TW436491B - Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions - Google Patents
Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions Download PDFInfo
- Publication number
- TW436491B TW436491B TW086114260A TW86114260A TW436491B TW 436491 B TW436491 B TW 436491B TW 086114260 A TW086114260 A TW 086114260A TW 86114260 A TW86114260 A TW 86114260A TW 436491 B TW436491 B TW 436491B
- Authority
- TW
- Taiwan
- Prior art keywords
- alkyl
- formula
- base
- benzyl
- compound
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Epoxy Resins (AREA)
- Catalysts (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP97810593 | 1997-08-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW436491B true TW436491B (en) | 2001-05-28 |
Family
ID=8230353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086114260A TW436491B (en) | 1997-08-22 | 1997-09-27 | Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions |
Country Status (13)
Country | Link |
---|---|
US (1) | US6057380A (ko) |
JP (1) | JP3250072B2 (ko) |
KR (1) | KR100264256B1 (ko) |
CN (1) | CN1086399C (ko) |
AT (1) | ATE194872T1 (ko) |
AU (1) | AU750819B2 (ko) |
BR (1) | BR9706264A (ko) |
CA (1) | CA2224441C (ko) |
DE (1) | DE69702605T2 (ko) |
RU (1) | RU2210798C2 (ko) |
SG (1) | SG63787A1 (ko) |
TW (1) | TW436491B (ko) |
ZA (1) | ZA9710985B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI620018B (zh) * | 2012-05-17 | 2018-04-01 | Taiyo Ink Mfg Co Ltd | 鹼顯影型之熱硬化性樹脂組成物、印刷配線板 |
Families Citing this family (51)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002523393A (ja) | 1998-08-21 | 2002-07-30 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 光活性化が可能な窒素含有塩基 |
JP2002544205A (ja) * | 1999-05-10 | 2002-12-24 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | 新規な光開始剤及びその応用 |
SG97168A1 (en) * | 1999-12-15 | 2003-07-18 | Ciba Sc Holding Ag | Photosensitive resin composition |
DE10018918C2 (de) * | 2000-04-17 | 2002-07-18 | 3M Espe Ag | Katalysatorkomponente |
AU6032501A (en) * | 2000-05-26 | 2001-12-11 | Akzo Nobel Nv | Photoactivatable coating composition |
DE10237950A1 (de) * | 2002-08-20 | 2004-03-11 | Tesa Ag | UV-initiiert thermisch vernetzte Acrylathaftklebemassen |
JP2005208562A (ja) * | 2003-12-25 | 2005-08-04 | Kansai Paint Co Ltd | 光導波路の形成方法及びその方法により得られた光導波路 |
JP4843955B2 (ja) * | 2004-02-16 | 2011-12-21 | 三菱瓦斯化学株式会社 | 光塩基発生剤 |
KR100590881B1 (ko) * | 2004-05-14 | 2006-06-19 | 삼성전자주식회사 | 광경화성 수지 조성물 및 그의 패터닝 방법 |
AU2006290828A1 (en) * | 2005-09-15 | 2007-03-22 | Basf Se | Coating compositions comprising a latent activator for marking substrates |
US7914641B2 (en) * | 2005-10-03 | 2011-03-29 | Mitsui Chemicals, Inc. | Sealing material for flat panel display |
WO2007111092A1 (ja) | 2006-03-24 | 2007-10-04 | Konica Minolta Medical & Graphic, Inc. | 透明バリア性シートおよび透明バリア性シートの製造方法 |
US7910768B2 (en) * | 2006-05-17 | 2011-03-22 | American Dye Source, Inc. | Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
