SE7700229L - Forfarande for beleggning av substrat genom utfellning fran ett plasma - Google Patents
Forfarande for beleggning av substrat genom utfellning fran ett plasmaInfo
- Publication number
- SE7700229L SE7700229L SE7700229A SE7700229A SE7700229L SE 7700229 L SE7700229 L SE 7700229L SE 7700229 A SE7700229 A SE 7700229A SE 7700229 A SE7700229 A SE 7700229A SE 7700229 L SE7700229 L SE 7700229L
- Authority
- SE
- Sweden
- Prior art keywords
- precipitation
- plasma
- procedure
- coating
- substrate
- Prior art date
Links
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 238000001556 precipitation Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/02274—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/0217—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
- H01L21/02211—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound being a silane, e.g. disilane, methylsilane or chlorosilane
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Silicon Compounds (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US65155776A | 1976-01-22 | 1976-01-22 | |
US05/651,556 US4142004A (en) | 1976-01-22 | 1976-01-22 | Method of coating semiconductor substrates |
Publications (1)
Publication Number | Publication Date |
---|---|
SE7700229L true SE7700229L (sv) | 1977-07-23 |
Family
ID=27096092
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE7700229A SE7700229L (sv) | 1976-01-22 | 1977-01-11 | Forfarande for beleggning av substrat genom utfellning fran ett plasma |
Country Status (7)
Country | Link |
---|---|
JP (1) | JPS52115785A (xx) |
DE (1) | DE2702165A1 (xx) |
ES (1) | ES455227A1 (xx) |
FR (1) | FR2339251A1 (xx) |
IT (1) | IT1075610B (xx) |
NL (1) | NL7700641A (xx) |
SE (1) | SE7700229L (xx) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54128283A (en) * | 1978-03-29 | 1979-10-04 | Hitachi Ltd | Manufacture of semiconductor device |
JPS5643731A (en) * | 1979-09-17 | 1981-04-22 | Mitsubishi Electric Corp | Film forming method |
JPS5687353A (en) * | 1979-12-18 | 1981-07-15 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Semiconductor integrated circuit device |
JPS5745931A (en) * | 1980-09-04 | 1982-03-16 | Fujitsu Ltd | Semiconductor device with multilayer passivation film and manufacture thereof |
JPS57141935A (en) * | 1981-02-25 | 1982-09-02 | Nec Corp | Manufacture of semiconductor device |
JPS58131733A (ja) * | 1982-01-29 | 1983-08-05 | Toshiba Corp | 半導体装置 |
EP0089382B1 (de) * | 1982-03-18 | 1986-08-20 | Ibm Deutschland Gmbh | Plasmareaktor und seine Anwendung beim Ätzen und Beschichten von Substraten |
JPS598341A (ja) * | 1982-07-06 | 1984-01-17 | Toshiba Corp | 半導体装置 |
JPS5994848A (ja) * | 1982-11-24 | 1984-05-31 | Fuji Electric Co Ltd | 半導体装置の製造方法 |
US4513684A (en) * | 1982-12-22 | 1985-04-30 | Energy Conversion Devices, Inc. | Upstream cathode assembly |
US4455351A (en) * | 1983-06-13 | 1984-06-19 | At&T Bell Laboratories | Preparation of photodiodes |
JPS61128403A (ja) * | 1984-11-28 | 1986-06-16 | 鐘淵化学工業株式会社 | 非単結晶状シリコン系絶縁材料 |
US4618541A (en) * | 1984-12-21 | 1986-10-21 | Advanced Micro Devices, Inc. | Method of forming a silicon nitride film transparent to ultraviolet radiation and resulting article |
JPS61284928A (ja) * | 1985-06-10 | 1986-12-15 | Mitsubishi Electric Corp | 半導体装置 |
JPH084109B2 (ja) * | 1987-08-18 | 1996-01-17 | 富士通株式会社 | 半導体装置およびその製造方法 |
FR2725015B1 (fr) * | 1994-09-23 | 1996-12-20 | Innovatique Sa | Four utilisable pour la nitruration a basse pression d'une piece metallique |
EP0707661B1 (fr) * | 1994-04-22 | 2000-03-15 | Innovatique S.A. | Procede pour la nitruration a basse pression d'une piece metallique et four pour la mise en uvre dudit procede |
JP6146160B2 (ja) * | 2013-06-26 | 2017-06-14 | 東京エレクトロン株式会社 | 成膜方法、記憶媒体及び成膜装置 |
-
1977
- 1977-01-11 SE SE7700229A patent/SE7700229L/xx unknown
- 1977-01-20 IT IT19482/77A patent/IT1075610B/it active
- 1977-01-20 FR FR7701539A patent/FR2339251A1/fr not_active Withdrawn
- 1977-01-20 DE DE19772702165 patent/DE2702165A1/de active Pending
- 1977-01-21 ES ES455227A patent/ES455227A1/es not_active Expired
- 1977-01-21 NL NL7700641A patent/NL7700641A/xx not_active Application Discontinuation
- 1977-01-22 JP JP544077A patent/JPS52115785A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE2702165A1 (de) | 1977-07-28 |
NL7700641A (nl) | 1977-07-26 |
ES455227A1 (es) | 1978-04-16 |
IT1075610B (it) | 1985-04-22 |
JPS52115785A (en) | 1977-09-28 |
FR2339251A1 (fr) | 1977-08-19 |
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