TW202331855A - 用於嵌入式晶片的封裝製程 - Google Patents
用於嵌入式晶片的封裝製程 Download PDFInfo
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- 238000012858 packaging process Methods 0.000 title claims abstract description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 70
- 239000011889 copper foil Substances 0.000 claims abstract description 49
- 239000003292 glue Substances 0.000 claims abstract description 21
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 239000003365 glass fiber Substances 0.000 claims abstract description 6
- 238000005530 etching Methods 0.000 claims abstract description 5
- 239000010410 layer Substances 0.000 claims description 52
- 239000012790 adhesive layer Substances 0.000 claims description 29
- 229910052802 copper Inorganic materials 0.000 claims description 21
- 239000010949 copper Substances 0.000 claims description 21
- 238000007747 plating Methods 0.000 claims description 8
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000009713 electroplating Methods 0.000 claims description 3
- 238000007772 electroless plating Methods 0.000 claims description 2
- 239000002131 composite material Substances 0.000 claims 2
- 238000000059 patterning Methods 0.000 claims 1
- 238000000034 method Methods 0.000 description 4
- 238000001723 curing Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 238000010147 laser engraving Methods 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 238000004806 packaging method and process Methods 0.000 description 2
- 238000012536 packaging technology Methods 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- 229920006397 acrylic thermoplastic Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
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- H01L24/18—High density interconnect [HDI] connectors; Manufacturing methods related thereto
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Abstract
本發明提供一種用於嵌入式晶片的封裝製程,包括以下步驟:(1)在一電路基板表面貼裝至少一IC晶片,IC晶片具有至少一裸露的接腳;(2)在電路基板表面貼附一背膠銅箔,其中背膠銅箔具有一銅箔層及一B階段的絕緣膠層,絕緣膠層塗布於銅箔層上,絕緣膠層中不具有玻璃纖維,接腳接觸絕緣膠層但不接觸銅箔層,絕緣膠層覆蓋IC晶片,銅箔層具有至少一對應於接腳的孔位銅箔區,絕緣膠層具有至少一對應於接腳的孔位絕緣膠區;(3)移除孔位銅箔區;(4)利用蝕刻液移除孔位絕緣膠區;(5)將絕緣膠層完全固化。
Description
本發明是關於一種嵌入式晶片封裝技術。
有別於許多貼裝於電路板表面的IC晶片,嵌入式晶片封裝則是將IC晶片內嵌於電路板的內層中。為了要與內嵌的IC晶片的接腳形成電連接,需要在與接腳對應的位置形成通孔,並在通孔內鍍銅。現有技術中,這些通孔是以雷射雕刻方式形成,過程中IC晶片的一部份受到雷射照射而容易受到傷害,實有改良的必要。
有鑑於此,本發明之主要目的在於提供一種能避免IC晶片被雷射照射的內嵌式晶片封裝技術。
為了達成上述及其他目的,本發明提供一種用於嵌入式晶片的封裝製程,包括以下步驟:
(1)在一電路基板表面貼裝至少一IC晶片,該IC晶片具有至少一裸露的接腳;
(2)在該電路基板表面貼附一背膠銅箔,其中該背膠銅箔具有一銅箔層及一B階段的絕緣膠層,該絕緣膠層塗布於該銅箔層上,該絕緣膠層中不具有玻璃纖維,該接腳接觸該絕緣膠層但不接觸該銅箔層,該絕緣膠層覆蓋該IC晶片,該銅箔層具有至少一對應於所述接腳的孔位銅箔區,該絕緣膠層具有至少一對應於所述接腳的孔位絕緣膠區;
