TW201712370A - Light shielding member, black resin composition, and black resin molded article - Google Patents

Light shielding member, black resin composition, and black resin molded article Download PDF

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Publication number
TW201712370A
TW201712370A TW105115798A TW105115798A TW201712370A TW 201712370 A TW201712370 A TW 201712370A TW 105115798 A TW105115798 A TW 105115798A TW 105115798 A TW105115798 A TW 105115798A TW 201712370 A TW201712370 A TW 201712370A
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light
shielding film
resin
light shielding
black
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TW105115798A
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Chinese (zh)
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TWI725971B (en
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長濱豪士
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木本股份有限公司
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20—Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/02—Elements
    • C08K3/04—Carbon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/02—Homopolymers or copolymers of acids; Metal or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00—Coating compositions based on unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/32—Radiation-absorbing paints
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/42—Gloss-reducing agents
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B11/00—Filters or other obturators specially adapted for photographic purposes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2601/00—Inorganic fillers
    • B05D2601/02—Inorganic fillers used for pigmentation effect, e.g. metallic effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0406—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being air
    • B05D3/0413—Heating with air
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
    • B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/001—Conductive additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B11/00—Filters or other obturators specially adapted for photographic purposes
    • G03B11/04—Hoods or caps for eliminating unwanted light from lenses, viewfinders or focusing aids
    • G03B11/045—Lens hoods or shields
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B17/00—Details of cameras or camera bodies; Accessories therefor
    • G03B17/02—Bodies
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/145—Housing details, e.g. position adjustments thereof

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Laminated Bodies (AREA)
  • Diaphragms For Cameras (AREA)
  • Blocking Light For Cameras (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Lens Barrels (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

To provide a light shielding member, a black resin composition, and a black resin molded article excellent in durability and solvent resistance. [Solution] A light shielding member (1) includes a base (11), and a light shielding film (21) formed adjacently to at least one side of the base (11). The light shielding film (21) contains a UV curable resin serving as binder resin and a black pigment serving as a filler dispersed in the binder resin. Preferably, the light shielding film (21) further contains photo- and/or thermal- polymerization initiator. The content of the filler in the light shielding film (21) is preferably 10 % by mass or more and 60 % by mass or less in terms of the solid content of the total resin component contained in the light shielding film (21).

Description

遮光構件、黑色樹脂組成物及黑色樹脂成形品 Light shielding member, black resin composition, and black resin molded article

本發明係有關於遮光構件、黑色樹脂組成物及黑色樹脂成形品。 The present invention relates to a light shielding member, a black resin composition, and a black resin molded article.

以往，在相機或投影機等的光學機器中，係以具遮光性的構件構成相機內壁面等，來防止外光所致之光暈或疊影的發生等。作為此類遮光構件，已知有例如將由含有碳黑的黑色塗料構成且具有規定之表面形狀的光吸收膜設於基材薄膜的表面的光吸收性構件(參照專利文獻1)。 Conventionally, in an optical device such as a camera or a projector, a member having a light-shielding property is used to constitute a camera inner wall surface or the like to prevent occurrence of halation or superimposing due to external light. As such a light-shielding member, for example, a light-absorbing member in which a light-absorbing film having a predetermined surface shape and having a predetermined surface shape is provided on a surface of a base film is known (see Patent Document 1).

又，在單眼反射式照相機、小型相機、攝影機等的各種光學機器的快門、光圈構件或透鏡單元等中，也使用具遮光性的構件。甚而在這些遮光構件中，基於其使用態樣，也要求滑行性(滑動性)優良、及為低光澤。而且，以往作為各種光學機器的快門、光圈構件或透鏡單元等，係慣用對金屬薄膜塗佈黑色塗料而成者。然，近年 來，有人探討用輕量的塑膠材料取而代之。 Further, in a shutter, a diaphragm member, a lens unit, and the like of various optical devices such as a monocular reflex camera, a compact camera, and a video camera, a member having a light blocking property is also used. Even in these light-shielding members, it is required to have excellent gliding property (slidability) and low glossiness depending on the manner of use thereof. Further, conventionally, as a shutter, a diaphragm member, a lens unit, and the like of various optical devices, a black paint is applied to a metal thin film. However, in recent years Come, some people discuss using lightweight plastic materials instead.

作為此類非金屬製的遮光構件，已知有將在熱硬化型樹脂或常溫硬化型樹脂中含有碳黑及潤滑劑的遮光膜形成於樹脂薄膜的兩面的遮光構件(參照專利文獻2)。又，尚已知有將含有碳黑、聚乙烯蠟等的潤滑劑、吸油量為250(g/100g)以上之二氧化矽微粒子及黏結劑樹脂的遮光膜形成於樹脂薄膜的兩面的遮光性薄膜(參照專利文獻3)。 A light-shielding member in which a light-shielding film containing carbon black and a lubricant in a thermosetting resin or a room temperature curing resin is formed on both surfaces of a resin film is known as such a non-metallic light-shielding member (see Patent Document 2). Further, it is known that a light-shielding film containing a lubricant such as carbon black or polyethylene wax and a light-shielding film having an oil absorption of 250 (g/100 g) or more and a binder resin is formed on both surfaces of the resin film. Film (refer to Patent Document 3).

先前技術文獻 Prior technical literature 專利文獻 Patent literature

專利文獻1：日本特開2003-266580號公報 Patent Document 1: Japanese Laid-Open Patent Publication No. 2003-266580

專利文獻2：日本特開平04-009802號公報 Patent Document 2: Japanese Laid-Open Patent Publication No. 04-009802

專利文獻3：國際公開第2006/016555號 Patent Document 3: International Publication No. 2006/016555

然而，上述習知遮光膜仍稱不上耐久性(耐擦傷性)及耐溶劑性充分者，而要求進一步之改善。又，對於滑行性(滑動性)亦同樣地要求進一步之性能提升。然而，例如在習知技術中光學濃度為5.4以上者，碳黑、潤滑劑、二氧化矽微粒子等填充劑的填充率既已處於飽和狀態，填充劑之進一步的高度填充會達到技術上的極限。在所述情況下，例如為了提升滑行性而高度填充潤滑劑 時，便需縮減碳黑等其他的填充劑的摻混量，而此種設計變更會損及遮光性。 However, the conventional light-shielding film described above is still not sufficient in durability (scratch resistance) and solvent resistance, and further improvement is required. Further, for the gliding property (slidability), further performance improvement is required in the same manner. However, for example, in the prior art, when the optical density is 5.4 or more, the filling rate of the filler such as carbon black, lubricant, cerium oxide microparticles and the like is already saturated, and the further high filling of the filler reaches the technical limit. . In this case, for example, in order to improve the gliding property, the lubricant is highly filled. At this time, it is necessary to reduce the blending amount of other fillers such as carbon black, and such design changes may impair the light blocking property.

本發明係有鑑於上述課題而完成者。亦即，本發明係以提供一種耐久性及耐溶劑性優良的遮光構件、黑色樹脂組成物及黑色樹脂成形品為目的。又，本發明之進一步的目的在於提供一種不僅耐久性及耐溶劑性，且滑行性及遮光性亦優良的遮光構件、黑色樹脂組成物及黑色樹脂成形品。 The present invention has been made in view of the above problems. That is, the present invention has an object of providing a light-shielding member, a black resin composition, and a black resin molded article which are excellent in durability and solvent resistance. Further, a further object of the present invention is to provide a light-shielding member, a black resin composition, and a black resin molded article which are excellent in both gliding property and light-shielding property, not only durability and solvent resistance.

本案發明人等為解決上述課題而致力進行研究。其結果發現，透過使用紫外線硬化型樹脂作為黏結劑樹脂，可解決上述課題，而達成本發明。 The inventors of the present invention have made efforts to solve the above problems. As a result, it has been found that the above problems can be solved by using an ultraviolet curable resin as a binder resin, and the present invention has been achieved.

亦即，本發明係提供以下(1)~(11)所示之具體態樣： That is, the present invention provides the following specific aspects as shown in (1) to (11):

(1)一種遮光構件，其係具備基材、與設於該基材之至少一面的遮光膜，前述遮光膜係至少含有黏結劑樹脂與分散於該黏結劑樹脂中的填充劑，前述黏結劑樹脂係含有紫外線硬化型樹脂，前述填充劑係含有黑色顏料。 (1) A light shielding member comprising a substrate and a light shielding film provided on at least one surface of the substrate, wherein the light shielding film contains at least a binder resin and a filler dispersed in the binder resin, and the binder The resin contains an ultraviolet curable resin, and the filler contains a black pigment.

(2)如上述(1)之遮光構件，其中前述遮光膜係進一步含有光及/或熱聚合起始劑。 (2) The light shielding member according to (1) above, wherein the light shielding film further contains a light and/or a thermal polymerization initiator.

(3)如上述(1)或(2)之遮光構件，其中前述遮光膜中之填充劑的含量，以相對於前述遮光膜中所含之全樹脂成分的固形分換算，為10質量%以上、60質量%以 下。 (3) The light-shielding member of the above-mentioned (1) or (2), wherein the content of the filler in the light-shielding film is 10% by mass or more based on the solid content of the total resin component contained in the light-shielding film. 60% by mass under.

(4)如上述(1)~(3)中任一項之遮光構件，其中前述黑色顏料的含量，以相對於前述填充劑之總量的固形分換算，為85質量%以上、100質量%以下。 (4) The light-shielding member according to any one of the above-mentioned (1), wherein the content of the black pigment is 85 mass% or more and 100 mass% in terms of solid content with respect to the total amount of the filler. the following.

(5)如上述(1)~(4)中任一項之遮光構件，其中前述遮光膜係具有3μm以上且未達10μm的總厚度。 (5) The light shielding member according to any one of (1) to (4) above, wherein the light shielding film has a total thickness of 3 μm or more and less than 10 μm.

(6)如上述(1)~(5)中任一項之遮光構件，其中前述基材為片狀基材，前述遮光膜係設於前述片狀基材的其中一主面及另一主面。 The light shielding member according to any one of the above aspects, wherein the substrate is a sheet substrate, and the light shielding film is provided on one of the main faces of the sheet substrate and the other main member. surface.

(7)一種黑色樹脂組成物，其係至少含有基體樹脂與分散於該基體樹脂中的填充劑，前述基體樹脂係含有紫外線硬化型樹脂，前述填充劑係含有黑色顏料。 (7) A black resin composition comprising at least a matrix resin and a filler dispersed in the matrix resin, wherein the matrix resin contains an ultraviolet curable resin, and the filler contains a black pigment.

(8)如上述(7)之黑色樹脂組成物，其係進一步含有光及/或熱聚合起始劑。 (8) The black resin composition according to (7) above, which further contains a light and/or a thermal polymerization initiator.

(9)如上述(7)或(8)之黑色樹脂組成物，其中前述填充劑的含量，以相對於全樹脂成分的固形分換算，為10質量%以上、60質量%以下。 (9) The black resin composition according to the above (7) or (8), wherein the content of the filler is 10% by mass or more and 60% by mass or less based on the solid content of the total resin component.

