SG94791A1 - Illuminance measurement apparatus and exposure apparatus - Google Patents

Illuminance measurement apparatus and exposure apparatus

Info

Publication number
SG94791A1
SG94791A1 SG200101837A SG200101837A SG94791A1 SG 94791 A1 SG94791 A1 SG 94791A1 SG 200101837 A SG200101837 A SG 200101837A SG 200101837 A SG200101837 A SG 200101837A SG 94791 A1 SG94791 A1 SG 94791A1
Authority
SG
Singapore
Prior art keywords
illuminance measurement
exposure
exposure apparatus
measurement apparatus
illuminance
Prior art date
Application number
SG200101837A
Other languages
English (en)
Inventor
Fujinaka Tsuyoshi
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of SG94791A1 publication Critical patent/SG94791A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200101837A 2000-03-24 2001-03-23 Illuminance measurement apparatus and exposure apparatus SG94791A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000083627 2000-03-24
JP2001023812A JP2001338868A (ja) 2000-03-24 2001-01-31 照度計測装置及び露光装置

Publications (1)

Publication Number Publication Date
SG94791A1 true SG94791A1 (en) 2003-03-18

Family

ID=26588238

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200101837A SG94791A1 (en) 2000-03-24 2001-03-23 Illuminance measurement apparatus and exposure apparatus

Country Status (6)

Country Link
US (1) US6690455B2 (ja)
EP (1) EP1139174A3 (ja)
JP (1) JP2001338868A (ja)
KR (1) KR20010090519A (ja)
SG (1) SG94791A1 (ja)
TW (1) TW516094B (ja)

