504734 A7 B7 五、發明説明（1 ) I:發明之背景〕 (請先閲讀背面之注意事項再填寫本頁} 本發明係有關適用於轉動例如要使用於液晶顯示裝置 之玻璃基板等之基板Ί、，供應顯像液於該基板上來進行顯 像處理的顯像處理裝置等之基板處理裝置者。 •般在於液晶顯示裝置之製程中，爲了形成例如 I TO (氧化銦錫，Indium Tin Oxide )之薄膜或電路圖 案於玻璃基板表面，會利用與半導體製程時同樣之照相平 版技術（光刻）。該狀態時，例如由抗蝕劑塗佈處理來塗 佈（塗敷）抗蝕劑於玻璃基板表面，而由曝光處理來曝光 電路圖案於玻璃基板上之抗蝕劑'並由顯像處理來顯魯曝 光於抗蝕劑上的電路圖案。 上述之顯像處理係由例如載置玻璃基板於旋轉夾盤上 ，而且予以轉動之同時，可均勻地供應顯像液於玻璃基板 丨·.之顯像處理裝置來進行。並以收容該等於杯狀物內來進 行處理，而防止處理液飛散。 經濟部智慧財產局員工消費合作社印製 在於上述之一連串之處理中，因在顯像處理後有需要 實施洗濯（沖洗）冼淨處理，因而，裝配洗淨機構於顯像 處理裝置內之.構造的裝置被所周知。而在如此之裝置，乃^ 以構成杯狀物成例如內外之二層構造’以在顯像時由內側 杯狀物來回收顯像液，而在洗淨時’則由外側杯狀物來回 收沖洗（洗濯）液，使得可再利用顯像液。並在洗淨後以 高速旋轉玻璃基板來進行甩開乾燥。然而’在於該等過程 屮，R何會產生包有顯像液之霧形成飛散而再附著於玻璃 基板，以致對於其後之過程（製程）波及不良影響之虞。 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X297公釐） 504734 A7 B7 五'發明説明（2 ) 爲此，進行例如配設排氣口於內側杯狀物下部並藉排氣口 來排出杯狀物內之氣氛（氣體環境）。 但構成爲如上述之從排氣口來排氣杯狀物內之氣氛時 ，1丨f:j排氣成爲不充分，使得具有所謂無法防止由霧之飛 散liij産生冉附著於玻璃基板之問題。尤其是，杯狀物構成 爲内外二層之構造時，外側杯狀物之排氣會成爲不充分之 狀況爲多。 . 〔發明之槪要〕 本發明之目的係擬提供一種可防止在杯狀物內所飛散 之霧（nust)會再附著於基板的基板處理裝置。 爲了達成上述目的，本發明之基板處理裝置係具備有 :要保持基板來旋轉之保持、旋轉機構；從前述所保持之 基板上供應所定之處理液的液（體）供應機構；沿著基板 周圍配置成可升降且配設通氣口於下方之內側杯狀物；沿 著前述內側杯狀物所配置之外側杯狀物；配設於前述外側 杯狀物之內壁，而導引由旋轉之.基板離心力所飛散之氣氛 C氣體環境）.至外側杯狀物之內壁下方的第1導件；以藉 前述通氣口來導引由前述第1導件所導引之氣氛至前述內 側杯狀物內的第2導件；及要排氣前述內側杯狀物的排氣 1:幾構' 於本發明，.杯狀物內之氣氛可由第1導件及第2導件 所導丨:丨..由排氣機構所排氣，因此，可防止在杯.狀物內所飛 散之霧再度附著於基板。 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X297公釐） ~ ""~ _ ^ (請先閲讀背面之注意事項再填寫本頁) 訂 經濟/部智逄財表局員工消費合作社印製 504734 A7 _ B7 五、發明説明（3 ) (請先閱讀背面之注意事項再填寫本頁) 本發明之基板處理裝置係具備有：保持基板來旋轉之 保持、旋轉機構；.從前述所保持之基板上供應所定之處理 液的液體供應機構；沿著前述所保持之基板周圍所配設之 杯狀物；配設於前述杯狀物之內壁而導引由旋轉之基板離 心力所飛散之氣氛至杯狀物之內壁下方的導件；及要洗淨 前述導件之洗淨機構。 本發明之基板處理裝置係具備有：保持基板來旋轉之 保持、旋轉機構；從前述所保持之基板上供應所定之處理 液的液體供應機構；沿著前述所保持之基板周圍所配設之 杯狀·物；及配設於前述杯狀物之內壁而導引由旋轉之基板 離心力所飛散之氣氛至杯狀物之內壁下方的導件；而前述 杯狀物係由基部和前述導件，以及對於前述基部可裝卸之 裝卸部所構成。 ‘ 經濟部智慧財產局員工消費合作社印製 木發明之基板處理裝置係具備有：保持基板來旋轉之 保持、旋轉機構；從前述所保持之基板上供應所定之處理 液的液體供應機構；沿著前述所保持之基板周圍所配設之 杯狀物；及配設於前述杯狀物之內壁而導引由旋轉之基板 離心力所飛散之氣氛至杯狀物之內壁下方的導件’而前述 導件乃與前述杯狀物內壁形成4 5 °左右之角度，且使從 前述杯狀物內壁上方朝下方傾斜之板狀構件以沿著前述杯 狀物之內周並以所定間隔來配置者，再者，前述導件乃被 分割成具有成相鄰之複數的前述板狀構件的複數部件（ b 1 〇 C k ),且前述各部件形成能與前述杯狀物之間進行裝卸 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 504734 A7 B7 五、發明説明（4 ) 「發明之實施形態〕 (請先閲讀背面之注意事項再填寫本頁) 以下，將參照所附上之圖式詳細說明本發明之實施形 態 將本發明之一實施形態，以適用於圖1所示之LCD (液晶顯示裝置）的玻璃基板（以下簡稱爲基板）之塗佈 顯像處理系統1時爲例來加以說明。 該塗佈顯像處理系統1係對於基板G塗佈抗蝕液之後 ，先暫時交給曝光裝置（E X P ) 2，而再一次接受由該 曝光裝置實施曝光處理後之基板來進行顯像處理者。 爲了進行如此之一連串的處理，該塗佈顯像處理系統 1乃具有：要實施裝載及卸載基板用之裝載/卸載部（L / u L ) 3 ;要實施基板洗淨處理用之第1處理部4 ;要 實施塗佈（塗敷）抗蝕液反周邊（緣）抗蝕劑去除處理用 之第2處理部5 ;要實施顯像處理用之第3處理部6 ;及 與曝光裝置2之間實施交接基板用之轉接部（ I/F， Interface 咅丨3 ) 7。 經濟部智慧財產局員工消費合作社印製 裝載/卸載部3乃具備有卡匣載置台1 〇及搬運部（ c / s ) 1 1。卡匣載置台1 0上乃載置有二種類之卡匣 c 1、c 2。例如在第1卡匣C 1收容有處理前之基板G .’ Ιίπ在第2卡I® C 2收容有處理後之基板G。 又搬運部1 1配設有第1輔助臂機構1 3。該第1輔 助ff機構1 3乃具有可保持基板的例如臂1 4.，並形成以 旋轉、進退、上下移動來取出被收容於第1卡匣C 1之基 本紙張尺度通用中國國家標準（CNS ) A4規格（210X297公釐） 五、發明説明 (5 A7 B7 板， 經濟部智慧財產局員工消背合作社印製 便得可交給於第1處理部4側。再者，已完成所有之 處斑]」 一 '之基板，係由該第1輔助臂機構1 3來從例如第1處 壤部4側收容至第2卡匣C2。 上述第1處理部4乃具有從上述第1輔助臂1 3接收 趟板之第1主臂機構1 5。該第1主臂機構1 5乃具備行 &於沿著Y方向延伸所設之第1中央搬運道1 6上的底座 丄(’及在該底座1 7上被驅動成可旋轉、進退、上下之 例如臂1 8。 在於該第1主臂機構1 5側方，沿著中央搬運道1 6 ’各配設有例如由擦洗（淸潔）器所形成之2個洗淨部（ S C R ) 1 9，例如具有熱板之加熱/加熱部（Η P / Η Ρ ) 2 0，由紫外線洗淨裝置所形成之乾式洗淨部（ U V ) 2 1 ，及例如具備冷卻板之冷卻部（C〇L ) 2 2 〇 在此，所謂「加熱/加熱部（ΗΡ/ΗΡ) 」之標示 ’’係顯不具有熱板之加熱部例如疊成上下兩層來設置者（ 以下同）。又圖中，表示加熱部Η Ρ及表示冷卻部之 C〇L的後面所附加之數目字（「Η Ρ 1」或C〇L 1」· 等），乃表示加熱處理或冷卻處理之種類或順序者。 上述第1主臂機構1 5係形成令從上述裝載/卸載部 .3所接受之基板予以***於各處理部1 9〜2 0 ，實施所 需要之處理後，.取出該基板且依序搬運至另外之處理部 1 9〜2 0或搬運至第2處理部5。 而第2處理部5乃具有會行走沿著γ方向延伸配設之 (請先閱讀背面之注意事項再填寫本頁) ·裝· 訂 本紙張尺度適用中國國家標準（CNS ) Α4規格（210Χ297公釐） -8- 504734 Α7 Β7 五、發明説明（6 ) 第2中央搬運道2 3上的第2主臂機構2 4。該第2主臂 機構2 4係具有與上述第1主臂機構1 5同樣所構成之底 座2 5及臂2 6 ° 又在該第2主臂機構2 4側方，配置有要對基板進行 塗佈抗蝕劑之同時，要去除周邊部之不需要的抗蝕劑用的 抗蝕劑塗佈、周邊抗餽劑去除部（C T / E R ) 2 8，和 毀進行基板表面之疎水化處理用之黏者/冷卻部（AD/ C〇L ). 2 9 ，及加熱/加熱部（H P ’ H p ) 3 0、加 熱/冷卻部（Η P / C〇L ) 3 1 ° . 上述第2主臂機構2 4係形成從上述第1處理部4接 受之基板***於各處理部2 8〜3 1 ’進行所需要之處理 後，取出該基板且依序搬運至另外之處理部2 8〜3 1或 .搬運至第3處理部6側。 · 第3處理部6乃具有會行走沿著Υ方向延伸配設之第 3中央搬運道3 3上的第3主臂機構3 4 °該第3主臂機 構3 4乃具有與上述第1、第2之主臂機構1 5、 2 4同 樣構成之底座3 5及臂3 6 ° 而在該第3主臂機構3 4側方’配設有要顯像處理曝 光處理後之基板G用之3個顯像處理部（D E V ) 3 8， 和要燙印名稱（標題）的名稱燙印裝置（TITLER ) 3. 9 ， 及加熱/加熱部（Η P / Η P )以及加熱/冷卻部（Η P / C 〇 L ) 4 1。 上述第3主臂機構3 4係形成從上述第2.處理部5接 受之L!塗佈有抗飩液之基板，藉轉接部7來移送至曝光裝 ^紙張尺度適用中國國家標準（CNS ) Α4規格（210X297公釐）~〜 ' - (請先閲讀背面之注意事項再填寫本頁) -·裝· 、1Τ 經濟部智慧財產局員工消費合作社印製 504734 A7 B7 經濟，部智慧財產局員工消費合作社印製 五、發明説明（7 ) 2側之同丨诗’將上述巳完成曝光之基板藉轉接部7從曝 ^裝置2側接受。.並***該曝光完成之基板於各處理部3 8〜4 1且實施所需要之處理後，取出該基板依序搬運至 W外之處理部3 8〜4 1或第2處理部5側。 再者’如該圖所示，於第1、第2、第3之處理部4 、5、 6間’配設有冷卻部（c〇L ) 4 2、 4 3。該等 丨令卻1部4 2、4 3係用於暫時性地要使處理中之基板待命 用者。 . 接著.，將參照圖2之流程圖來說明構成如上述之塗佈 顯像處理系統1的處理步驟。 |狂先’被收容於上述載置台1 〇上之第1卡匣C 1內 的未處理基板’將藉上述搬運部（c：/s) 11來從上述 .裝戟/卸載邰3父給於第1處理部4之第1主臂機構1 5 (步驟S 1、S 2 )。接著，該基板由乾式洗淨裝置（ U V ) 2 1實施紫外線洗淨（步驟3 )，而後由上述冷卻 邰2 2進行第1之冷卻（C〇L )(步驟s 4 )。 具次’當由....t述濕式洗淨裝置1 9完成擦洗洗淨（ s c R )時，.由上述加熱部2 0之第1加熱處理（Η P 1 )被加熱烘乾後（步驟S 6 )，由上述冷卻部2 2進行第 2之冷卻處理來加以冷卻（步驟S 7 )。接著，該基板將 從第 2 4 臂機構 交給於第2處理部5之第2主臂機構 被交給於第2處理部之基板，將由黏著處.理部2 9進 行表面之疎水化處理（A D )後（步驟s 8 )，實施第3 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X297公釐） (請先閲讀背面之注意事項再填寫本頁) ·裝· 訂 -10- 504734 A7 B7 五、發明説明（8 ) (請先閲讀背面之注意事項再填寫本頁) 之冷卻處理（c〇L 3 )(步驟S 9 ),。接著，將疎水化 處理後之基板導人於抗触液塗佈、周邊抗鈾劑去除部2 8 ’以進行抗触劑塗佈（C T )及去除基板周邊所不需要之 抗蝕液（E R )。 以如此所處理之基板，將被***於上述加熱部3〇、 3 1.來進行烘乾處理（Η P 2 )(步驟S 1 1 )。由而， 可揮發包含於塗佈在基板之抗蝕液的溶齊[J。接著，***該 基板於冷卻部（C〇L 4 )來冷卻‘直至略爲室溫之狀態（ 步驟S 1 2 )。接著，從上述第2主臂機構2.4藉第3主 臂機構3 4來搬運該基板至轉接部7，並交給於曝光裝置 2 (步驟S 1 3 )。且在該曝光裝置2實施曝光處理（ Ε X Ρ )(步驟 S 1 4 )。 已進行曝光處理之基板，將藉上述轉接部7 ·，第3主 臂機構3 4來***於名稱燙印裝置3 9 ，以進行名稱燙印 處埋（步驟S 1 5 )。 經濟部智慧財產局員工消費合作社印製 而後，導入基板於顯像處理部38，並進行顯像處理 (D Ε V )(步驟S 1 6 )。該顯像處理部3 8係實施例 勿I供應顯像液於基板上之同時予以旋轉基板而實施顯像，. 丨-ί以沖|洗液來洗淨顯像液後，進行甩開乾燥。504734 A7 B7 V. Description of the invention (1) I: Background of the invention] (Please read the precautions on the back before filling out this page} This invention relates to substrates suitable for rotating glass substrates such as those used in liquid crystal display devices. A substrate processing device such as a development processing device that supplies a developing solution to the substrate to perform development processing. • Generally, in the process of manufacturing a liquid crystal display device, in order to form, for example, I TO (Indium Tin Oxide) The film or circuit pattern on the surface of the glass substrate uses the same photolithography technology (lithography) as in the semiconductor manufacturing process. In this state, for example, a resist coating process is used to apply (apply) a resist to the glass. The surface of the substrate is exposed to the resist pattern of the circuit pattern on the glass substrate by exposure processing, and the circuit pattern exposed to the resist is developed by the development processing. The above-mentioned development processing is performed by, for example, placing a glass substrate. On the rotating chuck, and while rotating, the developing processing device that can uniformly supply the developing liquid to the glass substrate 丨. It is printed