TW200628952A - Method for manufacturing array board for display device - Google Patents
Method for manufacturing array board for display deviceInfo
- Publication number
- TW200628952A TW200628952A TW095103708A TW95103708A TW200628952A TW 200628952 A TW200628952 A TW 200628952A TW 095103708 A TW095103708 A TW 095103708A TW 95103708 A TW95103708 A TW 95103708A TW 200628952 A TW200628952 A TW 200628952A
- Authority
- TW
- Taiwan
- Prior art keywords
- display device
- substrate
- resin layer
- array board
- positive
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 229920002120 photoresistant polymer Polymers 0.000 abstract 4
- 239000011347 resin Substances 0.000 abstract 3
- 229920005989 resin Polymers 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/161—Coating processes; Apparatus therefor using a previously coated surface, e.g. by stamping or by transfer lamination
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16L—PIPES; JOINTS OR FITTINGS FOR PIPES; SUPPORTS FOR PIPES, CABLES OR PROTECTIVE TUBING; MEANS FOR THERMAL INSULATION IN GENERAL
- F16L55/00—Devices or appurtenances for use in, or in connection with, pipes or pipe systems
- F16L55/16—Devices for covering leaks in pipes or hoses, e.g. hose-menders
- F16L55/179—Devices for covering leaks in pipes or hoses, e.g. hose-menders specially adapted for bends, branch units, branching pipes or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136231—Active matrix addressed cells for reducing the number of lithographic steps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/1201—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/80—Manufacture or treatment specially adapted for the organic devices covered by this subclass using temporary substrates
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials For Photolithography (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
- Thin Film Transistor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20050009530 | 2005-02-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200628952A true TW200628952A (en) | 2006-08-16 |
TWI348068B TWI348068B (en) | 2011-09-01 |
Family
ID=36777450
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095103708A TWI348068B (en) | 2005-02-02 | 2006-02-03 | Method for manufacturing array board for display device |
Country Status (7)
Country | Link |
---|---|
US (1) | US8216762B2 (zh) |
EP (1) | EP1844364B1 (zh) |
JP (1) | JP4699483B2 (zh) |
KR (1) | KR100786200B1 (zh) |
CN (1) | CN100565310C (zh) |
TW (1) | TWI348068B (zh) |
WO (1) | WO2006083104A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8853695B2 (en) | 2006-10-13 | 2014-10-07 | Kobe Steel, Ltd. | Thin film transistor substrate including source-drain electrodes formed from a nitrogen-containing layer or an oxygen/nitrogen-containing layer |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5408848B2 (ja) * | 2007-07-11 | 2014-02-05 | 株式会社ジャパンディスプレイ | 半導体装置の製造方法 |
KR101305803B1 (ko) * | 2008-09-10 | 2013-09-06 | 코오롱인더스트리 주식회사 | 다층구조의 필름형 감광성 전사재료 |
KR20100066808A (ko) * | 2008-12-10 | 2010-06-18 | 주식회사 동진쎄미켐 | 포지티브형 감광성 유-무기 하이브리드 절연막 조성물 |
JP5590837B2 (ja) | 2009-09-15 | 2014-09-17 | キヤノン株式会社 | 機能性領域の移設方法 |
KR101949225B1 (ko) | 2012-04-16 | 2019-04-26 | 삼성디스플레이 주식회사 | 박막 트랜지스터 및 이를 포함하는 표시 장치 |
JP6022254B2 (ja) * | 2012-08-06 | 2016-11-09 | 東京応化工業株式会社 | スクリーン印刷用インク組成物およびパターン形成方法 |
WO2016027985A1 (ko) * | 2014-08-20 | 2016-02-25 | 주식회사 엘지화학 | 포토레지스트 제거용 스트리퍼 조성물 및 이를 이용한 포토레지스트의 박리방법 |
WO2017032437A1 (en) * | 2015-08-21 | 2017-03-02 | Merck Patent Gmbh | Patterned bank structures on substrates and formation method |
JP6748478B2 (ja) * | 2016-04-25 | 2020-09-02 | 太陽インキ製造株式会社 | ドライフィルム、硬化物およびプリント配線板 |
TW201740524A (zh) * | 2016-05-10 | 2017-11-16 | Sony Corp | 導電性元件、輸入裝置及電子機器 |
CN106873309A (zh) * | 2017-02-22 | 2017-06-20 | 浙江福斯特新材料研究院有限公司 | 一种正性感光水溶性阻焊干膜及用途 |
