TW200710568A - Photosensitive resin composition for forming light shielding pattern of plasma display - Google Patents
Photosensitive resin composition for forming light shielding pattern of plasma displayInfo
- Publication number
- TW200710568A TW200710568A TW095129984A TW95129984A TW200710568A TW 200710568 A TW200710568 A TW 200710568A TW 095129984 A TW095129984 A TW 095129984A TW 95129984 A TW95129984 A TW 95129984A TW 200710568 A TW200710568 A TW 200710568A
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- photosensitive resin
- light
- plasma display
- light shielding
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Gas-Filled Discharge Tubes (AREA)
- Polymerisation Methods In General (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005261220A JP4640971B2 (ja) | 2005-09-08 | 2005-09-08 | プラズマディスプレイの遮光性パターン形成用感光性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200710568A true TW200710568A (en) | 2007-03-16 |
TWI319118B TWI319118B (zh) | 2010-01-01 |
Family
ID=37858723
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095129984A TW200710568A (en) | 2005-09-08 | 2006-08-15 | Photosensitive resin composition for forming light shielding pattern of plasma display |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4640971B2 (zh) |
KR (1) | KR100899410B1 (zh) |
CN (1) | CN1928718B (zh) |
TW (1) | TW200710568A (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI675872B (zh) * | 2016-04-11 | 2019-11-01 | 日商東洋油墨Sc控股股份有限公司 | 遮光層形成用樹脂組合物及其製造方法、遮光層、以及遮光性構件及其製造方法 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4795086B2 (ja) * | 2006-04-13 | 2011-10-19 | 富士フイルム株式会社 | 感光性組成物及びそれを用いた感光性転写材料、表示装置用遮光膜及びその製造方法、ブラックマトリクス、遮光膜付基板並びに表示装置 |
KR101142631B1 (ko) * | 2007-12-14 | 2012-05-10 | 코오롱인더스트리 주식회사 | 샌드블라스트 레지스트용 감광성 수지 조성물 및 드라이필름 포토레지스트 |
JP5266958B2 (ja) * | 2008-08-22 | 2013-08-21 | 凸版印刷株式会社 | 液晶表示装置用カラーフィルタ |
KR101261619B1 (ko) * | 2010-03-16 | 2013-05-07 | 주식회사 엘지화학 | 컬러 필터 제조용 잉크 조성물 |
JP5732222B2 (ja) * | 2010-09-30 | 2015-06-10 | 太陽ホールディングス株式会社 | 感光性樹脂組成物 |
WO2017078271A1 (en) * | 2015-11-04 | 2017-05-11 | Rohm And Haas Electronic Materials Korea Ltd. | Colored photosensitive resin composition and light shielding spacer prepared therefrom |
KR102674086B1 (ko) * | 2022-04-01 | 2024-06-14 | (주)호전에이블 | 구리 소결 페이스트 조성물 및 이의 제조방법 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6010824A (en) | 1992-11-10 | 2000-01-04 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same |
JPH1184125A (ja) * | 1997-09-12 | 1999-03-26 | Tokyo Ohka Kogyo Co Ltd | 色フィルタ用光重合性組成物、および色フィルタの製造方法 |
MY121423A (en) * | 1998-06-26 | 2006-01-28 | Ciba Sc Holding Ag | Photopolymerizable thermosetting resin compositions |
JP2001261761A (ja) * | 2000-03-22 | 2001-09-26 | Jsr Corp | 感放射線性樹脂組成物および表示パネル用スペーサー |
JP4130102B2 (ja) * | 2001-09-18 | 2008-08-06 | 富士フイルム株式会社 | 感放射線性着色組成物 |
TW200714651A (en) * | 2002-10-28 | 2007-04-16 | Mitsubishi Chem Corp | Photopolymerization composition and color filter using the same |
KR100581971B1 (ko) * | 2003-02-11 | 2006-05-22 | 주식회사 동진쎄미켐 | 미세 전극 형성용 고점도 Ag 페이스트 조성물 및 이를이용하여 제조된 미세 전극 |
JP4437651B2 (ja) * | 2003-08-28 | 2010-03-24 | 新日鐵化学株式会社 | 感光性樹脂組成物及びそれを用いたカラーフィルター |
JP2005091853A (ja) * | 2003-09-18 | 2005-04-07 | Toppan Printing Co Ltd | 感光性組成物およびそれを用いて形成したフォトスペーサを有するカラーフィルタ |
JP2005129319A (ja) * | 2003-10-23 | 2005-05-19 | Matsushita Electric Ind Co Ltd | 光硬化型組成物、それを用いたプラズマディスプレイパネルおよびその製造方法 |
JP2005202252A (ja) * | 2004-01-16 | 2005-07-28 | Dainippon Printing Co Ltd | 固体撮像素子カラーフィルター用感光性着色組成物、固体撮像素子カラーフィルター、固体撮像素子、及び固体撮像素子カラーフィルターの製造方法 |
TWI285297B (en) * | 2004-02-09 | 2007-08-11 | Chi Mei Corp | Light-sensitive resin composition for black matrix |
-
2005
- 2005-09-08 JP JP2005261220A patent/JP4640971B2/ja not_active Expired - Fee Related
-
2006
- 2006-08-15 TW TW095129984A patent/TW200710568A/zh not_active IP Right Cessation
- 2006-09-05 CN CN2006101518102A patent/CN1928718B/zh not_active Expired - Fee Related
- 2006-09-06 KR KR1020060085555A patent/KR100899410B1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI675872B (zh) * | 2016-04-11 | 2019-11-01 | 日商東洋油墨Sc控股股份有限公司 | 遮光層形成用樹脂組合物及其製造方法、遮光層、以及遮光性構件及其製造方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI319118B (zh) | 2010-01-01 |
CN1928718B (zh) | 2010-05-26 |
KR100899410B1 (ko) | 2009-05-26 |
JP2007073434A (ja) | 2007-03-22 |
KR20070029064A (ko) | 2007-03-13 |
JP4640971B2 (ja) | 2011-03-02 |
CN1928718A (zh) | 2007-03-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |