TW202041557A - 感光性樹脂組成物、使感光性樹脂組成物硬化而成的硬化膜、帶有硬化膜的基板及帶有硬化膜的基板的製造方法 - Google Patents
感光性樹脂組成物、使感光性樹脂組成物硬化而成的硬化膜、帶有硬化膜的基板及帶有硬化膜的基板的製造方法 Download PDFInfo
- Publication number
- TW202041557A TW202041557A TW109110258A TW109110258A TW202041557A TW 202041557 A TW202041557 A TW 202041557A TW 109110258 A TW109110258 A TW 109110258A TW 109110258 A TW109110258 A TW 109110258A TW 202041557 A TW202041557 A TW 202041557A
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- photosensitive resin
- acid
- group
- substrate
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Architecture (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polymerisation Methods In General (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Optical Filters (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019068558 | 2019-03-29 | ||
JP2019-068558 | 2019-03-29 | ||
JP2020-045160 | 2020-03-16 | ||
JP2020045160A JP2020166254A (ja) | 2019-03-29 | 2020-03-16 | 感光性樹脂組成物、感光性樹脂組成物を硬化してなる硬化膜、硬化膜付き基板および硬化膜付き基板の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW202041557A true TW202041557A (zh) | 2020-11-16 |
Family
ID=72716164
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109110258A TW202041557A (zh) | 2019-03-29 | 2020-03-26 | 感光性樹脂組成物、使感光性樹脂組成物硬化而成的硬化膜、帶有硬化膜的基板及帶有硬化膜的基板的製造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2020166254A (ja) |
KR (1) | KR20200115270A (ja) |
TW (1) | TW202041557A (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20240075890A (ko) * | 2021-11-09 | 2024-05-29 | 후지필름 가부시키가이샤 | 경화성 조성물, 경화물의 제조 방법, 막, 광학 소자, 이미지 센서, 고체 촬상 소자, 화상 표시 장치, 및, 라디칼 중합 개시제 |
KR20230103406A (ko) * | 2021-12-31 | 2023-07-07 | 주식회사 동진쎄미켐 | 감광성 수지 조성물, 표시장치 및 패턴 형성 방법 |
JP2023150423A (ja) | 2022-03-31 | 2023-10-16 | 日鉄ケミカル&マテリアル株式会社 | 感光性樹脂組成物、感光性樹脂組成物を硬化してなる硬化膜、硬化膜付き基板及び硬化膜付き基板の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4660986B2 (ja) | 2001-06-28 | 2011-03-30 | Jsr株式会社 | カラー液晶表示装置用感放射線性組成物、およびカラーフィルタ |
-
2020
- 2020-03-16 JP JP2020045160A patent/JP2020166254A/ja active Pending
- 2020-03-25 KR KR1020200036057A patent/KR20200115270A/ko unknown
- 2020-03-26 TW TW109110258A patent/TW202041557A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
JP2020166254A (ja) | 2020-10-08 |
KR20200115270A (ko) | 2020-10-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI782104B (zh) | 感光性樹脂組成物及附帶樹脂膜的基板的製造方法 | |
JP6822758B2 (ja) | タッチパネル用感光性樹脂組成物およびその硬化膜、ならびに当該硬化膜を有するタッチパネル | |
JP6713746B2 (ja) | スペーサー機能を有する遮光膜用の感光性樹脂組成物、遮光膜、液晶表示装置、スペーサー機能を有する遮光膜用の感光性樹脂組成物の製造方法、遮光膜の製造方法、および液晶表示装置の製造方法 | |
TW202041557A (zh) | 感光性樹脂組成物、使感光性樹脂組成物硬化而成的硬化膜、帶有硬化膜的基板及帶有硬化膜的基板的製造方法 | |
JP2011122151A (ja) | アルカリ可溶性樹脂及び感光性樹脂組成物 | |
JP2017181976A (ja) | 遮光膜用感光性樹脂組成物、これを硬化させた遮光膜を備えたディスプレイ用基板、及びディスプレイ用基板の製造方法 | |
TWI829905B (zh) | 黑色抗蝕劑用感光性樹脂組成物以及使其硬化而成的遮光膜以及彩色濾光片 | |
TW202043297A (zh) | 附硬化膜的基板之製造方法、附硬化膜的基板、感光性樹脂組成物、使感光性樹脂組成物硬化而成的硬化膜以及具有硬化膜或附硬化膜的基板之顯示裝置 | |
TW202115147A (zh) | 黑阻劑用感光性樹脂組成物、該感光性樹脂組成物的製造方法、及使其硬化而成的遮光膜、具有該遮光膜的彩色濾光片及觸控面板、具有該彩色濾光片及觸控面板的顯示裝置 | |
TW202040269A (zh) | 感光性樹脂組成物、使感光性樹脂組成物硬化而成的硬化膜、帶有硬化膜的基板及帶有硬化膜的基板的製造方法 | |
JP2020164720A (ja) | 重合性不飽和基含有アルカリ可溶性樹脂の製造方法、重合性不飽和基含有アルカリ可溶性樹脂、それを含む感光性樹脂組成物、それを硬化してなる硬化物、その硬化物を構成成分として含むタッチパネルおよびカラーフィルター | |
CN111752101A (zh) | 感光性树脂组合物、硬化膜、带有硬化膜的基板及带有硬化膜的基板的制造方法 | |
TW202340861A (zh) | 感光性樹脂組成物、使感光性樹脂組成物硬化而成的硬化膜、附有硬化膜的基板及附有硬化膜的基板的製造方法 | |
CN111752102A (zh) | 感光性树脂组合物、硬化膜、带有硬化膜的基板及带有硬化膜的基板的制造方法 | |
CN113448168A (zh) | 感光性树脂组合物、硬化膜、基板、基板的制造方法及显示装置 | |
JP2021105711A (ja) | ブラックレジスト用感光性樹脂組成物およびこれを硬化してなる遮光膜、当該遮光膜を有するカラーフィルターおよびタッチパネル、当該カラーフィルターおよびタッチパネルを有する表示装置 | |
TW202325753A (zh) | 光阻組成物、使用該光阻組成物之硬化物及基質圖案、著色分散液、以及光阻組成物之製造方法 | |
TW202309659A (zh) | 黑色抗蝕劑用感光性樹脂組成物、硬化膜、硬化膜的製造方法、以及具有所述硬化膜的彩色濾光片及隔離壁 | |
JP2023097381A (ja) | レジスト組成物、それを用いた硬化物及びマトリクスパターン、着色分散液、並びにレジスト組成物の製造方法 | |
TW202419474A (zh) | 黑色阻劑用感光性樹脂組成物、遮光膜、濾色器、觸控面板及顯示裝置 | |
TW202138418A (zh) | 感光性樹脂組成物及其硬化膜、具有該硬化膜的彩色濾光片 | |
CN118259550A (en) | Photosensitive resin composition, cured film, color filter, touch panel, and display device | |
TW202237669A (zh) | 感光性樹脂及使用該感光性樹脂之感光性樹脂組成物、以及該感光性樹脂組成物之硬化物及彩色濾光片 | |
TW202202531A (zh) | 黑色抗蝕劑用感光性樹脂組成物、其製造方法、遮光膜、彩色濾光片、觸控面板及顯示裝置 | |
JP2023096728A (ja) | 感光性樹脂組成物、硬化膜、硬化膜付き基板およびその製造方法、ならびに表示装置 |