MY160307A - Compositon for polishing glass substrate, and polishing slurry - Google Patents

Compositon for polishing glass substrate, and polishing slurry

Info

Publication number
MY160307A
MY160307A MYPI2013001922A MYPI2013001922A MY160307A MY 160307 A MY160307 A MY 160307A MY PI2013001922 A MYPI2013001922 A MY PI2013001922A MY PI2013001922 A MYPI2013001922 A MY PI2013001922A MY 160307 A MY160307 A MY 160307A
Authority
MY
Malaysia
Prior art keywords
polishing
glass substrate
compositon
slurry
group
Prior art date
Application number
MYPI2013001922A
Inventor
Kentaro Hamashima
Hidekazu Inagaki
Original Assignee
Moresco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Moresco Corp filed Critical Moresco Corp
Publication of MY160307A publication Critical patent/MY160307A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions

Abstract

A COMPOSITION FOR POLISHING GLASS SUBSTRATE COMPRISING COMPONENTS (A), (B) AND OPTIONALLY (C) AND/OR (D), AND POLISHING SLURRY COMPRISING THE COMPOSITION AND ABRASIVE GRAINS. (A) A TETRAZOLE DERIVATIVE HAVING AT LEAST ONE GROUP SELECTED FROM MERCAPTO GROUP, ALKYLTHIO GROUP AND ALKYL GROUP, (B) WATER, (C) A HIGH MOLECULAR POLYSACCHARIDE, (D) AN AMINE
MYPI2013001922A 2010-12-06 2011-11-30 Compositon for polishing glass substrate, and polishing slurry MY160307A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010271434 2010-12-06

Publications (1)

Publication Number Publication Date
MY160307A true MY160307A (en) 2017-02-28

Family

ID=46207180

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2013001922A MY160307A (en) 2010-12-06 2011-11-30 Compositon for polishing glass substrate, and polishing slurry

Country Status (5)

Country Link
JP (1) JP5531236B2 (en)
CN (1) CN103249525B (en)
MY (1) MY160307A (en)
SG (1) SG191038A1 (en)
WO (1) WO2012077693A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6411759B2 (en) * 2014-03-27 2018-10-24 株式会社フジミインコーポレーテッド Polishing composition, method for using the same, and method for producing a substrate

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4273475B2 (en) * 1999-09-21 2009-06-03 株式会社フジミインコーポレーテッド Polishing composition
JP2001269859A (en) * 2000-03-27 2001-10-02 Jsr Corp Aqueous dispersing element for polishing chemical machine
JP2004031446A (en) * 2002-06-21 2004-01-29 Hitachi Chem Co Ltd Polishing solution and polishing method
US7553345B2 (en) * 2002-12-26 2009-06-30 Kao Corporation Polishing composition
US7071105B2 (en) * 2003-02-03 2006-07-04 Cabot Microelectronics Corporation Method of polishing a silicon-containing dielectric
JP2007095841A (en) * 2005-09-27 2007-04-12 Fujifilm Corp Chemical mechanical polishing method
JP5080012B2 (en) * 2006-02-24 2012-11-21 富士フイルム株式会社 Polishing liquid for metal
JP5401766B2 (en) * 2006-04-21 2014-01-29 日立化成株式会社 CMP polishing agent and substrate polishing method
JP2009094430A (en) * 2007-10-12 2009-04-30 Adeka Corp Polishing composition for cmp
JP5277640B2 (en) * 2007-10-17 2013-08-28 日立化成株式会社 Polishing liquid and polishing method for CMP
JP5473587B2 (en) * 2009-12-24 2014-04-16 花王株式会社 Polishing liquid composition for magnetic disk substrate

Also Published As

Publication number Publication date
CN103249525A (en) 2013-08-14
JPWO2012077693A1 (en) 2014-05-19
WO2012077693A1 (en) 2012-06-14
CN103249525B (en) 2016-01-06
SG191038A1 (en) 2013-07-31
JP5531236B2 (en) 2014-06-25

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