JP5224845B2 - 半導体装置の製造方法及び半導体装置 - Google Patents
半導体装置の製造方法及び半導体装置 Download PDFInfo
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- JP5224845B2 JP5224845B2 JP2008036235A JP2008036235A JP5224845B2 JP 5224845 B2 JP5224845 B2 JP 5224845B2 JP 2008036235 A JP2008036235 A JP 2008036235A JP 2008036235 A JP2008036235 A JP 2008036235A JP 5224845 B2 JP5224845 B2 JP 5224845B2
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- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5389—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates the chips being integrally enclosed by the interconnect and support structures
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- H01L24/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
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Description
(第1の実施の形態)
図2乃至図3Bを参照し、本発明の第1の実施の形態に係る半導体装置を説明する。
(第1の実施の形態に係る半導体装置の製造方法)
次に、図3A及び図3Bを参照し、本実施の形態に係る半導体装置の製造方法について説明する。
(第1の実施の形態の第1の変形例)
次に、図4乃至図6を参照し、本発明の第1の実施の形態の第1の変形例について説明する。
(第1の実施の形態の第1の変形例に係る半導体装置の第1の製造方法)
次に、図5A乃至図5Cを参照し、本変形例に係る半導体装置の第1の製造方法について説明する。
(第1の実施の形態の第1の変形例に係る半導体装置の第2の製造方法)
次に、図5B乃至図6を参照し、本変形例に係る半導体装置の第2の製造方法について説明する。
(第1の実施の形態の第2の変形例)
次に、図7乃至図9を参照し、本発明の第1の実施の形態の第2の変形例について説明する。
(第1の実施の形態の第2の変形例に係る半導体装置の第1の製造方法)
次に、図8A乃至図8Cを参照し、本変形例に係る半導体装置の第1の製造方法について説明する。
(第1の実施の形態の第2の変形例に係る半導体装置の第2の製造方法)
次に、図8B乃至図9を参照し、本変形例に係る半導体装置の第2の製造方法について説明する。
(第1の実施の形態の第3の変形例)
次に、図10乃至図11Cを参照し、本発明の第1の実施の形態の第3の変形例について説明する。
(第1の実施の形態の第3の変形例に係る半導体装置の第1の製造方法)
次に、図11A乃至図11Cを参照し、本変形例に係る半導体装置の第1の製造方法について説明する。
(第1の実施の形態の第3の変形例に係る半導体装置の第2の製造方法)
次に、図11B乃至図12を参照し、本変形例に係る半導体装置の第2の製造方法について説明する。
(第1の実施の形態の第4の変形例)
次に、図13及び図14を参照し、本発明の第1の実施の形態の第4の変形例について説明する。
(第1の実施の形態の第4の変形例に係る半導体装置の製造方法)
次に、図14A乃至図14Cを参照し、本変形例に係る半導体装置の製造方法について説明する。
(第1の実施の形態の第5の変形例)
次に、図15を参照し、本発明の第1の実施の形態の第5の変形例に係る半導体装置を説明する。
(第1の実施の形態の第6の変形例)
次に、図16を参照し、本発明の第1の実施の形態の第6の変形例に係る半導体装置を説明する。
(第1の実施の形態の第7の変形例)
次に、図17を参照し、本発明の第1の実施の形態の第7の変形例に係る半導体装置を説明する。
(第1の実施の形態の第8の変形例)
次に、図18を参照し、本発明の第1の実施の形態の第8の変形例に係る半導体装置を説明する。
(第1の実施の形態の第9の変形例)
次に、図19を参照し、本発明の第1の実施の形態の第9の変形例に係る半導体装置を説明する。
(第2の実施の形態)
次に、図20を参照し、本発明の第2の実施の形態に係る配線基板を説明する。
(第2の実施の形態の第1の変形例)
次に、図21を参照し、本発明の第2の実施の形態の第1の変形例に係る配線基板を説明する。
(第2の実施の形態の第2の変形例)
次に、図22を参照し、本発明の第2の実施の形態の第2の変形例に係る配線基板を説明する。
(第2の実施の形態の第3の変形例)
次に、図23を参照し、本発明の第2の実施の形態の第3の変形例に係る配線基板を説明する。
(第2の実施の形態の第4の変形例)
次に、図24を参照し、本発明の第2の実施の形態の第4の変形例に係る配線基板を説明する。
(第2の実施の形態の第5の変形例)
