SG11202100743XA - Membrane diffuser for a substrate container - Google Patents
Membrane diffuser for a substrate containerInfo
- Publication number
- SG11202100743XA SG11202100743XA SG11202100743XA SG11202100743XA SG11202100743XA SG 11202100743X A SG11202100743X A SG 11202100743XA SG 11202100743X A SG11202100743X A SG 11202100743XA SG 11202100743X A SG11202100743X A SG 11202100743XA SG 11202100743X A SG11202100743X A SG 11202100743XA
- Authority
- SG
- Singapore
- Prior art keywords
- substrate container
- membrane diffuser
- diffuser
- membrane
- container
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/0039—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with flow guiding by feed or discharge devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/10—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces
- B01D46/103—Curved filtering elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/26—Polyalkenes
- B01D71/261—Polyethylene
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6732—Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67376—Closed carriers characterised by sealing arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67383—Closed carriers characterised by substrate supports
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67386—Closed carriers characterised by the construction of the closed carrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Vacuum Packaging (AREA)
- Packaging Of Annular Or Rod-Shaped Articles, Wearing Apparel, Cassettes, Or The Like (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862723979P | 2018-08-28 | 2018-08-28 | |
US201962837389P | 2019-04-23 | 2019-04-23 | |
US201962874647P | 2019-07-16 | 2019-07-16 | |
PCT/US2019/048247 WO2020046867A1 (en) | 2018-08-28 | 2019-08-27 | Membrane diffuser for a substrate container |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202100743XA true SG11202100743XA (en) | 2021-02-25 |
Family
ID=69640054
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202100743XA SG11202100743XA (en) | 2018-08-28 | 2019-08-27 | Membrane diffuser for a substrate container |
Country Status (7)
Country | Link |
---|---|
US (2) | US11610795B2 (ko) |
JP (2) | JP7280348B2 (ko) |
KR (2) | KR20210027495A (ko) |
CN (1) | CN112640079A (ko) |
SG (1) | SG11202100743XA (ko) |
TW (1) | TWI726402B (ko) |
WO (1) | WO2020046867A1 (ko) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11610795B2 (en) * | 2018-08-28 | 2023-03-21 | Entegris, Inc. | Membrane diffuser for a substrate container |
WO2021178703A1 (en) * | 2020-03-06 | 2021-09-10 | Entegris, Inc. | Manifold for a substrate container |
CN115885373A (zh) * | 2020-07-10 | 2023-03-31 | 未来儿股份有限公司 | 基板收纳容器 |
TWI751814B (zh) * | 2020-09-22 | 2022-01-01 | 家登精密工業股份有限公司 | 支撐片狀物的中央支撐裝置及存放片狀物的儲存設備 |
WO2023183517A1 (en) * | 2022-03-25 | 2023-09-28 | Entegris, Inc. | Wafer container purge port assembly |
WO2024145403A1 (en) * | 2022-12-30 | 2024-07-04 | Entegris, Inc. | Substrate container with purge gas diffuser |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3367421B2 (ja) * | 1998-04-16 | 2003-01-14 | 東京エレクトロン株式会社 | 被処理体の収納装置及び搬出入ステージ |
