NL8602021A - Werkwijze voor het vervaardigen van een beeldopneeminrichting voor radiografische toepassingen. - Google Patents

Werkwijze voor het vervaardigen van een beeldopneeminrichting voor radiografische toepassingen. Download PDF

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Publication number
NL8602021A
NL8602021A NL8602021A NL8602021A NL8602021A NL 8602021 A NL8602021 A NL 8602021A NL 8602021 A NL8602021 A NL 8602021A NL 8602021 A NL8602021 A NL 8602021A NL 8602021 A NL8602021 A NL 8602021A
Authority
NL
Netherlands
Prior art keywords
image pick
layer
csl
elements
protective layer
Prior art date
Application number
NL8602021A
Other languages
English (en)
Dutch (nl)
Original Assignee
Optische Ind De Oude Delft Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=19848383&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=NL8602021(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Optische Ind De Oude Delft Nv filed Critical Optische Ind De Oude Delft Nv
Priority to NL8602021A priority Critical patent/NL8602021A/nl
Priority to DE8787201429T priority patent/DE3762176D1/de
Priority to EP87201429A priority patent/EP0257678B1/en
Priority to US07/079,084 priority patent/US4746619A/en
Priority to IN581/CAL/87A priority patent/IN165686B/en
Priority to IL83428A priority patent/IL83428A/xx
Priority to KR1019870008600A priority patent/KR880003430A/ko
Priority to JP62197987A priority patent/JPS6347689A/ja
Publication of NL8602021A publication Critical patent/NL8602021A/nl
Priority to US07/197,105 priority patent/US4906850A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/29—Measurement performed on radiation beams, e.g. position or section of the beam; Measurement of spatial distribution of radiation
    • G01T1/2914—Measurement of spatial distribution of radiation
    • G01T1/2921—Static instruments for imaging the distribution of radioactivity in one or two dimensions; Radio-isotope cameras
    • G01T1/2928—Static instruments for imaging the distribution of radioactivity in one or two dimensions; Radio-isotope cameras using solid state detectors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16—Measuring radiation intensity
    • G01T1/20—Measuring radiation intensity with scintillation detectors
    • G01T1/2018—Scintillation-photodiode combinations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0216—Coatings
    • H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0232—Optical elements or arrangements associated with the device
    • H01L31/02322—Optical elements or arrangements associated with the device comprising luminescent members, e.g. fluorescent sheets upon the device

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Measurement Of Radiation (AREA)
  • Solid State Image Pick-Up Elements (AREA)
NL8602021A 1986-08-07 1986-08-07 Werkwijze voor het vervaardigen van een beeldopneeminrichting voor radiografische toepassingen. NL8602021A (nl)

Priority Applications (9)

Application Number Priority Date Filing Date Title
NL8602021A NL8602021A (nl) 1986-08-07 1986-08-07 Werkwijze voor het vervaardigen van een beeldopneeminrichting voor radiografische toepassingen.
DE8787201429T DE3762176D1 (de) 1986-08-07 1987-07-24 Herstellungsverfahren einer bildaufnahmeeinrichtung fuer radiographische zwecke.
EP87201429A EP0257678B1 (en) 1986-08-07 1987-07-24 Method of manufacturing an image detection device for radiographic purposes
US07/079,084 US4746619A (en) 1986-08-07 1987-07-27 Method of manufacturing an image detection device for radiographic purposes
IN581/CAL/87A IN165686B (ko) 1986-08-07 1987-07-29
IL83428A IL83428A (en) 1986-08-07 1987-08-04 Method of manufacturing an image recording device for radiographic purposes
KR1019870008600A KR880003430A (ko) 1986-08-07 1987-08-05 방사선용 영상탐지 장치 제조방법
JP62197987A JPS6347689A (ja) 1986-08-07 1987-08-07 放射線写真用の像検出装置を製造する方法
US07/197,105 US4906850A (en) 1986-08-07 1988-05-20 Radiographic image detection device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8602021 1986-08-07
NL8602021A NL8602021A (nl) 1986-08-07 1986-08-07 Werkwijze voor het vervaardigen van een beeldopneeminrichting voor radiografische toepassingen.

Publications (1)

Publication Number Publication Date
NL8602021A true NL8602021A (nl) 1988-03-01

Family

ID=19848383

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8602021A NL8602021A (nl) 1986-08-07 1986-08-07 Werkwijze voor het vervaardigen van een beeldopneeminrichting voor radiografische toepassingen.

