NL8902471A - Tweetraps positioneerinrichting. - Google Patents
Tweetraps positioneerinrichting. Download PDFInfo
- Publication number
- NL8902471A NL8902471A NL8902471A NL8902471A NL8902471A NL 8902471 A NL8902471 A NL 8902471A NL 8902471 A NL8902471 A NL 8902471A NL 8902471 A NL8902471 A NL 8902471A NL 8902471 A NL8902471 A NL 8902471A
- Authority
- NL
- Netherlands
- Prior art keywords
- carriage
- positioning device
- coordinate direction
- slide
- coil
- Prior art date
Links
- 230000003068 static effect Effects 0.000 claims description 5
- 238000006073 displacement reaction Methods 0.000 description 19
- 230000001133 acceleration Effects 0.000 description 4
- 239000000969 carrier Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 3
- 238000010276 construction Methods 0.000 description 2
- 238000011010 flushing procedure Methods 0.000 description 2
- 239000010438 granite Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000001174 ascending effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D3/00—Control of position or direction
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/44—Movable or adjustable work or tool supports using particular mechanisms
- B23Q1/56—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism
- B23Q1/60—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism
- B23Q1/62—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides
- B23Q1/621—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides a single sliding pair followed perpendicularly by a single sliding pair
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/19—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
- G05B19/39—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path using a combination of the means covered by at least two of the preceding groups G05B19/21, G05B19/27 and G05B19/33
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/37—Measurements
- G05B2219/37275—Laser, interferometer
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/49—Nc machine tool, till multiple
- G05B2219/49271—Air bearing slide, hydraulic, electromagnetic bearing
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/49—Nc machine tool, till multiple
- G05B2219/49276—Floating, air, magnetic suspension xy table, sawyer motor, xenetics
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/49—Nc machine tool, till multiple
- G05B2219/49284—Two cascaded slides, large range sits on small range, piggyback
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- Human Computer Interaction (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Machine Tool Units (AREA)
- Control Of Position Or Direction (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Machine Tool Positioning Apparatuses (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8902471A NL8902471A (nl) | 1989-10-05 | 1989-10-05 | Tweetraps positioneerinrichting. |
KR1019900015469A KR0154513B1 (ko) | 1989-10-05 | 1990-09-28 | 위치결정 장치 |
DE69010610T DE69010610T2 (de) | 1989-10-05 | 1990-10-01 | Zweistufen- Positioniervorrichtung. |
EP90202582A EP0421527B1 (de) | 1989-10-05 | 1990-10-01 | Zweistufen- Positioniervorrichtung |
US07/594,520 US5120034A (en) | 1989-10-05 | 1990-10-04 | Two-step positioning device using lorentz forces and a static gas bearing |
JP2266526A JP3016088B2 (ja) | 1989-10-05 | 1990-10-05 | 位置決め装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8902471 | 1989-10-05 | ||
NL8902471A NL8902471A (nl) | 1989-10-05 | 1989-10-05 | Tweetraps positioneerinrichting. |
Publications (1)
Publication Number | Publication Date |
---|---|
NL8902471A true NL8902471A (nl) | 1991-05-01 |
Family
ID=19855399
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL8902471A NL8902471A (nl) | 1989-10-05 | 1989-10-05 | Tweetraps positioneerinrichting. |
Country Status (6)
Country | Link |
---|---|
US (1) | US5120034A (de) |
EP (1) | EP0421527B1 (de) |
JP (1) | JP3016088B2 (de) |
KR (1) | KR0154513B1 (de) |
DE (1) | DE69010610T2 (de) |
NL (1) | NL8902471A (de) |
Families Citing this family (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL9100421A (nl) * | 1991-03-08 | 1992-10-01 | Asm Lithography Bv | Ondersteuningsinrichting met een kantelbare objecttafel alsmede optisch lithografische inrichting voorzien van een dergelijke ondersteuningsinrichting. |
