NO130903B - - Google Patents

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Info

Publication number: NO130903B
Authority: NO; Norway
Prior art keywords: trichlorosilane; chlorine; hydrogen; approx; tetrachlorosilane
Prior art date: 1969-09-27

Application number

NO03659/70A

Other languages

English (en)

Norwegian (no)

Other versions

NO130903C (fi

Inventor

H Koetzsch

H Vahlensieck

Original Assignee

Dynamit Nobel Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1969-09-27

Filing date

1970-09-25

Publication date

1974-11-25

1970-09-25 Application filed by Dynamit Nobel Ag filed Critical Dynamit Nobel Ag

1974-11-25 Publication of NO130903B publication Critical patent/NO130903B/no

1975-03-05 Publication of NO130903C publication Critical patent/NO130903C/no

Links

239000000203 mixture Substances 0.000 claims description 30
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical group [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 28
239000000460 chlorine Chemical group 0.000 claims description 28
229910052801 chlorine Chemical group 0.000 claims description 28
239000001257 hydrogen Substances 0.000 claims description 18
229910052739 hydrogen Inorganic materials 0.000 claims description 18
238000000034 method Methods 0.000 claims description 16
KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 11
239000005046 Chlorosilane Substances 0.000 claims description 8
238000006243 chemical reaction Methods 0.000 claims description 8
125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
-1 hydrogen silanes Chemical class 0.000 claims description 5
ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 36
239000005052 trichlorosilane Substances 0.000 description 36
FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 18
239000000047 product Substances 0.000 description 17
BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 15
229910000077 silane Inorganic materials 0.000 description 14
238000004821 distillation Methods 0.000 description 11
VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 10
229910000041 hydrogen chloride Inorganic materials 0.000 description 10
239000007789 gas Substances 0.000 description 8
150000004756 silanes Chemical class 0.000 description 8
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 6
238000002156 mixing Methods 0.000 description 6
229910052710 silicon Inorganic materials 0.000 description 6
239000010703 silicon Substances 0.000 description 6
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
239000007795 chemical reaction product Substances 0.000 description 5
238000009835 boiling Methods 0.000 description 4
238000005660 chlorination reaction Methods 0.000 description 4
239000007788 liquid Substances 0.000 description 4
229910052786 argon Inorganic materials 0.000 description 3
238000004880 explosion Methods 0.000 description 3
238000011835 investigation Methods 0.000 description 3
229910052757 nitrogen Inorganic materials 0.000 description 3
230000001681 protective effect Effects 0.000 description 3
238000010992 reflux Methods 0.000 description 3
239000000126 substance Substances 0.000 description 3
CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
230000009286 beneficial effect Effects 0.000 description 2
239000006227 byproduct Substances 0.000 description 2
150000001804 chlorine Chemical class 0.000 description 2
230000000694 effects Effects 0.000 description 2
239000011521 glass Substances 0.000 description 2
238000005286 illumination Methods 0.000 description 2
239000012442 inert solvent Substances 0.000 description 2
239000001301 oxygen Substances 0.000 description 2
229910052760 oxygen Inorganic materials 0.000 description 2
238000003756 stirring Methods 0.000 description 2
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
POFAUXBEMGMSAV-UHFFFAOYSA-N [Si].[Cl] Chemical class [Si].[Cl] POFAUXBEMGMSAV-UHFFFAOYSA-N 0.000 description 1
239000000853 adhesive Substances 0.000 description 1
230000001070 adhesive effect Effects 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
239000001569 carbon dioxide Substances 0.000 description 1
229910002092 carbon dioxide Inorganic materials 0.000 description 1
238000006555 catalytic reaction Methods 0.000 description 1
239000003638 chemical reducing agent Substances 0.000 description 1
125000001309 chloro group Chemical group Cl* 0.000 description 1
229910052681 coesite Inorganic materials 0.000 description 1
238000002485 combustion reaction Methods 0.000 description 1
230000000052 comparative effect Effects 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
229910052906 cristobalite Inorganic materials 0.000 description 1
238000005235 decoking Methods 0.000 description 1
238000007872 degassing Methods 0.000 description 1
239000002552 dosage form Substances 0.000 description 1
230000007717 exclusion Effects 0.000 description 1
239000002360 explosive Substances 0.000 description 1
238000011049 filling Methods 0.000 description 1
239000003517 fume Substances 0.000 description 1
238000004817 gas chromatography Methods 0.000 description 1
239000002920 hazardous waste Substances 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
239000008240 homogeneous mixture Substances 0.000 description 1
230000007062 hydrolysis Effects 0.000 description 1
238000006460 hydrolysis reaction Methods 0.000 description 1
238000007654 immersion Methods 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
238000006116 polymerization reaction Methods 0.000 description 1
229920001296 polysiloxane Polymers 0.000 description 1
238000002360 preparation method Methods 0.000 description 1
239000011814 protection agent Substances 0.000 description 1
239000011541 reaction mixture Substances 0.000 description 1
230000000630 rising effect Effects 0.000 description 1
239000004065 semiconductor Substances 0.000 description 1
238000000926 separation method Methods 0.000 description 1
239000000377 silicon dioxide Substances 0.000 description 1
235000012239 silicon dioxide Nutrition 0.000 description 1
229910052682 stishovite Inorganic materials 0.000 description 1
238000003786 synthesis reaction Methods 0.000 description 1
QHAHOIWVGZZELU-UHFFFAOYSA-N trichloro(trichlorosilyloxy)silane Chemical compound Cl[Si](Cl)(Cl)O[Si](Cl)(Cl)Cl QHAHOIWVGZZELU-UHFFFAOYSA-N 0.000 description 1
229910052905 tridymite Inorganic materials 0.000 description 1
238000010626 work up procedure Methods 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Inorganic Chemistry (AREA)
Silicon Compounds (AREA)