Country Status (8)

Country Link
US (2) US4746619A (ko)
EP (1) EP0257678B1 (ko)
JP (1) JPS6347689A (ko)
KR (1) KR880003430A (ko)
DE (1) DE3762176D1 (ko)
IL (1) IL83428A (ko)
IN (1) IN165686B (ko)
NL (1) NL8602021A (ko)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6031892A (en) * 1989-12-05 2000-02-29 University Of Massachusetts Medical Center System for quantitative radiographic imaging
US5187369A (en) * 1990-10-01 1993-02-16 General Electric Company High sensitivity, high resolution, solid state x-ray imaging device with barrier layer
US5153438A (en) * 1990-10-01 1992-10-06 General Electric Company Method of forming an x-ray imaging array and the array
US5059800A (en) * 1991-04-19 1991-10-22 General Electric Company Two dimensional mosaic scintillation detector
US5208460A (en) * 1991-09-23 1993-05-04 General Electric Company Photodetector scintillator radiation imager having high efficiency light collection
US5463225A (en) * 1992-06-01 1995-10-31 General Electric Company Solid state radiation imager with high integrity barrier layer and method of fabricating
US5368882A (en) * 1993-08-25 1994-11-29 Minnesota Mining And Manufacturing Company Process for forming a radiation detector
US5401668A (en) * 1993-09-02 1995-03-28 General Electric Company Method for fabrication solid state radiation imager having improved scintillator adhesion
US5596198A (en) * 1994-04-22 1997-01-21 The Regents, University Of California Gamma ray camera
US7019301B2 (en) 1997-02-14 2006-03-28 Hamamatsu Photonics K.K. Radiation detection device and method of making the same
JP5031172B2 (ja) 2000-09-11 2012-09-19 浜松ホトニクス株式会社 シンチレータパネル、放射線イメージセンサおよびそれらの製造方法
EP1326093A4 (en) * 2000-09-11 2006-11-15 Hamamatsu Photonics Kk SCINTILLATE PANEL, RADIATION IMAGE SENSOR AND METHOD FOR THE PRODUCTION THEREOF
US6483115B1 (en) * 2000-11-08 2002-11-19 General Electric Company Method for enhancing scintillator adhesion to digital x-ray detectors
US6324249B1 (en) 2001-03-21 2001-11-27 Agilent Technologies, Inc. Electronic planar laminography system and method
US6707046B2 (en) * 2002-01-03 2004-03-16 General Electric Company Optimized scintillator and pixilated photodiode detector array for multi-slice CT x-ray detector using backside illumination
DE102010004890A1 (de) * 2010-01-18 2011-07-21 Siemens Aktiengesellschaft, 80333 Photodiodenarray, Strahlendetektor und Verfahren zur Herstellung eines solchen Photodiodenarrays und eines solchen Strahlendetektors

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3936645A (en) * 1974-03-25 1976-02-03 Radiologic Sciences, Inc. Cellularized Luminescent structures
US4197633A (en) * 1977-09-01 1980-04-15 Honeywell, Inc. Hybrid mosaic IR/CCD focal plane
US4234792A (en) * 1977-09-29 1980-11-18 Raytheon Company Scintillator crystal radiation detector
US4290844A (en) * 1979-02-26 1981-09-22 Carson Alexiou Corporation Focal plane photo-detector mosaic array fabrication
JPS55129782A (en) * 1979-03-30 1980-10-07 Hitachi Medical Corp Radiant ray detector
US4411059A (en) * 1979-10-18 1983-10-25 Picker Corporation Method for manufacturing a charge splitting resistive layer for a semiconductor gamma camera
FR2575602B1 (fr) * 1984-12-27 1987-01-30 Thomson Csf Dispositif photosensible de grand format, et procede d'utilisation
US4686761A (en) * 1985-03-21 1987-08-18 The United States Of America As Represented By The Secretary Of The Army Method of fabrication of low crosstalk photodiode array
US4618380A (en) * 1985-06-18 1986-10-21 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Method of fabricating an imaging X-ray spectrometer
JPS6243585A (ja) * 1985-08-21 1987-02-25 Toshiba Corp Ｘ線ｃｔ用検出器
US4672207A (en) * 1985-08-21 1987-06-09 The United States Of America As Represented By The United States Department Of Energy Readout system for multi-crystal gamma cameras

Also Published As

Publication number Publication date
EP0257678B1 (en) 1990-04-04
US4906850A (en) 1990-03-06
IL83428A (en) 1990-12-23
IL83428A0 (en) 1988-01-31
JPS6347689A (ja) 1988-02-29
EP0257678A1 (en) 1988-03-02
US4746619A (en) 1988-05-24
DE3762176D1 (de) 1990-05-10
IN165686B (ko) 1989-12-09
KR880003430A (ko) 1988-05-17

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BV The patent application has lapsed