JP2714502B2 (ja) | 1991-09-18 | 1998-02-16 | キヤノン株式会社 | 移動ステージ装置 |
EP0583035B1 (de) * | 1992-08-12 | 1996-11-27 | Koninklijke Philips Electronics N.V. | Getriebemechanismus sowie Positioniereinrichtung mit einem derartigen Getriebemechanismus und Lithographieeinrichtung mit einer derartigen Positioniereinrichtung |
KR950003660A (ko) * | 1992-08-12 | 1995-02-17 | 제이지에이롤프스 | 변속 기구, 변속 기구를 구비한 위치 설정 장치 및, 위치 설정 장치를 구비한 리도그래픽 장치 |
GB9223716D0 (en) * | 1992-11-12 | 1992-12-23 | British Aerospace | An aircraft landing gear trolley |
DE4307482A1 (de) * | 1993-03-10 | 1994-09-22 | Max Rhodius Gmbh | Werkzeugmaschine |
US5874820A (en) * | 1995-04-04 | 1999-02-23 | Nikon Corporation | Window frame-guided stage mechanism |
US6989647B1 (en) * | 1994-04-01 | 2006-01-24 | Nikon Corporation | Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
US7365513B1 (en) | 1994-04-01 | 2008-04-29 | Nikon Corporation | Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
US5528118A (en) | 1994-04-01 | 1996-06-18 | Nikon Precision, Inc. | Guideless stage with isolated reaction stage |
US6721034B1 (en) | 1994-06-16 | 2004-04-13 | Nikon Corporation | Stage unit, drive table, and scanning exposure apparatus using the same |
US5850280A (en) | 1994-06-16 | 1998-12-15 | Nikon Corporation | Stage unit, drive table, and scanning exposure and apparatus using same |
JP3484684B2 (ja) * | 1994-11-01 | 2004-01-06 | 株式会社ニコン | ステージ装置及び走査型露光装置 |
US6246204B1 (en) | 1994-06-27 | 2001-06-12 | Nikon Corporation | Electromagnetic alignment and scanning apparatus |
US5623853A (en) * | 1994-10-19 | 1997-04-29 | Nikon Precision Inc. | Precision motion stage with single guide beam and follower stage |
US6008500A (en) * | 1995-04-04 | 1999-12-28 | Nikon Corporation | Exposure apparatus having dynamically isolated reaction frame |
TW316874B (de) * | 1995-05-30 | 1997-10-01 | Philips Electronics Nv | |
WO1996038764A1 (en) * | 1995-05-30 | 1996-12-05 | Philips Electronics N.V. | Lithographic device with a three-dimensionally positionable mask holder |
TW318255B (de) * | 1995-05-30 | 1997-10-21 | Philips Electronics Nv | |
US5760564A (en) * | 1995-06-27 | 1998-06-02 | Nikon Precision Inc. | Dual guide beam stage mechanism with yaw control |
EP0762255B1 (de) * | 1995-09-04 | 1999-03-17 | Canon Kabushiki Kaisha | Einrichtung zur Antriebsregelung |
JP3002142B2 (ja) * | 1996-10-07 | 2000-01-24 | キヤノン株式会社 | 移動ステージ装置および半導体焼付け装置 |
US5815246A (en) * | 1996-12-24 | 1998-09-29 | U.S. Philips Corporation | Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device |
JP3155936B2 (ja) * | 1997-06-26 | 2001-04-16 | キヤノン株式会社 | リニアモータとステージ装置及びこれを用いた走査型露光装置やデバイス製造方法 |
US6003230A (en) * | 1997-10-03 | 1999-12-21 | Massachusetts Institute Of Technology | Magnetic positioner having a single moving part |
US6054784A (en) * | 1997-12-29 | 2000-04-25 | Asm Lithography B.V. | Positioning device having three coil systems mutually enclosing angles of 120° and lithographic device comprising such a positioning device |
TWI242113B (en) * | 1998-07-17 | 2005-10-21 | Asml Netherlands Bv | Positioning device and lithographic projection apparatus comprising such a device |
US6144118A (en) | 1998-09-18 | 2000-11-07 | General Scanning, Inc. | High-speed precision positioning apparatus |
TW526630B (en) * | 1998-11-10 | 2003-04-01 | Asml Netherlands Bv | Actuator and transducer |
US6721045B1 (en) | 1999-09-07 | 2004-04-13 | Applied Materials, Inc. | Method and apparatus to provide embedded substrate process monitoring through consolidation of multiple process inspection techniques |
US6707544B1 (en) | 1999-09-07 | 2004-03-16 | Applied Materials, Inc. | Particle detection and embedded vision system to enhance substrate yield and throughput |
US6707545B1 (en) | 1999-09-07 | 2004-03-16 | Applied Materials, Inc. | Optical signal routing method and apparatus providing multiple inspection collection points on semiconductor manufacturing systems |
US6813032B1 (en) | 1999-09-07 | 2004-11-02 | Applied Materials, Inc. | Method and apparatus for enhanced embedded substrate inspection through process data collection and substrate imaging techniques |
