PL2541322T3 - Kompozycja, proces przygotowania oraz sposób zastosowania i naświetlania papieru służącego do tworzenia obrazu - Google Patents

Kompozycja, proces przygotowania oraz sposób zastosowania i naświetlania papieru służącego do tworzenia obrazu

Info

Publication number
PL2541322T3
PL2541322T3 PL12006562T PL12006562T PL2541322T3 PL 2541322 T3 PL2541322 T3 PL 2541322T3 PL 12006562 T PL12006562 T PL 12006562T PL 12006562 T PL12006562 T PL 12006562T PL 2541322 T3 PL2541322 T3 PL 2541322T3
Authority
PL
Poland
Prior art keywords
exposure
preparation
composition
application
light imaging
Prior art date
Application number
PL12006562T
Other languages
English (en)
Inventor
Richard C Williams
Richard D Faber
Oleg Grinevich
John Malpert
Alexandre Mejiritski
Douglas C Neckers
Original Assignee
Int Paper Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Int Paper Co filed Critical Int Paper Co
Publication of PL2541322T3 publication Critical patent/PL2541322T3/pl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/732—Leuco dyes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/775—Photosensitive materials characterised by the base or auxiliary layers the base being of paper
    • G03C1/79—Macromolecular coatings or impregnations therefor, e.g. varnishes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Paper (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
PL12006562T 2008-10-15 2009-10-12 Kompozycja, proces przygotowania oraz sposób zastosowania i naświetlania papieru służącego do tworzenia obrazu PL2541322T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US19612708P 2008-10-15 2008-10-15
EP09744517A EP2338088B1 (en) 2008-10-15 2009-10-12 Composition, process of preparation and method of application and exposure for light imaging paper
EP12006562.8A EP2541322B1 (en) 2008-10-15 2009-10-12 Composition, process of preparation and method of application and exposure for light imaging paper

Publications (1)

Publication Number Publication Date
PL2541322T3 true PL2541322T3 (pl) 2016-02-29

Family

ID=41445601

Family Applications (2)

Application Number Title Priority Date Filing Date
PL12006562T PL2541322T3 (pl) 2008-10-15 2009-10-12 Kompozycja, proces przygotowania oraz sposób zastosowania i naświetlania papieru służącego do tworzenia obrazu
PL09744517T PL2338088T3 (pl) 2008-10-15 2009-10-12 Kompozycja, sposób otrzymywania oraz sposób nakładania i naświetlania papieru służącego do tworzenia obrazu

Family Applications After (1)

Application Number Title Priority Date Filing Date
PL09744517T PL2338088T3 (pl) 2008-10-15 2009-10-12 Kompozycja, sposób otrzymywania oraz sposób nakładania i naświetlania papieru służącego do tworzenia obrazu

Country Status (8)

Country Link
US (2) US8586280B2 (pl)
EP (2) EP2541322B1 (pl)
CN (1) CN102224458B (pl)
CA (1) CA2740695C (pl)
ES (2) ES2396050T3 (pl)
PL (2) PL2541322T3 (pl)
PT (2) PT2338088E (pl)
WO (1) WO2010045140A1 (pl)

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CN104656372B (zh) 2008-10-15 2016-08-24 国际纸业公司 成像颗粒组合物、纸张和方法以及使用双波长光对纸张成像的方法
WO2013100350A1 (en) 2011-12-28 2013-07-04 Samsung Electronics Co., Ltd. Image processing apparatus, upgrade apparatus, display system including the same, and control method thereof
US9540769B2 (en) 2013-03-11 2017-01-10 International Paper Company Method and apparatus for measuring and removing rotational variability from a nip pressure profile of a covered roll of a nip press
US9804044B2 (en) 2014-05-02 2017-10-31 International Paper Company Method and system associated with a sensing roll and a mating roll for collecting data including first and second sensor arrays
US9797788B2 (en) 2014-05-02 2017-10-24 International Paper Company Method and system associated with a sensing roll including pluralities of sensors and a mating roll for collecting roll data
US10378980B2 (en) 2014-05-02 2019-08-13 International Paper Company Method and system associated with a sensing roll and a mating roll for collecting roll data
TWI511871B (zh) * 2014-05-23 2015-12-11 Benq Materials Corp 製備彩色隱形眼鏡之方法
US9534970B1 (en) 2015-06-10 2017-01-03 International Paper Company Monitoring oscillating components
US9696226B2 (en) 2015-06-10 2017-07-04 International Paper Company Count-based monitoring machine wires and felts
US9677225B2 (en) 2015-06-10 2017-06-13 International Paper Company Monitoring applicator rods
US9816232B2 (en) 2015-06-10 2017-11-14 International Paper Company Monitoring upstream machine wires and felts
US9863827B2 (en) 2015-06-10 2018-01-09 International Paper Company Monitoring machine wires and felts
US10370795B2 (en) 2015-06-10 2019-08-06 International Paper Company Monitoring applicator rods and applicator rod nips

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Also Published As

Publication number Publication date
CN102224458B (zh) 2013-04-24
EP2338088B1 (en) 2012-09-19
EP2541322B1 (en) 2015-08-12
US20140080057A1 (en) 2014-03-20
EP2338088A1 (en) 2011-06-29
US20110250545A1 (en) 2011-10-13
WO2010045140A1 (en) 2010-04-22
PL2338088T3 (pl) 2013-02-28
ES2552855T3 (es) 2015-12-02
PT2541322E (pt) 2015-11-26
CN102224458A (zh) 2011-10-19
CA2740695A1 (en) 2010-04-22
ES2396050T3 (es) 2013-02-18
CA2740695C (en) 2013-06-18
EP2541322A1 (en) 2013-01-02
PT2338088E (pt) 2013-01-08
US8586280B2 (en) 2013-11-19

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