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CN1288502C (zh) * 2001-10-25 2006-12-06 东丽工程株式会社 利用激光束的识别码的打印装置
EP1316847A1 (en) * 2001-11-30 2003-06-04 Degraf s.r.l. "Machine for the uv exposure of flexographic plates"
US20050224902A1 (en) * 2002-02-06 2005-10-13 Ramsey Craig C Wireless substrate-like sensor
US7289230B2 (en) 2002-02-06 2007-10-30 Cyberoptics Semiconductors, Inc. Wireless substrate-like sensor
US6828542B2 (en) * 2002-06-07 2004-12-07 Brion Technologies, Inc. System and method for lithography process monitoring and control
JP2004055933A (ja) * 2002-07-22 2004-02-19 Advantest Corp 電子ビーム露光装置、及び電子ビーム計測モジュール
US7053355B2 (en) 2003-03-18 2006-05-30 Brion Technologies, Inc. System and method for lithography process monitoring and control
EP3226073A3 (en) 2003-04-09 2017-10-11 Nikon Corporation Exposure method and apparatus, and method for fabricating device
TW201834020A (zh) 2003-10-28 2018-09-16 日商尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
CN100461336C (zh) 2003-10-31 2009-02-11 株式会社尼康 曝光装置以及器件制造方法
TW201809801A (zh) 2003-11-20 2018-03-16 日商尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
TWI437618B (zh) 2004-02-06 2014-05-11 尼康股份有限公司 偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
US7828929B2 (en) * 2004-12-30 2010-11-09 Research Electro-Optics, Inc. Methods and devices for monitoring and controlling thin film processing
JP2006260090A (ja) * 2005-03-16 2006-09-28 Fuji Xerox Co Ltd シート、表示媒体ユニット、シート取付装置およびシート取外装置
EP1881521B1 (en) 2005-05-12 2014-07-23 Nikon Corporation Projection optical system, exposure apparatus and exposure method
US7924416B2 (en) 2005-06-22 2011-04-12 Nikon Corporation Measurement apparatus, exposure apparatus, and device manufacturing method
JP4580327B2 (ja) * 2005-11-21 2010-11-10 東京エレクトロン株式会社 被処理体の取り出し方法及びプログラム記憶媒体並びに載置機構
US7893697B2 (en) 2006-02-21 2011-02-22 Cyberoptics Semiconductor, Inc. Capacitive distance sensing in semiconductor processing tools
CN101410690B (zh) 2006-02-21 2011-11-23 赛博光学半导体公司 半导体加工工具中的电容性距离感测
TWI454859B (zh) * 2006-03-30 2014-10-01 尼康股份有限公司 移動體裝置、曝光裝置與曝光方法以及元件製造方法
WO2007129753A1 (ja) 2006-05-10 2007-11-15 Nikon Corporation 露光装置及びデバイス製造方法
US20080056557A1 (en) * 2006-08-31 2008-03-06 Texas Instruments Incorporated System and method for analyzing a light beam of a wafer inspection tool or an exposure tool
US20080055590A1 (en) * 2006-08-31 2008-03-06 Texas Instruments Incorporated System and method for analyzing a light beam of an exposure tool or a reticle inspection tool
KR101388304B1 (ko) 2006-09-29 2014-04-22 싸이버옵틱스 쎄미콘덕터 인코퍼레이티드 기판형 입자 센서
US7778793B2 (en) 2007-03-12 2010-08-17 Cyberoptics Semiconductor, Inc. Wireless sensor for semiconductor processing systems
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
TWI385905B (zh) * 2008-05-08 2013-02-11 Univ Nat Taiwan Science Tech 太陽能電池模擬裝置
JP5253000B2 (ja) * 2008-06-03 2013-07-31 オリンパス株式会社 撮像装置
TWI402174B (zh) * 2009-09-03 2013-07-21 Univ Nat Cheng Kung 無縫式壓印滾輪模仁製作方法與設備
DE102011076297A1 (de) 2011-05-23 2012-11-29 Carl Zeiss Smt Gmbh Blende
JP2012253055A (ja) * 2011-05-31 2012-12-20 Nuflare Technology Inc 荷電粒子ビーム描画装置及び描画方法
JP5950538B2 (ja) * 2011-10-26 2016-07-13 キヤノン株式会社 被検体情報取得装置
JP6069706B2 (ja) * 2013-05-27 2017-02-01 富士通株式会社 光電池
TWI499760B (zh) * 2014-10-21 2015-09-11 Ind Tech Res Inst 照度量測系統
JP6570966B2 (ja) * 2015-10-27 2019-09-04 株式会社ニューフレアテクノロジー 温度測定マスクおよび温度測定方法
KR102082050B1 (ko) 2018-07-16 2020-02-27 국민대학교산학협력단 일주기 조도 측정 장치
KR102166726B1 (ko) 2019-01-18 2020-10-16 국민대학교산학협력단 일주기 보정 계수 측정 모듈 및 이를 포함하는 바이오 조도 측정 장치
KR102135627B1 (ko) 2019-01-23 2020-07-21 국민대학교산학협력단 일주기 리듬 관리 장치 및 시스템
KR102155085B1 (ko) 2019-01-23 2020-09-11 국민대학교산학협력단 바이오 조도 측정 장치
KR20200123669A (ko) 2019-04-22 2020-10-30 국민대학교산학협력단 귓속형 심부 체온계 및 이를 포함하는 일주기 리듬 측정 장치

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JPH0217626A (ja) * 1988-07-05 1990-01-22 Mitsubishi Electric Corp 縮小投影露光装置
JPH1062833A (ja) * 1996-08-22 1998-03-06 Kyocera Corp 自動露出カメラ
US5905569A (en) * 1996-03-29 1999-05-18 Canon Kabushiki Kaisha Illuminance measuring method, an exposure apparatus using the method, and a device manufacturing method

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JP3968862B2 (ja) * 1998-03-09 2007-08-29 株式会社ニコン 照度計、照度計測方法及び露光装置
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Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
JPH0217626A (ja) * 1988-07-05 1990-01-22 Mitsubishi Electric Corp 縮小投影露光装置
US5905569A (en) * 1996-03-29 1999-05-18 Canon Kabushiki Kaisha Illuminance measuring method, an exposure apparatus using the method, and a device manufacturing method
JPH1062833A (ja) * 1996-08-22 1998-03-06 Kyocera Corp 自動露出カメラ

Also Published As

Publication number Publication date
EP1139174A2 (en) 2001-10-04
TW516094B (en) 2003-01-01
US6690455B2 (en) 2004-02-10
KR20010090519A (ko) 2001-10-18
US20010050769A1 (en) 2001-12-13
JP2001338868A (ja) 2001-12-07
EP1139174A3 (en) 2005-02-09

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