SE425838B - Elektronstrale-arrangemang - Google Patents

Elektronstrale-arrangemang

Info

Publication number: SE425838B
Authority: SE; Sweden
Prior art keywords: aperture; image; character; arrangement; electron beam
Prior art date: 1977-08-10

Application number

SE7808326A

Other languages

English (en)

Swedish (sv)

Other versions

SE7808326L (sv

Inventor

H C Pfeiffer

Original Assignee

Ibm

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1977-08-10

Filing date

1978-08-02

Publication date

1982-11-15

1978-08-02 Application filed by Ibm filed Critical Ibm

1979-02-11 Publication of SE7808326L publication Critical patent/SE7808326L/xx

1982-11-15 Publication of SE425838B publication Critical patent/SE425838B/sv

Links

238000010894 electron beam technology Methods 0.000 claims description 25
230000004075 alteration Effects 0.000 claims description 16
238000012937 correction Methods 0.000 claims description 14
238000010422 painting Methods 0.000 claims description 9
239000002131 composite material Substances 0.000 claims description 8
238000005286 illumination Methods 0.000 claims description 2
238000004519 manufacturing process Methods 0.000 description 9
230000009467 reduction Effects 0.000 description 7
239000004065 semiconductor Substances 0.000 description 6
230000008901 benefit Effects 0.000 description 5
230000015654 memory Effects 0.000 description 5
230000003252 repetitive effect Effects 0.000 description 4
238000003384 imaging method Methods 0.000 description 3
238000000034 method Methods 0.000 description 3
230000015572 biosynthetic process Effects 0.000 description 2
238000010586 diagram Methods 0.000 description 2
230000000694 effects Effects 0.000 description 2
230000006870 function Effects 0.000 description 2
206010010071 Coma Diseases 0.000 description 1
230000008859 change Effects 0.000 description 1
238000009826 distribution Methods 0.000 description 1
238000000609 electron-beam lithography Methods 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
239000003344 environmental pollutant Substances 0.000 description 1
238000009432 framing Methods 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
231100000719 pollutant Toxicity 0.000 description 1
210000001747 pupil Anatomy 0.000 description 1
238000007493 shaping process Methods 0.000 description 1

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path

Landscapes

Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Electron Beam Exposure (AREA)
Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)

SE7808326A 1977-08-10 1978-08-02 Elektronstrale-arrangemang SE425838B (sv)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US82335277A	1977-08-10	1977-08-10

Publications (2)

Publication Number	Publication Date
SE7808326L SE7808326L (sv)	1979-02-11
SE425838B true SE425838B (sv)	1982-11-15

Family

ID=25238513

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
SE7808326A SE425838B (sv)	1977-08-10	1978-08-02	Elektronstrale-arrangemang

Country Status (9)

Country	Link
JP (1)	JPS5429981A (de)
BR (1)	BR7804994A (de)
CH (1)	CH631574A5 (de)
DE (1)	DE2834391C2 (de)
FR (1)	FR2400256A1 (de)
GB (1)	GB1598219A (de)
IT (1)	IT1112285B (de)
NL (1)	NL7808162A (de)
SE (1)	SE425838B (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5435173U (de) *	1977-08-12	1979-03-07
JPS5463681A (en) *	1977-10-29	1979-05-22	Nippon Aviotronics Kk	Electron beam exposure device
FR2488043A1 (fr) *	1980-07-30	1982-02-05	Le N Proizv	Dispositif a optique electronique pour l'etude d'echantillons
JPS57206173A (en) *	1981-06-15	1982-12-17	Nippon Telegr & Teleph Corp <Ntt>	Focusing deflecting device for charged corpuscule beam
JPS61183926A (ja) *	1985-02-08	1986-08-16	Toshiba Corp	荷電ビ−ム照射装置
JPS62206828A (ja) *	1986-03-06	1987-09-11	Nec Corp	荷電粒子線描画装置
JPH02246318A (ja) *	1989-03-20	1990-10-02	Fujitsu Ltd	荷電粒子ビーム露光装置
JP2746098B2 (ja) *	1994-01-19	1998-04-28	日本電気株式会社	電子ビーム描画用アパーチャおよび電子ビーム描画方法
JP3206448B2 (ja)	1996-08-30	2001-09-10	日本電気株式会社	電子ビーム描画装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3644700A (en) *	1969-12-15	1972-02-22	Ibm	Method and apparatus for controlling an electron beam
DE2460716C2 (de) *	1974-12-19	1976-12-30	Siemens Ag	Korpuskularstrahloptisches geraet zur korpuskelbestrahlung eines praeparats
US3956635A (en) *	1975-06-13	1976-05-11	International Business Machines Corporation	Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns
JPS5251871A (en) *	1975-10-23	1977-04-26	Rikagaku Kenkyusho	Projecting method for charge particle beams
JPS5283177A (en) *	1975-12-31	1977-07-11	Fujitsu Ltd	Electron beam exposure device
GB1557924A (en) *	1976-02-05	1979-12-19	Western Electric Co	Irradiation apparatus and methods
FR2351497A1 (fr) *	1976-05-14	1977-12-09	Thomson Csf	Dispositif permettant le trace programme de figures de formes differentes
JPS5357764A (en) *	1976-11-04	1978-05-25	Fujitsu Ltd	Electron beam exposure apparatus
CA1166766A (en) *	1977-02-23	1984-05-01	Hans C. Pfeiffer	Method and apparatus for forming a variable size electron beam
US4182958A (en) *	1977-05-31	1980-01-08	Rikagaku Kenkyusho	Method and apparatus for projecting a beam of electrically charged particles

1978
- 1978-05-10 GB GB18816/78A patent/GB1598219A/en not_active Expired
- 1978-06-29 FR FR7820120A patent/FR2400256A1/fr active Granted
- 1978-07-07 CH CH740878A patent/CH631574A5/de not_active IP Right Cessation
- 1978-07-12 JP JP8411578A patent/JPS5429981A/ja active Granted
- 1978-07-26 IT IT26097/78A patent/IT1112285B/it active
- 1978-08-02 SE SE7808326A patent/SE425838B/sv not_active IP Right Cessation
- 1978-08-03 BR BR7804994A patent/BR7804994A/pt unknown
- 1978-08-03 NL NL787808162A patent/NL7808162A/xx not_active Application Discontinuation
- 1978-08-05 DE DE2834391A patent/DE2834391C2/de not_active Expired

Also Published As

Publication number	Publication date
DE2834391C2 (de)	1986-04-17
SE7808326L (sv)	1979-02-11
CH631574A5 (en)	1982-08-13
JPS5438035B2 (de)	1979-11-19
JPS5429981A (en)	1979-03-06
IT1112285B (it)	1986-01-13
FR2400256A1 (fr)	1979-03-09
IT7826097A0 (it)	1978-07-26
BR7804994A (pt)	1979-04-17
NL7808162A (nl)	1979-02-13
GB1598219A (en)	1981-09-16
FR2400256B1 (de)	1982-02-05
DE2834391A1 (de)	1979-02-22

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1995-01-31

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