in one of the above-mentioned series of processes by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, because it is necessary to perform cleaning (rinsing) and cleaning after the development process. Therefore, the assembly is cleaned. The structure of the device in the imaging processing device is well known. In such a device, the cup is formed into a two-layer structure such as inside and outside so that the imaging can be recovered by the inside cup during development. When cleaning, 'the washing (washing) liquid is recovered from the outer cup, so that the developing solution can be reused. After washing, the glass substrate is rotated and dried at high speed. However,' is In these processes, why R will generate mist that is covered with imaging fluid and spreads and then attaches to the glass substrate, so that it may affect the subsequent process (process). This paper scale applies the Chinese National Standard (CNS) A4 specification (210 X297 mm) 504734 A7 B7 Five 'invention description (2) To this end, for example, an exhaust port is provided at the lower part of the inner cup and the exhaust port is used to exhaust the atmosphere in the cup ( Gas environment). However, when the atmosphere in the cup is exhausted from the exhaust port as described above, the f exhaustion of 1 丨 f: j becomes insufficient, so that there is a so-called inability to prevent the liij from being scattered by the mist. Problems with glass substrates. In particular, when the cup is structured as a two-layer structure, the exhaust of the outer cup may become insufficient. [Summary of the Invention] The object of the present invention is to provide A substrate processing apparatus capable of preventing the mist (nust) scattered in a cup from re-adhering to a substrate. In order to achieve the above object, the substrate processing apparatus of the present invention is provided with a holding and rotating mechanism for holding a substrate for rotation A liquid (body) supply mechanism for supplying a predetermined processing liquid from the substrate held above; an inner cup arranged along the periphery of the substrate that can be raised and lowered and provided with an air vent below; along the inner cup The outer cup is configured; it is arranged on the inner wall of the outer cup, and guides the atmosphere (the gas atmosphere scattered by the centrifugal force of the substrate). To the first guide below the inner wall of the outer cup. To guide the atmosphere guided by the first guide to the second guide in the inner cup by the aforementioned vent; and to exhaust the air cup 1: the structure of the inner cup In the present invention, the atmosphere in the cup can be guided by the first guide and the second guide 丨: 丨. The air is exhausted by the exhaust mechanism, so that the mist scattered in the cup can be prevented Reattached to the substrate. This paper size applies to China National Standard (CNS) A4 specification (210 X297 mm) ~ " " ~ _ ^ (Please read the precautions on the back before filling this page) Order printed by the Ministry of Economy / Ministry of Finance and Economics Bureau Consumer Consumption Cooperative 504734 A7 _ B7 V. Description of the invention (3) (Please read the precautions on the back before filling in this page) The substrate processing device of the present invention is provided with a holding and rotating mechanism that holds the substrate to rotate; A liquid supply mechanism for supplying a predetermined processing liquid on a substrate; a cup provided along the periphery of the substrate held above; arranged on the inner wall of the cup to guide the scattered by the centrifugal force of the rotating substrate Atmosphere to the guide below the inner wall of the cup; and a cleaning mechanism to clean the aforementioned guide. The substrate processing apparatus of the present invention includes a holding and rotating mechanism for holding the substrate to rotate; a liquid supply mechanism for supplying a predetermined processing liquid from the substrate held; and a cup provided along the periphery of the substrate held. And a guide provided on the inner wall of the cup to guide the atmosphere scattered by the rotating substrate centrifugal force to the bottom of the cup; and the cup is formed by the base and the guide And a mounting and dismounting unit that is attachable to and detachable from the aforementioned base. '' The substrate processing device of the printed wood invention printed by the employee's consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs includes: a holding and rotating mechanism that holds the substrate to rotate; a liquid supply mechanism that supplies a predetermined processing liquid from the substrate held above; Cups arranged around the substrate held above; and guides arranged on the inner wall of the cup to guide the atmosphere scattered by the rotating substrate centrifugal force to the bottom of the cup's inner wall The guide is formed at an angle of about 45 ° with the inner wall of the cup, and the plate-shaped member inclined downward from above the inner wall of the cup is arranged at a predetermined interval along the inner periphery of the cup. For configuration, further, the guide is divided into a plurality of parts (b 1 0C k) having the plurality of adjacent plate-shaped members, and the formation of the parts can be performed with the cup. The size of this paper is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 504734 A7 B7 V. Description of the invention (4) "Implementation mode of the invention" (Please read the precautions on the back before filling this page) Hereinafter, embodiments of the present invention will be described in detail with reference to the attached drawings. One embodiment of the present invention is applied to a glass substrate (hereinafter referred to as a substrate) applied to the LCD (liquid crystal display device) shown in FIG. 1. The cloth development processing system 1 will be described as an example. The coating development processing system 1 applies a resist solution to the substrate G, and then temporarily passes it to the exposure device (EXP) 2 and receives the exposure again. In order to perform such a series of processing, the coating development processing system 1 includes a loading / unloading unit (L / u L) for carrying out loading and unloading of substrates in order to perform such a series of processing. ) 3; the first processing unit 4 for substrate cleaning processing; the second processing unit 5 for coating (coating) the anti-peripheral (edge) resist removal processing of the resist liquid; the development The third processing unit 6 for processing; and the transfer unit (I / F, Interface 咅 丨 3) 7 for transferring the substrate to and from the exposure device 2. 