(10)如上述(7)~(9)中任一項之黑色樹脂、組成物，其中前述黑色顏料的含量，以相對於前述填充劑之總量的固形分換算，為85質量%以上、100質量%以下。 (10) The black resin or the composition according to any one of the above (7), wherein the content of the black pigment is 85% by mass or more based on the solid content of the total amount of the filler. 100% by mass or less.

(11)一種黑色樹脂成形品，其係將如上述(7)~(10)中任一項之黑色樹脂組成物成形而成。 (11) A black resin molded article obtained by molding the black resin composition according to any one of the above (7) to (10).

於本發明中，係透過採用紫外線硬化型樹脂作為黏結劑樹脂，來提升耐久性(耐擦傷性)及耐溶劑 性。因此，無需高度填充用於提升滑行性的潤滑劑，而能夠將黑色顏料的摻混量維持於較高的程度，故可抑制滑行性及遮光性的劣化。又，在本發明較佳之態樣中，係進一步含有光及/或熱聚合起始劑。若如此構成，由於可藉由製膜時的照光處理及/或熱處理而形成更強固的遮光膜，而能夠進一步提升耐久性及耐溶劑性。再者，在其他較佳之態樣中，由於係將填充劑的含量設定得較少，藉此亦可進一步提升耐久性及耐溶劑性。於此情況下，亦可將黑色顏料相對於填充劑之總量的使用比例維持於較高的程度，因此，就遮光性而言亦能以高維度使其與前述特性達平衡。 In the present invention, durability (scratch resistance) and solvent resistance are improved by using an ultraviolet curable resin as a binder resin. Sex. Therefore, it is not necessary to highly fill the lubricant for improving the gliding property, and the blending amount of the black pigment can be maintained at a high level, so that deterioration of the gliding property and the light blocking property can be suppressed. Further, in a preferred aspect of the invention, the optical and/or thermal polymerization initiator is further included. According to this configuration, since a stronger light-shielding film can be formed by the illuminating treatment and/or heat treatment at the time of film formation, durability and solvent resistance can be further improved. Further, in other preferred aspects, since the content of the filler is set to be small, durability and solvent resistance can be further improved. In this case, the ratio of use of the black pigment to the total amount of the filler can be maintained at a high level, and therefore, the light-shielding property can be balanced with the aforementioned characteristics in a high dimension.

根據本發明，可提供一種耐久性及耐溶劑性優良的遮光構件、黑色樹脂組成物及黑色樹脂成形品。又，根據本發明較佳之態樣，可提供一種不僅耐久性及耐溶劑性，且滑行性及遮光性亦優良的遮光構件、黑色樹脂組成物及黑色樹脂成形品。而且，根據本發明，透過耐久性及耐溶劑性的改善，可延長製品壽命。又，藉由提升耐溶劑性，在穿孔加工或對製品組裝前等所進行的藥品洗淨時，由於可抑制塗膜的脫落或變色等，亦有助於製品的良率提升。 According to the invention, it is possible to provide a light-shielding member, a black resin composition, and a black resin molded article which are excellent in durability and solvent resistance. Moreover, according to a preferred aspect of the present invention, it is possible to provide a light-shielding member, a black resin composition, and a black resin molded article which are excellent in both gliding property and light-shielding property, not only durability and solvent resistance. Moreover, according to the present invention, the durability of the product and the solvent resistance can be extended to extend the life of the product. Further, by improving the solvent resistance, it is possible to suppress the peeling or discoloration of the coating film and the like, and also contribute to an improvement in the yield of the product when the medicine is cleaned by perforation or before the assembly of the product.

1‧‧‧遮光構件 1‧‧‧ shading members

11‧‧‧基材 11‧‧‧Substrate

21‧‧‧遮光膜 21‧‧‧Shade film

第1圖為示意性表示第一實施形態之遮光構件1的特取部分的圖。 Fig. 1 is a view schematically showing a specific portion of the light shielding member 1 of the first embodiment.

[實施發明之形態] [Formation of the Invention]

以下，針對本發明之實施形態，參照圖式詳細加以說明。此外，上下左右等的位置關係，除非特別合先敘明，否則係基於圖式所示之位置關係。又，圖式的尺寸比率不限定於圖示之比率。惟，以下之實施形態係用以說明本發明之例示，本發明不限定於此等，在不脫離其要旨的範圍內可任意變更而實施。此外，於本說明書中，例如「1~100」之數值範圍的表記係包含其上限值「1」及下限值「100」之兩者。又，就其他的數值範圍的表記亦同。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In addition, the positional relationship of up, down, left, and right, etc., is based on the positional relationship shown in the drawing unless otherwise specified. Further, the dimensional ratio of the drawings is not limited to the ratio shown. The following embodiments are intended to be illustrative of the present invention, and the present invention is not limited thereto, and may be modified as desired without departing from the scope of the invention. In addition, in the present specification, for example, the numerical range of "1 to 100" includes both the upper limit "1" and the lower limit "100". Also, the same is true for other numerical ranges.

第1圖為示意性表示本發明第一實施形態之遮光構件1的特取部分的圖。本實施形態之遮光構件1係具備基材11、與設於該基材11之至少一面的遮光膜21。遮光膜21係至少含有黏結劑樹脂及分散於該黏結劑樹脂中的填充劑。而且，本實施形態之遮光構件1係以含有紫外線硬化型樹脂及黑色顏料作為遮光膜21中所含之黏結劑樹脂及填充劑為特徵。 Fig. 1 is a view schematically showing a specific portion of a light shielding member 1 according to a first embodiment of the present invention. The light shielding member 1 of the present embodiment includes a substrate 11 and a light shielding film 21 provided on at least one surface of the substrate 11. The light shielding film 21 contains at least a binder resin and a filler dispersed in the binder resin. Further, the light shielding member 1 of the present embodiment is characterized in that an ultraviolet curable resin and a black pigment are contained as a binder resin and a filler contained in the light shielding film 21.

以下，就遮光構件1的各構成要素詳述之。 Hereinafter, each constituent element of the light shielding member 1 will be described in detail.

就基材11而言，只要是可支持遮光膜21者，則其種 類不特別限定。作為其具體例，可舉出紙、合成紙、金屬片、合金片、金屬箔、合成樹脂薄膜及此等的層合體等，但不特別限定於此等。此外，基材11可為與遮光膜21具有接著性者，亦可為與其不具有接著性者。與遮光膜21不具有接著性的基材11可發揮脫模薄膜之機能。基於尺寸穩定性、機械強度及輕量化等觀點，較佳使用合成樹脂薄膜。作為合成樹脂薄膜，可舉出聚酯薄膜、ABS(丙烯腈-丁二烯-苯乙烯)薄膜、聚醯亞胺薄膜、聚苯乙烯薄膜、聚碳酸酯薄膜等。又，亦可使用丙烯酸系、聚烯烴系、纖維素系、聚碸系、聚苯硫醚系、聚醚碸系、聚醚醚酮系之薄膜。此等當中，作為基材11，較適宜使用聚酯薄膜。特別是，經過延伸加工，尤為經過雙軸延伸加工的聚酯薄膜因機械強度及尺寸穩定性優良，因而特佳。又，對於耐熱用途，特佳為聚醯亞胺薄膜。於此，基材11的外觀可為透明、半透明、不透明任一種，不特別限定。亦可使用例如發泡聚酯薄膜等經發泡之合成樹脂薄膜、或使其含有碳黑等的黑色顏料或其他的顏料之合成樹脂薄膜。要求更薄且具高遮光性時，透過使用光學濃度較高的基材11，亦可補強遮光構件1全體的光學濃度。 As far as the substrate 11 is concerned, as long as it is capable of supporting the light shielding film 21, The class is not particularly limited. Specific examples thereof include paper, synthetic paper, metal sheet, alloy sheet, metal foil, synthetic resin film, and the like, but are not particularly limited thereto. Further, the substrate 11 may have an adhesive property with the light shielding film 21 or may have no adhesion thereto. The substrate 11 which does not have an adhesive property with the light-shielding film 21 can exhibit the function of a release film. A synthetic resin film is preferably used from the viewpoints of dimensional stability, mechanical strength, and weight reduction. Examples of the synthetic resin film include a polyester film, an ABS (acrylonitrile-butadiene-styrene) film, a polyimide film, a polystyrene film, and a polycarbonate film. Further, a film of an acrylic type, a polyolefin type, a cellulose type, a polyfluorene type, a polyphenylene sulfide type, a polyether type, or a polyetheretherketone type can also be used. Among these, as the substrate 11, a polyester film is preferably used. In particular, the polyester film which has been subjected to the stretching process, particularly the biaxially stretched processing, is excellent in mechanical strength and dimensional stability. Further, for heat-resistant use, a polyimide film is particularly preferred. Here, the appearance of the substrate 11 may be transparent, translucent or opaque, and is not particularly limited. For example, a foamed synthetic resin film such as a foamed polyester film or a synthetic resin film containing a black pigment such as carbon black or another pigment may be used. When it is required to be thinner and has a high light-shielding property, the optical density of the entire light-shielding member 1 can be reinforced by using the substrate 11 having a high optical density.

基材11的厚度可依據要求性能及用途適宜設定，不特別限定。一般而言係以1μm以上且未達250μm為標準。於此，基於遮光構件1的強度或剛性等觀點，較佳為51μm以上且未達250μm；基於輕量化及薄膜化觀點，則較佳為1μm以上、50μm以下。在本實施形態之遮 光構件1中，由於可格外提高遮光膜21之厚度換算的光學濃度(ODt)，即使將基材11及遮光膜21此兩者設定為薄膜，也可在維持遮光性等的各性能的狀態下實現例如總厚度為60μm以下，較佳為總厚度為35μm以下，更佳為總厚度為15μm以下，特佳為總厚度為10μm以下的遮光構件1。因此，在特別要求薄膜化的用途中，基材11的厚度更佳為1μm以上、25μm以下，再更佳為4μm以上、10μm以下，特佳為5μm以上、7μm以下。此外，基於提升與遮光膜21之接著性的觀點，亦可視需求對基材11表面進行錨定處理或電暈處理等的各種周知之表面處理。 The thickness of the substrate 11 can be appropriately set depending on the required properties and use, and is not particularly limited. Generally, it is based on 1 μm or more and less than 250 μm. In view of the strength, rigidity, and the like of the light-shielding member 1, it is preferably 51 μm or more and less than 250 μm, and is preferably 1 μm or more and 50 μm or less from the viewpoint of weight reduction and film formation. Covered in this embodiment In the optical member 1, the optical density (ODt) in terms of the thickness of the light-shielding film 21 can be increased, and even if both the substrate 11 and the light-shielding film 21 are formed as a film, the performance of each performance such as light-shielding property can be maintained. For example, the total thickness is 60 μm or less, preferably the total thickness is 35 μm or less, more preferably the total thickness is 15 μm or less, and particularly preferably the total thickness is 10 μm or less. Therefore, in the application in which film formation is particularly required, the thickness of the substrate 11 is more preferably 1 μm or more and 25 μm or less, still more preferably 4 μm or more and 10 μm or less, and particularly preferably 5 μm or more and 7 μm or less. Further, from the viewpoint of improving the adhesion to the light-shielding film 21, various known surface treatments such as anchoring treatment or corona treatment may be performed on the surface of the substrate 11 as needed.