JP5727135B2 (ja) | 2006-06-09 | 2015-06-03 | デンツプライ インターナショナル インコーポレーテッド | 光重合性組成物 |
CN101522745B (zh) * | 2006-09-29 | 2013-06-19 | 西巴控股有限公司 | 以封闭异氰酸酯为基础的体系的光潜碱 |
JP5339907B2 (ja) * | 2007-06-14 | 2013-11-13 | 積水化学工業株式会社 | 光硬化型粘接着剤組成物 |
JP5581208B2 (ja) * | 2007-07-18 | 2014-08-27 | データレース リミテッド | レーザー感受性被覆配合物 |
ATE527327T1 (de) * | 2007-07-18 | 2011-10-15 | Datalase Ltd | Beschichtungszusammensetzungen |
TWI409280B (zh) * | 2007-07-31 | 2013-09-21 | American Dye Source Inc | 聚合物染料、塗覆層組合物及熱微影印刷板 |
CN101925616A (zh) * | 2008-01-28 | 2010-12-22 | 巴斯夫欧洲公司 | 用于氧化还原固化可自由基固化的配制剂的光潜脒碱 |
RU2011120235A (ru) | 2008-10-23 | 2012-11-27 | Дейталейз Лимитед | Теплопоглощающие добавки |
US9267042B2 (en) | 2008-10-27 | 2016-02-23 | Datalase Ltd. | Coating composition for marking substrates |
CN102232065B (zh) | 2008-12-02 | 2014-11-05 | 和光纯药工业株式会社 | 光产碱剂 |
EP2428199A1 (en) | 2010-09-09 | 2012-03-14 | 3M Innovative Properties Company | Curable composition, process of production and use thereof |
EP2638077B1 (en) * | 2010-11-12 | 2015-01-07 | Coloplast A/S | Novel polymeric photoinitiators |
JP6036703B2 (ja) | 2011-12-16 | 2016-11-30 | 株式会社スリーボンド | 硬化性樹脂組成物 |
DE102012205951B4 (de) * | 2012-04-12 | 2016-09-01 | Chemetall Gmbh | Dichtmassen-System, ungehärtete Grundmasse und Mischung, Härter, Verfahren zum Beschichten eines Substrates und Verwendung eines Dichtmassen-Systems |
JP5949123B2 (ja) * | 2012-05-11 | 2016-07-06 | 住友化学株式会社 | 偏光板 |
JP6105858B2 (ja) * | 2012-05-17 | 2017-03-29 | 太陽インキ製造株式会社 | パターン形成方法、アルカリ現像型の熱硬化性樹脂組成物、及びプリント配線板 |
KR102073440B1 (ko) * | 2012-05-17 | 2020-02-04 | 다이요 잉키 세이조 가부시키가이샤 | 알칼리 현상형의 열경화성 수지 조성물, 프린트 배선판 |
CN102660190A (zh) * | 2012-05-23 | 2012-09-12 | 江苏海田技术有限公司 | 一种uv印铁底油 |
JP6306296B2 (ja) * | 2013-07-09 | 2018-04-04 | 太陽インキ製造株式会社 | 感光性熱硬化性樹脂組成物およびフレキシブルプリント配線板 |
US20160152783A1 (en) | 2013-07-18 | 2016-06-02 | Cemedine Co., Ltd. | Photocurable composition |
JP2015043793A (ja) * | 2013-08-27 | 2015-03-12 | ディーダブルエス エス・アール・エル | 人工歯の製造方法 |
CN105829485B (zh) | 2013-12-13 | 2018-10-12 | 思美定株式会社 | 具有粘合性的光固化性组合物 |
EP3176153B1 (en) * | 2014-08-01 | 2020-04-08 | Adeka Corporation | Novel polymerization initiator and radically polymerizable composition containing same |
CN104371518A (zh) * | 2014-11-13 | 2015-02-25 | 青岛厚科信息工程有限公司 | 一种耐候性好的涂料 |
CN104371389A (zh) * | 2014-11-17 | 2015-02-25 | 青岛厚科信息工程有限公司 | 一种含有新型光引发剂的涂料 |
CN104449373A (zh) * | 2014-11-17 | 2015-03-25 | 青岛厚科信息工程有限公司 | 一种转化形油漆 |
CN104403563A (zh) * | 2014-11-24 | 2015-03-11 | 青岛市市南区隆德中医药研究所 | 一种保光性好的涂料 |
JP6520134B2 (ja) * | 2015-01-16 | 2019-05-29 | セメダイン株式会社 | 光硬化性組成物 |
BR112017023446A2 (pt) * | 2015-04-29 | 2018-07-31 | 3M Innovative Properties Co | método para a fabricação de uma rede polimérica a partir de um politiol e um poliepóxido |