(3)移除該孔位銅箔區;
(4)利用蝕刻液移除該孔位絕緣膠區,從而在該背膠銅箔上形成至少一對應於所述接腳的通孔;以及
(5)將該絕緣膠層完全固化。
由於本發明使用的絕緣膠層並不具有玻璃纖維,並且剛貼附於電路基板時還處於B階段,從而可通過蝕刻液來將孔位絕緣膠區移除,無須使用雷射雕刻,進而避免IC晶片被雷射照射而容易損壞的問題。
本發明揭示一種用於嵌入式晶片的封裝製程,以下通過第1至10圖說明本發明其中一實施例的製程,其中的電路設計是出於說明的目的而簡化,但實際電路設計並不以此為限。
本實施例的嵌入式晶片封裝結構是由包括以下步驟的製程所製作:
步驟(1):
請參考第1、2圖,在一電路基板10表面貼裝至少一IC晶片20,IC晶片20具有至少一裸露的接腳21,該裸露的接腳21未直接接觸該電路基板10表面,IC晶片20例如是貼裝於電路基板10表面的介質層11上,但並不以此為限。所述電力基板10可用任何適當的方法依需求製作,IC晶片20例如可為有源元件、無源元件、MEMS或其他晶片。
步驟(2):
請參考第3、4圖,在電路基板10表面再貼附一背膠銅箔30,其中,背膠銅箔30具有一銅箔層31及一B階段(B-Stage)的絕緣膠層32,絕緣膠層32塗布於銅箔層31上,絕緣膠層32中不具有玻璃纖維,接腳21接觸絕緣膠層32但不接觸銅箔層31,絕緣膠層32覆蓋並包覆IC晶片20;絕緣膠層32例如可為環氧樹脂類、壓克力類、聚醯亞胺類的光及/或熱可固化樹脂,所述B階段是指所述可固化樹脂並未完全固化,但已被乾燥而具有指觸乾燥性的狀態;根據其光固化及/或熱固化的特性,B階段的樹脂可在特定光波照射下及/或特定固化溫度下被完全固化至C階段;本發明中,絕緣膠層32在步驟(5)前都維持在B階段。其中,銅箔層31具有至少一對應於所述接腳21的孔位銅箔區311,該絕緣膠層32具有至少一對應於所述接腳21的孔位絕緣膠區321,孔位絕緣膠區321被孔位銅箔區311覆蓋。
步驟(3):
請參考第5圖,移除孔位銅箔區311,從而裸露孔位絕緣膠區321。在可能的實施方式中,孔位銅箔區311是通過貼附光阻、曝光、顯影、蝕刻等常規方式移除,但並不以此為限,例如可以雷射雕刻方式移除。
步驟(4):
請參考第6圖,利用蝕刻液移除孔位絕緣膠區321,從而在背膠銅箔30上形成至少一對應於所述接腳21的通孔33;所述蝕刻液是指可將與其接觸的B階段絕緣膠層移除的藥劑。孔位絕緣膠區321被移除後,可以裸露所述接腳21。值得一提的是,在步驟(3)、(4)中,接腳21及IC晶片20的其他部分不會暴露於雷射,而可避免損壞。
步驟(5):
根據絕緣膠層32的光固化及/或熱固化的特性,B階段的絕緣膠層32可在特定光波照射下及/或特定固化溫度下被完全固化,其外觀仍維持第6圖所示的外觀。
步驟(7):
如第7圖所示,通過化學鍍方式在銅箔層31上及該通孔33中形成化鍍銅層40。
步驟(8):
如第8圖所示,通過電鍍方式在化鍍銅層40上形成電鍍銅層50。
步驟(9):
對銅箔層31、化鍍銅層40及電鍍銅層50以及進行圖形化處理,形成如第9圖所示的狀態。其中,電路基板可以形成其他盲孔或貫孔,這些盲孔與貫孔的製作可以但不限於在步驟(3)、(4)中一併進行,在本案圖式中並未特別表示這些盲孔與貫孔的製作流程。
一個嵌入式晶片封裝結構1可在上述步驟後完成,其具有一電路基板10、至少一IC晶片20、一完全固化的絕緣膠層32、一銅箔層31、至少一形成於該絕緣膠層32及銅箔層31的通孔33、一化鍍銅層40及一電鍍銅層50,IC晶片20貼裝於該電路基板10表面,IC晶片20具有至少一裸露的接腳21,絕緣膠層32中不具有玻璃纖維,接腳21接觸絕緣膠層32但不接觸銅箔層31,絕緣膠層32覆蓋並包覆IC晶片20,銅箔層31覆蓋絕緣膠層32,通孔33分別對應於接腳21,化鍍銅層40電連接於接腳21及銅箔層31間,電鍍銅層50形成於化鍍銅層40上。其中,嵌入式晶片封裝結構1可再依設計需求進行其他後續處理。
1:嵌入式晶片封裝結構
10:電路基板
11:介質層
20:IC晶片
21:接腳
30:背膠銅箔
31:銅箔層
311:孔位銅箔區
32:絕緣膠層
321:孔位絕緣膠區
33:通孔
40:化鍍銅層
50:電鍍銅層
第1至10圖是本發明其中一實施例的製程示意圖。
1:嵌入式晶片封裝結構
10:電路基板
11:介質層
20:IC晶片
21:接腳
31:銅箔層
32:絕緣膠層
33:通孔
40:化鍍銅層
50:電鍍銅層
Claims (3)
- 一種用於嵌入式晶片的封裝製程,包括以下步驟: (1)在一電路基板表面貼裝至少一IC晶片,該IC晶片具有至少一裸露的接腳; (2)在該電路基板表面貼附一背膠銅箔,其中該背膠銅箔具有一銅箔層及一B階段(B-Stage)的絕緣膠層,該絕緣膠層塗布於該銅箔層上,該絕緣膠層中不具有玻璃纖維,該接腳接觸該絕緣膠層但不接觸該銅箔層,該絕緣膠層覆蓋該IC晶片,該銅箔層具有至少一對應於所述接腳的孔位銅箔區,該絕緣膠層具有至少一對應於所述接腳的孔位絕緣膠區; (3)移除該孔位銅箔區; (4)利用蝕刻液移除該孔位絕緣膠區,從而在該背膠銅箔上形成至少一對應於所述接腳的通孔;以及 (5)將該絕緣膠層完全固化。
- 如請求項1所述的軟硬複合板的製程,其中在該步驟(5)後更包括以下步驟: (6)通過化學鍍方式在該銅箔層上及該通孔中形成化鍍銅層;以及 (7)通過電鍍方式在該化鍍銅層上形成電鍍銅層。
- 如請求項2所述的軟硬複合板的製程,其中在該步驟(7)後更包括以下步驟: (8)對該銅箔層、該化鍍銅層及該電鍍銅層進行圖形化處理。
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CN202210209020.4A CN116525458A (zh) | 2022-01-20 | 2022-03-03 | 用于嵌入式芯片的封装制程 |
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