TW436491B - Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions - Google Patents

Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions Download PDF

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Publication number
TW436491B
TW436491B TW086114260A TW86114260A TW436491B TW 436491 B TW436491 B TW 436491B TW 086114260 A TW086114260 A TW 086114260A TW 86114260 A TW86114260 A TW 86114260A TW 436491 B TW436491 B TW 436491B
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TW
Taiwan
Prior art keywords
alkyl
formula
base
benzyl
compound
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TW086114260A
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English (en)
Chinese (zh)
Inventor
Jean-Luc Birbaum
Martin Kunz
Akira Kimura
Hisatoshi Kura
Hidetaka Oka
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Ciba Sc Holding Ag
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Publication of TW436491B publication Critical patent/TW436491B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Epoxy Resins (AREA)
  • Catalysts (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Paints Or Removers (AREA)
TW086114260A 1997-08-22 1997-09-27 Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions TW436491B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP97810593 1997-08-22

Publications (1)

Publication Number Publication Date
TW436491B true TW436491B (en) 2001-05-28

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW086114260A TW436491B (en) 1997-08-22 1997-09-27 Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions

Country Status (13)

Country Link
US (1) US6057380A (ko)
JP (1) JP3250072B2 (ko)
KR (1) KR100264256B1 (ko)
CN (1) CN1086399C (ko)
AT (1) ATE194872T1 (ko)
AU (1) AU750819B2 (ko)
BR (1) BR9706264A (ko)
CA (1) CA2224441C (ko)
DE (1) DE69702605T2 (ko)
RU (1) RU2210798C2 (ko)
SG (1) SG63787A1 (ko)
TW (1) TW436491B (ko)
ZA (1) ZA9710985B (ko)

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JP6105858B2 (ja) * 2012-05-17 2017-03-29 太陽インキ製造株式会社 パターン形成方法、アルカリ現像型の熱硬化性樹脂組成物、及びプリント配線板
KR102073440B1 (ko) * 2012-05-17 2020-02-04 다이요 잉키 세이조 가부시키가이샤 알칼리 현상형의 열경화성 수지 조성물, 프린트 배선판
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JP6306296B2 (ja) * 2013-07-09 2018-04-04 太陽インキ製造株式会社 感光性熱硬化性樹脂組成物およびフレキシブルプリント配線板
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CN104371389A (zh) * 2014-11-17 2015-02-25 青岛厚科信息工程有限公司 一种含有新型光引发剂的涂料
CN104449373A (zh) * 2014-11-17 2015-03-25 青岛厚科信息工程有限公司 一种转化形油漆
CN104403563A (zh) * 2014-11-24 2015-03-11 青岛市市南区隆德中医药研究所 一种保光性好的涂料
JP6520134B2 (ja) * 2015-01-16 2019-05-29 セメダイン株式会社 光硬化性組成物
BR112017023446A2 (pt) * 2015-04-29 2018-07-31 3M Innovative Properties Co método para a fabricação de uma rede polimérica a partir de um politiol e um poliepóxido
CA3042861A1 (en) * 2016-11-03 2018-05-11 3M Innovative Properties Company Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods
EP3535341A1 (en) 2016-11-03 2019-09-11 3M Innovative Properties Company Polythiol sealant compositions
WO2018085546A1 (en) 2016-11-03 2018-05-11 3M Innovative Properties Company Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition
TWI774931B (zh) 2018-03-02 2022-08-21 日商日本化藥股份有限公司 新穎化合物、含有該化合物的光聚合起始劑及含有該光聚合起始劑的感光性樹脂組成物
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CN112752803A (zh) 2018-09-27 2021-05-04 3M创新有限公司 包含氨基官能硅烷的组合物以及将密封剂施用到基材的方法
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Publication number Priority date Publication date Assignee Title
TWI620018B (zh) * 2012-05-17 2018-04-01 Taiyo Ink Mfg Co Ltd 鹼顯影型之熱硬化性樹脂組成物、印刷配線板

Also Published As

Publication number Publication date
JPH1171450A (ja) 1999-03-16
US6057380A (en) 2000-05-02
BR9706264A (pt) 1999-07-27
KR19990022661A (ko) 1999-03-25
CN1209442A (zh) 1999-03-03
CA2224441A1 (en) 1999-02-22
RU2210798C2 (ru) 2003-08-20
JP3250072B2 (ja) 2002-01-28
DE69702605T2 (de) 2001-03-29
AU4765897A (en) 1999-03-04
DE69702605D1 (de) 2000-08-24
AU750819B2 (en) 2002-07-25
CN1086399C (zh) 2002-06-19
KR100264256B1 (ko) 2000-09-01
ZA9710985B (en) 1999-02-22
CA2224441C (en) 2003-01-21
ATE194872T1 (de) 2000-08-15
SG63787A1 (en) 1999-03-30

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