SE8104565L - IMPROVED BRIGHTNESS MATERIAL - Google Patents

IMPROVED BRIGHTNESS MATERIAL

Info

Publication number
SE8104565L
SE8104565L SE8104565A SE8104565A SE8104565L SE 8104565 L SE8104565 L SE 8104565L SE 8104565 A SE8104565 A SE 8104565A SE 8104565 A SE8104565 A SE 8104565A SE 8104565 L SE8104565 L SE 8104565L
Authority
SE
Sweden
Prior art keywords
treatment
diazo compound
pretreatment
improved brightness
improved
Prior art date
Application number
SE8104565A
Other languages
Unknown language ( )
Swedish (sv)
Inventor
E Golda
A Wilkes
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of SE8104565L publication Critical patent/SE8104565L/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)

Abstract

A presensitized plate adapted for use in lithography comprising a support member with a metal surface, e.g. aluminum metal, and overlying layer containing a diazo compound. In accordance with this invention, the relative exposure sensitivity of the diazo compound is improved by pretreatment to accelerate its reactivity in the presence of actinic light. Methods of pretreatment described are preheating the diazo compound to a temperature above about 35 DEG C up to about 120 DEG C, treatment with ultraviolet light, treatment with a laser beam, treatment with an electron beam source and treatment with deep ultraviolet energy.
SE8104565A 1980-07-28 1981-07-27 IMPROVED BRIGHTNESS MATERIAL SE8104565L (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US17322980A 1980-07-28 1980-07-28

Publications (1)

Publication Number Publication Date
SE8104565L true SE8104565L (en) 1982-01-29

Family

ID=22631087

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8104565A SE8104565L (en) 1980-07-28 1981-07-27 IMPROVED BRIGHTNESS MATERIAL

Country Status (9)

Country Link
JP (1) JPS57118239A (en)
AU (1) AU544060B2 (en)
DE (1) DE3129501A1 (en)
DK (1) DK335681A (en)
FR (1) FR2487534A1 (en)
GB (1) GB2080964B (en)
IT (1) IT1171405B (en)
NL (1) NL8103455A (en)
SE (1) SE8104565L (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4702995A (en) * 1984-08-24 1987-10-27 Nec Corporation Method of X-ray lithography
CA1285418C (en) * 1985-07-18 1991-07-02 Robert A. Owens Pre-exposure method for increased sensitivity in high contrast resist development
JP2511658B2 (en) * 1986-09-09 1996-07-03 コニカ株式会社 Method for producing photosensitive printing plate having excellent printing durability and chemical resistance
FR2697646B1 (en) * 1992-11-03 1995-01-13 Digipress Sa Process for the preparation of photosensitive compositions based on polymerizable resins and device for carrying out this process.
IL106619A0 (en) * 1993-08-08 1993-12-08 Scitex Corp Ltd Apparatus and method for exposing a photosensitive substrate
CN1083777C (en) * 1995-11-24 2002-05-01 霍西尔绘图工业有限公司 Hydrophilized support for planographic printing plates and its preparation
GB9624224D0 (en) 1996-11-21 1997-01-08 Horsell Graphic Ind Ltd Planographic printing
GB9702568D0 (en) * 1997-02-07 1997-03-26 Horsell Graphic Ind Ltd Planographic printing
GB9710552D0 (en) 1997-05-23 1997-07-16 Horsell Graphic Ind Ltd Planographic printing
US6357351B1 (en) 1997-05-23 2002-03-19 Kodak Polychrome Graphics Llc Substrate for planographic printing
US6293197B1 (en) 1999-08-17 2001-09-25 Kodak Polychrome Graphics Hydrophilized substrate for planographic printing

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1064100A (en) * 1964-03-04 1967-04-05 Warren S D Co Improved photolithographic coating containing a diazonium salt
DE1447955C3 (en) * 1965-01-02 1978-10-05 Hoechst Ag, 6000 Frankfurt Method of making a presensitized printing plate
GB1328782A (en) * 1967-11-15 1973-09-05 Howson Algraphy Ltd Printing plates
US3899332A (en) * 1972-09-11 1975-08-12 Lith Kem Corp Printing plate and method of making the same
ZA739244B (en) * 1973-04-19 1974-11-27 Grace W R & Co Preparation of printing of pattern plates
DE2534795C3 (en) * 1975-08-04 1978-05-24 Siemens Ag, 1000 Berlin Und 8000 Muenchen Process for the production of structures from positive photoresist layers

Also Published As

Publication number Publication date
DE3129501A1 (en) 1982-05-27
GB2080964A (en) 1982-02-10
GB2080964B (en) 1984-08-30
DK335681A (en) 1982-01-29
IT8148940A0 (en) 1981-07-21
FR2487534A1 (en) 1982-01-29
JPS57118239A (en) 1982-07-23
NL8103455A (en) 1982-02-16
JPS6356531B2 (en) 1988-11-08
AU544060B2 (en) 1985-05-16
IT1171405B (en) 1987-06-10
AU7312181A (en) 1982-02-04

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