PL416810A1 - N, N-bis[(hydroxyphosphinyl)methyl]-2-aminosuccinic acid and method for producing it - Google Patents

N, N-bis[(hydroxyphosphinyl)methyl]-2-aminosuccinic acid and method for producing it

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Publication number
PL416810A1
PL416810A1 PL416810A PL41681016A PL416810A1 PL 416810 A1 PL416810 A1 PL 416810A1 PL 416810 A PL416810 A PL 416810A PL 41681016 A PL41681016 A PL 41681016A PL 416810 A1 PL416810 A1 PL 416810A1
Authority
PL
Poland
Prior art keywords
acid
bis
hydroxyphosphinyl
methyl
aminobutandic
Prior art date
Application number
PL416810A
Other languages
Polish (pl)
Inventor
Mirosław Soroka
Anna Brol
Elżbieta Wojaczyńska
Klaudia Slopek
Original Assignee
Politechnika Wrocławska
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Politechnika Wrocławska filed Critical Politechnika Wrocławska
Priority to PL416810A priority Critical patent/PL416810A1/en
Publication of PL416810A1 publication Critical patent/PL416810A1/en

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Abstract

Zgłoszenie dotyczy kwasu N,N-bis[(hydroksyfosfinylo)metylo]-2-aminobutandiowego o wzorze 1, który jest przeznaczony do stosowania jako substrat do syntezy kwasu N,N-bis(fosfonometylo)-2-aminobutandiowego oraz poliamfolitów zawierających fragmenty strukturalne kwasu asparaginowego. Zgłoszenie dotyczy również sposobu wytwarzania kwasu N,N-bis[(hydroksyfosfinylo)metylo]-2-aminobutandiowego, który polega na tym, że jedną część molową kwasu asparaginowego poddaje się reakcji z co najmniej dwiema częściami molowymi formaldehydu zawartego w substancji wybranej z grupy formalina, trioksan i paraform, i co najmniej dwiema częściami molowymi kwasu fosfinowego, a reakcję prowadzi się w możliwie najniższej akceptowalnej technologicznie temperaturze, korzystnie w temperaturze 273 - 298 K, w wodzie, aż do przereagowania substratów.The application relates to N, N-bis [(hydroxyphosphinyl) methyl] -2-aminobutandic acid of formula 1, which is intended to be used as a substrate for the synthesis of N, N-bis (phosphonomethyl) -2-aminobutandic acid and polyampolytes containing acid structural fragments aspartic. The application also relates to a process for the production of N, N-bis [(hydroxyphosphinyl) methyl] -2-aminobutandic acid, which consists in the fact that one molar part of aspartic acid is reacted with at least two molar parts of formaldehyde contained in a substance selected from the group formalin , trioxane and paraform, and at least two molar parts of phosphinic acid, and the reaction is carried out at the lowest technologically acceptable temperature, preferably at a temperature of 273 - 298 K, in water until the reactants react.

PL416810A 2016-04-11 2016-04-11 N, N-bis[(hydroxyphosphinyl)methyl]-2-aminosuccinic acid and method for producing it PL416810A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL416810A PL416810A1 (en) 2016-04-11 2016-04-11 N, N-bis[(hydroxyphosphinyl)methyl]-2-aminosuccinic acid and method for producing it

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL416810A PL416810A1 (en) 2016-04-11 2016-04-11 N, N-bis[(hydroxyphosphinyl)methyl]-2-aminosuccinic acid and method for producing it

Publications (1)

Publication Number Publication Date
PL416810A1 true PL416810A1 (en) 2017-02-13

Family

ID=57965396

Family Applications (1)

Application Number Title Priority Date Filing Date
PL416810A PL416810A1 (en) 2016-04-11 2016-04-11 N, N-bis[(hydroxyphosphinyl)methyl]-2-aminosuccinic acid and method for producing it

Country Status (1)

Country Link
PL (1) PL416810A1 (en)

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