TWD206653S - 基板處理裝置用吸頂式加熱器的保持板 - Google Patents

基板處理裝置用吸頂式加熱器的保持板 Download PDF

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Publication number
TWD206653S
TWD206653S TW108307122F TW108307122F TWD206653S TW D206653 S TWD206653 S TW D206653S TW 108307122 F TW108307122 F TW 108307122F TW 108307122 F TW108307122 F TW 108307122F TW D206653 S TWD206653 S TW D206653S
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TW
Taiwan
Prior art keywords
processing device
substrate processing
holding plate
ceiling heater
ceiling
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Application number
TW108307122F
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English (en)
Inventor
杉浦忍
小杉哲也
山口天和
Original Assignee
日商國際電氣股份有限公司
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Application filed by 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司
Publication of TWD206653S publication Critical patent/TWD206653S/zh

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Abstract

【物品用途】;本設計的物品是基板處理裝置用吸頂式加熱器的保持板，為設置在用來加熱基板處理裝置之處理室的加熱爈的頂部，如「使用狀態參考圖」所示，將加熱線配置在凹部內來使用。;【設計說明】;(無)

Description

基板處理裝置用吸頂式加熱器的保持板
本設計的物品是基板處理裝置用吸頂式加熱器的保持板，為設置在用來加熱基板處理裝置之處理室的加熱爈的頂部，如「使用狀態參考圖」所示，將加熱線配置在凹部內來使用。
(無)
TW108307122F 2019-07-18 2019-11-21 基板處理裝置用吸頂式加熱器的保持板 TWD206653S (zh)

Applications Claiming Priority (2)

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JP2019-016134 2019-01-31
JPD2019-16134F JP1651623S (zh) 2019-07-18 2019-07-18

Publications (1)

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TWD206653S true TWD206653S (zh) 2020-08-21

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TW108307122F TWD206653S (zh) 2019-07-18 2019-11-21 基板處理裝置用吸頂式加熱器的保持板

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US (1) USD918848S1 (zh)
JP (1) JP1651623S (zh)
TW (1) TWD206653S (zh)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD223375S (zh) 2021-03-29 2023-02-01 大陸商北京北方華創微電子裝備有限公司 靜電卡盤

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USD918848S1 (en) 2021-05-11
JP1651623S (zh) 2020-01-27

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