SG123783A1 - Lithographic projection apparatus and actuator - Google Patents
Lithographic projection apparatus and actuatorInfo
- Publication number
- SG123783A1 SG123783A1 SG200508422A SG200508422A SG123783A1 SG 123783 A1 SG123783 A1 SG 123783A1 SG 200508422 A SG200508422 A SG 200508422A SG 200508422 A SG200508422 A SG 200508422A SG 123783 A1 SG123783 A1 SG 123783A1
- Authority
- SG
- Singapore
- Prior art keywords
- actuator
- projection apparatus
- lithographic projection
- lithographic
- projection
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/03—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using magnetic or electromagnetic means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F6/00—Magnetic springs; Fluid magnetic springs, i.e. magnetic spring combined with a fluid
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
- H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Aviation & Aerospace Engineering (AREA)
- Acoustics & Sound (AREA)
- Electromagnetism (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Toxicology (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/006,821 US7180571B2 (en) | 2004-12-08 | 2004-12-08 | Lithographic projection apparatus and actuator |
Publications (1)
Publication Number | Publication Date |
---|---|
SG123783A1 true SG123783A1 (en) | 2006-07-26 |
Family
ID=36084301
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200508422A SG123783A1 (en) | 2004-12-08 | 2005-10-27 | Lithographic projection apparatus and actuator |
Country Status (7)
Country | Link |
---|---|
US (1) | US7180571B2 (ja) |
EP (1) | EP1669805A3 (ja) |
JP (2) | JP4376860B2 (ja) |
KR (1) | KR100749949B1 (ja) |
CN (1) | CN1786831B (ja) |
SG (1) | SG123783A1 (ja) |
TW (1) | TWI323388B (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1756663B1 (en) * | 2004-06-17 | 2015-12-16 | Nikon Corporation | Fluid pressure compensation for immersion lithography lens |
US8687166B2 (en) * | 2007-05-24 | 2014-04-01 | Asml Netherlands B.V. | Lithographic apparatus having an encoder position sensor system |
US8760615B2 (en) * | 2007-05-24 | 2014-06-24 | Asml Netherlands B.V. | Lithographic apparatus having encoder type position sensor system |
EP2045664B1 (en) | 2007-10-04 | 2013-03-06 | ASML Netherlands B.V. | Lithographic apparatus, projection assembly and active damping |
WO2012016744A1 (en) * | 2010-08-05 | 2012-02-09 | Asml Netherlands B.V. | Imprint lithography |
EP2469340B1 (en) | 2010-12-21 | 2021-01-06 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
NL2009692A (en) * | 2011-12-07 | 2013-06-10 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3554186B2 (ja) * | 1998-04-08 | 2004-08-18 | キヤノン株式会社 | 露光装置、デバイス製造方法および反力受け方法 |
JP2001118783A (ja) * | 1999-10-21 | 2001-04-27 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
JP2001358056A (ja) * | 2000-06-15 | 2001-12-26 | Canon Inc | 露光装置 |
JP2002373849A (ja) | 2001-06-15 | 2002-12-26 | Canon Inc | 露光装置 |
EP1321822A1 (en) * | 2001-12-21 | 2003-06-25 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
SG135052A1 (en) * | 2002-11-12 | 2007-09-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
TWI591445B (zh) * | 2003-02-26 | 2017-07-11 | 尼康股份有限公司 | Exposure apparatus, exposure method, and device manufacturing method |
ATE426914T1 (de) * | 2003-04-07 | 2009-04-15 | Nikon Corp | Belichtungsgerat und verfahren zur herstellung einer vorrichtung |
JP4574206B2 (ja) | 2003-04-25 | 2010-11-04 | キヤノン株式会社 | 駆動装置、それを用いた露光装置、デバイスの製造方法 |
EP1477856A1 (en) | 2003-05-13 | 2004-11-17 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
TWI295414B (en) * | 2003-05-13 | 2008-04-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
TWI625762B (zh) * | 2003-08-29 | 2018-06-01 | Nikon Corp | Liquid recovery device, exposure device, exposure method, and component manufacturing method |
CN101477312B (zh) | 2003-09-03 | 2015-04-08 | 株式会社尼康 | 曝光设备和装置制造方法 |
KR101253355B1 (ko) | 2004-03-25 | 2013-04-11 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
SG155929A1 (en) * | 2004-09-17 | 2009-10-29 | Nikon Corp | Exposure apparatus, exposure method, and method for manufacturing device |
-
2004
- 2004-12-08 US US11/006,821 patent/US7180571B2/en active Active
-
2005
- 2005-10-27 SG SG200508422A patent/SG123783A1/en unknown
- 2005-11-25 TW TW094141633A patent/TWI323388B/zh not_active IP Right Cessation
- 2005-12-02 EP EP05077759A patent/EP1669805A3/en not_active Withdrawn
- 2005-12-07 CN CN2005101310491A patent/CN1786831B/zh not_active Expired - Fee Related
- 2005-12-07 JP JP2005353278A patent/JP4376860B2/ja not_active Expired - Fee Related
- 2005-12-08 KR KR1020050119337A patent/KR100749949B1/ko active IP Right Grant
-
2009
- 2009-01-06 JP JP2009001028A patent/JP5055301B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US7180571B2 (en) | 2007-02-20 |
EP1669805A2 (en) | 2006-06-14 |
JP2009111415A (ja) | 2009-05-21 |
JP2006165575A (ja) | 2006-06-22 |
KR20060064550A (ko) | 2006-06-13 |
JP4376860B2 (ja) | 2009-12-02 |
KR100749949B1 (ko) | 2007-08-16 |
TWI323388B (en) | 2010-04-11 |
TW200627081A (en) | 2006-08-01 |
EP1669805A3 (en) | 2006-09-27 |
CN1786831B (zh) | 2012-04-25 |
JP5055301B2 (ja) | 2012-10-24 |
US20060119810A1 (en) | 2006-06-08 |
CN1786831A (zh) | 2006-06-14 |
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