遮光膜21為設於上述之基材11的至少一面者，係至少含有紫外線硬化型樹脂及黑色顏料。此外，第1圖中，係示出僅在片狀之基材11的其中一主面(上面)設置遮光膜21的態樣，惟亦可在片狀之基材11的其中一主面(上面)及另一主面(下面)分別設置遮光膜21。藉由在片狀之基材11的上面及下面此兩者設置遮光膜21，可提高遮光構件1的處理性。 The light shielding film 21 is provided on at least one side of the above-described substrate 11, and contains at least an ultraviolet curable resin and a black pigment. In addition, in the first drawing, the light-shielding film 21 is provided only on one main surface (upper surface) of the sheet-like base material 11, but it may be in one main surface of the sheet-like base material 11 ( The light shielding film 21 is provided on the upper surface and the other main surface (below). By providing the light shielding film 21 on both the upper surface and the lower surface of the sheet-like base material 11, the handleability of the light shielding member 1 can be improved.

遮光膜21係含有紫外線硬化型樹脂作為黏結劑樹脂，以其為必需成分。就此紫外線硬化型樹脂而言，可使用可藉由紫外線的照射而交聯硬化的光聚合性預聚物。例如，適宜使用1分子中具有2個以上的丙醯烯基，且可藉由交聯硬化而形成三維網目結構的丙烯酸系預聚物。作為丙烯酸系預聚物，可舉出胺基甲酸酯丙烯酸酯、 聚酯丙烯酸酯、環氧丙烯酸酯、三聚氰胺丙烯酸酯、聚氟烷基丙烯酸酯、聚矽氧丙烯酸酯等，但不特別限定於此等。紫外線硬化型樹脂可單獨使用1種，亦可組合2種以上使用。上述之丙烯酸系預聚物亦可單獨使用，而為了賦予提升交聯硬化性等的各種的性能，亦可併用聚合性單體。 The light-shielding film 21 contains an ultraviolet curable resin as a binder resin, and is an essential component. As the ultraviolet curable resin, a photopolymerizable prepolymer which can be crosslinked and cured by irradiation with ultraviolet rays can be used. For example, an acrylic prepolymer having two or more propenyl groups in one molecule and capable of forming a three-dimensional network structure by crosslinking and hardening is suitably used. Examples of the acrylic prepolymer include urethane acrylate, Polyester acrylate, epoxy acrylate, melamine acrylate, polyfluoroalkyl acrylate, polyoxy acrylate, etc., but it is not particularly limited to these. The ultraviolet curable resin may be used singly or in combination of two or more. The acrylic prepolymer described above may be used alone, and a polymerizable monomer may be used in combination in order to impart various properties such as crosslinking hardenability.

作為上述之聚合性單體，可舉出丙烯酸2-乙基己酯、丙烯酸2-羥基乙酯、丙烯酸2-羥基丙酯、丙烯酸丁氧基乙酯等的單官能丙烯酸單體；1,6-己二醇二丙烯酸酯、新戊二醇二丙烯酸酯、二乙二醇二丙烯酸酯、聚乙二醇二丙烯酸酯、羥基特戊酸酯新戊二醇二丙烯酸酯等的2官能丙烯酸單體；二新戊四醇六丙烯酸酯、三甲基丙烷三丙烯酸酯、新戊四醇三丙烯酸酯等的多官能丙烯酸單體等，但不特別限定於此等。此等可單獨使用1種，亦可組合2種以上使用。 Examples of the above polymerizable monomer include monofunctional acrylic monomers such as 2-ethylhexyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, and butoxyethyl acrylate; 1,6 2-functional acrylic acid such as hexanediol diacrylate, neopentyl glycol diacrylate, diethylene glycol diacrylate, polyethylene glycol diacrylate, hydroxypivalate neopentyl glycol diacrylate A polyfunctional acrylic monomer such as dipentaerythritol hexaacrylate, trimethylpropane triacrylate or pentaerythritol triacrylate, but is not particularly limited thereto. These may be used alone or in combination of two or more.

遮光膜21中之紫外線硬化型樹脂的含量不特別限定，以相對於遮光膜21之總量的固形分換算(phr)，較佳為40~90質量%，更佳為50~85質量%，再更佳為60~80質量%。藉由使紫外線硬化型樹脂的含量處於上述之較佳的範圍內，可使基材11與遮光膜21的接著性、遮光膜21的耐久性、耐溶劑性、遮光性、表面光澤性及滑動性等的物性以高維度平衡。又，可提升形成之遮光膜21的耐劃傷性，同時亦可防止遮光膜21脆化。 The content of the ultraviolet curable resin in the light-shielding film 21 is not particularly limited, and is preferably 40 to 90% by mass, and more preferably 50 to 85% by mass, based on the solid content of the total amount of the light-shielding film 21 (phr). More preferably, it is 60 to 80% by mass. By setting the content of the ultraviolet curable resin within the above preferred range, the adhesion between the substrate 11 and the light shielding film 21, the durability of the light shielding film 21, solvent resistance, light blocking property, surface gloss, and sliding can be achieved. Physical properties such as sex are balanced in a high dimension. Further, the scratch resistance of the formed light-shielding film 21 can be improved, and the light-shielding film 21 can be prevented from being embrittled.

另一方面，遮光膜21所含有的黑色顏料係用 來將紫外線硬化型樹脂著色成黑色而賦予遮光性者。作為此處所使用的黑色顏料，可舉出例如黑色樹脂粒子、鈦黑、磁鐵礦系黑、銅‧鐵‧錳系黑、碳黑等，但不特別限定於此等。此等當中，由隱蔽性優良而言，較佳為黑色樹脂粒子、鈦黑、碳黑，更佳為碳黑。就碳黑而言，基於對遮光膜21賦予導電性並防止靜電所產生的帶電之觀點，特佳使用導電性碳黑。碳黑的歷史較早，係由例如三菱化學股份有限公司、ASAHI CARBON股份有限公司、御國色素股份有限公司、RESINO COLOR公司、Cabot公司、DEGUSSA公司等上市販售各種等級的碳黑單質及碳黑分散液，只要依據要求性能或用途，由此等當中適宜選擇即可。此等可單獨使用1種，亦可組合2種以上使用。 On the other hand, the black pigment contained in the light shielding film 21 is used. The ultraviolet curable resin is colored black to impart light shielding properties. Examples of the black pigment used herein include, but are not limited to, black resin particles, titanium black, magnetite black, copper, iron, manganese black, and carbon black. Among these, from the viewpoint of excellent concealability, black resin particles, titanium black, carbon black, and more preferably carbon black are preferable. In the case of carbon black, conductive carbon black is particularly preferably used from the viewpoint of imparting conductivity to the light-shielding film 21 and preventing charging due to static electricity. The history of carbon black is earlier. For example, Mitsubishi Chemical Corporation, ASAHI CARBON Co., Ltd., Yuko Co., Ltd., RESINO COLOR, Cabot, DEGUSSA, etc., sell various grades of carbon black and carbon. The black dispersion may be appropriately selected according to the required performance or use. These may be used alone or in combination of two or more.

基於有效提高遮光膜21的遮光性之觀點，較佳使用平均粒徑不同的2種黑色顏料作為遮光膜21所含有的黑色顏料。透過如此使用大小2種的黑色顏料，在較大的黑色顏料之粒子間的空隙便緊密地填充有較小的黑色顏料，而能夠獲得可提高黑色顏料相對於總充填量之遮光性的遮光膜21。更具體而言，較佳與平均粒徑D50為0.4~2.5μm的第1黑色顏料共同併用平均粒徑D50為0.01~0.3μm的第2黑色顏料。再者，第1黑色顏料的平均粒徑D50，基於壓低表面光澤度且提升滑行性等觀點，更佳為0.5~1.5μm。又，第2黑色顏料的平均粒徑D50，基於獲得分散性或充分的遮光性等觀點，更佳為0.08~0.2μm。此外，本說明書中的平均粒徑係指以雷射繞射式粒度分布 測定裝置(例如島津製作所公司：SALD-7000等)測得的中值徑(D50)。如此使用大小2種的黑色顏料時，第1黑色顏料及第2黑色顏料的含有比例不特別限定，基於遮光性、表面光澤度、滑行性的平衡之觀點，以固形分換算的質量比計較佳為20：80~95：5，更佳為30：70~80：20，再更佳為40：60~70：30。此外，遮光膜21亦可含有上述之第1及第2黑色顏料以外的黑色顏料。 From the viewpoint of effectively improving the light blocking property of the light shielding film 21, it is preferable to use two kinds of black pigments having different average particle diameters as the black pigment contained in the light shielding film 21. By using two kinds of black pigments in this way, the gap between the particles of the larger black pigment is closely filled with a small black pigment, and a light-shielding film which can improve the light-shielding property of the black pigment with respect to the total filling amount can be obtained. twenty one. More specifically, it is preferable to use a second black pigment having an average particle diameter D 50 of 0.01 to 0.3 μm in combination with the first black pigment having an average particle diameter D 50 of 0.4 to 2.5 μm. In addition, the average particle diameter D 50 of the first black pigment is more preferably 0.5 to 1.5 μm from the viewpoint of lowering the surface glossiness and improving the gliding property. In addition, the average particle diameter D 50 of the second black pigment is more preferably 0.08 to 0.2 μm from the viewpoint of obtaining dispersibility or sufficient light blocking property. Further, the average particle diameter in the present specification means a median diameter (D 50 ) measured by a laser diffraction type particle size distribution measuring apparatus (for example, Shimadzu Corporation: SALD-7000, etc.). When the black pigment having two sizes is used in this manner, the content ratio of the first black pigment and the second black pigment is not particularly limited, and the mass ratio in terms of solid content is preferably based on the balance of light blocking property, surface glossiness, and gliding property. It is 20:80~95:5, more preferably 30:70~80:20, and even more preferably 40:60~70:30. Further, the light shielding film 21 may contain a black pigment other than the above-described first and second black pigments.

遮光膜21中之全黑色顏料的含量不特別限定，以相對於遮光膜21中所含之全樹脂成分的固形分換算(phr)，較佳為10質量%以上、60質量%以下，更佳為15質量%以上、50質量%以下，再更佳為20質量%以上、40質量%以下。藉由使黑色顏料的含量處於上述之較佳的範圍內，可使基材11與遮光膜21的接著性、遮光膜21的耐久性、耐溶劑性、遮光性、表面光澤性及滑行性等的各物性以高維度平衡。 The content of the total black pigment in the light-shielding film 21 is not particularly limited, and is preferably 10% by mass or more and 60% by mass or less, more preferably in terms of solid content (phr) of the total resin component contained in the light-shielding film 21. It is 15% by mass or more and 50% by mass or less, and more preferably 20% by mass or more and 40% by mass or less. By setting the content of the black pigment within the above preferred range, the adhesion between the substrate 11 and the light shielding film 21, the durability of the light shielding film 21, solvent resistance, light blocking property, surface gloss, and gliding property can be achieved. The physical properties are balanced in a high dimension.

