US3888053A
(en)
*
|
1973-05-29 |
1975-06-10 |
Rca Corp |
Method of shaping semiconductor workpiece
|
NL7404364A
(nl)
*
|
1974-04-01 |
1975-10-03 |
Philips Nv |
Werkwijze en inrichting voor het bewerken van vlakke voorwerpen.
|
JPS5419298B2
(de)
*
|
1974-05-10 |
1979-07-13 |
|
|
JPS5810193B2
(ja)
*
|
1974-08-02 |
1983-02-24 |
株式会社日立製作所 |
ラツピングソウチ
|
JPS54143770U
(de)
*
|
1977-11-29 |
1979-10-05 |
|
|
US4519593A
(en)
*
|
1982-09-01 |
1985-05-28 |
Westinghouse Electric Corp. |
Grid assembly fixture, retention strap
|
JPS6099538A
(ja)
*
|
1983-11-01 |
1985-06-03 |
横河・ヒュ−レット・パッカ−ド株式会社 |
ピンチヤツク
|
US4747608A
(en)
*
|
1984-10-30 |
1988-05-31 |
Canon Kabushiki Kaisha |
Wafer chuck
|
KR910009320B1
(ko)
*
|
1986-08-19 |
1991-11-09 |
미쓰비시 마테리알 가부시기가이샤 |
연마장치
|
DE68920365T2
(de)
*
|
1988-06-28 |
1995-06-08 |
Mitsubishi Material Silicon |
Verfahren zur Polierung eines Halbleiter-Plättchens.
|
US5189843A
(en)
*
|
1990-08-30 |
1993-03-02 |
Silicon Technology Corporation |
Wafer slicing and grinding machine and a method of slicing and grinding wafers
|
US5230184A
(en)
*
|
1991-07-05 |
1993-07-27 |
Motorola, Inc. |
Distributed polishing head
|
US5273615A
(en)
*
|
1992-04-06 |
1993-12-28 |
Motorola, Inc. |
Apparatus and method for handling fragile semiconductor wafers
|
US5345170A
(en)
|
1992-06-11 |
1994-09-06 |
Cascade Microtech, Inc. |
Wafer probe station having integrated guarding, Kelvin connection and shielding systems
|
US6380751B2
(en)
|
1992-06-11 |
2002-04-30 |
Cascade Microtech, Inc. |
Wafer probe station having environment control enclosure
|
US5738165A
(en)
*
|
1993-05-07 |
1998-04-14 |
Nikon Corporation |
Substrate holding apparatus
|
JPH07169660A
(ja)
*
|
1993-09-09 |
1995-07-04 |
Xerox Corp |
ウェハ対を接合する装置及び方法
|
US6232789B1
(en)
|
1997-05-28 |
2001-05-15 |
Cascade Microtech, Inc. |
Probe holder for low current measurements
|
US5561377A
(en)
|
1995-04-14 |
1996-10-01 |
Cascade Microtech, Inc. |
System for evaluating probing networks
|
US5632667A
(en)
*
|
1995-06-29 |
1997-05-27 |
Delco Electronics Corporation |
No coat backside wafer grinding process
|
US5914613A
(en)
|
1996-08-08 |
1999-06-22 |
Cascade Microtech, Inc. |
Membrane probing system with local contact scrub
|
US6002263A
(en)
|
1997-06-06 |
1999-12-14 |
Cascade Microtech, Inc. |
Probe station having inner and outer shielding
|
US6256882B1
(en)
|
1998-07-14 |
2001-07-10 |
Cascade Microtech, Inc. |
Membrane probing system
|
US6578264B1
(en)
|
1999-06-04 |
2003-06-17 |
Cascade Microtech, Inc. |
Method for constructing a membrane probe using a depression
|
US6445202B1
(en)
|
1999-06-30 |
2002-09-03 |
Cascade Microtech, Inc. |
Probe station thermal chuck with shielding for capacitive current
|
US6838890B2