JP3916380B2 (ja) * | 1999-07-06 | 2007-05-16 | 株式会社荏原製作所 | 基板搬送容器待機ステーション |
JP3939101B2 (ja) * | 2000-12-04 | 2007-07-04 | 株式会社荏原製作所 | 基板搬送方法および基板搬送容器 |
JP2002170874A (ja) * | 2000-12-04 | 2002-06-14 | Ebara Corp | 基板搬送容器 |
US7328727B2 (en) | 2004-04-18 | 2008-02-12 | Entegris, Inc. | Substrate container with fluid-sealing flow passageway |
US7758338B2 (en) * | 2007-05-29 | 2010-07-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Substrate carrier, port apparatus and facility interface and apparatus including same |
CN102017119B (zh) | 2008-03-13 | 2014-01-01 | 安格斯公司 | 具有管状环境控制部件的晶圆容器 |
CN102812545B (zh) * | 2009-12-10 | 2016-08-03 | 恩特格里公司 | 用于微环境中均匀分布吹扫气体的多孔隔板 |
TWM453233U (zh) * | 2013-01-07 | 2013-05-11 | Gudeng Prec Ind Co Ltd | 應用於基板收納容器的氣體填充裝置 |
WO2015057739A1 (en) | 2013-10-14 | 2015-04-23 | Entegris, Inc. | Towers for substrate carriers |
TWM489155U (en) | 2014-06-09 | 2014-11-01 | Gudeng Precision Industrial Co Ltd | Gas diffusion device of wafer pod |
US9881826B2 (en) | 2014-10-24 | 2018-01-30 | Lam Research Corporation | Buffer station with single exit-flow direction |
JP2016105443A (ja) | 2014-12-01 | 2016-06-09 | ミライアル株式会社 | 基板収納容器 |
KR101748361B1 (ko) | 2015-04-29 | 2017-06-19 | (주)젠스엠 | 웨이퍼 용기의 가스공급장치 |
KR20200035506A (ko) * | 2015-05-12 | 2020-04-03 | 엔테그리스, 아이엔씨. | 외부 수동 게터 모듈을 구비하는 웨이퍼 컨테이너 |
KR101601600B1 (ko) | 2015-05-22 | 2016-03-09 | 조창현 | 기판 보관 및 이송용기의 청정 유지를 위한 퍼지 장치 |
KR102088753B1 (ko) | 2015-06-17 | 2020-03-13 | 엔테그리스, 아이엔씨. | 장비 전방 단부 모듈을 위한 유동 수정 고정구 |
TWM526559U (zh) | 2016-04-22 | 2016-08-01 | Univ Nat Taipei Technology | 晶圓盒 |
JP6977217B2 (ja) * | 2016-09-06 | 2021-12-08 | 信越ポリマー株式会社 | 基板収納容器及び気体置換ユニット |
US10903103B2 (en) * | 2018-01-22 | 2021-01-26 | Nanya Technology Corporation | Front opening unified pod |
US11610795B2 (en) * | 2018-08-28 | 2023-03-21 | Entegris, Inc. | Membrane diffuser for a substrate container |
-
2019
- 2019-08-27 US US16/552,005 patent/US11610795B2/en active Active
- 2019-08-27 KR KR1020217005299A patent/KR20210027495A/ko not_active IP Right Cessation
- 2019-08-27 CN CN201980055888.XA patent/CN112640079A/zh active Pending
- 2019-08-27 JP JP2021505233A patent/JP7280348B2/ja active Active
- 2019-08-27 WO PCT/US2019/048247 patent/WO2020046867A1/en active Application Filing
- 2019-08-27 KR KR1020237030360A patent/KR20230134612A/ko not_active Application Discontinuation
- 2019-08-27 SG SG11202100743XA patent/SG11202100743XA/en unknown
- 2019-08-28 TW TW108130748A patent/TWI726402B/zh active
-
2023
- 2023-02-14 US US18/109,756 patent/US11901205B2/en active Active
- 2023-05-11 JP JP2023078652A patent/JP2023099621A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JP7280348B2 (ja) | 2023-05-23 |
KR20230134612A (ko) | 2023-09-21 |
TWI726402B (zh) | 2021-05-01 |
TW202012288A (zh) | 2020-04-01 |
WO2020046867A1 (en) | 2020-03-05 |
JP2023099621A (ja) | 2023-07-13 |
US11610795B2 (en) | 2023-03-21 |
US20200075374A1 (en) | 2020-03-05 |
US20230197490A1 (en) | 2023-06-22 |
KR20210027495A (ko) | 2021-03-10 |
CN112640079A (zh) | 2021-04-09 |
JP2022517892A (ja) | 2022-03-11 |
US11901205B2 (en) | 2024-02-13 |
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