此外，遮光膜21亦可含有上述之紫外線硬化型樹脂紫外線硬化型樹脂以外的其他的樹脂作為黏結劑樹脂。作為此其他的樹脂，可舉出聚(甲基)丙烯酸系樹脂、聚酯系樹脂、聚乙酸乙烯酯系樹脂、聚氯乙烯系樹脂、聚乙烯縮丁醛系樹脂、纖維素系樹脂、聚苯乙烯/聚丁二烯樹脂、聚胺基甲酸酯系樹脂、醇酸樹脂、丙烯酸系樹脂、不飽和聚酯系樹脂、環氧酯系樹脂、環氧系樹脂、環氧丙烯酸酯系樹脂、胺基甲酸酯丙烯酸酯系樹脂、聚酯丙烯酸酯系樹脂、聚醚丙烯酸酯系樹脂、酚系樹脂、三聚 氰胺系樹脂、尿素系樹脂、鄰苯二甲酸二烯丙酯系樹脂等的熱塑性樹脂或熱硬化性樹脂，但不特別限定於此等。又，亦可使用熱塑性彈性體、熱硬化性彈性體等。此等可單獨使用1種，亦可組合2種以上使用。 Further, the light shielding film 21 may contain a resin other than the ultraviolet curable resin ultraviolet curable resin described above as a binder resin. Examples of the other resin include a poly(meth)acrylic resin, a polyester resin, a polyvinyl acetate resin, a polyvinyl chloride resin, a polyvinyl butyral resin, a cellulose resin, and a poly Styrene/polybutadiene resin, polyurethane resin, alkyd resin, acrylic resin, unsaturated polyester resin, epoxy ester resin, epoxy resin, epoxy acrylate resin , urethane acrylate resin, polyester acrylate resin, polyether acrylate resin, phenol resin, trimer A thermoplastic resin such as a cyanamide resin, a urea resin, or a diallyl phthalate resin, or a thermosetting resin, but is not particularly limited thereto. Further, a thermoplastic elastomer, a thermosetting elastomer, or the like can also be used. These may be used alone or in combination of two or more.

又，在使用上述紫外線硬化型樹脂之際，係以使遮光膜21進一步含有光及/或熱聚合起始劑為佳。透過使其含有光及/或熱聚合起始劑，藉由製膜時的照光處理及/或熱處理可形成更強固的遮光膜21，因此可進一步提升耐久性及耐溶劑性。 Moreover, when the ultraviolet curable resin is used, it is preferred that the light shielding film 21 further contains light and/or a thermal polymerization initiator. By containing the light and/or thermal polymerization initiator, a stronger light-shielding film 21 can be formed by the illuminating treatment and/or heat treatment at the time of film formation, so that durability and solvent resistance can be further improved.

光聚合起始劑只要是可藉由照射可作為聚合反應的開端之波長的紫外線而裂解，而生成自由基的物質即可，其種類不特別限定。可舉出例如芳香族酮類、芳香族縮酮類、茂金屬化合物、肟酯類、羰基化合物、硫雜蒽酮類等的光聚合起始劑。更具體而言，可舉出苯乙酮、聯苯醯、二苯甲酮、米勒酮、安息香、苯甲基甲基縮酮、苯甲醯基苯甲酸酯、α-醯基肟酯、硫雜蒽酮類等，但不特別限定於此等。此等可單獨使用1種，亦可組合2種以上使用。 The photopolymerization initiator is not particularly limited as long as it can be cleaved by irradiation with ultraviolet rays having a wavelength at the beginning of the polymerization reaction to generate a radical. For example, a photopolymerization initiator such as an aromatic ketone, an aromatic ketal, a metallocene compound, an oxime ester, a carbonyl compound or a thioxanthone can be mentioned. More specifically, acetophenone, biphenyl hydrazine, benzophenone, meloketone, benzoin, benzyl methyl ketal, benzhydryl benzoate, α-mercapto oxime ester And thioxanthone or the like, but is not particularly limited thereto. These may be used alone or in combination of two or more.

熱聚合起始劑只要是可藉由加熱而裂解，而生成自由基的物質即可，其種類不特別限定。可舉出例如有機鹵化物、有機過氧化物、鎓鹽化合物、偶氮化合物等的熱聚合起始劑。此等當中，較佳使用偶氮化合物。作為偶氮化合物，可舉出偶氮腈化合物、偶氮醯胺化合物、環狀偶氮脒化合物、偶氮脒化合物等，但不特別限定於此 等。可使用例如2,2’-偶氮雙(2,4,4-三甲基戊烷)、4,4’-偶氮雙(4-氰基戊酸)、1,1’-偶氮雙(1-乙醯氧基-1-苯基乙烷)、1,1’-偶氮雙(1-環己烷羧酸甲酯)、4,4’-偶氮雙(4-氰基戊酸2-(全氟丁基)乙基)、4,4’-偶氮雙(4-氰基戊酸2-(三氟甲基)乙基)、4,4’-偶氮雙(4-氰基戊酸2-(全氟己基)乙基)等，及偶氮雙乙醯氧基苯基乙烷等。此等可單獨使用1種，亦可組合2種以上使用。 The thermal polymerization initiator is not particularly limited as long as it can be cleaved by heating to form a radical. For example, a thermal polymerization initiator such as an organic halide, an organic peroxide, an onium salt compound, or an azo compound can be mentioned. Among these, an azo compound is preferably used. The azo compound may, for example, be an azonitrile compound, an azoamine compound, a cyclic azo compound or an azo compound, but is not particularly limited thereto. Wait. For example, 2,2'-azobis(2,4,4-trimethylpentane), 4,4'-azobis(4-cyanovaleric acid), 1,1'-azo double can be used. (1-Ethyloxy-1-phenylethane), 1,1'-azobis(methyl 1-cyclohexanecarboxylate), 4,4'-azobis(4-cyanopentyl) Acid 2-(perfluorobutyl)ethyl), 4,4'-azobis(4-cyanopentanoate 2-(trifluoromethyl)ethyl), 4,4'-azobis (4 - 2-(perfluorohexyl)ethyl cyanovalerate, and the like, and azobisethoxy phenylethane. These may be used alone or in combination of two or more.

光及/或熱聚合起始劑的含量不特別限定，以相對於遮光膜21中所含之全樹脂成分的固形分換算，合計較佳為1.0~15質量%，更佳為3.0~10質量%。藉由使光及/或熱聚合起始劑的含量處於上述之較佳的範圍內，即容易獲得基材11與遮光膜21的接著性、遮光膜21的耐久性及耐溶劑性等更優良的遮光膜21。 The content of the light and/or the thermal polymerization initiator is not particularly limited, and is preferably 1.0 to 15% by mass, and more preferably 3.0 to 10% by mass, based on the solid content of the total resin component contained in the light-shielding film 21. %. When the content of the light and/or the thermal polymerization initiator is in the above preferred range, the adhesion between the substrate 11 and the light shielding film 21, the durability of the light shielding film 21, and the solvent resistance are more preferably obtained. The light shielding film 21.

更者，遮光膜21特佳含有熱聚合起始劑與光聚合起始劑。透過如此併用聚合起始劑，藉由使用熱聚合起始劑的熱硬化及使用光聚合起始劑的光硬化，便容易控制遮光膜21之膜表面及膜內部的硬化度，而容易調整所得之遮光膜21的強度、表面光澤性及滑行性等。如此併用聚合起始劑時，熱聚合起始劑與光聚合起始劑的摻混比例不特別限定，較佳為10：90~70：30，更佳為20：80~60：40，再更佳為30：70~50：50。此外，製膜時的硬化處理，可依序進行熱處理及照光處理，亦可同時進行兩種處理。基於所得之遮光膜21的強度、表面光澤性及滑行性等的易調整性觀點，係以比照光處理先進行熱處理 為佳。此時，可於熱處理後進行照光處理，亦可於熱處理後進一步接著進行熱處理並同時進行照光處理。 Further, the light shielding film 21 particularly preferably contains a thermal polymerization initiator and a photopolymerization initiator. By using the polymerization initiator in combination as described above, by heat hardening using a thermal polymerization initiator and photocuring using a photopolymerization initiator, it is easy to control the film surface of the light shielding film 21 and the degree of hardening inside the film, and it is easy to adjust the yield. The strength, surface gloss, and gliding properties of the light-shielding film 21. When the polymerization initiator is used in combination, the blending ratio of the thermal polymerization initiator to the photopolymerization initiator is not particularly limited, and is preferably 10:90 to 70:30, more preferably 20:80 to 60:40. More preferably 30:70~50:50. Further, the hardening treatment at the time of film formation may be sequentially performed by heat treatment and illuminating treatment, or two treatments may be simultaneously performed. Based on the ease of adjustment of the strength, surface gloss, and gliding property of the obtained light-shielding film 21, heat treatment is performed by photo-irradiation treatment. It is better. At this time, the illuminating treatment may be performed after the heat treatment, or may be further followed by the heat treatment after the heat treatment and simultaneously performing the illuminating treatment.

此外，遮光膜21亦可與上述之光及/或熱聚合起始劑共同含有聚合促進劑。於此，聚合促進劑係可減輕硬化時之空氣所引起的聚合障礙而加快硬化速度者。作為其具體例，可舉出對二甲基胺基苯甲酸異戊酯、對二甲基胺基苯甲酸乙酯等，但不特別限定於此等。此等可單獨使用1種，亦可組合2種以上使用。 Further, the light shielding film 21 may contain a polymerization accelerator together with the above-mentioned light and/or thermal polymerization initiator. Here, the polymerization accelerator can reduce the polymerization failure caused by the air during hardening and accelerate the hardening speed. Specific examples thereof include, but are not limited to, isoamyl dimethylaminobenzoate and ethyl p-dimethylaminobenzoate. These may be used alone or in combination of two or more.