7. The loading / unloading department printed by the employee's consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 3 is provided with a cassette mounting table 1 〇 And conveying section (c / s) 1 1. Two types of cassettes c 1 and c 2 are mounted on the cassette mounting table 10. For example, the first cassette C 1 contains a substrate G before processing. The second card I® C 2 houses the processed substrate G. The transporting unit 11 is also equipped with a first auxiliary arm mechanism 1 3. The first auxiliary ff mechanism 13 includes, for example, an arm 1 that can hold a substrate. 4. And form the basic paper size contained in the first cassette C 1 by rotating, advancing, reciprocating, and moving up and down. Common Chinese National Standard (CNS) A4 specification (210X297 mm) 5. Description of the invention (5 A7 B7 board The employee of the Intellectual Property Bureau of the Ministry of Economic Affairs printed it on the cooperative so that it could be handed over to the first processing department 4 side. In addition, all the substrates have been completed], and the substrate is received by the first auxiliary arm mechanism 13 from the side of the first portion 4 to the second cassette C2, for example. The first processing unit 4 includes a first main arm mechanism 15 that receives a plate from the first auxiliary arm 13. The first main arm mechanism 15 is provided with a base 丄 ('on a first central conveying path 16 extending along the Y direction, and is driven on the base 17 to be rotatable, forward and backward, The upper and lower arms are, for example, 18. On the sides of the first main arm mechanism 15 are two cleaning units (SCR) formed by a scrubber (e.g., scrubber) along the central conveying path 16 '. 19, for example, a heating / heating section (Η P / Ρ) 2 0 with a hot plate, a dry washing section (UV) 2 1 formed by an ultraviolet cleaning device, and a cooling section (C) having a cooling plate, for example 〇L) 2 2 〇 Here, the so-called "heating / heating section (HP / HP)" indicates that the heating section without a hot plate is, for example, stacked in two layers (the same applies hereinafter). In the above, the numerals ("HP 1" or COL 1 ", etc.) appended to the heating section ΡP and the cooling section COL are used to indicate the type or order of the heat treatment or cooling treatment. The above-mentioned first main arm mechanism 15 is formed so that the substrate received from the above-mentioned loading / unloading section .3 is inserted into each of the processing sections 19 to 20. After the required processing, the substrate is taken out and sequentially transferred to another processing section 19 to 20 or to the second processing section 5. The second processing section 5 is arranged to extend along the γ direction. (Please read the notes on the back before filling in this page) · The size of the paper for the binding and binding is applicable to the Chinese National Standard (CNS) A4 specification (210 × 297 mm) -8- 504734 Α7 Β7 V. Description of the invention (6) Section 2 The second main arm mechanism 2 4 on the central conveying path 23 is provided with a base 2 5 and an arm 2 6 which are the same as the first main arm mechanism 15 described above. 2 Main arm mechanism 2 On the 4 side, a resist coating for removing unnecessary resist on the peripheral part and a peripheral anti-repellent removal part (CT for removing resist on the substrate) are arranged. / ER) 28, and the adhesion / cooling section (AD / COL) for the hydration treatment of the substrate surface. 2 9 and the heating / heating section (HP'Hp) 30, heating / cooling (Η P / COL) 3 1 °. The second main arm mechanism 2 4 is formed so that the substrate received from the first processing unit 4 is inserted into each processing unit 2 8 to 3 1 'After performing the required processing, take out the substrate and sequentially transfer it to another processing section 2 8 ~ 3 1 or .Transfer to the third processing section 6 side. · The third processing section 6 has the ability to walk along the Υ The third main boom mechanism 3 4 on the third central conveying path 3 3 extending in the direction. The third main boom mechanism 34 has the same structure as the first and second main boom mechanisms 15 and 24. The base 3 5 and the arm 3 6 ° are provided with 3 development processing units (DEV) 3 8 for the substrate G to be developed and exposed after the third main arm mechanism 3 4, and The name stamping device (TITLER) 3. 9 and the heating / heating section (Η P / Η P) and the heating / cooling section (Η P / C 〇L) 41 to be stamped. The above-mentioned third main arm mechanism 34 is formed of the L! Coated with anti-rhenium substrate received from the above-mentioned 2. processing unit 5 and transferred to the exposure equipment by the transfer unit 7 ^ Paper standards are applicable to Chinese national standards (CNS ) Α4 specification (210X297 mm) ~~ '-(Please read the precautions on the back before filling out this page)-··· 1T Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and Consumer Cooperatives 504734 A7 B7 Economy, Ministry of Intellectual Property Bureau Printed by the employee's consumer cooperative V. Invention description (7) Same on the 2 side Poem 'Receive the substrate on which the above-mentioned exposure has been completed is borrowed through the transfer unit 7 from the exposure device 2 side. After inserting the exposed substrate into each of the processing sections 3 8 to 41 and carrying out the required processing, the substrate is taken out and transferred to the processing section 3 8 to 4 1 or the second processing section 5 side in order. Further, as shown in the figure, cooling units (coL) 4 2, 4 3 are arranged in the first, second, and third processing units 4, 5, and 6. One of these orders is 4, 2, 4, and 3, which are used to temporarily make the substrate in process standby. Next, the processing steps constituting the coating and developing processing system 1 as described above will be described with reference to the flowchart of FIG. 2. | Kuangxian 'unprocessed substrate contained in the first cassette C 1 on the mounting table 10' will be removed from the above by the above-mentioned conveying section (c: / s) 11 The first main arm mechanism 15 in the first processing unit 4 (steps S1, S2). Next, the substrate is cleaned with ultraviolet rays by a dry cleaning device (UV) 21 (step 3), and then the first cooling (COL) is performed by the above-mentioned cooling unit 22 (step s4). When the scrub cleaning (sc R) is completed by the wet cleaning device 19 described above, the first heating treatment (Η P 1) of the heating section 20 is heated and dried. (Step S 6) The second cooling process is performed by the cooling unit 22 to perform cooling (step S 7). Next, the substrate is transferred from the second 4 arm mechanism to the second processing unit 5. The second main arm mechanism is transferred to the substrate of the second processing unit, and the surface of the substrate is hydration-treated by the adhesion portion 29. After (AD) (step s 8), implement the third paper size to apply the Chinese National Standard (CNS) A4 specification (210 X297 mm) (Please read the precautions on the back before filling out this page) · Binding · Order -10 -504734 A7 B7 V. Cooling treatment (c0L3) (step S9) of the invention description (8) (please read the precautions on the back before filling this page). Next, the substrate after the tritium hydration treatment is introduced into an anti-contact liquid coating and a peripheral anti-uranium agent removing section 28 'to perform anti-contact coating (CT) and remove the unnecessary resist solution (ER) around the substrate. ). The substrate thus processed is inserted into the heating sections 30 and 31 to perform a drying process (ΗP 2) (step S 1 1). As a result, the solvent contained in the resist solution coated on the substrate may be volatile [J. Next, the substrate is inserted into a cooling section (C0L 4) to cool it to a state where it is slightly room temperature (step S 1 2). Next, the third main arm mechanism 34 is borrowed from the second main arm mechanism 2.4 to carry the substrate to the transfer section 7 and handed over to the exposure device 2 (step S 1 3). Then, an exposure process (E X P) is performed in the exposure device 2 (step S 1 4). The substrate subjected to the exposure processing will be inserted into the name stamping device 3 9 by the above-mentioned transfer section 7 · and the third main arm mechanism 34 to perform name stamping (step S 1 5). It is then printed by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, and then the substrate is introduced into the development processing unit 38 and subjected to development processing (D E V) (step S 1 6). The development processing section 38 is an example of the 8-series embodiment. I don't supply the developing solution on the substrate while rotating the substrate to develop. 丨 -ί Wash and wash the developing solution, and then shake off and dry it. .
而該基板，最後將***於對向於該基板之加熱/加熱 部4 0或加熱/冷卻部4 1 ，且由第3之加熱處理（HP 3 )被加熱乾燥後（步驟S 1 7 )，並由第5之冷卻處理 (C〇L 5 )所冷卻（步驟S 1 8 )。 所有之以上處理完成（終了）後的基板，將從上述第 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） ' -11 - 504734 Α7 Β7 五、發明説明（9 ) 3 K臂機構3 4 ，藉上述第2 ，第1之主臂機構24、 1 5來交給於配設在上述搬運部11 (C/S)之第1輔助 (請先閲讀背面之注意事項再填寫本頁) 臂機構13 (步驟S19)。而由該第1輔助臂機構13 來收容於被載置於上述裝載/卸載部3之第2卡匣C 2內 圖3及圖4係顯示在於上述顯像處理部（d E V ) 3 8之顯像處理裝置的結構圖，圖3係從正面看該顯像處 理裝置之部分剖面圖，圖4係其平面圖。 顯 像處理 裝 置 5 1 之 中 心 部 配 設 有 以 驅 .動 馬 達 ( 電 動 機 ) 5 ^ 2形 成 可 旋 轉 且 升 降 缸 AW 同 5 3 成 可 上 下 移 動 之 旋 轉 夾 盤E 3 4 0 該 旋 轉 夾 盤 5 4 上 面 乃 被 構 成 爲 可 由 真 空 吸 箸 來 吸著保 士土 f寸 基 板 G 成 水 平 狀 態 〇 又 在 驅 動 馬 達 5 2 和 .rjTj.- 降 缸 /rA- Γ 同, 3 3 之 間 介 居 插 入 有 做 爲 止 動 器 之 滾 珠 軸 承 5 5 〇 亦 即： ，形 成 由 升 降 缸 /rA- 同 5 3 而 使 旋 轉 夾 盤 5 4 下 降 之 時，驅動馬達5 2下部會抵接於滾珠軸承5 5上面，使得 旋轉夾盤5 4無法較該處更下降。 經濟部智慧財產局員工消費合作社印製 該旋轉夾盤5 4下方及配設有下面（側）容器5 6。 又配置外側杯狀物5 7成包圍旋轉夾盤5 4之外周圍，下 面（側）容器5 6和外側杯狀物5 7之間乃配設有內側杯 狀物5 8。 外側杯狀物5 7和內側杯狀物5 8係由連結構件5 9 所連結，而該等外側杯狀物5 7及內側杯狀物5 8乃依據 控制部6 0之命令，形成可由升降缸筒6 1來.進行升降。 外側杯狀物5 7及內側杯狀物5 8之上部係配設成伴隨著 本紙張尺度適用中國國家標準（CNS ) A4規格（2丨〇'〆297公釐） 504734 A7 _ B7 _ 五、發明説明（) (請先閲讀背面之注意事項再填寫本頁) 朝上而變成狹窄之朝內側傾斜著。該傾斜係做成例如與水 平面所成之角度爲3 0 °左右。以如此地對於水平面形成 狹窄之角度時，可增進排氣效果。又在該等外側杯狀物5 7及內側杯狀物5 8之表面，實施塗敷特氟隆（聚四氟乙 烯）。由而，可增進防水（拒水）性，而可防止杯狀物成 爲骯髒〔污穢）。外側杯狀物5 7之上端開口部直徑係較 内側杯狀物5 8之上端開口部直徑爲大，且該等之上端開 Μ郃ιΐϊ徑丨3形成爲基板G維持水.平狀態下可下降被收容於 杯狀物內之大小。 . 下面容器5 6乃具備有：從中心部朝外面成朝下方傾 斜之傾斜部6 2 ;及配設有（接受）盤6 3。盤6 3底面 配設奋筒狀之豎立壁6 4，豎立壁6 4係介居於外側杯狀 物5 7和內側杯狀物5 8之間。又內側杯狀物58之傾斜 部係超過豎立壁6 4而展延於豎立壁6 4之外周。由而， 流動於內側杯狀物5 8之傾斜部的流體形成會流入於以（ 接受）盤6 3之豎立壁6 4所隔開之外側室6 5中。 Ι:血容器5 6之傾斜部6 2背面側，配設有要排氣杯 狀物內用之排.氣口 6 6 ，排氣口 6 6連接有排氣泵6 7。' 經濟部智慧財1局員工消費合作社印製 在以盤6 3之豎立壁6 4所隔開之內側室6 8下部形成有 排液口 6 9 ，並在外側室6 5下部形成有排洩口 7 0.。對 於排液口 6 9則藉回收管7 1連接有要再生處理已使用之 顯像液所用的再生處理機構7 2。再生處理機構係由要實 施氣（.體）液（體）分開（解開）用之氣液分.開機構7 3 及要去除已使用之顯像液中之雜物用之雜物去除機構7 4 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X297公釐） -13- A7 B7 明説明（11 ) …楛成，丨:]·被連接於顯像液收容槽7 5。排洩口 7 ◦係連 ^於次陶小之I"丨收槽、. 在杯狀物上部-‘側方’配置有要對基板G表面吐出顯 像液闲之顯像液吐出機構8 1 ，另一側則配設有要對基板 G表面吐出沖洗液用之洗淨機構8 2。又如圖4所示，在 杯状物上部之前方及背後，配設有搬運用軌道8 3、8 4 福像液吐出機構81安裝有搬運用馬達8 5 ，而在控制 部6 〇之控制—^，驅動搬運馬達8. 5 ，使得顯像液吐出機 _ 8 1可沿著搬運用軌道8 3、8 4搬運至杯狀物內上部 。該顯像液吐出機構8 1能在控制部6 〇之控制下，藉泵 8 5從顯像液收容槽7 5供應顯像液。又在顯像液吐出機 構81 ，安裝有複數之顯像液吐出管嘴8 6於被配置於水 1Λ Λ向之未圖示之保持棒。 . 冼淨機構8 2能在控制部6 0之控制下，藉泵8 7從 沖冼（洗淨）液槽8 8供應沖洗液（例如純水）。該洗淨 機構8 2係如圖4所示，具有被連結於旋轉驅動部8 9 ， 而設成能以基端部9 0爲中心轉動自如之支承臂9 1 ，及 被支承於該支.承臂9 1 .-端的沖洗液管嘴9 2。支承臂 9 1乃由控制部6 0之控制來驅動旋轉驅動部8 9 ，使得 以基端部9 0爲中心轉動，以令沖洗（淸淨）液吐出管嘴 9 2位於人致對應於基板G之中心部位來從沖洗液吐出管 嘴9 2進行吐出沖洗液。 在外側杯狀物5 7之內壁，配設有做爲導.弓丨由旋轉基 板G之離心力所飛散之氣氛（大氣）至外側杯狀物5 7之 本紙張尺度適用中國國家榡準（CNS ) A4規格（210 X297公釐） (請先閲讀背面之注意事項再填寫本頁) 馨裝. 訂 經濟部智慧財產局員工消費合作社印製 504734 A7 B7 五、發明説明（12 ) (請先閲讀背面之注意事項再填寫本頁) ㈧壁卜方用第1導件的翼片9 3 。翼片9 3係圖5所示， 沿著外側杯狀物5 1 7内周，例功:1以形成等間隔配設有3 2 仙丨各翼j 9 3係對於也边方向傾斜有所定角度0 ，例女p ϋ 〜6 0 左右，埋想爲4 5 左右。由而，基板G 访例關5屮之箭標記①方向時，就會產生圖5中箭標記② //向所示之朝內壁下方之氣流，使得該等附近之氣氛（大 氣）朝外側杯狀物5 7之內壁下方導引。而該等之翼片 9 3係由例如S U S (不銹鋼）等所形成，或施加特氟隆 塗佈等來防lh霧之附著。丨写者，當然也可採用由樹脂材料 所構成之翼片9 3。 ‘ 同樣，在內側杯狀物5 8內壁，也配設有做爲要導引 由旋轉基板G之離心力所飛散之氣氛至內側杯狀物5 8內 ，小方用之第3導件的翼片9 4。甚至對於翼片i4 ，也 構成爲例如與上述之翼片9 3同樣之結構。 义如圖6所示，在外側杯狀物5 7及內側杯狀物5 8 之卜部，固定有翼片9 5於豎立壁6 4成橫跨外側杯狀物 5 7下部側和內側杯狀物5 8下部側。翼片9 5也與上述 翼片9 3、 9. 4同樣，對於垂直方向形成所定之角度Θ ，' 經濟部智慧財產局員工消費合作社印製 例如3 0 °〜6 〇 °左右，更理想爲形成.4 5 °左右。由 而，形成如圖6中箭標記①所示，由翼片9 3從外側.杯狀 物5 7上部直至下部被導引之大氣（氣氛），將藉該等翼 〔）5導]I予内側杯狀物5 8的內側，亦即導引至排氣口 β fi .Ι,ί丨樣，以如圖6中箭標記②所示，’由翼.片9 4從內 側杯狀物5 8 .. .t部直至下部被導引之大氣，也會藉翼片 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 504734 A7 B7 五、發明説明（13 ) (請先閱讀背面之注意事項再填寫本頁) 9 5導引平內側杯狀物5 8的內側，亦即導引至排氣口。 乂翼片9 5也與t述同樣，例如由S U S等所形成，或施 )Jl l特緘隆塗佈等來防止霧之附著° 接著，說明有關構成如此之顯像處理裝置5 1之動作 被搬入於顯像處理裝置5 1內’而由旋轉夾盤5 4所 保持之基板G予以降下’而如圖7所示’外側杯狀物5 7 及內側杯狀物5 8予以上升至最高'位置’顯像液吐出機構 8 1係搬運直至基板G之大致中央且保持成靜.止。而後’ 旋轉Iti旋轉夾盤5 4所保持之基板G ’且由顯像液吐出機 構8 1之顯像液吐出管嘴8 6來對基板G吐出顯像液。又 從苺板G外周所飛散之顯像液會碰撞於內側杯狀物5 8內 側ιίπ由排氣□ 6 9來回收’並被再利用。該時’在內側杯 狀物.5 8內所產生之霧（氣）’將藉翼片94、 9 5被導 經濟部智慧財產局員工消費合作社印製 弓丨半：內側杯狀物5 8之內側’亦即導引至排氣口 6 6。由 •而，可防止上述之霧會附著於基板G。該時，若控制成提 高泵6 7之排氣壓時，就可極有效果地來排氣（排出）霧 。又供應顯像液時之旋轉夾盤5 4的轉數’理想爲形成較 後述之沖冼時之旋轉夾盤5 4的轉數爲慢。因在供應顯像 液時，產生霧（氣）較多，因而，可極有效果地抑制該狀 況；._ . 接著，如圖8所示，降下由旋轉夾盤所保持之玻璃基 板（:；，.外側杯狀物5 7及内側杯狀物5 8降下.至最低之位 茼，Ιί由旋轉夾盤5 4所保持之玻璃基板g予以形成靜止 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐厂 ~ " 504734 A7 B7 五、發明説明（14 ) 狀態，並轉動構成洗淨機.構8 2之支承鲁9 1 ’以令沖洗 (請先閲讀背面之注意事項再填寫本頁) 液叶出管嘴9 2位於基板G之大致中央部位。而後’旋轉 由旋轉夾盤5 4所保持之基板G，並從沖洗液吐出管嘴 9 2對基板G供應沖洗液（純水）.。該時，從基板G外周 所飛散之沖洗液會通過內側杯狀物5 8和外側杯狀物5 7 之間，並由排洩口 7 0來拋棄’父在外側杯狀物5 7內所 產生之霧，將藉翼片9 3、 9 5被導引至內側杯狀物5 8 .内_，亦即被導引至排氣Π 6 6.。Ίΐ而’可防止上述之霧 :U .:附6於钹板G之惜1Κ ' · . 當供應沖洗液完成時；支承臂9 1會從基板G之大致 1: ¾中心處朝與上述反方向轉動’以令沖洗彳仪吐出管卩角9 2 被搬運至杯狀物外。