AU1891299A - Illuminating device and exposure apparatus - Google Patents

Illuminating device and exposure apparatus

Info

Publication number
AU1891299A
AU1891299A AU18912/99A AU1891299A AU1891299A AU 1891299 A AU1891299 A AU 1891299A AU 18912/99 A AU18912/99 A AU 18912/99A AU 1891299 A AU1891299 A AU 1891299A AU 1891299 A AU1891299 A AU 1891299A
Authority
AU
Australia
Prior art keywords
exposure apparatus
illuminating device
illuminating
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU18912/99A
Inventor
Noriaki Tokuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU1891299A publication Critical patent/AU1891299A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU18912/99A 1998-01-19 1999-01-19 Illuminating device and exposure apparatus Abandoned AU1891299A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP745298 1998-01-19
JP10-7452 1998-01-19
JP3896098 1998-02-20
JP10-38960 1998-02-20
PCT/JP1999/000160 WO1999036832A1 (en) 1998-01-19 1999-01-19 Illuminating device and exposure apparatus

Publications (1)

Publication Number Publication Date
AU1891299A true AU1891299A (en) 1999-08-02

Family

ID=26341747

Family Applications (1)

Application Number Title Priority Date Filing Date
AU18912/99A Abandoned AU1891299A (en) 1998-01-19 1999-01-19 Illuminating device and exposure apparatus

Country Status (2)

Country Link
AU (1) AU1891299A (en)
WO (1) WO1999036832A1 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6628370B1 (en) * 1996-11-25 2003-09-30 Mccullough Andrew W. Illumination system with spatially controllable partial coherence compensating for line width variances in a photolithographic system
US6741394B1 (en) 1998-03-12 2004-05-25 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus
JPWO2003023832A1 (en) * 2001-09-07 2004-12-24 株式会社ニコン Exposure method and apparatus, and device manufacturing method
JP4268813B2 (en) * 2003-02-14 2009-05-27 大日本印刷株式会社 Exposure method and exposure apparatus
JP5225433B2 (en) * 2004-06-04 2013-07-03 キヤノン株式会社 Illumination optical system and exposure apparatus
US7173688B2 (en) * 2004-12-28 2007-02-06 Asml Holding N.V. Method for calculating an intensity integral for use in lithography systems
EP1894063A1 (en) * 2005-06-21 2008-03-05 Carl Zeiss SMT AG A double-facetted illumination system with attenuator elements on the pupil facet mirror
JP4310349B2 (en) * 2007-04-20 2009-08-05 キヤノン株式会社 Exposure apparatus and device manufacturing method
US7843549B2 (en) * 2007-05-23 2010-11-30 Asml Holding N.V. Light attenuating filter for correcting field dependent ellipticity and uniformity
JP5182588B2 (en) * 2008-04-29 2013-04-17 株式会社ニコン Optical integrator, illumination optical system, exposure apparatus, and device manufacturing method
JP5223921B2 (en) * 2008-07-14 2013-06-26 株式会社ニコン Illumination optical system, exposure apparatus, and exposure method
JP4921512B2 (en) * 2009-04-13 2012-04-25 キヤノン株式会社 Exposure method, exposure apparatus, and device manufacturing method
KR102496906B1 (en) * 2016-05-06 2023-02-08 가부시키가이샤 니콘 Beam scanning device and drawing device
JP6761306B2 (en) * 2016-08-30 2020-09-23 キヤノン株式会社 Illumination optics, lithography equipment, and article manufacturing methods
JP6740107B2 (en) * 2016-11-30 2020-08-12 Hoya株式会社 Mask blank, transfer mask, and semiconductor device manufacturing method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0540240A (en) * 1991-08-08 1993-02-19 Matsushita Electric Ind Co Ltd Illumination optical system
JP3277589B2 (en) * 1992-02-26 2002-04-22 株式会社ニコン Projection exposure apparatus and method
JPH09223661A (en) * 1996-02-15 1997-08-26 Nikon Corp Aligner

Also Published As

Publication number Publication date
WO1999036832A1 (en) 1999-07-22

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase