KR970049044A - Photoresist Coating Device - Google Patents

Photoresist Coating Device Download PDF

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Publication number
KR970049044A
KR970049044A KR1019950059279A KR19950059279A KR970049044A KR 970049044 A KR970049044 A KR 970049044A KR 1019950059279 A KR1019950059279 A KR 1019950059279A KR 19950059279 A KR19950059279 A KR 19950059279A KR 970049044 A KR970049044 A KR 970049044A
Authority
KR
South Korea
Prior art keywords
photosensitive liquid
nozzle
wafer
discharge port
robot arm
Prior art date
Application number
KR1019950059279A
Other languages
Korean (ko)
Inventor
이준택
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950059279A priority Critical patent/KR970049044A/en
Publication of KR970049044A publication Critical patent/KR970049044A/en

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Abstract

본 발명은 웨이퍼상에 감광액을 도포하는 감광액도포장치에 관한 것으로서, 그 구성은 로봇아암(14)에 의해 구동되어 웨이퍼(12)상으로 이동되어서 감광액(13)을 분사하는 감광액공급노즐(15)을 구비하고, 스핀척(12)에 회전에 의해 그 위에 놓여진 상기 웨이퍼(12)상에서 상기 감광액(13)이 퍼져서 도포되게 하고, 그리고 상기 감광액(13)의 분사후 상기 로봇아암(14)에 의해 상기 노즐(15)이 이동되어서 상기 노즐(15)의 토출구를 밀봉시켜서 외기와 차단되도록 하는 노즐밀봉수단(20)을 구비하고 있다. 상술한 감광액도포장치에 의하면, 웨이퍼의 전표면상에 균일한 점도를 가지면서 감광액을 균일하게 도포할 수 있다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive liquid applying apparatus for applying a photosensitive liquid onto a wafer, the configuration of which is driven by the robot arm 14 and moved onto the wafer 12 to inject the photosensitive liquid 13 into the photosensitive liquid supply nozzle 15. And spreading and spreading the photosensitive liquid 13 on the wafer 12 placed thereon by rotation to the spin chuck 12 and by the robot arm 14 after the injection of the photosensitive liquid 13. The nozzle 15 is moved to seal the discharge port of the nozzle 15 is provided with a nozzle sealing means 20 to block the outside air. According to the photosensitive liquid applying device described above, the photosensitive liquid can be uniformly applied while having a uniform viscosity on the entire surface of the wafer.

Description

감광액도포장치Photoresist Coating Device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제2도는 본 발명의 실시예에 따른 감광액도포장치의 구조를 보여주고 있는 도면.2 is a view showing the structure of a photosensitive liquid applying apparatus according to an embodiment of the present invention.

Claims (4)

로봇아암(14)에 의해 웨이퍼(12)상으로 이동되어서 감광액(13)을 분사하는 감광액공급노즐(15)을 구비하고, 스핀척(12)에 회전에 의해 그 위에 놓여진 상기 웨이퍼(12)상에서 상기 감광액(13)이 퍼져서 도포되게 하는 감광액도포장치에 있어서, 상기 감광액(13)의 분사후 상기 로봇아암(14)에 의해 상기 노즐(1)이 이동되어서 상기 노즐(15)의 토출구를 밀봉시켜서 외기와 차단되도록 하는 노즐밀봉수단(20)을 구비한 것을 특징으로 하는 감광액도포장치.On the wafer 12 provided with a photosensitive liquid supply nozzle 15 which is moved onto the wafer 12 by the robot arm 14 and ejects the photosensitive liquid 13, and placed on the spin chuck 12 by rotation. In the photosensitive liquid coating apparatus for spreading and applying the photosensitive liquid 13, after the injection of the photosensitive liquid 13, the nozzle 1 is moved by the robot arm 14 to seal the discharge port of the nozzle 15 A photoresist coating device, characterized in that it comprises a nozzle sealing means (20) to block the outside air. 제1항에 있어서, 상기 밀봉수단(20)은 상기 노즐(15)의 토출구를 받아들이는 수납홈(21)과, 상기 토출구를 향하여 일정기압의 가스를 공급하는 가스공급부(22)를 구비한 것을 특징으로 하는 감광액도포장치.The method of claim 1, wherein the sealing means 20 is provided with a receiving groove 21 for receiving the discharge port of the nozzle 15, and a gas supply unit 22 for supplying a gas of a constant atmospheric pressure toward the discharge port Photosensitive liquid coating device characterized in that. 제2항에 있어서, 상기 밀봉수단(20)은 상기 노즐(15)의 토출구가 상기 수납홈(21)에 수납된 때 밀봉되어 외기와 차단되도록 상기 노즐(15)에 형성되고 그리고 상기 수납홈(21)과 밀착되는 노즐밀봉용 캡(23)을 구비한 것을 특징으로 하는 감광액도포장치.The method of claim 2, wherein the sealing means 20 is formed in the nozzle 15 so as to be sealed when the discharge port of the nozzle 15 is received in the receiving groove 21 is blocked from the outside air and the receiving groove ( And a nozzle sealing cap (23) in close contact with 21). 제2항에 있어서, 상기 가스는 대기압 이상의 질소가스인 것을 특징으로 하는 감광액도포장치.The photosensitive liquid coating apparatus according to claim 2, wherein the gas is nitrogen gas at atmospheric pressure or higher. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950059279A 1995-12-27 1995-12-27 Photoresist Coating Device KR970049044A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950059279A KR970049044A (en) 1995-12-27 1995-12-27 Photoresist Coating Device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950059279A KR970049044A (en) 1995-12-27 1995-12-27 Photoresist Coating Device

Publications (1)

Publication Number Publication Date
KR970049044A true KR970049044A (en) 1997-07-29

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ID=66620044

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950059279A KR970049044A (en) 1995-12-27 1995-12-27 Photoresist Coating Device

Country Status (1)

Country Link
KR (1) KR970049044A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030000645A (en) * 2001-06-26 2003-01-06 주식회사 실리콘 테크 Nozzle driving method for photoresist dispense on semiconductor wafer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030000645A (en) * 2001-06-26 2003-01-06 주식회사 실리콘 테크 Nozzle driving method for photoresist dispense on semiconductor wafer

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