而以高速旋轉由旋轉夾盤5 4所保持 之基板G來進行甩開乾燥。至於產生在外側杯狀物5 7內 之霧，同樣藉翼片9 3、 9 5來導引至內側杯狀物5 8內 經濟部智慧財產局員工消費合作社印製 側，亦即被導引至排氣口 6 6。由而，可防止上述之霧（ 氣）附著於基板G之情事。本實施形態’尤其以翼片來構 成導件，w叫，在m開乾燥時，可有效地防止附著霧氣。 因伴隨轉卨速旋轉基板G可增進由翼片93、 9 5所產生_ 之導引效果的緣故。 ’ 本發明人等，予以比較配設有如此之翼片9 3、. 9 4 .9 5之顯像處理裝置和不具有翼片之顯像處理裝置的所 會附著於基板G之霧氣量，其結果，確認配設有翼片9 3 、9 4 .、9 5之顯像處理裝置--方可減低所附.著之霧氣成 爲五分之一以下。 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐） ^ 7 _ 504734 A7 B7 態 形 施 實 他 其 之 明 發 本 .關 } 有 15明 { 兌明：：發& 本 所卜淨 3 卸 洗 2 〇 2fT ο 1 ο 0 1 部 1 地 rl· p Kl· ί/J •l·' Ly f v/丨 k· l^· 設之 配卸 1 裝 ο 可 1 成 物 2 狀.ο 杯 1 7NJ 俱 咅 外基 將於 ， 對 示以 所 Η· Q^w ， 圖.3 如 9 係片 態翼 形及 施 2 從可配 可得於 成使對 形 ， 。 能 3 3 就 ο 9 ， 一—_ 時部.翼 此卸之 如+ .裝 3 爲之 ο 成 3 1 構 9 部 i j丨 Ρ ^,η j ί 。 翼裝 者有於 開設設 分配配The substrate is finally inserted into the heating / heating portion 40 or the heating / cooling portion 41 facing the substrate, and is heated and dried by the third heat treatment (HP 3) (step S 1 7). Then, it is cooled by the fifth cooling treatment (COL 5) (step S 1 8). After all the above processing is completed (final), the Chinese paper standard (CNS) A4 (210X297 mm) will be applied from the above paper size. '-11-504734 Α7 Β7 V. Description of invention (9) 3 K arm The institution 3 4 borrows the 2nd and 1st main arm mechanisms 24 and 15 to provide the 1st auxiliary equipment arranged in the above-mentioned conveying section 11 (C / S) (please read the precautions on the back before filling in this Page) Arm mechanism 13 (step S19). The first auxiliary arm mechanism 13 is housed in the second cassette C 2 which is placed in the loading / unloading section 3. Figures 3 and 4 are shown in the above-mentioned development processing section (d EV) 3 8 3 is a structural view of a development processing apparatus, and FIG. 3 is a partial cross-sectional view of the development processing apparatus viewed from the front, and FIG. 4 is a plan view thereof. The central part of the development processing device 5 1 is equipped with a drive motor (motor) 5 ^ 2 to form a rotatable and lifting cylinder AW and 5 3 to a rotatable chuck E 3 4 0 which can be moved up and down 5 4 The upper surface is configured to be sucked by vacuum suction to ensure that the boshitu f-inch substrate G is horizontal. It is also inserted between the drive motor 5 2 and .rjTj.- lowering cylinder / rA- Γ, and 3 3 There is a ball bearing 5 5 〇 which is a stopper, that is, when the rotary chuck 5 4 is lowered by the lift cylinder / rA- same as 5 3, the lower part of the drive motor 5 2 will abut on the ball bearing 5 5 , So that the rotating chuck 54 cannot be lowered more than that. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs The rotating chuck 5 4 is provided with a lower (side) container 5 6 below. An outer cup 5 7 is arranged so as to surround the outer periphery of the rotating chuck 5 4. An inner cup 5 8 is arranged between the lower (side) container 56 and the outer cup 5 7. The outer cup 5 7 and the inner cup 5 8 are connected by a connecting member 5 9, and the outer cup 5 7 and the inner cup 5 8 are raised and lowered according to a command of the control unit 60. Cylinder 6 1 comes up and down. The upper part of the outer cup 5 7 and the inner cup 5 8 are arranged so that the Chinese national standard (CNS) A4 specification (2 丨 〇'〆297 mm) is applied in accordance with the paper size. 504734 A7 _ B7 _ V. Description of the invention () (Please read the precautions on the back before filling in this page) It will turn upwards and become narrow and lean toward the inside. This inclination is made, for example, at an angle of about 30 ° to the horizontal plane. With such a narrow angle to the horizontal plane, the exhaust effect can be enhanced. Teflon (polytetrafluoroethylene) was applied to the surfaces of the outer cups 5 7 and the inner cups 5 8. As a result, water resistance (water repellency) is improved, and the cup is prevented from becoming dirty (dirty). The diameter of the opening at the upper end of the outer cup 5 7 is larger than the diameter of the opening at the upper end of the inner cup 5 8, and the upper ends have a diameter of 3 mm to form a substrate G to maintain water. Drop the size to be contained in a cup. The lower container 5 6 is provided with: an inclined portion 6 2 that is inclined downward from the center to the outside; and a (receiving) tray 63 is provided. The bottom surface of the tray 6 3 is provided with a cylindrical vertical wall 64, which is interposed between the outer cup 5 7 and the inner cup 5 8. The inclined portion of the inner cup 58 extends beyond the upright wall 64 and extends around the outer wall of the upright wall 64. As a result, the fluid flowing through the inclined portion of the inner cup 58 is allowed to flow into the outer chamber 65 separated by the (uptake) wall 64 of the tray 63. Ι: The rear side of the inclined portion 6 2 of the blood container 56 is provided with a row for exhausting the cup. The air port 6 6 and the air outlet 6 6 are connected to an exhaust pump 6 7. '' The employee co-operative cooperative of the 1st Bureau of Wisdom and Finance of the Ministry of Economic Affairs has printed a drain hole 6 9 in the lower part of the inner chamber 6 8 separated by the upright wall 6 4 of the tray 6 3 and a drain port in the lower part of the outer chamber 6 5 7 0 .. As for the liquid discharge port 6 9, a regeneration processing mechanism 72 for regenerating the used developing solution is connected to the recovery pipe 7 1. The regeneration processing mechanism is composed of gas and liquid for gas (.body) liquid (body) separation (unpacking). The opening mechanism 7 3 and the debris removing mechanism for removing debris in the used imaging liquid 7 4 This paper size is in accordance with Chinese National Standard (CNS) A4 specification (210X297 mm) -13- A7 B7 Explanation (11)… Cheng Cheng, 丨:] · is connected to the developer storage tank 75. Excretion port 7 ◦It is connected to the secondary pottery I " 丨 receiving slot .. On the upper side of the cup-'side ', there is a developing solution discharge mechanism 8 1 for discharging the developing solution to the surface of the substrate G. The other side is provided with a cleaning mechanism 8 2 for discharging the washing liquid onto the surface of the substrate G. As shown in FIG. 4, a transport rail 8 3, 8 4 is disposed in front of and behind the upper part of the cup, and a transport motor 8 5 is mounted on the image liquid ejection mechanism 81, and is controlled by the control unit 60. — ^, The conveying motor 8.5 is driven so that the developing liquid ejector _ 8 1 can be conveyed to the upper part of the cup along the conveying rail 8 3, 8 4. The developing solution discharge mechanism 81 can supply the developing solution from the developing solution storage tank 75 through the pump 85 under the control of the control unit 60. In addition, a plurality of developing solution discharge nozzles 8 6 are attached to the developing solution discharge mechanism 81 to a holding rod (not shown) arranged in the direction of water 1Λ Λ. The cleaning mechanism 82 can supply a flushing liquid (for example, pure water) from the flushing (washing) liquid tank 8 8 by the pump 8 7 under the control of the control section 60. The washing mechanism 8 2 is shown in FIG. 4, and has a support arm 9 1 that is connected to the rotation driving portion 8 9 and can be rotated around the base end portion 90 as a center, and is supported on the support. The arm 9 1 .