(en)
|
2000-02-25 |
2005-01-04 |
Cascade Microtech, Inc. |
Membrane probing system
|
US6965226B2
(en)
|
2000-09-05 |
2005-11-15 |
Cascade Microtech, Inc. |
Chuck for holding a device under test
|
US6914423B2
(en)
|
2000-09-05 |
2005-07-05 |
Cascade Microtech, Inc. |
Probe station
|
DE10143173A1
(de)
|
2000-12-04 |
2002-06-06 |
Cascade Microtech Inc |
Wafersonde
|
US6970634B2
(en)
*
|
2001-05-04 |
2005-11-29 |
Cascade Microtech, Inc. |
Fiber optic wafer probe
|
WO2003052435A1
(en)
|
2001-08-21 |
2003-06-26 |
Cascade Microtech, Inc. |
Membrane probing system
|
US6777964B2
(en)
|
2002-01-25 |
2004-08-17 |
Cascade Microtech, Inc. |
Probe station
|
JP2005527823A
(ja)
|
2002-05-23 |
2005-09-15 |
カスケード マイクロテック インコーポレイテッド |
デバイスのテスト用プローブ
|
US6847219B1
(en)
|
2002-11-08 |
2005-01-25 |
Cascade Microtech, Inc. |
Probe station with low noise characteristics
|
US6724205B1
(en)
|
2002-11-13 |
2004-04-20 |
Cascade Microtech, Inc. |
Probe for combined signals
|
US7250779B2
(en)
|
2002-11-25 |
2007-07-31 |
Cascade Microtech, Inc. |
Probe station with low inductance path
|
US6861856B2
(en)
|
2002-12-13 |
2005-03-01 |
Cascade Microtech, Inc. |
Guarded tub enclosure
|
US7001827B2
(en)
*
|
2003-04-15 |
2006-02-21 |
International Business Machines Corporation |
Semiconductor wafer front side protection
|
US7221172B2
(en)
|
2003-05-06 |
2007-05-22 |
Cascade Microtech, Inc. |
Switched suspended conductor and connection
|
US7057404B2
(en)
|
2003-05-23 |
2006-06-06 |
Sharp Laboratories Of America, Inc. |
Shielded probe for testing a device under test
|
US7492172B2
(en)
|
2003-05-23 |
2009-02-17 |
Cascade Microtech, Inc. |
Chuck for holding a device under test
|
US7250626B2
(en)
|
2003-10-22 |
2007-07-31 |
Cascade Microtech, Inc. |
Probe testing structure
|
DE202004021093U1
(de)
|
2003-12-24 |
2006-09-28 |
Cascade Microtech, Inc., Beaverton |
Aktiver Halbleiterscheibenmessfühler
|
US7187188B2
(en)
|
2003-12-24 |
2007-03-06 |
Cascade Microtech, Inc. |
Chuck with integrated wafer support
|
US7176705B2
(en)
|
2004-06-07 |
2007-02-13 |
Cascade Microtech, Inc. |
Thermal optical chuck
|
US7330041B2
(en)
|
2004-06-14 |
2008-02-12 |
Cascade Microtech, Inc. |
Localizing a temperature of a device for testing
|
JP4980903B2
(ja)
|
2004-07-07 |
2012-07-18 |
カスケード マイクロテック インコーポレイテッド |
膜懸垂プローブを具えるプローブヘッド
|
JP2008512680A
(ja)
|
2004-09-13 |
2008-04-24 |
カスケード マイクロテック インコーポレイテッド |
両面プロービング構造体
|
US7535247B2
(en)
|
2005-01-31 |
2009-05-19 |
Cascade Microtech, Inc. |
Interface for testing semiconductors
|
US7656172B2
(en)
|
2005-01-31 |
2010-02-02 |
Cascade Microtech, Inc. |
System for testing semiconductors
|
US7449899B2
(en)
|
2005-06-08 |
2008-11-11 |
Cascade Microtech, Inc. |
Probe for high frequency signals
