TW289873B - - Google Patents

Info

Publication number
TW289873B
TW289873B TW084111076A TW84111076A TW289873B TW 289873 B TW289873 B TW 289873B TW 084111076 A TW084111076 A TW 084111076A TW 84111076 A TW84111076 A TW 84111076A TW 289873 B TW289873 B TW 289873B
Authority
TW
Taiwan
Application number
TW084111076A
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Application granted granted Critical
Publication of TW289873B publication Critical patent/TW289873B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0384—Auxiliary electrodes, e.g. for pre-ionisation or triggering, or particular adaptations therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
TW084111076A 1994-11-04 1995-10-20 TW289873B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6271210A JPH08132321A (ja) 1994-11-04 1994-11-04 放電励起パルスレーザ装置

Publications (1)

Publication Number Publication Date
TW289873B true TW289873B (zh) 1996-11-01

Family

ID=17496887

Family Applications (1)

Application Number Title Priority Date Filing Date
TW084111076A TW289873B (zh) 1994-11-04 1995-10-20

Country Status (7)

Country Link
US (1) US5708676A (zh)
JP (1) JPH08132321A (zh)
KR (1) KR0157700B1 (zh)
CN (1) CN1126644A (zh)
CA (1) CA2161989C (zh)
DE (1) DE19541031A1 (zh)
TW (1) TW289873B (zh)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TR199901980T2 (xx) * 1997-02-12 1999-11-22 Siemens Aktiengesellschaft Kodlanm�� y�ksek frekans sinyalleri elde etmek i�in cihaz ve y�ntem
US6456643B1 (en) 1999-03-31 2002-09-24 Lambda Physik Ag Surface preionization for gas lasers
US6650679B1 (en) 1999-02-10 2003-11-18 Lambda Physik Ag Preionization arrangement for gas laser
US6188144B1 (en) * 1998-11-11 2001-02-13 Komatsu Ltd Power supply unit for pulsed laser using magnetic switch
US6757315B1 (en) 1999-02-10 2004-06-29 Lambda Physik Ag Corona preionization assembly for a gas laser
JP3427889B2 (ja) * 1999-12-21 2003-07-22 ウシオ電機株式会社 ＡｒＦエキシマレーザ装置及びフッ素レーザ装置
US6834066B2 (en) * 2000-04-18 2004-12-21 Lambda Physik Ag Stabilization technique for high repetition rate gas discharge lasers
DE10025561A1 (de) 2000-05-24 2001-12-06 Siemens Ag Energieautarker Hochfrequenzsender
US6763049B1 (en) * 2000-06-15 2004-07-13 Lambda Emi Very high repetition rate power supply system and method
US6671302B2 (en) 2000-08-11 2003-12-30 Lambda Physik Ag Device for self-initiated UV pre-ionization of a repetitively pulsed gas laser
US6693938B1 (en) * 2000-09-08 2004-02-17 Komatsu Ltd. Discharge circuit for pulsed laser
US6535540B1 (en) * 2000-09-13 2003-03-18 Komatsu Ltd. Discharge device for pulsed laser
DE10150128C2 (de) * 2001-10-11 2003-10-02 Enocean Gmbh Drahtloses Sensorsystem
US7545839B2 (en) * 2003-01-02 2009-06-09 Optiswitch Technology Corporation Apparatus and method for driving a pulsed laser diode
DE112009002139T5 (de) * 2008-09-02 2012-01-12 Mitsubishi Electric Corporation Stromversorgungsvorrichtung für eine Elektroerosionsmaschine
CN101599613B (zh) * 2009-01-13 2011-02-02 上海微电子装备有限公司 预电离与主放电时序控制装置及方法
CN103022858B (zh) * 2012-12-07 2014-09-24 华中科技大学 一种电晕预电离装置
JP6411120B2 (ja) * 2014-08-04 2018-10-24 株式会社アマダミヤチ レーザ装置
CN107026384B (zh) * 2017-05-02 2023-07-21 中国工程物理研究院激光聚变研究中心 一种为固体激光放大器泵浦能量的氙灯装置
US11870215B2 (en) * 2020-03-23 2024-01-09 Lumentum Operations Llc Reconfigurable laser pulse generating circuit

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62282475A (ja) * 1986-05-30 1987-12-08 Mitsubishi Electric Corp レ−ザ装置
JPS63197390A (ja) * 1987-02-12 1988-08-16 Mitsui Petrochem Ind Ltd パルスレ−ザ励起電源装置
JPS63304682A (ja) * 1987-06-03 1988-12-12 Nikon Corp エキシマレ−ザ装置
JPH077857B2 (ja) * 1989-05-17 1995-01-30 三菱電機株式会社 放電励起パルスレーザ装置
JPH04133378A (ja) * 1990-09-25 1992-05-07 Mitsubishi Electric Corp 放電励起パルスレーザ装置
US5181217A (en) * 1991-02-27 1993-01-19 Mitsubishi Denki Kabushiki Kaisha Laser oscillator circuit
JPH05218547A (ja) * 1992-01-30 1993-08-27 Mitsubishi Electric Corp 放電励起パルスレーザ装置
JPH05283777A (ja) * 1992-03-31 1993-10-29 Toshiba Corp ガスレーザ発振装置
JPH05327088A (ja) * 1992-05-22 1993-12-10 Toshiba Corp ガスレーザ発振装置

Also Published As

Publication number Publication date
CA2161989A1 (en) 1996-05-05
CA2161989C (en) 1999-05-25
DE19541031A1 (de) 1996-05-09
KR960019870A (ko) 1996-06-17
US5708676A (en) 1998-01-13
KR0157700B1 (ko) 1998-12-01
CN1126644A (zh) 1996-07-17
JPH08132321A (ja) 1996-05-28

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