-end of the flushing fluid nozzle 9 2. The support arm 91 is controlled by the control part 60 to drive the rotation driving part 8 9 so that the base end part 90 is rotated so that the flushing (cleaning) liquid discharge nozzle 92 is located on the human body corresponding to the substrate The center part of G is to discharge the irrigating liquid from the irrigating liquid discharge nozzle 92. On the inner wall of the outer cup 5 7, a bow is provided as a guide. The atmosphere (atmosphere) scattered by the centrifugal force of the rotating substrate G to the outer cup 5 7 is in accordance with Chinese paper standards ( CNS) A4 size (210 X297 mm) (Please read the notes on the back before filling out this page) Xinzhuang. Order printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 504734 A7 B7 V. Description of the invention (12) (please first (Please read the notes on the back and fill in this page.) The blades for the first guide 9 3 of the wall. The wings 9 3 are shown in FIG. 5, along the inner periphery of the outer cup 5 1 7, for example: 1 3 3 cents are arranged at equal intervals 丨 each wing j 9 3 is determined for the side tilt The angle is 0, for example, p p ~ 6 0, and the imagination is about 4 5. Therefore, when the substrate G visits the direction of the arrow mark ① of 5 屮, the arrow mark ② in FIG. 5 will be generated. ② // The airflow toward the inner wall below is shown, so that the surrounding atmosphere (atmosphere) faces outward. The cup 57 is guided under the inner wall. The fins 93 are made of, for example, SUS (stainless steel), or are coated with Teflon to prevent lh fog from adhering. The writer, of course, can also use the wings 9 3 made of resin material. '' Similarly, the inner wall of the inner cup 5 8 is also provided with a third guide member for guiding the atmosphere scattered by the centrifugal force of the rotating substrate G into the inner cup 5 8. Wings 9 4. Even the fin i4 is configured, for example, in the same manner as the fin 93 described above. As shown in FIG. 6, in the portion of the outer cup 5 7 and the inner cup 5 8, wings 9 5 are fixed to the standing wall 6 4 so as to cross the lower side and the inner cup of the outer cup 5 7.物 5 8 Lower side. The fin 95 is also the same as the above-mentioned fin 9 3, 9. 4. For the vertical direction to form a predetermined angle Θ, it is printed by the consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, for example, about 30 ° ~ 60 °, and more preferably Form .4 around 5 °. As a result, as shown by the arrow mark ① in FIG. 6, the atmosphere (atmosphere) guided by the wings 9 3 from the outside. The cup 5 7 is guided from the upper part to the lower part. The inner side of the inner cup 5 8 is guided to the exhaust port β fi .Ι, ί. As shown by the arrow mark ② in FIG. 6, '由 翼. 片 9 4 from the inner cup 5 8 .. .t The atmosphere guided to the lower part will also use the Chinese paper standard (CNS) A4 size (210X297 mm) by wing. 504734 A7 B7 V. Description of the invention (13) (please first Read the notes on the back and fill in this page) 9 5 Guide the inside of the flat cup 5 8, that is, guide to the exhaust port. The fin blade 95 is also the same as described above, for example, it is formed of SUS or the like, or J) l Teflon coating is used to prevent the adhesion of the mist. Next, the operation of the imaging processing device 51 that constitutes such a display will be described. The substrate G held by the rotating chuck 54 is lowered into the development processing device 51, and the outer cup 5 7 and the inner cup 5 8 are raised to the highest level as shown in FIG. 7. The 'position' developing liquid discharge mechanism 8 1 is conveyed until it is approximately at the center of the substrate G and is held still. Then, the substrate G held by the rotating chuck 5 4 is rotated, and the developing solution discharge nozzle 86 of the developing solution discharge mechanism 81 is used to discharge the developing solution to the substrate G. Furthermore, the imaging liquid scattered from the outer periphery of the raspberry board G will collide with the inner side of the inner cup 5 8 and be recovered by the exhaust gas □ 6 9 ′ and reused. At this time, the "fog (gas) generated in the inner cup. 5 8" will be printed by the wings 94, 9 5 to be printed by the employee's consumer cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. ½: The inner cup 5 8 The inner side is guided to the exhaust port 6 6. This prevents the above-mentioned mist from adhering to the substrate G. At this time, if it is controlled to increase the exhaust pressure of the pump 67, the mist can be exhausted (discharged) very effectively. It is desirable that the number of revolutions of the rotary chuck 54 during the supply of the developing solution is slower than that of the rotary chuck 54 during the flushing process described later. When the developer is supplied with a lot of mist (gas), this condition can be suppressed very effectively. Next, as shown in Figure 8, the glass substrate held by the rotating chuck (: ;. The outer cups 5 7 and the inner cups 5 8 are lowered to the lowest position, and the glass substrate g held by the rotating chuck 54 is formed to be stationary. This paper applies Chinese national standards (CNS) A4 specification (210X297 mm factory ~ " 504734 A7 B7 V. Description of the invention (14), and rotate to form a washing machine. Structure 8 2 support Lu 9 1 'to order flushing (please read the precautions on the back before (Fill in this page) The liquid leaf outlet nozzle 92 is located at a substantially central portion of the substrate G. Then, the substrate G held by the rotary chuck 54 is rotated, and the nozzle 92 is ejected from the rinse liquid, and the substrate G is supplied with a rinse liquid ( Pure water). At this time, the rinsing liquid scattered from the outer periphery of the substrate G will pass between the inner cup 5 8 and the outer cup 5 7 and discard the 'father in the outer cup' through the drain port 70. The