此外，遮光膜21除上述之紫外線硬化型樹脂、黑色顏料、光及/或熱聚合起始劑以外，亦可含有潤滑劑。透過含有潤滑劑，可提升遮光膜21表面的滑行性(滑動性)，在加工成光學機器的快門、光圈構件、透鏡單元等時，可減小作動時的摩擦阻力，而能夠提升表面的耐擦傷性。作為此潤滑劑，可使用作為周知之粒狀潤滑劑廣為人知的有機系潤滑劑或無機系潤滑劑。此等當中，較佳為液態潤滑劑。具體而言，可舉出聚乙烯、石蠟、蠟等的烴系潤滑劑；硬脂酸、12-羥基硬脂酸等的脂肪酸系潤滑劑；硬脂酸醯胺、油酸醯胺、芥酸醯胺等的醯胺系潤滑劑；硬脂酸丁酯、硬脂酸單甘油酯等的酯系潤滑劑；醇系潤滑劑；金屬皂、滑石、二硫化鉬等的固態潤滑劑；聚矽氧樹脂粒子、聚四氟乙烯蠟、聚偏二氟乙烯等的氟樹脂粒子；交聯聚甲基丙烯酸甲酯粒子、交聯聚苯乙烯粒子等，但不特別限定於此等。此等當中，特佳使用有機系潤滑劑。此等可單獨使用1種，亦可組合2種以上使用。 Further, the light shielding film 21 may contain a lubricant in addition to the ultraviolet curable resin, the black pigment, the light, and/or the thermal polymerization initiator described above. By containing a lubricant, the slidability (slidability) of the surface of the light-shielding film 21 can be improved, and when it is processed into a shutter, a diaphragm member, a lens unit or the like of an optical device, the frictional resistance at the time of actuation can be reduced, and the surface resistance can be improved. Scratch. As the lubricant, an organic lubricant or an inorganic lubricant which is widely known as a known particulate lubricant can be used. Among these, a liquid lubricant is preferred. Specific examples thereof include hydrocarbon-based lubricants such as polyethylene, paraffin, and wax; fatty acid-based lubricants such as stearic acid and 12-hydroxystearic acid; decyl stearate, decyl oleate, and erucic acid. An amine-based lubricant such as guanamine; an ester-based lubricant such as butyl stearate or stearic acid monoglyceride; an alcohol-based lubricant; a solid lubricant such as metal soap, talc or molybdenum disulfide; The fluororesin particles such as oxygen resin particles, polytetrafluoroethylene wax, and polyvinylidene fluoride; crosslinked polymethyl methacrylate particles, crosslinked polystyrene particles, and the like, but are not particularly limited thereto. Among these, organic lubricants are especially preferred. These may be used alone or in combination of two or more.

潤滑劑的含有比例不特別限定，以相對於遮光膜21中所含之全樹脂成分的固形分換算，一般而言較佳為0.5~10質量%。此外，於本實施形態中，遮光膜21實質上不含潤滑劑亦屬較佳態樣之一。藉由如此採用無潤滑劑之態樣，可提高遮光膜21中之紫外線硬化型樹脂或黑色顏料的相對含量。由此，可抑制遮光性及導電性以及滑行性的降低，甚而，亦能有助於遮光膜21的接著性、耐久性及耐溶劑性的提升。此外，「實質上不含潤滑劑」係指潤滑劑的含有比例，以相對於遮光膜21中所含之全樹脂成分的固形分換算未達0.5質量%之意，更佳為未達0.1質量%。 The content ratio of the lubricant is not particularly limited, and is generally preferably 0.5 to 10% by mass in terms of the solid content of the total resin component contained in the light-shielding film 21. Further, in the present embodiment, it is also preferable that the light-shielding film 21 contains substantially no lubricant. By using the lubricant-free state as described above, the relative content of the ultraviolet curable resin or the black pigment in the light shielding film 21 can be increased. Thereby, it is possible to suppress a decrease in light-shielding property, electrical conductivity, and gliding property, and it is also possible to contribute to improvement in adhesion, durability, and solvent resistance of the light-shielding film 21. In addition, the term "substantially free of lubricant" means that the content of the lubricant is not more than 0.5% by mass, more preferably less than 0.1%, based on the solid content of the total resin component contained in the light-shielding film 21. %.

再者，遮光膜21也可含有去光澤劑(消光劑)。透過含有去光澤劑，可降低遮光膜21表面的光澤度(鏡面光澤度)，得以提升遮光性。作為此去光澤劑，可使用周知者。具體而言，可舉出交聯丙烯酸珠等的有機系微粒子、二氧化矽、鋁鎂矽酸鹽、氧化鈦等的無機系微粒子等，但不特別限定於此等。此等當中，基於分散性或成本等觀點較佳為二氧化矽。此等可單獨使用1種，亦可組合2種以上使用。 Further, the light shielding film 21 may also contain a delustering agent (matting agent). By containing a delustering agent, the glossiness (mirror gloss) of the surface of the light-shielding film 21 can be reduced, and the light-shielding property can be improved. As the delustering agent, a well-known person can be used. Specifically, organic fine particles such as crosslinked acrylic beads, inorganic fine particles such as cerium oxide, aluminum magnesium silicate, and titanium oxide are exemplified, but are not particularly limited thereto. Among these, cerium oxide is preferred from the viewpoints of dispersibility or cost. These may be used alone or in combination of two or more.

去光澤劑的含有比例不特別限定，以相對於遮光膜21中所含之全樹脂成分的固形分換算，一般而言較佳為0.5~20質量%。此外，於本實施形態中，遮光膜21實質上不含去光澤劑亦屬較佳態樣之一。藉由如此採用無去光澤劑之態樣，可提高遮光膜21中之紫外線硬化 型樹脂或黑色顏料的相對含量。由此，可抑制遮光性及導電性以及滑行性的降低，甚而，亦能有助於遮光膜21的接著性及耐溶劑性的提升。此外，「實質上不含去光澤劑」係指去光澤劑的含有比例，以相對於遮光膜21中所含之全樹脂成分的固形分換算未達0.5質量%之意，更佳為未達0.1質量%。 The content ratio of the delustering agent is not particularly limited, and is generally preferably 0.5 to 20% by mass in terms of the solid content of the total resin component contained in the light-shielding film 21. Further, in the present embodiment, it is also preferable that the light-shielding film 21 contains substantially no delustering agent. By using the absence of the delustering agent in this way, the ultraviolet curing in the light shielding film 21 can be improved. The relative content of the type of resin or black pigment. Thereby, it is possible to suppress a decrease in light-shielding property, electrical conductivity, and gliding property, and it is also possible to contribute to improvement in adhesion and solvent resistance of the light-shielding film 21. In addition, the term "substantially no delustering agent" means that the content of the delustering agent is not more than 0.5% by mass, more preferably less than the solid content of the total resin component contained in the light-shielding film 21. 0.1% by mass.

又，遮光膜21還可進一步含有其他的成分。作為此其他的成分，可舉出SnO2等的導電劑、難燃劑、抗菌劑、防黴劑、抗氧化劑、塑化劑、調平劑、流動調整劑、消泡劑、分散劑等，但不特別限定於此等。又，使用光聚合起始劑時，亦可使用例如正丁胺、三乙胺、三正丁基膦等的敏化劑或紫外線吸收劑等。 Further, the light shielding film 21 may further contain other components. Examples of the other component include a conductive agent such as SnO 2 , a flame retardant, an antibacterial agent, an antifungal agent, an antioxidant, a plasticizer, a leveling agent, a flow regulator, an antifoaming agent, and a dispersing agent. However, it is not particularly limited to this. Further, when a photopolymerization initiator is used, a sensitizer such as n-butylamine, triethylamine or tri-n-butylphosphine, or an ultraviolet absorber may be used.

另一方面，遮光膜21的厚度可依據要求性能及用途適宜設定，不特別限定。在可容許有厚度的用途中，只要充分採用遮光膜21的厚度即可，由此，可實現遮光膜21中之全黑色顏料的含有比例大幅縮減的遮光膜21。在此種用途中，遮光膜21的總厚度較佳為10μm以上、60μm以下，更佳為10μm以上、40μm以下。另一方面，在特別要求薄膜化的用途中，遮光膜21的總厚度較佳為3μm以上且未達10μm，更佳為4μm以上、9μm以下，再更佳為5μm以上、8μm以下。於此，遮光膜21的總厚度，在僅於基材11的其中一主面設置遮光膜21時，係指該遮光膜21的厚度；於基材11的兩面(其中一主面及另一主面)設置遮光膜21時，則指其兩面之遮光膜21 的厚度相加所得的值。 On the other hand, the thickness of the light shielding film 21 can be appropriately set depending on the required performance and use, and is not particularly limited. In the use in which the thickness can be tolerated, the thickness of the light-shielding film 21 can be sufficiently used, whereby the light-shielding film 21 in which the content ratio of the all-black pigment in the light-shielding film 21 is greatly reduced can be achieved. In such an application, the total thickness of the light shielding film 21 is preferably 10 μm or more and 60 μm or less, and more preferably 10 μm or more and 40 μm or less. On the other hand, in the application in which film formation is particularly required, the total thickness of the light-shielding film 21 is preferably 3 μm or more and less than 10 μm, more preferably 4 μm or more and 9 μm or less, still more preferably 5 μm or more and 8 μm or less. Here, the total thickness of the light-shielding film 21 refers to the thickness of the light-shielding film 21 when only one of the main surfaces of the substrate 11 is provided with the light-shielding film 21; on both sides of the substrate 11 (one of the main faces and the other When the light shielding film 21 is provided on the main surface, it refers to the light shielding film 21 on both sides thereof. The thickness is added to the value obtained.

於此，上述之遮光膜21其經厚度換算的光學濃度(ODt)較佳為0.54~2.00(μm-1)，更佳為0.55~2.00(μm-1)，再更佳為0.80~1.80(μm-1)，特佳為0.90~1.50(μm-1)，尤佳為0.91~1.40(μm-1)，最佳為0.92~1.20(μm-1)。透過經厚度換算的光學濃度(ODt)處於上述之較佳範圍，可實現具有充分的光學濃度(OD)，同時經高度薄膜化的遮光膜21。 Here, the optical density (ODt) converted by the thickness of the light-shielding film 21 is preferably 0.54 to 2.00 (μm -1 ), more preferably 0.55 to 2.00 (μm -1 ), still more preferably 0.80 to 1.80 ( μm -1), particularly preferably (μm -1 0.90 ~ 1.50), particularly preferably 0.91 ~ 1.40 (μm -1), most preferably 0.92 ~ 1.20 (μm -1). By the thickness-converted optical density (ODt) in the above preferred range, the light-shielding film 21 having a sufficient optical density (OD) while being highly thinned can be realized.

又，遮光膜21其表面光澤度較佳為5.0%以下。如此表面光澤度較低，則入射光的反射變少，可提升製成遮光構件1時的消光性而有可提高光吸收性的傾向。遮光膜21的表面光澤度更佳為4.0%以下。 Moreover, the surface glossiness of the light-shielding film 21 is preferably 5.0% or less. When the surface glossiness is low, the reflection of the incident light is reduced, and the matting property when the light shielding member 1 is formed can be improved, and the light absorbing property tends to be improved. The surface glossiness of the light-shielding film 21 is more preferably 4.0% or less.

而且，本實施形態之遮光構件1，基於可因應進一步的薄膜化並且具備充分的遮光性之觀點，較佳具有5.4~6.0的光學濃度(OD)，更佳為5.5~6.0。此外，於本說明書中，光學濃度(OD)係採用在後述之實施例所記載的條件下測得的值。 Further, the light-shielding member 1 of the present embodiment preferably has an optical density (OD) of 5.4 to 6.0, more preferably 5.5 to 6.0, from the viewpoint of further thinning and sufficient light-shielding property. Further, in the present specification, the optical density (OD) is a value measured under the conditions described in the examples below.

