TW200609680A - Pattern-forming material, pattern-forming device, and pattern-forming method - Google Patents
Pattern-forming material, pattern-forming device, and pattern-forming methodInfo
- Publication number
- TW200609680A TW200609680A TW094124451A TW94124451A TW200609680A TW 200609680 A TW200609680 A TW 200609680A TW 094124451 A TW094124451 A TW 094124451A TW 94124451 A TW94124451 A TW 94124451A TW 200609680 A TW200609680 A TW 200609680A
- Authority
- TW
- Taiwan
- Prior art keywords
- pattern
- forming
- forming material
- viscosity
- photosensitive layer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Laminated Bodies (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004214896 | 2004-07-22 | ||
JP2005206210A JP2006058864A (ja) | 2004-07-22 | 2005-07-14 | パターン形成材料、並びにパターン形成装置及びパターン形成方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200609680A true TW200609680A (en) | 2006-03-16 |
Family
ID=35785228
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094124451A TW200609680A (en) | 2004-07-22 | 2005-07-20 | Pattern-forming material, pattern-forming device, and pattern-forming method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2006058864A (zh) |
TW (1) | TW200609680A (zh) |
WO (1) | WO2006009117A1 (zh) |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3406544B2 (ja) * | 1999-03-18 | 2003-05-12 | 日立化成工業株式会社 | 感光性エレメント、これを用いたレジストパターンの製造法、プリント配線板の製造法及びリードフレームの製造法 |
TWI255393B (en) * | 2000-03-21 | 2006-05-21 | Hitachi Chemical Co Ltd | Photosensitive resin composition, photosensitive element using the same, process for producing resist pattern and process for producing printed wiring board |
JP2001350255A (ja) * | 2000-06-08 | 2001-12-21 | Hitachi Chem Co Ltd | ブラックマトリックス形成用感光性フィルム |
JP2002148792A (ja) * | 2000-11-15 | 2002-05-22 | Fuji Photo Film Co Ltd | 樹脂積層体の製造方法及びカラーフィルタ |
JP2002236361A (ja) * | 2001-02-08 | 2002-08-23 | Fuji Photo Film Co Ltd | 感光性転写材料及びその製造方法 |
JP2003005364A (ja) * | 2001-06-20 | 2003-01-08 | Hitachi Chem Co Ltd | 回路形成用感光性フィルム及びプリント配線板の製造法 |
JP2003337428A (ja) * | 2002-05-20 | 2003-11-28 | Fuji Photo Film Co Ltd | 露光装置 |
JP2003337427A (ja) * | 2002-05-20 | 2003-11-28 | Fuji Photo Film Co Ltd | 露光装置 |
JP4076845B2 (ja) * | 2002-11-21 | 2008-04-16 | 富士フイルム株式会社 | 感光性転写材料 |
-
2005
- 2005-07-14 JP JP2005206210A patent/JP2006058864A/ja active Pending
- 2005-07-15 WO PCT/JP2005/013173 patent/WO2006009117A1/ja active Application Filing
- 2005-07-20 TW TW094124451A patent/TW200609680A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
JP2006058864A (ja) | 2006-03-02 |
WO2006009117A1 (ja) | 2006-01-26 |
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