SG11202109137XA - Improved coating processes - Google Patents
Improved coating processesInfo
- Publication number
- SG11202109137XA SG11202109137XA SG11202109137XA SG11202109137XA SG11202109137XA SG 11202109137X A SG11202109137X A SG 11202109137XA SG 11202109137X A SG11202109137X A SG 11202109137XA SG 11202109137X A SG11202109137X A SG 11202109137XA SG 11202109137X A SG11202109137X A SG 11202109137XA
- Authority
- SG
- Singapore
- Prior art keywords
- coating processes
- improved coating
- improved
- processes
- coating
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/027—Graded interfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Carbon And Carbon Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP19163306 | 2019-03-15 | ||
PCT/EP2020/056864 WO2020187744A1 (en) | 2019-03-15 | 2020-03-13 | Improved coating processes |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202109137XA true SG11202109137XA (en) | 2021-09-29 |
Family
ID=65818247
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202109137XA SG11202109137XA (en) | 2019-03-15 | 2020-03-13 | Improved coating processes |
Country Status (6)
Country | Link |
---|---|
US (1) | US20220162739A1 (zh) |
EP (1) | EP3938556A1 (zh) |
JP (1) | JP7382124B2 (zh) |
CN (1) | CN111690898B (zh) |
SG (1) | SG11202109137XA (zh) |
WO (1) | WO2020187744A1 (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20240035570A1 (en) | 2020-11-13 | 2024-02-01 | Nanofilm Vacuum Coating (Shanghai) Co., Ltd. | Piston rings and methods of manufacture |
CN115433901A (zh) * | 2021-06-04 | 2022-12-06 | 纳峰真空镀膜(上海)有限公司 | 防静电涂层 |
WO2024094870A1 (en) | 2022-11-03 | 2024-05-10 | Nanofilm Technologies International Limited | Sealed electrical devices |
WO2024094872A1 (en) | 2022-11-03 | 2024-05-10 | Nanofilm Technologies International Limited | Coated solar cell |
CN116695079B (zh) * | 2023-06-09 | 2024-04-02 | 深圳市博源碳晶科技有限公司 | 一种导热绝缘金刚石复合材料基板及其制备方法和应用 |
Family Cites Families (27)
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ATE65265T1 (de) | 1987-08-26 | 1991-08-15 | Balzers Hochvakuum | Verfahren zur aufbringung von schichten auf substraten und vakuumbeschichtungsanlage zur durchfuehrung des verfahrens. |
WO1991000374A1 (de) * | 1989-06-27 | 1991-01-10 | Hauzer Holding Bv | Verfahren und vorrichtung zur beschichtung von substraten |
US5358615A (en) * | 1993-10-04 | 1994-10-25 | Motorola, Inc. | Process for forming a sputter deposited metal film |
DE4405477A1 (de) | 1994-02-21 | 1995-08-24 | Hauzer Holding | PVD-Verfahren zur Abscheidung von mehrkomponentigen Hartstoffschichten |
CA2305938C (en) | 2000-04-10 | 2007-07-03 | Vladimir I. Gorokhovsky | Filtered cathodic arc deposition method and apparatus |
AUPR353601A0 (en) | 2001-03-05 | 2001-03-29 | Commonwealth Scientific And Industrial Research Organisation | Deposition process |