次に、図25を参照し、本発明の第2の実施の形態の第5の変形例に係る配線基板を説明する。
20 半導体チップ
30 支持基板
31 接着剤
32 第1の金属膜
33 第2の金属膜
34 嵌合孔
35 ドライフィルムレジスト
36 搭載面
37 支持基板表面処理膜
38 銅箔
40 端子電極
50 外部端子電極
60 ファンアウト部
61、61a、61b 絶縁層
62、62a、62b 貫通電極
63、63a、63b 金属配線
64、64a、64b 貫通孔
70 配線基板基体
71 配線基板端子電極
72 配線基板裏面端子電極
73 絶縁層
100、100a、100b、100c、100d、100e 配線基板
D1 第1の間隔
D2 第2の間隔
Claims (10)
- 支持基板の両面にそれぞれ金属層を形成する工程と、
前記支持基板の一方の面の前記金属層上に、金属膜を形成する工程と、
前記金属膜をエッチングし、嵌合孔を形成する工程と、
前記嵌合孔内に、複数の端子電極が設けられた面が上方を向くよう、半導体チップを実装する工程と、
前記支持基板上に、前記半導体チップの前記端子電極が設けられた面と側面とを覆う絶縁層を形成する工程と、
前記絶縁層上に、前記端子電極と接続する金属配線を形成する工程と、
前記金属配線上に複数の外部端子電極を形成する工程と、を有し、
それぞれの前記金属層は、前記金属膜のエッチングにより除去されないエッチングストッパ層を含み、
隣接する前記外部端子電極の間隔が、隣接する前記端子電極の間隔より大きいことを特徴とする半導体装置の製造方法。 - それぞれの前記金属層は、前記エッチングストッパ層よりも前記支持基板側に設けられた、前記エッチングストッパ層が前記支持基板に拡散することを防止する支持基板表面処理膜を含むことを特徴とする請求項1記載の半導体装置の製造方法。
- 前記半導体チップは主にシリコンからなり、前記エッチングストッパ層は主に金からなり、前記半導体チップと前記エッチングストッパ層とは共晶結合により接着されている請求項1又は2記載の半導体装置の製造方法。
- 前記金属膜を形成する工程において、
前記支持基板上に、めっきにより前記金属膜を形成することを特徴とする請求項1から3のいずれか1項記載の半導体装置の製造方法。 - 前記支持基板が、金属板または絶縁板からなることを特徴とする請求項1から4のいずれか1項記載の半導体装置の製造方法。
- 前記金属配線を形成する工程では、前記絶縁層上に、前記端子電極と接続する金属配線を形成し、更に前記金属配線上に他の絶縁層及び他の金属配線を積層し、
前記外部端子電極を形成する工程では、最表面に設けられた金属配線上に複数の外部端子電極を形成することを特徴とする請求項1から5のいずれか1項記載の半導体装置の製造方法。 - 両面にそれぞれ金属層が形成された支持基板と、
前記支持基板の一方の面の前記金属層上に形成された嵌合孔を有する金属膜と、
前記嵌合孔内に、複数の端子電極が設けられた面が上方を向くよう実装された半導体チップと、
前記支持基板上に、前記半導体チップの前記端子電極が設けられた面と側面とを覆うよう形成された絶縁層と、
前記絶縁層上に、前記端子電極と接続して形成された金属配線と、
前記金属配線上に複数形成された外部端子電極と、を有し、
前記支持基板の一方の面の前記金属層及び前記支持基板の他方の面の前記金属層は、それぞれ、前記金属膜を形成する金属材料とは異なる金属材料を含み、
隣接する前記外部端子電極の間隔が、隣接する前記端子電極の間隔より大きいことを特徴とする半導体装置。 - 前記金属膜がめっき金属からなることを特徴とする請求項7記載の半導体装置。
- 前記支持基板が、金属板または絶縁板からなることを特徴とする請求項7又は8記載の半導体装置。
- 更に前記金属配線上に他の絶縁層及び他の金属配線が積層され、
前記外部端子電極は、最表面に設けられた金属配線上に形成されていることを特徴とする請求項7から9のいずれか1項記載の半導体装置。
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Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5355363B2 (ja) * | 2009-11-30 | 2013-11-27 | 新光電気工業株式会社 | 半導体装置内蔵基板及びその製造方法 |
KR101141209B1 (ko) * | 2010-02-01 | 2012-05-04 | 삼성전기주식회사 | 단층 인쇄회로기판 및 그 제조방법 |
US8319318B2 (en) * | 2010-04-06 | 2012-11-27 | Intel Corporation | Forming metal filled die back-side film for electromagnetic interference shielding with coreless packages |
US8618652B2 (en) | 2010-04-16 | 2013-12-31 | Intel Corporation | Forming functionalized carrier structures with coreless packages |