fog generated in 5 7 will be guided to the inner cup 5 8. By the wings 9 3, 9 5, also Guided to the exhaust Π 6 6. Ίΐ and can prevent the above-mentioned fog: U .: Attached 6 to the fascia G. 1K '.. When the supply of the washing liquid is completed; the support arm 9 1 will be removed from the substrate G Approximately 1: ¾ turn the center in the opposite direction to the above to make the rinse funnel discharge tube corner 9 2 be carried out of the cup. The substrate G held by the rotating chuck 5 4 is rotated at high speed to perform Shake off and dry. As for the fog generated in the outer cup 5 7, the wings 9 3, 9 5 are also used to guide the inner cup 5 8 to the printed side of the employee's consumer cooperative in the Intellectual Property Bureau of the Ministry of Economic Affairs. That is, it is guided to the exhaust port 66. As a result, the above-mentioned mist (gas) can be prevented from adhering to the substrate G. This embodiment 'especially uses a fin to constitute a guide, and it is called "w" when it is dry. It can effectively prevent the adhesion of mist. Because the substrate G is rotated at a high speed, the guiding effect of the wings 93 and 95 can be enhanced. The inventors and others have compared and equipped such wings. 9 3 .. 9 4 .9 5 and the amount of mist that would be attached to the substrate G of the image processing device and the image processing device without a fin, As a result, it was confirmed that the imaging processing devices equipped with wings 9 3, 9 4., 9 5 can reduce the attached fog to less than one-fifth. This paper size applies the Chinese National Standard (CNS) A4 specifications (210 X 297 mm) ^ 7 _ 504734 A7 B7 State of implementation of other forms of hair. Guan} There are 15 clear {明明 ：： 发 ∓ the firm ’s clean 3 unwashing 2 〇2fT ο 1 ο 0 1 part 1 land rl · p Kl · ί / J • l · 'Ly fv / 丨 k · l ^ · Let's install and unload 1 pack ο can 1 product 2 shape. Ο cup 1 7NJ 咅 咅 外 基As shown in the figure, Q 示 w is shown in Fig. 3. As the 9-piece sheet wing shape and Shi 2 are available, they can be obtained in pairs. Can 3 3 be ο 9, a — _ time part. The wing is unloaded as +. Install 3 for it ο into 3 1 structure 9 parts i j 丨 Ρ ^, η j ί. Wing installers have
態 狀 之 樣 同 爲 成 構 可 也 物 狀 5 {1 內 之 件 a： '/ 3 V7 /1 /LZ 另 之 明 發 本.圖 關如 有係 明態 說形 ， 施 次實 其本 示 所 態 形 施 實 第 將 si口 分 r-H 一—Η 件 (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 成具有相 妝構成各 此時， μ/荇易地 側杯狀物 其次 . 本實 朝向被保 供應沖洗 背面沖洗 嘴1 2 2 i:中冼液之 •用設備之 其次 於 鄰之複數翼片9 3·之複數部件（block ) 1 1 3 ’ 部件能與外側杯狀物1 1 2裝卸者。當構成爲如 從外側杯狀物1 1 2卸下配設有翼片9 3 ，使得 進行洗淨各翼片9 3。對於配設有第3導件之內 ，也可構成爲同樣之狀態。 ，說明有關本發明又另-實施形態。 施形態係如圖1 1所示，具有例如在沖洗時，可 持於旋轉夾盤之基板G背面供應沖洗液之同時， 液於.翼片9 3、9 5之背面沖洗機構1 2 1者。 機構1 2 1具備有要吐出沖洗液之沖洗液吐出管 之同時，具有轉動沖洗液吐出管嘴1 2 2來改變 吐出方向的轉動機構者。由而’並不需要配備專 下，可進行洗淨翼片9 3、9 5。 ，說明有關本發明之再另一實施形態。 述實施形態，雖說明了在供應顯像液時，就上升 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 訂 504734 A7 B7 五、發明说明（16) (請先閲讀背面之注意事項再填寫本頁) 則杯‘狀物5 7及內側杯狀物5 8至最高位置，而由內側 杯狀物5 8來回收.顯像液，而_後’在沖洗時’就下降外側 杯狀物5 7及內側杯狀物I 5 8至最低位置’而由外個J杯狀 牧i 5 7來回收沖洗液者，亦即以各別之系統來回收顯像液 和沖洗液，使得僅將顯像液再力口以利用者，但在本實施形 態，將以圖7所示之狀態’則以上升外側杯狀物5 7及內 側杯狀物5 8.至最齋位_5：丨丨大態來進行供J1顯像液及沖洗 v _抓：丨U兄，擬山內側杯狀物58來回收顯像液反沖洗液 雙方者。由而，外側杯狀物5 7可經常位於基.板G上方之 區域，使得能由外側杯狀物5 7有效果地去除飛翔於基板 G上方區域的霧氣^ 經濟部智慧財產局員工消費合作社印製 又如此之霧氣的飛翔乃依存於旋轉夾盤5 4之轉數， 因而，也可構成爲因應於旋轉夾盤· 5 4之轉數來升降外側 杯狀物5 7及內側杯狀物5 8。亦即’在甩開顯像液及沖 洗液時，旋轉夾盤5 4會形成低速旋轉，該時予以降下外 側杯狀物5 7及內側杯狀物5 8至最低位置，而由外側杯 狀物5 7來進行回收液體-另一方面，在於除了上述之外 時，旋轉夾盤5 4會形成高速旋轉，該時就上升外側杯狀_ 物5 7及內側杯狀物5 8至最高位置，以內側杯狀物5 8 來l· |]收大部分之霧氣，並由外側杯狀物5 7來進行回收所 飛翔之霧氣。 再者，本發明並非僅限定於上述之實施形態而己。 例如圖1 2所示，也可配設從外側杯狀物.5 7之傾斜 面頂部朝下方表面吐出洗淨液之洗淨液吐出管嘴1 5 1。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 504734 A7 B7 五、發明説明（17 ) l|/|J ’形成爲11丨去除杯狀物所受到之藥液的污染。再者， 對於內側杯狀物5 .8 ，也可構成爲同樣之結構。 (請先閲讀背面之注意事項再填寫本頁) 父如圖1 3所示，也可構成爲介居絕緣材料57c ， 例如樹脂材料於外側杯狀物5 7之上部5 7 a和下部 5 T b之叫，並配匿離子放電裝置1 5 2於其附近。由而 ’ /ι:外側杯狀物57之上部573會帶有靜電，使得可由 該靜電來附著霧氣至外側杯狀物5 7並加以回收。再者， 對於內側杯狀物5 8，也可構成爲同樣之結構。 再者，外側杯狀物5 7及內側杯狀物5 8 .之構造也可 構成爲如1 4所示，則傾斜部1 5 3構成爲弧狀。由而， 杯狀物之高度即使構成爲較低，也不會失去回收霧氣等之 能力，使得Π丨意圖杯狀物之小型化。 又h述實施形態，雖適用本發明於要對於玻璃基板進 ir‘顯像處埋的顯像處埋裝置，但也可適用本發明於例如轉 動玻璃基板之同時，進行洗淨等之其他裝置。再者，本發 明之處理對象並非僅爲玻璃基板而已，當然也可適用於半 導體晶圓等之其他基板。 經濟部智慧財產局員工消費合作社印製 如以上所說明’依據本發明，可防止產生在杯狀物內. 所飛散之霧氣再附著於基板之情事。 ,ί圖式之簡單說明：] 圖1係顯帀有關本發叨之·實施形態的塗佈顯像處理 系統之+.屮圖· ： _ . 圖2係顯不圖1所不之塗佈顯像處理系統的處理步驟 本紙張尺度適用中國國家標準（CNS ) A4規格（210x297公楚；） 20- Α7 Β7 五、發明説明（18) 之流程圖。 瞻I 3係有關本發明之一實施形態的顯像處理裝置之正 (請先閲讀背面之注意事項再填寫本頁) 丨丨丨丨1!刹、 I晨I 4係圖3所示之顯像處理裝置的平面圖。 丨_ 5係_l 3 Mi 之顯像處埋裝置的部分放大斜視（立 ;(其中之1) ° 丨_ 6係圖3所不之顯像處理裝置的部分放大斜視圖（ 其中之2.)。 .. _ 7係用於說明圖3所示之顯像處理裝置的動作用之 槪略止:面圖（其中之1 ) 。· _ 8係用於說明圖3所示之顯像處理裝置的動作用之 槪略正面議（其中之2 ). 圖9係有關本發明之其他實施形態的顯像處理裝置之 槪略正面圖。 _ 1 0係有關本發明之另-·實施形態的顯像處理裝置 .-概略 i k ιΐ[Μ·Ι。 經濟部智慧財產局員工消費合作社印製 圖1 1係有關本發明之再另一實施形態的顯像處理裝 置之槪略正面圖。 圖1 2係顯示本發明之杯狀物的其他結構例之圖。 圖1 3係顯示本發明之杯狀物的另一結構例之圖。 圖1 4係顯示本發明之杯狀物的再另一結構例之圖。 1符號.之說明. 5 1 顯像處理裝置· 本紙張尺度適用中國國家標準（CNS ) Α4規格（210 X 297公釐） -21 - 經濟部智¾財產局員工消費合作社印製 504734 A7 _ B7 五、發明説明（19 ) 5 4 :旋轉夾盤 5 7 :外側杯狀物. 5 8 :內側杯狀物 6 6 :排氣口 6 7 :排氣泵 . 6 9 :排液I] 7〇：排洩口 8 1 :顯像液吐出機構 8 2 :洗淨機構 9 3 :翼片（第1導件）· 9 4 :翼片（第3導件） 9 5 :翼片（第2導件） 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐） (請先閲讀背面之注意事項再填寫本頁)The state of the state is the same as the structure, but also the state 5 {1 in a: '/ 3 V7 / 1 / LZ In addition to the Mingfa version. If there is a clear state in the picture, the implementation of this is shown The actual state of implementation will be divided into si mouth and rH—a piece (please read the precautions on the back before filling out this page). The employee's consumer cooperative of the Intellectual Property Bureau of the Ministry of Economy is printed with a makeup composition. At this time, μ / 荇The exoside cup is second. The real side is supplied with the flushing back flushing nozzle 1 2 2 i: the middle of the liquid • the equipment is used next to the neighboring plural fins 9 3 · the plural parts (block) 1 1 3 'Parts can be attached to the outer cup 1 1 2. When the configuration is such that the fins 9 3 are detached from the outer cup 1 1 2, the fins 9 3 are washed. The same configuration can be adopted for the inside provided with the third guide. Describes another embodiment of the present invention. The application form is shown in FIG. 11. For example, during the flushing process, it can be held on the back surface of the substrate G of the rotating chuck while supplying the flushing liquid. . The mechanism 1 2 1 is provided with a flushing liquid discharge pipe to discharge the flushing liquid, and a rotating mechanism for rotating the flushing liquid discharge nozzle 1 2 2 to change the discharge direction. Therefore, ‘does not need to be equipped with special staff, but can clean the flaps 9 3, 9 5. A description will be given of still another embodiment of the present invention. Although the description of the embodiment shows that when the developer is supplied, the paper size will be raised to apply the Chinese National Standard (CNS) A4 (210X297 mm). 