NO3659/70A 1969-09-27 1970-09-25 NO130903C (fi)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE1948911A DE1948911C3 (de)	1969-09-27	1969-09-27	Verfahren zur Entfernung von Hydrogensilanen aus Chlorsilanen

Publications (2)

Publication Number	Publication Date
NO130903B true NO130903B (fi)	1974-11-25
NO130903C NO130903C (fi)	1975-03-05

Family

ID=5746694

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NO3659/70A NO130903C (fi)	1969-09-27	1970-09-25

Country Status (14)

Country	Link
US (1)	US3790459A (fi)
JP (1)	JPS4943199B1 (fi)
AT (1)	AT303070B (fi)
BE (1)	BE756657A (fi)
CA (1)	CA937026A (fi)
CH (1)	CH540197A (fi)
DE (1)	DE1948911C3 (fi)
DK (1)	DK131619C (fi)
FI (1)	FI50407C (fi)
FR (1)	FR2062686A5 (fi)
GB (1)	GB1298738A (fi)
NL (1)	NL167658C (fi)
NO (1)	NO130903C (fi)
SE (1)	SE361297B (fi)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3502367A1 (de) *	1985-01-25	1986-07-31	Philips Patentverwaltung Gmbh, 2000 Hamburg	Verfahren zum entfernen von wasserstoff aus in siliziumtetrachlorid oder germaniumtetrachlorid geloesten wasserstoffhaltigen verbindungen
JPS6440301U (fi) *	1987-08-29	1989-03-10
DE3805282A1 (de) *	1988-02-19	1989-08-31	Wacker Chemitronic	Verfahren zur entfernung von n-dotierenden verunreinigungen aus bei der gasphasenabscheidung von silicium anfallenden fluessigen oder gasfoermigen stoffen
JP2867696B2 (ja) *	1990-11-29	1999-03-08	信越化学工業株式会社	四塩化ケイ素の精製方法
DE19616556A1 (de) *	1996-04-25	1997-10-30	Wacker Chemie Gmbh	Verfahren zur Stabilisierung von hydridischen Silanen

0
- BE BE756657D patent/BE756657A/xx not_active IP Right Cessation
1969
- 1969-09-27 DE DE1948911A patent/DE1948911C3/de not_active Expired
1970
- 1970-09-22 CH CH1403070A patent/CH540197A/de not_active IP Right Cessation
- 1970-09-25 DK DK489970A patent/DK131619C/da active
- 1970-09-25 AT AT867470A patent/AT303070B/de not_active IP Right Cessation
- 1970-09-25 NO NO3659/70A patent/NO130903C/no unknown
- 1970-09-25 GB GB45905/70A patent/GB1298738A/en not_active Expired
- 1970-09-25 CA CA094157A patent/CA937026A/en not_active Expired
- 1970-09-25 SE SE13088/70A patent/SE361297B/xx unknown
- 1970-09-25 FR FR7034881A patent/FR2062686A5/fr not_active Expired
- 1970-09-25 FI FI702623A patent/FI50407C/fi active
- 1970-09-25 NL NL7014170A patent/NL167658C/xx not_active IP Right Cessation
- 1970-09-28 US US00076253A patent/US3790459A/en not_active Expired - Lifetime
- 1970-09-28 JP JP45084935A patent/JPS4943199B1/ja active Pending

Also Published As

Publication number	Publication date
NO130903C (fi)	1975-03-05
CA937026A (en)	1973-11-20
DE1948911C3 (de)	1985-12-05
US3790459A (en)	1974-02-05
AT303070B (de)	1972-11-10
SE361297B (fi)	1973-10-29
GB1298738A (en)	1972-12-06
CH540197A (de)	1973-08-15
DE1948911A1 (de)	1971-04-15
BE756657A (fr)	1971-03-01
FR2062686A5 (fi)	1971-06-25
NL167658C (nl)	1982-01-18
DE1948911B2 (de)	1978-06-01
JPS4943199B1 (fi)	1974-11-19
NL7014170A (fi)	1971-03-30
DK131619C (da)	1976-01-12
FI50407C (fi)	1976-03-10
NL167658B (nl)	1981-08-17
DK131619B (da)	1975-08-11
FI50407B (fi)	1975-12-01

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