US8581421B2 (en) * | 2010-12-20 | 2013-11-12 | Shinko Electric Industries Co., Ltd. | Semiconductor package manufacturing method and semiconductor package |
JP2013114415A (ja) | 2011-11-28 | 2013-06-10 | Elpida Memory Inc | メモリモジュール |
KR101333893B1 (ko) * | 2012-01-03 | 2013-11-27 | 주식회사 네패스 | 반도체 패키지 및 그 제조 방법 |
TWI515841B (zh) * | 2013-08-02 | 2016-01-01 | 矽品精密工業股份有限公司 | 半導體封裝件及其製法 |
TWI582913B (zh) * | 2013-08-02 | 2017-05-11 | 矽品精密工業股份有限公司 | 半導體封裝件及其製法 |
US20150035163A1 (en) * | 2013-08-02 | 2015-02-05 | Siliconware Precision Industries Co., Ltd. | Semiconductor package and method of fabricating the same |
WO2015077808A1 (de) | 2013-11-27 | 2015-06-04 | At&S Austria Technologie & Systemtechnik Aktiengesellschaft | Leiterplattenstruktur |
AT515101B1 (de) | 2013-12-12 | 2015-06-15 | Austria Tech & System Tech | Verfahren zum Einbetten einer Komponente in eine Leiterplatte |
US11523520B2 (en) * | 2014-02-27 | 2022-12-06 | At&S Austria Technologie & Systemtechnik Aktiengesellschaft | Method for making contact with a component embedded in a printed circuit board |
TWI557853B (zh) * | 2014-11-12 | 2016-11-11 | 矽品精密工業股份有限公司 | 半導體封裝件及其製法 |
JP6437012B2 (ja) * | 2014-11-27 | 2018-12-12 | 国立研究開発法人産業技術総合研究所 | 表面実装型パッケージおよびその製造方法 |
US9659863B2 (en) | 2014-12-01 | 2017-05-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor devices, multi-die packages, and methods of manufacture thereof |
JP6511695B2 (ja) * | 2015-01-20 | 2019-05-15 | ローム株式会社 | 半導体装置およびその製造方法 |
US10083888B2 (en) * | 2015-11-19 | 2018-09-25 | Advanced Semiconductor Engineering, Inc. | Semiconductor device package |
US10115668B2 (en) * | 2015-12-15 | 2018-10-30 | Intel IP Corporation | Semiconductor package having a variable redistribution layer thickness |
JP6669586B2 (ja) | 2016-05-26 | 2020-03-18 | 新光電気工業株式会社 | 半導体装置、半導体装置の製造方法 |
JP6716363B2 (ja) * | 2016-06-28 | 2020-07-01 | 株式会社アムコー・テクノロジー・ジャパン | 半導体パッケージ及びその製造方法 |
JP6971052B2 (ja) * | 2017-04-20 | 2021-11-24 | 京セラ株式会社 | 半導体装置の製造方法および半導体装置 |
KR102185706B1 (ko) * | 2017-11-08 | 2020-12-02 | 삼성전자주식회사 | 팬-아웃 반도체 패키지 |
US10643919B2 (en) | 2017-11-08 | 2020-05-05 | Samsung Electronics Co., Ltd. | Fan-out semiconductor package |
TWI649795B (zh) * | 2018-02-13 | 2019-02-01 | 友達光電股份有限公司 | 顯示面板 |
JP6921794B2 (ja) * | 2018-09-14 | 2021-08-18 | 株式会社東芝 | 半導体装置 |
JP2019208045A (ja) * | 2019-07-17 | 2019-12-05 | 太陽誘電株式会社 | 回路基板 |
