SG158063A1 - Silica glass crucible and method of pulling silicon single crystal with silica glass crucible - Google Patents

Silica glass crucible and method of pulling silicon single crystal with silica glass crucible

Info

Publication number
SG158063A1
SG158063A1 SG200904457-9A SG2009044579A SG158063A1 SG 158063 A1 SG158063 A1 SG 158063A1 SG 2009044579 A SG2009044579 A SG 2009044579A SG 158063 A1 SG158063 A1 SG 158063A1
Authority
SG
Singapore
Prior art keywords
silica glass
glass crucible
single crystal
silicon single
pulling silicon
Prior art date
Application number
SG200904457-9A
Other languages
English (en)
Inventor
Hiroshi Kishi
Original Assignee
Japan Super Quartz Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Super Quartz Corp filed Critical Japan Super Quartz Corp
Publication of SG158063A1 publication Critical patent/SG158063A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/10—Crucibles or containers for supporting the melt
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/002—Crucibles or containers for supporting the melt
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/14—Crucibles or vessels
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/002—Crucibles or containers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032—Seed pulling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Glass Melting And Manufacturing (AREA)
SG200904457-9A 2008-06-30 2009-06-30 Silica glass crucible and method of pulling silicon single crystal with silica glass crucible SG158063A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2008170278 2008-06-30
JP2009150729A JP5008695B2 (ja) 2008-06-30 2009-06-25 石英ガラスルツボおよび石英ガラスルツボを用いたシリコン単結晶の引き上げ方法

Publications (1)

Publication Number Publication Date
SG158063A1 true SG158063A1 (en) 2010-01-29

Family

ID=41210962

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200904457-9A SG158063A1 (en) 2008-06-30 2009-06-30 Silica glass crucible and method of pulling silicon single crystal with silica glass crucible

Country Status (8)

Country Link
US (1) US20100162943A1 (zh)
EP (1) EP2141266B1 (zh)
JP (1) JP5008695B2 (zh)
KR (1) KR101100667B1 (zh)
CN (1) CN102758247A (zh)
AT (1) ATE552364T1 (zh)
SG (1) SG158063A1 (zh)
TW (1) TWI458864B (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5749150B2 (ja) * 2011-12-22 2015-07-15 株式会社Sumco シリカガラスルツボの赤外吸収スペクトルの三次元分布の決定方法、シリコン単結晶の製造方法
JP5818675B2 (ja) * 2011-12-22 2015-11-18 株式会社Sumco シリカガラスルツボの気泡分布の三次元分布の決定方法、シリコン単結晶の製造方法
CN104114976B (zh) * 2011-12-27 2017-08-04 株式会社Sumco 氧化硅玻璃坩埚的三维形状测量方法、单晶硅的制造方法
JP5657515B2 (ja) * 2011-12-27 2015-01-21 株式会社Sumco シリカガラスルツボの三次元形状測定方法、シリコン単結晶の製造方法
EP2835452A4 (en) 2013-04-08 2016-02-24 Shinetsu Quartz Prod SILICON DIOXIDE TIP FOR PULLING A SILICONE INCRISTAL AND METHOD FOR THE PRODUCTION THEREOF
US9816917B2 (en) * 2013-12-28 2017-11-14 Sumco Corporation Vitreous silica crucible and distortion-measuring apparatus for the same
JP5923644B2 (ja) * 2015-05-13 2016-05-24 株式会社Sumco シリカガラスルツボの赤外吸収スペクトルの三次元分布の決定方法、シリコン単結晶の製造方法
JP6114795B2 (ja) * 2015-09-29 2017-04-12 株式会社Sumco シリカガラスルツボの気泡分布の三次元分布の決定方法、シリコン単結晶の製造方法
CN108977879B (zh) * 2018-09-13 2021-02-26 浙江美晶新材料有限公司 一种单晶用高纯石英坩埚及其制备方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2616223B1 (fr) * 1987-06-03 1992-04-03 Quartz & Silice Procede et dispositif de controle du remplissage d'un moule par une matiere refractaire pulverulente
JP2714860B2 (ja) * 1989-07-28 1998-02-16 東芝セラミックス株式会社 半導体巣結晶引上げ用石英ガラスルツボ
JPH0825833B2 (ja) * 1990-04-27 1996-03-13 東芝セラミックス株式会社 シリコン単結晶の製造方法
JPH0585879A (ja) * 1991-09-04 1993-04-06 Mitsubishi Materials Corp 単結晶引上装置
JP2962976B2 (ja) * 1993-08-10 1999-10-12 東芝セラミックス株式会社 石英ガラスルツボ
JP3154916B2 (ja) * 1995-03-13 2001-04-09 東芝セラミックス株式会社 石英ガラス質ルツボ
JP2936392B2 (ja) * 1995-12-12 1999-08-23 三菱マテリアルクォーツ株式会社 シリコン単結晶引上げ用石英ルツボ
JP4217844B2 (ja) * 1998-06-18 2009-02-04 ジャパンスーパークォーツ株式会社 複合ルツボとその製造方法および再生方法
JP4454059B2 (ja) * 1999-01-29 2010-04-21 信越石英株式会社 シリコン単結晶引き上げ用大口径石英ガラスるつぼ
JP2002154894A (ja) 2000-11-17 2002-05-28 Kusuwa Kuorutsu:Kk 液面振動の少ない半導体シリコン引上げ用ルツボ
JP2002326889A (ja) * 2001-04-27 2002-11-12 Toshiba Ceramics Co Ltd シリコン単結晶引上げ用石英ガラスルツボ
JP4300333B2 (ja) * 2002-03-14 2009-07-22 ジャパンスーパークォーツ株式会社 リング状アークによる石英ガラスルツボの製造方法と装置およびその石英ガラスルツボ
JP4390461B2 (ja) * 2003-02-21 2009-12-24 ジャパンスーパークォーツ株式会社 石英ガラスルツボ及びこれを用いたシリコン単結晶の引き上げ方法
EP2484814A1 (en) * 2003-05-01 2012-08-08 Heraeus Quarzglas GmbH & Co. KG Quartz glass crucible for pulling up silicon single crystal and method for producing the same
JP4233059B2 (ja) * 2003-05-01 2009-03-04 信越石英株式会社 シリコン単結晶引上げ用石英ガラスルツボ及びその製造方法
US7383696B2 (en) * 2005-09-08 2008-06-10 Heraeus Shin-Etsu America, Inc. Silica glass crucible with bubble-free and reduced bubble growth wall
JP2008094639A (ja) * 2006-10-06 2008-04-24 Covalent Materials Corp シリカガラスルツボ

Also Published As

Publication number Publication date
TW201005133A (en) 2010-02-01
EP2141266B1 (en) 2012-04-04
JP2010030884A (ja) 2010-02-12
JP5008695B2 (ja) 2012-08-22
CN102758247A (zh) 2012-10-31
KR20100003236A (ko) 2010-01-07
US20100162943A1 (en) 2010-07-01
EP2141266A2 (en) 2010-01-06
EP2141266A3 (en) 2010-11-24
KR101100667B1 (ko) 2012-01-03
TWI458864B (zh) 2014-11-01
ATE552364T1 (de) 2012-04-15

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