TW429498B - Method for nondestructive measurement for minority carrier diffusion length and minority carrier lifetime in semiconductor devices - Google Patents
Method for nondestructive measurement for minority carrier diffusion length and minority carrier lifetime in semiconductor devicesInfo
- Publication number
- TW429498B TW429498B TW088104247A TW88104247A TW429498B TW 429498 B TW429498 B TW 429498B TW 088104247 A TW088104247 A TW 088104247A TW 88104247 A TW88104247 A TW 88104247A TW 429498 B TW429498 B TW 429498B
- Authority
- TW
- Taiwan
- Prior art keywords
- minority carrier
- semiconductor device
- length
- nondestructive measurement
- semiconductor devices
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/302—Contactless testing
- G01R31/308—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
- G01R31/311—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/265—Contactless testing
- G01R31/2656—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/2648—Characterising semiconductor materials
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/282—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
- G01R31/2831—Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/14—Measuring as part of the manufacturing process for electrical parameters, e.g. resistance, deep-levels, CV, diffusions by electrical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Vision & Pattern Recognition (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US7971698P | 1998-03-27 | 1998-03-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW429498B true TW429498B (en) | 2001-04-11 |
Family
ID=22152344
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW088104247A TW429498B (en) | 1998-03-27 | 1999-03-18 | Method for nondestructive measurement for minority carrier diffusion length and minority carrier lifetime in semiconductor devices |
Country Status (6)
Country | Link |
---|---|
US (1) | US6346821B1 (zh) |
EP (1) | EP0945733A3 (zh) |
JP (1) | JPH11330179A (zh) |
KR (1) | KR19990078176A (zh) |
CN (1) | CN1132015C (zh) |
TW (1) | TW429498B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI637180B (zh) * | 2017-04-21 | 2018-10-01 | 世界先進積體電路股份有限公司 | 測量半導體裝置之橫向擴散長度的方法 |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW528874B (en) * | 2000-10-26 | 2003-04-21 | Nec Electronics Corp | Non-destructive inspection method |
US7962716B2 (en) * | 2001-03-22 | 2011-06-14 | Qst Holdings, Inc. | Adaptive integrated circuitry with heterogeneous and reconfigurable matrices of diverse and adaptive computational units having fixed, application specific computational elements |
US6849874B2 (en) * | 2001-10-26 | 2005-02-01 | Cree, Inc. | Minimizing degradation of SiC bipolar semiconductor devices |
US20040010394A1 (en) * | 2002-07-15 | 2004-01-15 | Seh America, Inc. | Systems, methods and computer program products for determining contaminant concentrations in semiconductor materials |
US6836139B2 (en) | 2002-10-22 | 2004-12-28 | Solid State Measurments, Inc. | Method and apparatus for determining defect and impurity concentration in semiconducting material of a semiconductor wafer |
JP2006135125A (ja) * | 2004-11-08 | 2006-05-25 | Hokkaido Univ | 高移動度測定装置 |
US7811943B2 (en) * | 2004-12-22 | 2010-10-12 | Cree, Inc. | Process for producing silicon carbide crystals having increased minority carrier lifetimes |
US7830165B2 (en) * | 2006-03-31 | 2010-11-09 | Integrated Device Technology, Inc. | System and method for detecting single event latchup in integrated circuits |
EP2037288B1 (en) * | 2007-09-11 | 2011-06-22 | S.O.I. TEC Silicon on Insulator Technologies | Volume lifetime measurement |
CN102621465B (zh) * | 2012-03-19 | 2015-01-07 | 中国科学院上海技术物理研究所 | 半导体纳米线少数载流子寿命的检测方法 |
CN102645560A (zh) * | 2012-03-29 | 2012-08-22 | 北京大华无线电仪器厂 | 微波少数载流子寿命测试仪专用测量夹具 |
US9389273B2 (en) | 2012-11-13 | 2016-07-12 | International Business Machines Corporation | Solar cell characteristics determination |
US9733297B2 (en) * | 2013-02-19 | 2017-08-15 | Hamamatsu Photonics K.K. | Electric field concentration location observation device and electric field concentration location observation method |
CN103901335B (zh) * | 2014-04-22 | 2016-03-30 | 哈尔滨工业大学 | 一种半导体少数载流子寿命分布的红外偏振光学成像检测方法与*** |
CN103926519A (zh) * | 2014-04-26 | 2014-07-16 | 中国科学院新疆理化技术研究所 | 一种用于横向npn晶体管电离辐射损伤的定量测试方法 |
CN103969263A (zh) * | 2014-06-04 | 2014-08-06 | 哈尔滨工业大学 | 基于高频光电导衰减法的少子寿命测试仪 |
CN105720480B (zh) * | 2014-12-02 | 2018-08-28 | 山东华光光电子股份有限公司 | 一种检测扩散Zn半导体激光器窗口区Zn扩散程度的方法及其实现装置 |
CN106249122B (zh) * | 2016-09-07 | 2019-03-05 | 广州市昆德科技有限公司 | 可调控注入比的高频光电导寿命测试仪及其测试方法 |
CN106324471A (zh) * | 2016-11-07 | 2017-01-11 | 南京大学 | 利用瞬态载流子光栅技术的信号测量方法 |
JP6954775B2 (ja) | 2017-06-29 | 2021-10-27 | 浜松ホトニクス株式会社 | デバイス解析装置及びデバイス解析方法 |
CN107591340A (zh) * | 2017-08-01 | 2018-01-16 | 惠科股份有限公司 | 一种半导体的测试方法和测试装置 |
CN109613016A (zh) * | 2018-12-04 | 2019-04-12 | 中国电子产品可靠性与环境试验研究所((工业和信息化部电子第五研究所)(中国赛宝实验室)) | 一种半导体芯片缺陷检测设备及方法 |
CN110470965B (zh) * | 2019-07-09 | 2020-07-28 | 同济大学 | 一种半导体表面态载流子寿命测试方法 |
CN116047256B (zh) * | 2023-03-24 | 2023-08-29 | 长鑫存储技术有限公司 | 测试方法、测试装置及电子设备 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3676715A (en) * | 1970-06-26 | 1972-07-11 | Bell Telephone Labor Inc | Semiconductor apparatus for image sensing and dynamic storage |
US3674995A (en) * | 1970-08-31 | 1972-07-04 | Texas Instruments Inc | Computer controlled device testing and subsequent arbitrary adjustment of device characteristics |
US3859595A (en) * | 1973-12-06 | 1975-01-07 | Bell Telephone Labor Inc | Method for measuring traps in semiconductors |
US4122383A (en) * | 1977-12-16 | 1978-10-24 | Nasa | Method and apparatus for measuring minority carrier lifetimes and bulk diffusion length in P-N junction solar cells |
US4406949A (en) * | 1981-07-13 | 1983-09-27 | Mostek Corporation | Method and apparatus for aligning an integrated circuit |
HU196262B (en) * | 1986-03-17 | 1988-10-28 | Mta Mueszaki Fiz Kutato Inteze | Method for testing electrically active impuritles in semiconductor materials and structures and measuring arrangement for implementing method |
JPH065691B2 (ja) * | 1987-09-26 | 1994-01-19 | 株式会社東芝 | 半導体素子の試験方法および試験装置 |
JPS6489442A (en) * | 1987-09-30 | 1989-04-03 | Toshiba Corp | Measuring method of semiconductor device |
JP2889307B2 (ja) * | 1990-03-26 | 1999-05-10 | 株式会社東芝 | ▲iv▼族半導体のキャリアライフタイム測定法 |
JPH0798329A (ja) * | 1993-09-28 | 1995-04-11 | Hamamatsu Photonics Kk | E−oプローブ |
US5723981A (en) * | 1994-08-29 | 1998-03-03 | Imec Vzw | Method for measuring the electrical potential in a semiconductor element |
US5663657A (en) * | 1994-09-26 | 1997-09-02 | University Of South Florida | Determining long minority carrier diffusion lengths |
US5883518A (en) * | 1996-04-24 | 1999-03-16 | Boxer Cross, Inc. | System and method for measuring the doping level and doping profile of a region in a semiconductor substrate |
-
1999
- 1999-03-11 US US09/266,039 patent/US6346821B1/en not_active Expired - Lifetime
- 1999-03-18 TW TW088104247A patent/TW429498B/zh not_active IP Right Cessation
- 1999-03-22 EP EP99105753A patent/EP0945733A3/en not_active Withdrawn
- 1999-03-24 KR KR1019990009953A patent/KR19990078176A/ko not_active Application Discontinuation
- 1999-03-26 JP JP11084549A patent/JPH11330179A/ja not_active Withdrawn
- 1999-03-27 CN CN99107671A patent/CN1132015C/zh not_active Expired - Fee Related
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI637180B (zh) * | 2017-04-21 | 2018-10-01 | 世界先進積體電路股份有限公司 | 測量半導體裝置之橫向擴散長度的方法 |
Also Published As
Publication number | Publication date |
---|---|
CN1132015C (zh) | 2003-12-24 |
KR19990078176A (ko) | 1999-10-25 |
CN1271093A (zh) | 2000-10-25 |
JPH11330179A (ja) | 1999-11-30 |
US6346821B1 (en) | 2002-02-12 |
EP0945733A2 (en) | 1999-09-29 |
EP0945733A3 (en) | 2002-12-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent | ||
MM4A | Annulment or lapse of patent due to non-payment of fees |