CA3042861A1 (en) * | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Compositions including a photolatent amine, camphorquinone, and a coumarin and related methods |
EP3535341A1 (en) | 2016-11-03 | 2019-09-11 | 3M Innovative Properties Company | Polythiol sealant compositions |
WO2018085546A1 (en) | 2016-11-03 | 2018-05-11 | 3M Innovative Properties Company | Composition including a polythiol, a polyepoxide, a photolatent base, and an amine and methods relating to the composition |
TWI774931B (zh) | 2018-03-02 | 2022-08-21 | 日商日本化藥股份有限公司 | 新穎化合物、含有該化合物的光聚合起始劑及含有該光聚合起始劑的感光性樹脂組成物 |
US11286400B2 (en) | 2018-07-12 | 2022-03-29 | Ppg Industries Ohio, Inc. | Curable compositions containing reactive functional compounds and polysiloxane resins, articles of manufacture and coated articles prepared therefrom, and a method of mitigating dirt build-up on a substrate |
CN112752803A (zh) | 2018-09-27 | 2021-05-04 | 3M创新有限公司 | 包含氨基官能硅烷的组合物以及将密封剂施用到基材的方法 |
WO2020202076A1 (en) | 2019-04-04 | 2020-10-08 | 3M Innovative Properties Company | Method of irradiating a composition through a substrate |
CN110105799B (zh) | 2019-05-07 | 2021-10-01 | 广东华润涂料有限公司 | 木器用涂料组合物以及由其制成的木制品 |
WO2024053609A1 (ja) * | 2022-09-05 | 2024-03-14 | 株式会社日本触媒 | アルカリ可溶性樹脂及びその製造方法、感光性樹脂組成物、硬化物、表示装置用部材、及び、表示装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0088050B1 (de) * | 1982-02-26 | 1986-09-03 | Ciba-Geigy Ag | Photohärtbare gefärbte Massen |
DE3471486D1 (de) * | 1983-08-15 | 1988-06-30 | Ciba Geigy Ag | Photocurable compositions |
ES2054861T3 (es) * | 1987-03-26 | 1994-08-16 | Ciba Geigy Ag | Nuevas alfa-aminoacetofenonas como fotoiniciadores. |
JPH0717737B2 (ja) * | 1987-11-30 | 1995-03-01 | 太陽インキ製造株式会社 | 感光性熱硬化性樹脂組成物及びソルダーレジストパターン形成方法 |
EP0555749B1 (en) * | 1992-02-14 | 1999-05-19 | Shipley Company Inc. | Radiation sensitive compositions and processes |
TW434456B (en) * | 1994-12-30 | 2001-05-16 | Novartis Ag | A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate |
JP3190251B2 (ja) * | 1995-06-06 | 2001-07-23 | 太陽インキ製造株式会社 | アルカリ現像型のフレキシブルプリント配線板用光硬化性・熱硬化性樹脂組成物 |
DE10139936B4 (de) * | 2001-08-14 | 2005-04-28 | Siemens Ag | Verfahren und Anordnung zur Steuerung von Datenpaketen |
-
1997
- 1997-09-27 TW TW086114260A patent/TW436491B/zh not_active IP Right Cessation
- 1997-12-04 AT AT97810948T patent/ATE194872T1/de not_active IP Right Cessation
- 1997-12-04 DE DE69702605T patent/DE69702605T2/de not_active Expired - Lifetime
- 1997-12-05 US US08/985,984 patent/US6057380A/en not_active Expired - Lifetime
- 1997-12-08 ZA ZA9710985A patent/ZA9710985B/xx unknown
- 1997-12-09 AU AU47658/97A patent/AU750819B2/en not_active Ceased
- 1997-12-10 JP JP36974197A patent/JP3250072B2/ja not_active Expired - Fee Related
- 1997-12-10 CA CA002224441A patent/CA2224441C/en not_active Expired - Fee Related
- 1997-12-11 RU RU97120883/04A patent/RU2210798C2/ru not_active IP Right Cessation
- 1997-12-13 KR KR1019970070581A patent/KR100264256B1/ko not_active IP Right Cessation