US6923891B2 (en) * | 2003-01-10 | 2005-08-02 | Nanofilm Technologies International Pte Ltd. | Copper interconnects |
JP4939032B2 (ja) * | 2005-02-08 | 2012-05-23 | 株式会社神戸製鋼所 | 硬質皮膜、および硬質皮膜の製造方法 |
CN100519828C (zh) * | 2005-04-27 | 2009-07-29 | 北京实力源科技开发有限责任公司 | 一种真空镀膜方法和设备 |
JP4607687B2 (ja) * | 2005-07-04 | 2011-01-05 | 株式会社神戸製鋼所 | 非晶質炭素膜の成膜方法 |
JP2007291429A (ja) * | 2006-04-24 | 2007-11-08 | Nissan Motor Co Ltd | 硬質炭素被膜 |
CN100506527C (zh) * | 2007-06-26 | 2009-07-01 | 广州有色金属研究院 | 金属碳化物/类金刚石(MeC/DLC)纳米多层膜材料及其制备方法 |
JP2009283107A (ja) * | 2008-05-26 | 2009-12-03 | Fuji Electric Device Technology Co Ltd | テトラヘドラル・アモルファス・カーボン膜を主体とする保護膜および該保護膜を有する磁気記録媒体 |
JP2011522964A (ja) * | 2008-06-09 | 2011-08-04 | ナノフィルム テクノロジーズ インターナショナル ピーティーイー リミテッド | 基板上へのコーティングの迅速な蒸着方法 |
DE102010028558A1 (de) * | 2010-05-04 | 2011-11-10 | Walter Ag | PVD-Hybridverfahren zum Abscheiden von Mischkristallschichten |
JP5226826B2 (ja) * | 2011-04-25 | 2013-07-03 | 株式会社神戸製鋼所 | ダイヤモンドライクカーボン硬質多層膜成形体の製造方法 |
US10304665B2 (en) * | 2011-09-07 | 2019-05-28 | Nano-Product Engineering, LLC | Reactors for plasma-assisted processes and associated methods |
US9793098B2 (en) * | 2012-09-14 | 2017-10-17 | Vapor Technologies, Inc. | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
BR102014007893B1 (pt) | 2014-04-02 | 2022-03-22 | Mahle International Gmbh | Elemento deslizante, motor de combustão interna e processo de obtenção de elemento deslizante |
CN106282935A (zh) * | 2015-05-15 | 2017-01-04 | 新科实业有限公司 | 具有类金刚石涂层的材料及其制备方法 |
CN107022740A (zh) * | 2016-01-29 | 2017-08-08 | 广东耐信镀膜科技有限公司 | 一种超硬多层复合类金刚石涂层及其制备方法 |
CN107022761B (zh) * | 2017-04-28 | 2023-11-03 | 星弧涂层新材料科技(苏州)股份有限公司 | 基于类金刚石薄膜的复合厚膜及其镀膜方法 |
CN207313693U (zh) * | 2017-04-28 | 2018-05-04 | 星弧涂层新材料科技(苏州)股份有限公司 | 基于类金刚石薄膜的复合厚膜 |
CN107779839B (zh) * | 2017-11-15 | 2019-07-23 | 温州职业技术学院 | 基于阳极技术的dlc镀膜方法 |
CN108823544A (zh) | 2018-09-12 | 2018-11-16 | 杨杰平 | 基于氮化钛复合膜及其制备方法 |
CN109136872A (zh) * | 2018-10-11 | 2019-01-04 | 华杰新材料科技(苏州)有限公司 | 一种不锈钢基材表面CrN涂层制备方法 |
CN109371360A (zh) * | 2018-12-13 | 2019-02-22 | 纳峰真空镀膜(上海)有限公司 | 一种应用于低温材料上的耐磨类金刚石涂层的制备方法 |
-
2020
- 2020-03-13 WO PCT/EP2020/056864 patent/WO2020187744A1/en active Application Filing
- 2020-03-13 US US17/437,648 patent/US20220162739A1/en active Pending
- 2020-03-13 SG SG11202109137XA patent/SG11202109137XA/en unknown
- 2020-03-13 EP EP20714895.8A patent/EP3938556A1/en active Pending
- 2020-03-13 JP JP2021555506A patent/JP7382124B2/ja active Active
- 2020-03-15 CN CN202010178790.8A patent/CN111690898B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN111690898A (zh) | 2020-09-22 |
CN111690898B (zh) | 2024-04-26 |
US20220162739A1 (en) | 2022-05-26 |
WO2020187744A1 (en) | 2020-09-24 |
JP2022525212A (ja) | 2022-05-11 |
EP3938556A1 (en) | 2022-01-19 |
JP7382124B2 (ja) | 2023-11-16 |
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