JP2020141152A (ja) * | 2020-06-10 | 2020-09-03 | 株式会社アムコー・テクノロジー・ジャパン | 半導体アセンブリおよび半導体アセンブリの製造方法 |
TWI808618B (zh) * | 2022-01-20 | 2023-07-11 | 大陸商廣東則成科技有限公司 | 用於嵌入式晶片的封裝製程 |
CN116721978A (zh) * | 2023-06-29 | 2023-09-08 | 上海纳矽微电子有限公司 | 一种半导体封装结构及其制造方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6274391B1 (en) * | 1992-10-26 | 2001-08-14 | Texas Instruments Incorporated | HDI land grid array packaged device having electrical and optical interconnects |
JPH08240904A (ja) * | 1995-03-01 | 1996-09-17 | Hoya Corp | 転写マスクおよびその製造方法 |
DE19546443A1 (de) * | 1995-12-13 | 1997-06-19 | Deutsche Telekom Ag | Optische und/oder elektrooptische Verbindung und Verfahren zur Herstellung einer solchen |
US6350706B1 (en) * | 1998-09-03 | 2002-02-26 | Micron Technology, Inc. | Process for using photo-definable layers in the manufacture of semiconductor devices and resulting structures of same |
JP4623622B2 (ja) * | 1999-06-25 | 2011-02-02 | 東洋鋼鈑株式会社 | 半導体パッケージ用クラッド材の製造方法および半導体パッケージの製造方法 |
JP3277997B2 (ja) * | 1999-06-29 | 2002-04-22 | 日本電気株式会社 | ボールグリッドアレイパッケージとその製造方法 |
US6271469B1 (en) | 1999-11-12 | 2001-08-07 | Intel Corporation | Direct build-up layer on an encapsulated die package |
JP2001217359A (ja) * | 2000-01-31 | 2001-08-10 | Shinko Electric Ind Co Ltd | 放熱用フィン及びその製造方法並びに半導体装置 |
US6309912B1 (en) * | 2000-06-20 | 2001-10-30 | Motorola, Inc. | Method of interconnecting an embedded integrated circuit |
JP2002016173A (ja) * | 2000-06-30 | 2002-01-18 | Mitsubishi Electric Corp | 半導体装置 |
JP4243922B2 (ja) | 2001-06-26 | 2009-03-25 | イビデン株式会社 | 多層プリント配線板 |
TW557521B (en) * | 2002-01-16 | 2003-10-11 | Via Tech Inc | Integrated circuit package and its manufacturing process |
US6680529B2 (en) * | 2002-02-15 | 2004-01-20 | Advanced Semiconductor Engineering, Inc. | Semiconductor build-up package |
JP2005531137A (ja) * | 2002-04-29 | 2005-10-13 | アドヴァンスト インターコネクト テクノロジーズ リミテッド | 部分的にパターン形成したリードフレームならびに半導体パッケージングにおけるその製造および使用の方法 |
JP2005203390A (ja) * | 2004-01-13 | 2005-07-28 | Seiko Instruments Inc | 樹脂封止型半導体装置の製造方法 |
JP4343044B2 (ja) * | 2004-06-30 | 2009-10-14 | 新光電気工業株式会社 | インターポーザ及びその製造方法並びに半導体装置 |
JP4445351B2 (ja) * | 2004-08-31 | 2010-04-07 | 株式会社東芝 | 半導体モジュール |
TWI299248B (en) * | 2004-09-09 | 2008-07-21 | Phoenix Prec Technology Corp | Method for fabricating conductive bumps of a circuit board |
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