就本實施形態之遮光構件1的製造方法而言，只要可獲得上述之構成及組成的遮光構件1，則不特別限定。基於再現性良好、簡易且低成本地製造遮光膜21之觀點，適宜使用刮刀塗佈、浸漬塗佈、輥塗佈、棒塗佈、模塗佈、刮板塗佈、氣刀塗佈、觸壓塗佈、噴射塗佈、旋轉塗佈等向來周知之塗佈方法。而且，可藉由對如此塗佈的塗膜實施紫外線照射處理，並視需求進行熱及處 理或加壓處理等，而於基材11上製成遮光膜21。更具體而言，可藉由將溶媒中含有上述之紫外線硬化型樹脂、黑色顏料、以及視需求摻混的任意成分(光及/或熱聚合起始劑、潤滑劑、去光澤劑、其他的成分等)的遮光膜用塗佈液，塗佈於基材11的單面或兩面並使其乾燥後，實施紫外線照射處理，並進一步視需求進行熱處理或加壓處理等，而於基材11上製成遮光膜21。作為此處所使用之塗佈液的溶媒，可使用水；甲基乙基酮、甲基異丁基酮、環己酮等的酮系溶劑；乙酸甲酯、乙酸乙酯、乙酸丁酯等的酯系溶劑；甲基賽路蘇、乙基賽路蘇等的醚系溶劑；甲醇、乙醇、異丙醇等的醇系溶劑、以及此等的混合溶媒等。又，為提升基材11與遮光膜21之接著，亦可視需求對基材11表面進行錨定處理或電暈處理等。甚而，也可視需求在基材11與遮光膜21之間設置接著層等的中間層。 The method for producing the light shielding member 1 of the present embodiment is not particularly limited as long as the light shielding member 1 having the above-described configuration and composition can be obtained. From the viewpoint of producing the light-shielding film 21 with good reproducibility and being simple and low-cost, it is preferable to use doctor blade coating, dip coating, roll coating, bar coating, die coating, blade coating, air knife coating, and touch. A coating method known per se, such as press coating, spray coating, and spin coating. Moreover, the coating film thus coated can be subjected to ultraviolet irradiation treatment, and heat and heat can be carried out as needed. The light shielding film 21 is formed on the substrate 11 by a pressure treatment or the like. More specifically, the solvent may contain the above-mentioned ultraviolet curable resin, black pigment, and optional components (light and/or thermal polymerization initiator, lubricant, deluster, and the like) which are optionally blended. The coating liquid for a light-shielding film of the component or the like is applied to one surface or both surfaces of the substrate 11 and dried, and then subjected to ultraviolet irradiation treatment, and further subjected to heat treatment or pressure treatment as needed, and is applied to the substrate 11 . A light shielding film 21 is formed thereon. As a solvent of the coating liquid used here, water, a ketone solvent such as methyl ethyl ketone, methyl isobutyl ketone or cyclohexanone; methyl acetate, ethyl acetate, butyl acetate or the like can be used. An ester solvent; an ether solvent such as methyl sarbuta or ethyl sarbuta; an alcohol solvent such as methanol, ethanol or isopropyl alcohol; and a mixed solvent thereof. Further, in order to lift the substrate 11 and the light shielding film 21, the surface of the substrate 11 may be subjected to anchoring treatment, corona treatment, or the like as needed. Further, an intermediate layer such as an adhesive layer may be provided between the substrate 11 and the light shielding film 21 as needed.

於此，紫外線照射處理中所使用的光源，只要是可產生紫外線的光源則不特別限定。可使用例如低壓水銀燈、中壓水銀燈、高壓水銀燈、超高壓水銀燈、碳弧燈、金屬鹵化物燈、氙燈等。又，紫外線的照射條件可依據使用之光源的種類或輸出性能等適宜設定，不特別限定。紫外線的照射量一般而言係以累計光量1000~6000mJ/cm2左右為標準，較佳為2000~5000mJ/cm2。 Here, the light source used in the ultraviolet irradiation treatment is not particularly limited as long as it is a light source that can generate ultraviolet rays. For example, a low pressure mercury lamp, a medium pressure mercury lamp, a high pressure mercury lamp, an ultra high pressure mercury lamp, a carbon arc lamp, a metal halide lamp, a xenon lamp, or the like can be used. Further, the irradiation condition of the ultraviolet rays can be appropriately set depending on the type of the light source to be used, the output performance, and the like, and is not particularly limited. 2 is a left ultraviolet light irradiation amount generally based integrated quantity of light 1000 ~ 6000mJ / cm standard, preferably 2000 ~ 5000mJ / cm 2.

又，熱處理中所使用的熱源亦不特別限定。接觸式及非接觸式任一種均可適合使用。可使用例如遠紅 外線加熱器、短波長紅外線加熱器、中波長紅外線加熱器、碳製加熱器、烘箱、加熱滾筒等。熱處理中的處理溫度不特別限定，一般而言為100~200℃，較佳為120~190℃，更佳為130℃~180℃。 Further, the heat source used in the heat treatment is also not particularly limited. Both contact and non-contact types are suitable for use. Can use, for example, far red External heaters, short-wavelength infrared heaters, medium-wavelength infrared heaters, carbon heaters, ovens, heating rollers, etc. The treatment temperature in the heat treatment is not particularly limited, and is generally 100 to 200 ° C, preferably 120 to 190 ° C, more preferably 130 ° C to 180 ° C.

如以上所詳述，本實施形態之遮光構件1由於可在不過度損及滑行性及遮光性的情況下提升耐久性及耐溶劑性，從而，在例如精密機械領域、半導體領域、光學機器領域等中，可適合使用於作為長壽命的遮光構件。又，由於滑行性及耐久性優良，可特別適合使用於作為高性能單眼反射式照相機、小型相機、攝影機、行動電話、投影機等的光學機器用之遮光構件，例如快門、光圈構件、透鏡單元等。 As described in detail above, the light-shielding member 1 of the present embodiment can improve durability and solvent resistance without excessively impairing the gliding property and the light-shielding property, and is, for example, in the field of precision machinery, semiconductor, and optical equipment. Among them, it can be suitably used as a light-shielding member which is a long life. Moreover, since it is excellent in gliding property and durability, it can be suitably used for a light-shielding member for an optical device such as a high-performance single-lens reflex camera, a compact camera, a video camera, a mobile phone, or a projector, such as a shutter, a diaphragm member, and a lens unit. Wait.

此外，於上述實施形態中，係示出在基材11上設置遮光膜21之態樣，惟本發明也能以省略基材11之態樣實施。例如，採用至少含有基體樹脂與分散於該基體樹脂中的填充劑的樹脂組成物(黑色樹脂組成物)，即其中含有紫外線硬化型樹脂作為基體樹脂，且含有黑色顏料作為填充劑者，可有效地實施本發明。作為此處所使用的基體樹脂，可使用與在上述第一實施形態之紫外線硬化型樹脂及其他的樹脂中所說明者相同者。又，作為黑色顏料，可使用與在上述第一實施形態所說明者相同者。而且，該黑色樹脂組成物由於具有與上述實施形態中所說明之遮光膜21相同的組成，耐久性及耐溶劑性優良。因此，透過將其藉由紫外線硬化成形、熱成形、壓縮成形、 射出成形、吹塑成形、轉注成形、擠出成形等的各種周知之成形法成形，可獲得耐久性及耐溶劑性優良的成形品(黑色樹脂成形品)。又，暫時成形為片狀後，亦可進行真空成形或壓空成形等。 Further, in the above embodiment, the light shielding film 21 is provided on the substrate 11, but the present invention can also be carried out with the substrate 11 omitted. For example, a resin composition (black resin composition) containing at least a matrix resin and a filler dispersed in the matrix resin, that is, an ultraviolet curable resin as a matrix resin and containing a black pigment as a filler, can be effectively used. The invention is embodied. As the base resin used herein, the same as those described for the ultraviolet curable resin and other resins of the first embodiment described above can be used. Further, as the black pigment, the same as those described in the first embodiment above can be used. Further, the black resin composition has the same composition as that of the light-shielding film 21 described in the above embodiment, and is excellent in durability and solvent resistance. Therefore, it is formed by ultraviolet curing, thermoforming, compression molding, Various well-known molding methods such as injection molding, blow molding, transfer molding, and extrusion molding can be used to obtain a molded article (black resin molded article) excellent in durability and solvent resistance. Further, after being temporarily formed into a sheet shape, vacuum forming, pressure forming, or the like may be performed.

實施例 Example

以下，舉出實施例及比較例對本發明詳細加以說明，惟本發明不受此等實施例任何限定。就本發明而言，只要不悖離本發明之要旨而達成本發明之目的，則可採用各種的條件。此外，以下除非特別指定，否則「份」係表示「質量份」，「phr」係表示遮光膜中所含之「相對於全樹脂成分的固形分換算的質量%」。 Hereinafter, the present invention will be specifically described by way of Examples and Comparative Examples, but the present invention is not limited to these Examples. In the present invention, various conditions can be employed as long as the object of the present invention is achieved without departing from the gist of the present invention. In addition, unless otherwise specified, "parts" means "parts by mass", and "phr" means "mass % converted to solid content of all resin components" contained in the light-shielding film.

(實施例1) (Example 1)

在作為基材之厚度6μm的聚酯薄膜(K200：Mitsubishi Chemical Polyester公司)的兩面，將下述之遮光膜用塗佈液E1藉由棒塗佈法分別塗佈成乾燥後的厚度成為3μm並使其乾燥。其後，利用循環式熱風乾燥機進行150℃的熱處理，接著利用高壓水銀燈進行UV照射處理(累計光量：1000mJ/cm2)，而於基材的兩面分別形成厚度3μm的遮光膜，由此製成實施例1之光學機器用遮光構件。 On both surfaces of a polyester film (K200: Mitsubishi Chemical Polyester Co., Ltd.) having a thickness of 6 μm as a substrate, the following coating liquid E1 for a light-shielding film was applied by a bar coating method to a thickness of 3 μm after drying. Let it dry. Thereafter, heat treatment was performed at 150 ° C by a circulating hot air dryer, followed by UV irradiation treatment (accumulated light amount: 1000 mJ/cm 2 ) by a high pressure mercury lamp, and a light shielding film having a thickness of 3 μm was formed on both surfaces of the substrate. The light shielding member for an optical device of Example 1 was used.

<遮光膜用塗佈液E1> <Coating liquid E1 for coating film>

‧胺基甲酸酯丙烯酸酯100質量份 ‧ urethane acrylate 100 parts by mass

(樹脂1700BA：日本合成化學公司製，固形分：90%) (Resin 1700BA: manufactured by Nippon Synthetic Chemical Co., Ltd., solid content: 90%)

‧第1黑色顏料10.1phr ‧1st black pigment 10.1phr

(導電性碳黑SD-TT2003：RESINO COLOR公司製，平均粒徑0.6μm) (Conductive carbon black SD-TT2003: RESINO COLOR company, average particle size 0.6μm)

‧第2黑色顏料9.9phr ‧2nd black pigment 9.9phr

(導電性碳黑#273：御國色素公司製，平均粒徑0.15μm) (Conductive carbon black #273: made by Yuki Co., Ltd., average particle size 0.15μm)

‧調平劑 相對於固形分總量為0.2質量% ‧ Leveling agent is 0.2% by mass relative to the total solid content

(聚矽氧系添加劑M-ADDITIVE：Dow Corning Toray公司製) (Polyoxime-based additive M-ADDITIVE: manufactured by Dow Corning Toray Co., Ltd.)

