軸時的旋轉角度、該第一乘載件在xy平面的第一移動分量a1,以及該第一乘載件在xz平面的第二移動分量a2,藉此提供另一種實施態樣,供使用者作選擇。 Referring to FIG. 4, a second embodiment of the measurement device of the linear motion platform of the present invention has substantially the same structure as the first embodiment, except that the second path D2 is parallel to the y-axis, and The rotation angle of the first carrier 11 when the z-axis is used as the rotation axis can still be calculated through the first formula 1. A first movement component a1 of the first carrier member in the xy plane and a second movement component a2 of the first carrier member in the xz plane, thereby providing another implementation aspect for the user to choose.
綜上所述,本發明線性運動平台之量測裝置,藉由該光源31發射出該入射光I至該二維光柵2,以探測該線性運動平台1在空間中的狀態。再藉由該二維感測器36與該處理模組38,以計算出該第一乘載件11以該z軸作為旋轉軸時的旋轉角度、該第一移動分量a1,以及該第二移動分量a2,且該光源31與該二維感測器36的數量皆只需一個,故確實能達成本發明之目的。 In summary, the measuring device of the linear motion platform of the present invention emits the incident light I to the two-dimensional grating 2 through the light source 31 to detect the state of the linear motion platform 1 in space. Then, the two-dimensional sensor 36 and the processing module 38 are used to calculate the rotation angle, the first movement component a1, and the second when the first carrier 11 uses the z-axis as the rotation axis The moving component a2, and the number of the light source 31 and the two-dimensional sensor 36 are only one, so it can indeed achieve the purpose of the invention.
惟以上所述者,僅為本發明之實施例而已,當不能以此限定本發明實施之範圍,凡是依本發明申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。 However, the above are only examples of the present invention, and should not be used to limit the scope of implementation of the present invention, any simple equivalent changes and modifications made in accordance with the scope of the patent application of the present invention and the contents of the patent specification are still Within the scope of the invention patent.
1‧‧‧線性運動平台1‧‧‧ linear motion platform
11‧‧‧第一乘載件11‧‧‧ First Carrier
12‧‧‧第二乘載件12‧‧‧ Second carrier
2‧‧‧二維光柵2‧‧‧Two-dimensional grating
3‧‧‧量測單元3‧‧‧Measurement unit
31‧‧‧光源31‧‧‧Light source
32‧‧‧第一透鏡32‧‧‧First lens
33‧‧‧分光鏡33‧‧‧Spectroscope
34‧‧‧偏振片34‧‧‧Polarizer
35‧‧‧第二透鏡35‧‧‧Second lens
36‧‧‧二維感測器36‧‧‧Two-dimensional sensor
37‧‧‧第三透鏡37‧‧‧third lens
38‧‧‧處理模組38‧‧‧Processing module
D1‧‧‧第一路徑D1‧‧‧ First Path
D2‧‧‧第二路徑D2‧‧‧Second path
I‧‧‧入射光I‧‧‧incident light
R‧‧‧反射光R‧‧‧reflected light
f‧‧‧距離f‧‧‧Distance
a1‧‧‧第一移動分量a1‧‧‧ First moving component
a2‧‧‧第二移動分量a2‧‧‧Second mobile component
‧‧‧以該z軸作為旋轉軸時的旋轉角度 ‧‧‧The rotation angle when the z axis is used as the rotation axis
‧‧‧以該x軸作為旋轉軸時的旋轉角度 ‧‧‧Rotation angle when the x-axis is used as the rotation axis
本發明之其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中: 圖1是一個立體圖,說明本發明線性運動平台之量測裝置的一個第一實施例; 圖2是一個立體圖,說明該第一實施例的一個二維光柵之表面形貌; 圖3是一個示意圖,說明該第一實施例的一個量測單元;及 圖4是一個立體圖,說明本發明線性運動平台之量測裝置的一個第二實施例。Other features and functions of the present invention will be clearly presented in the embodiment with reference to the drawings, in which: FIG. 1 is a perspective view illustrating a first embodiment of the measuring device of the linear motion platform of the present invention; FIG. 2 is A perspective view illustrating the surface morphology of a two-dimensional grating of the first embodiment; FIG. 3 is a schematic view illustrating a measurement unit of the first embodiment; and FIG. 4 is a perspective view illustrating the linear motion platform of the present invention A second embodiment of the measuring device.
Claims (4)
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TW200521404A (en) * | 2003-12-31 | 2005-07-01 | Nat Huwei Inst Of Technology | Optical real-time measurement method and system with single-axis, 6 degrees of freedom |
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TW200941161A (en) * | 2008-02-08 | 2009-10-01 | Asml Netherlands Bv | Lithographic apparatus and calibration method |
US8687200B2 (en) * | 2011-06-10 | 2014-04-01 | Gwangju Institute Of Science And Technology | Method and device for measuring motion error of linear stage |
TWI507663B (en) * | 2014-11-14 | 2015-11-11 | Metal Ind Res & Dev Ct | Measurement device of linear bearing stage and measuring method thereof |
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