504734 A7 B7 V. Description of the invention (16) (Please read the back Note: Please fill in this page again) Then the cups 5 7 and the inner cups 5 8 reach the highest position, and the inner cups 5 8 will be recovered. The imaging liquid, and _ will be lowered 'after washing'. The outer cup 5 7 and the inner cup I 5 8 are at the lowest position, and those who recover the washing liquid from the outer cup 5 5 are used to recover the developing solution and the washing liquid by separate systems. So that only the developer is reapplied to the user, but in this embodiment, the outer cup 5 7 and the inner cup 5 8 will be raised in the state shown in FIG. 7 to the highest position. _5: 丨 丨 General for the J1 imaging solution and flushing v _ Grab: 丨 U brother, the person inside the cup 58 to recover the imaging solution backwashing solution. Therefore, the outer cup 5 7 can often be located in the area above the base plate G, so that the outer cup 5 7 can effectively remove the mist flying over the area above the substrate G. ^ Consumer Consumption Cooperative of Intellectual Property Bureau, Ministry of Economic Affairs The printing of such a mist depends on the number of revolutions of the rotating chuck 54, so it can also be configured to raise and lower the outer cup 57 and the inner cup according to the number of rotations of the rotating chuck 54 5 8. That is, when the developing liquid and the flushing liquid are thrown off, the rotating chuck 54 will rotate at a low speed. At this time, the outer cup 5 7 and the inner cup 5 8 are lowered to the lowest position, and the outer cup 5 Object 5 7 for liquid recovery-On the other hand, in addition to the above, the rotating chuck 5 4 will rotate at a high speed, and then the outer cup_ 7 and inner cup 5 8 will be raised to the highest position. The inner cup 5 8 is used to collect most of the mist, and the outer cup 5 7 is used to recover the flying mist. The present invention is not limited to the embodiments described above. For example, as shown in FIG. 12, a cleaning liquid discharge nozzle 1 5 1 that discharges the cleaning liquid from the inclined surface of the outer cup 5. 7 to the lower surface may also be provided. This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 504734 A7 B7 V. Description of the invention (17) l | / | J '11 is formed to remove the contamination of the medicinal solution from the cup. In addition, the inner cup 5.8 may be configured in the same manner. (Please read the precautions on the back before filling in this page.) As shown in Figure 13, the parent can also be constituted as an insulating material 57c, such as a resin material on the outer cup 5 7 on the upper part 5 7 a and the lower part 5 T It is called b, and is equipped with an ion discharge device 1 5 2 near it. Therefore, the upper part 573 of the outer cup 57 is charged with static electricity, so that the static electricity can attach the mist to the outer cup 57 and recover it. In addition, the inner cup 5 8 may be configured in the same manner. Furthermore, the structures of the outer cup 57 and the inner cup 5 8. May be configured as shown in FIG. 14, and the inclined portion 1 5 3 may be formed in an arc shape. Therefore, even if the height of the cup is configured to be low, the ability to recover mist and the like will not be lost, so that the miniaturization of the cup is intended. The embodiment is also described. Although the present invention is applied to a developing device for burying a glass substrate into an ir 'developing place, the invention can also be applied to other devices such as cleaning while rotating the glass substrate. . Furthermore, the object of the present invention is not only a glass substrate, but it can also be applied to other substrates such as semiconductor wafers. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs As explained above, according to the present invention, it is possible to prevent the generated mist from re-adhering to the substrate. Brief description of the drawings:] Figure 1 shows the coating development processing system of the present invention and the embodiment of the coating. +. Figures: _. Figure 2 shows the coating not shown in Figure 1. Processing steps of the development processing system This paper size applies to the Chinese National Standard (CNS) A4 specification (210x297); 20- Α7 Β7 V. Flowchart of the description of the invention (18). See I 3 is about the development processing device of one embodiment of the present invention (please read the precautions on the back before filling out this page) 丨 丨 丨 1! Brake, I morning I 4 is the display shown in Figure 3 A plan view of an image processing device.丨 _ 5 Series_l Partially enlarged oblique view of the 3 Mi imaging device (standing; (one of them) ° 丨 _ 6 is a partially enlarged oblique view of the imaging processing device not shown in Figure 3 (of which 2. ) .. _ 7 is used to explain the operation of the development processing device shown in FIG. 3 and is only used for illustration: a surface view (1 of them). _ 8 is used to describe the development processing shown in FIG. 3 The outline of the operation of the device is discussed in front (No. 2). Fig. 9 is a schematic front view of a development processing device related to another embodiment of the present invention. _ 1 0 is related to another-· embodiment of the present invention. Development processing device.- Outline ik ιΐ [Μ · Ι. Printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs. Figure 11 is a schematic front view of a development processing device according to still another embodiment of the present invention. Figure 1 2 is a diagram showing another structural example of the cup of the present invention. FIG. 1 is a diagram showing another structural example of the cup of the present invention. FIG. 1 is a diagram showing another cup of the present invention. A diagram of a structural example. 1 Symbol. Explanation. 5 1 Development processing device · This paper size is in accordance with China National Standard (CNS) Α4 specification (210 X 297 mm) -21-Printed by the Intellectual Property Agency of the Ministry of Economic Affairs and the Consumer Cooperative of the Property Bureau 504734 A7 _ B7 V. Description of the invention (19) 5 4: Rotating chuck 5 7: Outer cup. 5 8: Inner cup 6 6: Exhaust port 6 7: Exhaust pump. 6 9: Drain I] 70: Drain port 8 1: Development liquid discharge mechanism 8 2: Washing mechanism 9 3: Wing (first guide) · 9 4: Wings (No. 3) 9 5: Wings (No. 2) This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) (Please read the notes on the back first (Fill in this page again)