‧偶氮系聚合起始劑5.0質量份 ‧ azo polymerization initiator 5.0 parts by mass

‧肟酯系光聚合起始劑3.0質量份 ‧ oxime ester photopolymerization initiator 3.0 parts by mass

‧稀釋溶劑100質量份 ‧Dilution solvent 100 parts by mass

(MEK：乙酸丁酯=54：46的混合溶媒) (MEK: butyl acetate = 54:46 mixed solvent)

(實施例2) (Example 2)

除將遮光膜用塗佈液E1中第1及第2黑色顏料的摻混量分別變更為7.6phr及7.4phr以外，係與實施例1同樣地操作，製成實施例2之光學機器用遮光構件。 In the same manner as in Example 1, except that the blending amounts of the first and second black pigments in the coating liquid E1 for the light-shielding film were changed to 7.6 phr and 7.4 phr, respectively, the optical device for the optical device of Example 2 was produced. member.

(實施例3) (Example 3)

除將遮光膜用塗佈液E1中第1及第2黑色顏料的摻 混量分別變更為15.1phr及14.9phr以外，係與實施例1同樣地操作，製成實施例3之光學機器用遮光構件。 In addition to the blending of the first and second black pigments in the coating liquid E1 for the light-shielding film The light shielding member for an optical device of Example 3 was produced in the same manner as in Example 1 except that the blending amount was changed to 15.1 phr and 14.9 phr, respectively.

(比較例1) (Comparative Example 1)

除使用下述之遮光膜用塗佈液CE1替代上述之遮光膜用塗佈液E1，並省略熱處理及UV照射處理以外，係與實施例1同樣地操作，製成比較例1之光學機器用遮光構件。 The optical device for Comparative Example 1 was used in the same manner as in Example 1 except that the coating liquid for coating for a light-shielding film CE1 was used instead of the coating liquid E1 for a light-shielding film described above, and the heat treatment and the UV irradiation treatment were omitted. Shading member.

<遮光膜用塗佈液CE1> <Coating liquid for coating film CE1>

‧丙烯酸多元醇100質量份 ‧100 parts by weight of acrylic polyol

(ACRYDIC A801P：DIC公司製，固形分：50%) (ACRYDIC A801P: DIC company, solid content: 50%)

‧異氰酸酯22.7質量份 ‧ Isocyanate 22.7 parts by mass

(TAKENATE D110N：Mitsui Chemicals & SKC Polyurethanes公司製，固形分：60%) (TAKENATE D110N: manufactured by Mitsui Chemicals & SKC Polyurethanes, solid content: 60%)

‧導電性奈米粒子碳黑23.16phr ‧ Conductive nanoparticle carbon black 23.16phr

(VULCAN XC-72R：Cabot公司製，平均一次粒徑30nm，凝聚體粒徑0.4μm) (VULCAN XC-72R: manufactured by Cabot, with an average primary particle size of 30 nm and agglomerate size of 0.4 μm)

‧去光澤劑5.6phr ‧ Delustering agent 5.6phr

(二氧化矽微粒子Acematt_TS100：EVONIK公司製，平均粒徑10μm) (Acerium oxide microparticles Acematt_TS100: manufactured by EVONIK, with an average particle size of 10 μm)

‧調平劑 相對於固形分總量為0.1質量% ‧ Leveling agent is 0.1% by mass relative to the total solid content

(聚矽氧系添加劑M-ADDITIVE：Dow Corning Toray公司製) (Polyoxime-based additive M-ADDITIVE: manufactured by Dow Corning Toray Co., Ltd.)

‧稀釋溶劑100質量份 ‧Dilution solvent 100 parts by mass

(MEK：甲苯：乙酸丁酯=4：3：3的混合溶媒) (MEK: toluene: butyl acetate = 4:3:3 mixed solvent)

(比較例2) (Comparative Example 2)

除使用下述之遮光膜用塗佈液CE2替代遮光膜用塗佈液CE1以外，係與比較例1同樣地操作，製成比較例2之光學機器用遮光構件。 A light-shielding member for an optical device of Comparative Example 2 was produced in the same manner as in Comparative Example 1, except that the coating liquid CE2 for a light-shielding film was used instead of the coating liquid CE1 for a light-shielding film.

<遮光膜用塗佈液CE2> <Coating liquid for coating film CE2>

‧丙烯酸多元醇100質量份 ‧100 parts by weight of acrylic polyol

(ACRYDIC A801P：DIC公司製，固形分：50%) (ACRYDIC A801P: DIC company, solid content: 50%)

‧異氰酸酯25.0質量份 ‧ Isocyanate 25.0 parts by mass

(TAKENATE D110N：Mitsui Chemicals & SKC Polyurethanes公司製，固形分：60%) (TAKENATE D110N: manufactured by Mitsui Chemicals & SKC Polyurethanes, solid content: 60%)

‧導電性奈米粒子碳黑40.00phr ‧ Conductive nanoparticle carbon black 40.00phr

(VULCAN XC-72R：Cabot公司製，平均一次粒徑30nm，凝聚體粒徑0.4μm) (VULCAN XC-72R: manufactured by Cabot, with an average primary particle size of 30 nm and agglomerate size of 0.4 μm)

‧調平劑 相對於固形分總量為0.05質量% ‧ Leveling agent is 0.05% by mass relative to the total solid content

(聚矽氧系添加劑M-ADDITIVE：Dow Corning Toray公司製) (Polyoxime-based additive M-ADDITIVE: manufactured by Dow Corning Toray Co., Ltd.)

‧稀釋溶劑100質量份 ‧Dilution solvent 100 parts by mass

(MEK：甲苯：乙酸丁酯=4：3：3的混合溶媒) (MEK: toluene: butyl acetate = 4:3:3 mixed solvent)

(比較例3) (Comparative Example 3)

除使用對遮光膜用塗佈液CE2摻混比較例1中使用之去光澤劑5.6phr的遮光膜用塗佈液CE3以外，係與比較例2同樣地操作，製成比較例3之光學機器用遮光構件。 An optical apparatus of Comparative Example 3 was produced in the same manner as in Comparative Example 2, except that the coating liquid CE3 for a light-shielding film of 5.6 phr of the glossing agent used in Comparative Example 1 was blended with the coating liquid CE2 for the light-shielding film. Use a shading member.

對所得之實施例1~3及比較例1~3之光學機器用遮光構件，依以下之條件進行各物性的測定及評定。將評定結果示於表1。 The obtained light-shielding members for optical devices of Examples 1 to 3 and Comparative Examples 1 to 3 were measured and evaluated for each physical property under the following conditions. The evaluation results are shown in Table 1.

(1)耐久性(耐擦傷性) (1) Durability (scratch resistance)

將所得之實施例1~3及比較例1~3之光學機器用遮光構件作為相機的光圈構件使用，使其作動100萬次並檢視塗膜面之擦傷與剝離的有無。於此，係將無擦傷及剝離者評為「◎」，將有些許的擦傷或剝離但使用上無問題者評為「○」，將無法使用者評為「×」。 The obtained light-shielding members for optical devices of Examples 1 to 3 and Comparative Examples 1 to 3 were used as a diaphragm member of a camera, and were operated for 1 million times to examine the presence or absence of scratches and peeling of the coating film surface. Here, the person who has no abrasion and peeling is rated as "◎", and those who have some scratches or peeling but have no problem in use are rated as "○", and the user cannot be rated as "X".

(2)耐溶劑性 (2) Solvent resistance

對遮光膜擦拭含有甲基乙基酮的擦拭布來回20次，檢視遮光膜的變化。將無變化者評為「◎」，將有些許的變化但使用上無問題者評為「○」，將無法使用者評為「×」。 The wiping cloth containing methyl ethyl ketone was wiped back and forth 20 times on the light-shielding film to examine the change of the light-shielding film. Those who have no change will be rated as "◎", those who have changed slightly but who have no problem in use will be rated as "○", and users will not be rated as "X".

(3)光學濃度OD (3) Optical density OD

光學濃度的測定係基於JIS-K7651：1988，使用光學濃度計(TD-904：GretagMacbeth公司)測定。此外，測定係使用UV濾光片。 The optical density was measured based on JIS-K7651:1988 using an optical densitometer (TD-904: GretagMacbeth Co., Ltd.). In addition, the measurement system uses a UV filter.

(4)厚度換算的光學濃度ODt (4) Optical density ODt converted by thickness

由光學濃度除以膜厚，算出每厚度1μm的光學濃度ODt(μm-1)。 The optical density ODt (μm -1 ) per thickness of 1 μm was calculated by dividing the optical density by the film thickness.

(5)表面光澤度 (5) Surface gloss

使用數位變角光澤計(UGV-5K：Suga Test Instruments公司)，依據JIS-Z8741：1997，測定入射受光角60°處之遮光膜表面的表面光澤度(鏡面光澤度)(%)。可看出光澤度愈低，消光性愈優良。 The surface gloss (mirror gloss) (%) of the surface of the light-shielding film at an incident light-receiving angle of 60° was measured in accordance with JIS-Z8741:1997 using a digital variable angle gloss meter (UGV-5K: Suga Test Instruments). It can be seen that the lower the gloss, the better the matting property.

(6)滑行性的評定 (6) Assessment of taxiing

依據JIS-K7125：1999，在荷重200(g)、速度100(mm/min)的條件下量測遮光膜的靜摩擦係數(μs)與動摩擦係數(μk)，分別依照以下之基準進行評定。 According to JIS-K7125:1999, the static friction coefficient (μs) and the dynamic friction coefficient (μk) of the light-shielding film were measured under the conditions of a load of 200 (g) and a speed of 100 (mm/min), and were evaluated according to the following criteria.

靜摩擦係數(μs) Static friction coefficient (μs)

未達0.30 ◎ Not up to 0.30 ◎

0.30以上且未達0.35 ○ 0.30 or more and less than 0.35 ○

0.35以上且未達0.40 △ 0.35 or more and less than 0.40 △

0.40以上 × 0.40 or more ×

動摩擦係數(μk) Dynamic friction coefficient (μk)

0.30以上且未達0.35 ◎ 0.30 or more and less than 0.35 ◎

0.35以上且未達0.40 ○ 0.35 or more and less than 0.40 ○

0.40以上 × 0.40 or more ×

如表1所示，在屬習知設計的比較例1之光學機器用遮光構件中，耐久性及耐溶劑性較差。又，遮光膜之厚度換算的光學濃度(ODt)低至0.51，作為基本性能的遮光性亦不充分。再者，由於為壓低表面光澤度而摻混的去光澤劑之故，滑行性亦惡化。 As shown in Table 1, in the light-shielding member for optical devices of Comparative Example 1 which is of a conventional design, durability and solvent resistance were inferior. Further, the optical density (ODt) in terms of the thickness of the light-shielding film was as low as 0.51, and the light-shielding property as a basic property was also insufficient. Further, the gliding property is also deteriorated due to the delustering agent blended to lower the surface glossiness.