CN111712763A (zh) * | 2018-02-16 | 2020-09-25 | 富士胶片株式会社 | 抗蚀剂图案的制造方法、电路基板的制造方法及触摸面板的制造方法 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS6024545A (ja) | 1983-07-21 | 1985-02-07 | Japan Synthetic Rubber Co Ltd | ポジ型感光性樹脂組成物 |
JPS62194249A (ja) * | 1986-02-20 | 1987-08-26 | Fuji Photo Film Co Ltd | ポジ型感光性組成物 |
JPS62251739A (ja) * | 1986-04-24 | 1987-11-02 | Fuji Photo Film Co Ltd | 感光性組成物 |
US4845008A (en) * | 1986-02-20 | 1989-07-04 | Fuji Photo Film Co., Ltd. | Light-sensitive positive working, o-guinone diazide presensitized plate with mixed solvent |
EP0345305A4 (en) * | 1987-12-10 | 1991-10-02 | Macdermid Incorporated | Image-reversible dry-film photoresists |
JPH03280588A (ja) * | 1990-03-29 | 1991-12-11 | Hitachi Aic Inc | プリント配線板の製造方法 |
JPH05107760A (ja) * | 1991-10-14 | 1993-04-30 | Sannopuko Kk | 感光性樹脂組成物 |
JPH06102662A (ja) | 1991-10-14 | 1994-04-15 | Sannopuko Kk | 感光性樹脂組成物 |
JPH0695369A (ja) * | 1991-10-14 | 1994-04-08 | Sannopuko Kk | 感光性樹脂組成物 |
JP3613640B2 (ja) * | 1994-08-05 | 2005-01-26 | 住友化学株式会社 | キノンジアジドスルホン酸エステル、その製法及び用途 |
JP3427562B2 (ja) * | 1995-05-09 | 2003-07-22 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
JP3057010B2 (ja) * | 1996-08-29 | 2000-06-26 | 東京応化工業株式会社 | ポジ型レジスト組成物及びレジストパターンの形成方法 |
JPH11142829A (ja) | 1997-09-08 | 1999-05-28 | Asahi Chem Ind Co Ltd | 液晶表示素子の製造法 |
JPH1195442A (ja) * | 1997-09-24 | 1999-04-09 | Sharp Corp | フォトレジストパターン形成方法 |
US6462107B1 (en) | 1997-12-23 | 2002-10-08 | The Texas A&M University System | Photoimageable compositions and films for printed wiring board manufacture |
US6396559B1 (en) | 1998-11-17 | 2002-05-28 | Sharp Kabushiki Kaisha | LCD including spacers used in combination with polymer walls |
JP2000214470A (ja) | 1999-01-26 | 2000-08-04 | Sharp Corp | ドライフィルムレジストおよび液晶表示装置の製造方法 |
JP3490375B2 (ja) | 1999-06-28 | 2004-01-26 | シャープ株式会社 | 液晶表示装置の製造方法 |
JP3683785B2 (ja) | 1999-07-28 | 2005-08-17 | シャープ株式会社 | 液晶表示装置およびその製造方法 |
JP2002049043A (ja) | 2000-05-25 | 2002-02-15 | Sharp Corp | 積層型液晶表示装置及びその製造方法 |
JP2002341525A (ja) | 2001-05-14 | 2002-11-27 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト転写材料およびそれを用いた基板表面の加工方法 |
US7312281B2 (en) * | 2002-04-19 | 2007-12-25 | Dupont Electronic Polymers L.P. | Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity |
US7449280B2 (en) * | 2004-05-26 | 2008-11-11 | Microchem Corp. | Photoimageable coating composition and composite article thereof |
TWI285074B (en) * | 2004-10-01 | 2007-08-01 | Au Optronics Corp | Supporting cone of bottom-lighting backlight module |
CN101111803B (zh) * | 2005-02-02 | 2011-07-20 | 可隆株式会社 | 正性干膜光致抗蚀剂以及用于制备该光致抗蚀剂的组合物 |
-
2006
- 2006-02-01 EP EP06715802.2A patent/EP1844364B1/en not_active Not-in-force
- 2006-02-01 US US11/814,899 patent/US8216762B2/en not_active Expired - Fee Related
- 2006-02-01 JP JP2007553045A patent/JP4699483B2/ja not_active Expired - Fee Related
- 2006-02-01 WO PCT/KR2006/000349 patent/WO2006083104A1/en active Application Filing
- 2006-02-01 CN CNB2006800036717A patent/CN100565310C/zh not_active Expired - Fee Related
- 2006-02-02 KR KR1020060009912A patent/KR100786200B1/ko active IP Right Grant
- 2006-02-03 TW TW095103708A patent/TWI348068B/zh active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8853695B2 (en) | 2006-10-13 | 2014-10-07 | Kobe Steel, Ltd. | Thin film transistor substrate including source-drain electrodes formed from a nitrogen-containing layer or an oxygen/nitrogen-containing layer |
Also Published As
Publication number | Publication date |
---|---|
JP4699483B2 (ja) | 2011-06-08 |
EP1844364A1 (en) | 2007-10-17 |
EP1844364A4 (en) | 2010-06-02 |
WO2006083104A1 (en) | 2006-08-10 |
EP1844364B1 (en) | 2015-04-01 |
KR100786200B1 (ko) | 2007-12-17 |
JP2008537597A (ja) | 2008-09-18 |
US20080135842A1 (en) | 2008-06-12 |
KR20060088843A (ko) | 2006-08-07 |
CN101111798A (zh) | 2008-01-23 |
US8216762B2 (en) | 2012-07-10 |
TWI348068B (en) | 2011-09-01 |
CN100565310C (zh) | 2009-12-02 |
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