|
WO2006137979A2
(en)
|
2005-06-13 |
2006-12-28 |
Cascade Microtech, Inc. |
Wideband active-passive differential signal probe
|
US20070090479A1
(en)
*
|
2005-10-20 |
2007-04-26 |
Chien-Hua Chen |
Controlling bond fronts in wafer-scale packaging
|
KR100898793B1
(ko)
*
|
2005-12-29 |
2009-05-20 |
엘지디스플레이 주식회사 |
액정표시소자용 기판 합착 장치
|
WO2007146285A2
(en)
|
2006-06-09 |
2007-12-21 |
Cascade Microtech, Inc. |
Differential signal probe with integral balun
|
US7764072B2
(en)
|
2006-06-12 |
2010-07-27 |
Cascade Microtech, Inc. |
Differential signal probing system
|
US7403028B2
(en)
|
2006-06-12 |
2008-07-22 |
Cascade Microtech, Inc. |
Test structure and probe for differential signals
|
US7443186B2
(en)
|
2006-06-12 |
2008-10-28 |
Cascade Microtech, Inc. |
On-wafer test structures for differential signals
|
US7723999B2
(en)
|
2006-06-12 |
2010-05-25 |
Cascade Microtech, Inc. |
Calibration structures for differential signal probing
|
US7876114B2
(en)
|
2007-08-08 |
2011-01-25 |
Cascade Microtech, Inc. |
Differential waveguide probe
|
US7888957B2
(en)
|
2008-10-06 |
2011-02-15 |
Cascade Microtech, Inc. |
Probing apparatus with impedance optimized interface
|
US8410806B2
(en)
|
2008-11-21 |
2013-04-02 |
Cascade Microtech, Inc. |
Replaceable coupon for a probing apparatus
|
US8319503B2
(en)
|
2008-11-24 |
2012-11-27 |
Cascade Microtech, Inc. |
Test apparatus for measuring a characteristic of a device under test
|
US9922851B2
(en)
|
2014-05-05 |
2018-03-20 |
International Business Machines Corporation |
Gas-controlled bonding platform for edge defect reduction during wafer bonding
|
CN104385129B
(zh)
*
|
2014-09-29 |
2016-11-16 |
无锡康柏斯机械科技有限公司 |
一种专用于工件底面钻孔找平的安装夹具
|
USD811451S1
(en)
*
|
2015-12-14 |
2018-02-27 |
Ngk Spark Plug Co., Ltd. |
Vacuum chuck
|
USD811452S1
(en)
*
|
2015-12-14 |
2018-02-27 |
Ngk Spark Plug Co., Ltd. |
Vacuum chuck
|
DE102016106706A1
(de)
*
|
2016-04-12 |
2017-10-12 |
Laser Imaging Systems Gmbh |
Vorrichtung zum Fixieren von Objekten mittels Vakuum
|
CN105834900B
(zh)
*
|
2016-04-28 |
2019-03-26 |
浙江工业大学 |
一种抛光工件真空夹具自动调节装置
|
CN106141910A
(zh)
*
|
2016-08-26 |
2016-11-23 |
卢明杰 |
一种具有全方位打磨功能的石材加工平台
|
CN107738203B
(zh)
*
|
2017-10-10 |
2019-06-28 |
青岛永丰高新包装制品有限公司 |
用于塑料编织袋固定的吸附定位装置
|
KR102010271B1
(ko)
*
|
2017-11-03 |
2019-10-21 |
에이엠테크놀로지 주식회사 |
연마장치
|
CN108705690B
(zh)
*
|
2018-05-29 |
2020-08-25 |
新昌县皇骐电子科技有限公司 |
一种半导体晶圆划片机
|
CN110549184A
(zh)
*
|
2018-05-30 |
2019-12-10 |
佛山市三水区琪昌机械设备有限公司 |
一种用于一次烧瓷砖生坯的抛平机
|
CN112726358A
(zh)
*
|
2021-01-27 |
2021-04-30 |
刘金月 |
一种建筑施工用混凝土磨光机
|
CN113400186B
(zh)
*
|
2021-07-20 |
2022-02-15 |
深圳市科源信科技有限公司 |
一种石英晶振片研磨架
|
CN113649949A
(zh)
*
|
2021-08-24 |
2021-11-16 |
上海致领半导体科技发展有限公司 |
一种用于半导体晶片抛光的多通路真空吸盘部件
|