US7012684B1 (en) | 1999-09-07 | 2006-03-14 | Applied Materials, Inc. | Method and apparatus to provide for automated process verification and hierarchical substrate examination |
US6630995B1 (en) | 1999-09-07 | 2003-10-07 | Applied Materials, Inc. | Method and apparatus for embedded substrate and system status monitoring |
US6693708B1 (en) | 1999-09-07 | 2004-02-17 | Applied Materials, Inc. | Method and apparatus for substrate surface inspection using spectral profiling techniques |
TW546551B (en) | 1999-12-21 | 2003-08-11 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
US20020196336A1 (en) * | 2001-06-19 | 2002-12-26 | Applied Materials, Inc. | Method and apparatus for substrate imaging |
US6903346B2 (en) * | 2001-07-11 | 2005-06-07 | Nikon Corporation | Stage assembly having a follower assembly |
US6888289B2 (en) * | 2002-07-16 | 2005-05-03 | Baldor Electric Company | Multi-axes, sub-micron positioner |
US7417714B2 (en) * | 2004-11-02 | 2008-08-26 | Nikon Corporation | Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage |
US7869000B2 (en) * | 2004-11-02 | 2011-01-11 | Nikon Corporation | Stage assembly with lightweight fine stage and low transmissibility |
US7468589B2 (en) * | 2006-01-13 | 2008-12-23 | Asml Netherlands B.V. | Lithographic apparatus having a controlled motor, and motor control system and method |
US8659205B2 (en) * | 2007-06-27 | 2014-02-25 | Brooks Automation, Inc. | Motor stator with lift capability and reduced cogging characteristics |
US8823294B2 (en) | 2007-06-27 | 2014-09-02 | Brooks Automation, Inc. | Commutation of an electromagnetic propulsion and guidance system |
US8283813B2 (en) | 2007-06-27 | 2012-10-09 | Brooks Automation, Inc. | Robot drive with magnetic spindle bearings |
KR101659931B1 (ko) | 2007-06-27 | 2016-09-26 | 브룩스 오토메이션 인코퍼레이티드 | 다차원 위치 센서 |
US9752615B2 (en) * | 2007-06-27 | 2017-09-05 | Brooks Automation, Inc. | Reduced-complexity self-bearing brushless DC motor |
US7834618B2 (en) * | 2007-06-27 | 2010-11-16 | Brooks Automation, Inc. | Position sensor system |
KR20180014247A (ko) | 2007-07-17 | 2018-02-07 | 브룩스 오토메이션 인코퍼레이티드 | 챔버 벽들에 일체화된 모터들을 갖는 기판 처리 장치 |
DE102012000664B4 (de) | 2012-01-17 | 2014-07-10 | Mirjana Jovanovic | Vorrichtung zur Erzeugung von dreidimmensionalen Objekten |
EP2907158B1 (de) | 2012-10-09 | 2016-05-04 | Koninklijke Philips N.V. | Positionierungsvorrichtung, steuerungsvorrichtung und steuerungsverfahren |
CN102940509A (zh) * | 2012-12-10 | 2013-02-27 | 深圳市海曼医疗设备有限公司 | 一种超声诊断仪操作台 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1477579C3 (de) * | 1960-09-13 | 1974-01-03 | Hellmut Dipl.-Ing. 7300 Esslingen-Liebersbronn Mueller | Vorrichtung zum Bearbeiten von Werkstücken |
CH436751A (de) * | 1966-05-31 | 1967-05-31 | Contraves Ag | Koordinatograph |
JPS5313272A (en) * | 1976-07-23 | 1978-02-06 | Hitachi Ltd | Precision planar moving plate |
US4492356A (en) * | 1982-02-26 | 1985-01-08 | Hitachi, Ltd. | Precision parallel translation system |
JPS5961132A (ja) * | 1982-09-30 | 1984-04-07 | Fujitsu Ltd | 電子ビ−ム露光装置 |
JPS60150950A (ja) * | 1984-01-20 | 1985-08-08 | Hitachi Ltd | 案内装置 |
JPH0727042B2 (ja) * | 1986-12-02 | 1995-03-29 | キヤノン株式会社 | ステ−ジ装置 |
-
1989
- 1989-10-05 NL NL8902471A patent/NL8902471A/nl not_active Application Discontinuation
-
1990
- 1990-09-28 KR KR1019900015469A patent/KR0154513B1/ko not_active IP Right Cessation
- 1990-10-01 DE DE69010610T patent/DE69010610T2/de not_active Expired - Fee Related
- 1990-10-01 EP EP90202582A patent/EP0421527B1/de not_active Expired - Lifetime
- 1990-10-04 US US07/594,520 patent/US5120034A/en not_active Expired - Lifetime
- 1990-10-05 JP JP2266526A patent/JP3016088B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR0154513B1 (ko) | 1998-12-15 |
JP3016088B2 (ja) | 2000-03-06 |
US5120034A (en) | 1992-06-09 |
DE69010610D1 (de) | 1994-08-18 |
EP0421527A1 (de) | 1991-04-10 |
JPH03142136A (ja) | 1991-06-17 |
KR910008528A (ko) | 1991-05-31 |
DE69010610T2 (de) | 1995-02-23 |
EP0421527B1 (de) | 1994-07-13 |
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Legal Events
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A1B | A search report has been drawn up | ||
BV | The patent application has lapsed |