- 1997-12-17 SG SG1997004521A patent/SG63787A1/en unknown
- 1997-12-23 BR BR9706264A patent/BR9706264A/pt not_active Application Discontinuation
-
1998
- 1998-01-19 CN CN98103997A patent/CN1086399C/zh not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI620018B (zh) * | 2012-05-17 | 2018-04-01 | Taiyo Ink Mfg Co Ltd | 鹼顯影型之熱硬化性樹脂組成物、印刷配線板 |
Also Published As
Publication number | Publication date |
---|---|
JPH1171450A (ja) | 1999-03-16 |
US6057380A (en) | 2000-05-02 |
BR9706264A (pt) | 1999-07-27 |
KR19990022661A (ko) | 1999-03-25 |
CN1209442A (zh) | 1999-03-03 |
CA2224441A1 (en) | 1999-02-22 |
RU2210798C2 (ru) | 2003-08-20 |
JP3250072B2 (ja) | 2002-01-28 |
DE69702605T2 (de) | 2001-03-29 |
AU4765897A (en) | 1999-03-04 |
DE69702605D1 (de) | 2000-08-24 |
AU750819B2 (en) | 2002-07-25 |
CN1086399C (zh) | 2002-06-19 |
KR100264256B1 (ko) | 2000-09-01 |
ZA9710985B (en) | 1999-02-22 |
CA2224441C (en) | 2003-01-21 |
ATE194872T1 (de) | 2000-08-15 |
SG63787A1 (en) | 1999-03-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW436491B (en) | Compositions for use in base-catalysed reactions, a process for curing said compostions and a process for photochemically generating bases in base catalysed polymeriaztion reactions | |
TW452575B (en) | New Α-aminoacetophenone photoinitiators and photopolymerizable compositions comprising these photoinitiators | |
JP4575777B2 (ja) | 光開始剤の貯蔵安定性の改善 | |
JP4171073B2 (ja) | 不揮発性フェニルグリオキシル酸エステル | |
JP2518592B2 (ja) | 新規芳香族アミノケトンおよびそれよりなるエチレン性不飽和化合物の光重合のための光開始剤 | |
TWI586652B (zh) | A novel sulfonic acid derivative compound, a photoacid generator, a cationic polymerization initiator, a barrier composition and a cationically polymerizable composition | |
Nakamura | Photopolymers: photoresist materials, processes, and applications | |
EP0898202B1 (en) | Photogeneration of amines from alpha-aminoacetophenones | |
NO309571B1 (no) | Alkylfenylbisacyl-fosfinoksyder, fotoinitiatorblandinger og fotopolymeriserbare sammensetninger samt anvendelse herav | |
TW412540B (en) | Bisborate compounds and photoinitiators comprising said compounds in combination with electron donor compounds | |
TW200422296A (en) | Oxime ester photoinitiators with heteroaromatic groups | |
TW466255B (en) | Photoactivatable nitrogen-contained bases on Α-amino alkenes | |
TW200305582A (en) | Incorporable photoinitiator | |
KR19990044967A (ko) | 광중합성 조성물에서의 신규 퀴놀리늄 염료 및 보레이트 | |
JP2002538241A (ja) | オキシム誘導体及び光開始剤としてのその使用 | |
DE69917261T2 (de) | Photoinitiatoren und ihre Verwendungen | |
JP2000510884A (ja) | 重合性組成物 | |
WO2004104051A1 (en) | Bimolecular photoinitiator systems | |
JP2004511636A (ja) | 低彩度の暗色光硬化性組成物 | |
MXPA98000278A (en) | Photogeneration of amines from alpha-aminoacetophen |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent | ||
MK4A | Expiration of patent term of an invention patent |