又，為提升光學濃度OD而高度填充黑色顏料的比較例2之光學機器用遮光構件，對比於比較例1其遮光性及滑行性雖提升，但耐久性及耐溶劑性仍差，甚而表面光澤度惡化。為改善此表面光澤度的惡化而進一步摻混去光澤劑者為比較例3。就此比較例3之光學機器用遮光構件，由於去光澤劑的摻混，雖可壓低表面光澤度，但另一方面耐久性及耐溶劑性仍差，而且大幅損及滑行性。 Further, in the optical device light-shielding member of Comparative Example 2, which is highly filled with a black pigment to raise the optical density OD, the light-shielding property and the gliding property are improved as compared with Comparative Example 1, but the durability and the solvent resistance are still poor, and even the surface gloss is improved. Degree deteriorated. In Comparative Example 3, in order to improve the deterioration of the gloss of the surface, the delustering agent was further blended. In the light-shielding member for an optical device of Comparative Example 3, the glossiness of the surface can be lowered due to the blending of the delustering agent, but on the other hand, durability and solvent resistance are still poor, and the gliding property is greatly impaired.

相對於此，本發明實施例1~3之光學機器用遮光構件，可看出其耐久性及耐溶劑性均獲改善。又，由實施例1~3的對比，可看出有若減少黑色顏料的含量，則可進一步改善耐久性及耐溶劑性的傾向。再者，可知實施例1~3之光學機器用遮光構件，就其遮光性、表面光澤度及滑行性亦為高性能者。特別是，可看出就表面光澤度及滑行性而言，儘管未使用去光澤劑或滑動劑，但仍顯示出優良的性能。由以上可確認，本發明實施例1~3之光學機器用遮光構件其單面的膜厚為3μm而達成超薄膜化，同時，可在未過度損及遮光性、表面光澤度及滑行性的情況下改善耐久性及耐溶劑性。 On the other hand, in the light-shielding members for optical devices according to Examples 1 to 3 of the present invention, it was found that both durability and solvent resistance were improved. Further, from the comparison of Examples 1 to 3, it can be seen that if the content of the black pigment is reduced, the durability and solvent resistance tend to be further improved. Further, it is understood that the light-shielding members for optical devices of Examples 1 to 3 are also high in light-shielding property, surface glossiness, and gliding property. In particular, it can be seen that in terms of surface gloss and gliding, although no delustering agent or slip agent is used, excellent performance is exhibited. From the above, it was confirmed that the light-shielding members for optical devices according to Examples 1 to 3 of the present invention have a film thickness of 3 μm on one side, thereby achieving ultra-thin film formation, and at the same time, the light-shielding property, surface glossiness, and gliding property are not excessively impaired. Improve durability and solvent resistance in case.

(實施例4) (Example 4)

除使用下述之遮光膜用塗佈液E4替代遮光膜用塗佈液E1，在基材的兩面分別予以塗佈成乾燥後的厚度成為單面5μm以外，係與實施例1同樣地操作，製成實施例4之光學機器用遮光構件。 The coating liquid E1 for a light-shielding film was used in the same manner as in Example 1 except that the coating liquid E1 for a light-shielding film was used instead of the coating liquid E1 which was applied to both surfaces of the substrate and dried to a thickness of 5 μm on one side. A light shielding member for an optical device of Example 4 was produced.

<遮光膜用塗佈液E2> <Coating liquid E2 for coating film>

‧胺基甲酸酯丙烯酸酯100質量份 ‧ urethane acrylate 100 parts by mass

(樹脂1700BA：日本合成化學公司製，固形分：90%) (Resin 1700BA: manufactured by Nippon Synthetic Chemical Co., Ltd., solid content: 90%)

‧黑色顏料30.0phr ‧Black pigment 30.0phr

(導電性碳黑SD-TT2003：RESINO COLOR公司製，平均粒徑0.6μm) (Conductive carbon black SD-TT2003: RESINO COLOR company, average particle size 0.6μm)

‧調平劑 相對於固形分總量為0.2質量% ‧ Leveling agent is 0.2% by mass relative to the total solid content

(聚矽氧系添加劑M-ADDITIVE：Dow Corning Toray公司製) (Polyoxime-based additive M-ADDITIVE: manufactured by Dow Corning Toray Co., Ltd.)

‧偶氮系聚合起始劑5.0質量份 ‧ azo polymerization initiator 5.0 parts by mass

‧肟酯系光聚合起始劑3.0質量份 ‧ oxime ester photopolymerization initiator 3.0 parts by mass

‧稀釋溶劑100質量份 ‧Dilution solvent 100 parts by mass

(MEK：乙酸丁酯=54：46的混合溶媒) (MEK: butyl acetate = 54:46 mixed solvent)

(實施例5) (Example 5)

除使用將遮光膜用塗佈液E4中黑色顏料的摻混量變更為40.0phr的遮光膜用塗佈液E5，在基材的兩面予以分 別塗佈成乾燥後的厚度成為單面4μm以外，係與實施例1同樣地操作，製成實施例5之光學機器用遮光構件。 The coating liquid E5 for a light-shielding film in which the amount of the black pigment in the coating liquid E4 for the light-shielding film is changed to 40.0 phr is divided on both sides of the substrate. The light-shielding member for an optical device of Example 5 was produced in the same manner as in Example 1 except that the thickness after drying was 4 μm on one side.

如表2所示，可看出本發明實施例4~5之光學機器用遮光構件其耐久性及耐溶劑性均獲改善。又，可知實施例4~5之光學機器用遮光構件，就其遮光性、表面光澤度及滑行性，亦具有充分的性能。特別是，可看出就滑行性而言，儘管未使用去光澤劑或滑動劑，但仍顯示出優良的性能。由以上可確認，本發明實施例4~5之光學機器用遮光構件可在未過度損及遮光性、表面光澤度及滑行性的情況下改善耐久性及耐溶劑性。 As shown in Table 2, it can be seen that the light-shielding members for optical devices of Examples 4 to 5 of the present invention are improved in durability and solvent resistance. Moreover, it is understood that the light-shielding members for optical devices of Examples 4 to 5 have sufficient performance in terms of light-shielding property, surface glossiness, and gliding property. In particular, it can be seen that in terms of gliding property, although no delustering agent or slip agent is used, excellent performance is exhibited. From the above, it was confirmed that the light-shielding members for optical devices of Examples 4 to 5 of the present invention can improve durability and solvent resistance without excessively impairing light-shielding properties, surface glossiness, and gliding properties.

[產業上可利用性] [Industrial availability]

本發明可在精密機械領域、半導體領域、光學機器領域等中，廣泛且有效地利用於作為長壽命且耐溶劑性優良的遮光構件。又，由於亦可實現滑行性及遮光性亦優良者，因此，本發明可特別適合利用於作為高性能單眼反射式照相機、小型相機、攝影機、行動電話、投影機等的光學機器用之遮光構件，例如快門、光圈構件、透鏡單元等。 The present invention can be widely and effectively utilized as a light-shielding member which is excellent in long-life and excellent in solvent resistance in the field of precision machinery, semiconductor, and optical equipment. Further, since the gliding property and the light-shielding property are also excellent, the present invention is particularly suitable for use as a light-shielding member for an optical device such as a high-performance single-lens reflex camera, a compact camera, a video camera, a mobile phone, or a projector. For example, a shutter, a diaphragm member, a lens unit, and the like.

1‧‧‧遮光構件 1‧‧‧ shading members

11‧‧‧基材 11‧‧‧Substrate

21‧‧‧遮光膜 21‧‧‧Shade film

Claims (11)

一種遮光構件，其係具備基材、與設於該基材之至少一面的遮光膜，前述遮光膜係至少含有黏結劑樹脂與分散於該黏結劑樹脂中的填充劑，前述黏結劑樹脂係含有紫外線硬化型樹脂，前述填充劑係含有黑色顏料。 A light shielding member comprising a base material and a light shielding film provided on at least one surface of the base material, wherein the light shielding film contains at least a binder resin and a filler dispersed in the binder resin, and the binder resin contains The ultraviolet curable resin, the filler contains a black pigment. 如請求項1之遮光構件，其中前述遮光膜係進一步含有光及/或熱聚合起始劑。 The light shielding member according to claim 1, wherein the light shielding film further contains a light and/or a thermal polymerization initiator. 如請求項1或2之遮光構件，其中前述遮光膜中之填充劑的含量，以相對於前述遮光膜中所含之全樹脂成分的固形分換算，為10質量%以上、60質量%以下。 The light-shielding member of claim 1 or 2, wherein the content of the filler in the light-shielding film is 10% by mass or more and 60% by mass or less based on the solid content of the total resin component contained in the light-shielding film. 如請求項1~3中任一項之遮光構件，其中前述黑色顏料的含量，以相對於前述填充劑之總量的固形分換算，為85質量%以上、100質量%以下。 The light-shielding member according to any one of claims 1 to 3, wherein the content of the black pigment is 85% by mass or more and 100% by mass or less based on the solid content of the total amount of the filler. 如請求項1~4中任一項之遮光構件，其中前述遮光膜係具有3μm以上且未達10μm的總厚度。 The light shielding member according to any one of claims 1 to 4, wherein the light shielding film has a total thickness of 3 μm or more and less than 10 μm. 如請求項1~5中任一項之遮光構件，其中前述基材為片狀基材，前述遮光膜係設於前述片狀基材的其中一主面及另一主面。 The light shielding member according to any one of claims 1 to 5, wherein the substrate is a sheet substrate, and the light shielding film is provided on one of the main surfaces and the other main surface of the sheet substrate. 一種黑色樹脂組成物，其係至少含有基體樹脂與分散於該基體樹脂中的填充劑，前述基體樹脂係含有紫外線硬化型樹脂，前述填充劑係含有黑色顏料。 A black resin composition comprising at least a matrix resin and a filler dispersed in the matrix resin, wherein the matrix resin contains an ultraviolet curable resin, and the filler contains a black pigment. 如請求項7之黑色樹脂組成物，其係進一步含有光及/或熱聚合起始劑。 The black resin composition of claim 7, which further comprises a light and/or thermal polymerization initiator. 如請求項7或8之黑色樹脂組成物，其中前述填充劑的含量，以相對於全樹脂成分的固形分換算，為10質量%以上、60質量%以下。 The black resin composition of claim 7 or 8, wherein the content of the filler is 10% by mass or more and 60% by mass or less based on the solid content of the total resin component. 如請求項7~9中任一項之黑色樹脂組成物，其中前述黑色顏料的含量，以相對於前述填充劑之總量的固形分換算，為85質量%以上、100質量%以下。 The black resin composition according to any one of claims 7 to 9, wherein the content of the black pigment is 85% by mass or more and 100% by mass or less based on the solid content of the total amount of the filler. 一種黑色樹脂成形品，其係將如請求項7~10中任一項之黑色樹脂組成物成形而成。 A black resin molded article obtained by molding the black resin composition according to any one of claims 7 to 10.
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