KR970049044A - Photoresist Coating Device - Google Patents
Photoresist Coating Device Download PDFInfo
- Publication number
- KR970049044A KR970049044A KR1019950059279A KR19950059279A KR970049044A KR 970049044 A KR970049044 A KR 970049044A KR 1019950059279 A KR1019950059279 A KR 1019950059279A KR 19950059279 A KR19950059279 A KR 19950059279A KR 970049044 A KR970049044 A KR 970049044A
- Authority
- KR
- South Korea
- Prior art keywords
- photosensitive liquid
- nozzle
- wafer
- discharge port
- robot arm
- Prior art date
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- Coating Apparatus (AREA)
Abstract
본 발명은 웨이퍼상에 감광액을 도포하는 감광액도포장치에 관한 것으로서, 그 구성은 로봇아암(14)에 의해 구동되어 웨이퍼(12)상으로 이동되어서 감광액(13)을 분사하는 감광액공급노즐(15)을 구비하고, 스핀척(12)에 회전에 의해 그 위에 놓여진 상기 웨이퍼(12)상에서 상기 감광액(13)이 퍼져서 도포되게 하고, 그리고 상기 감광액(13)의 분사후 상기 로봇아암(14)에 의해 상기 노즐(15)이 이동되어서 상기 노즐(15)의 토출구를 밀봉시켜서 외기와 차단되도록 하는 노즐밀봉수단(20)을 구비하고 있다. 상술한 감광액도포장치에 의하면, 웨이퍼의 전표면상에 균일한 점도를 가지면서 감광액을 균일하게 도포할 수 있다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photosensitive liquid applying apparatus for applying a photosensitive liquid onto a wafer, the configuration of which is driven by the robot arm 14 and moved onto the wafer 12 to inject the photosensitive liquid 13 into the photosensitive liquid supply nozzle 15. And spreading and spreading the photosensitive liquid 13 on the wafer 12 placed thereon by rotation to the spin chuck 12 and by the robot arm 14 after the injection of the photosensitive liquid 13. The nozzle 15 is moved to seal the discharge port of the nozzle 15 is provided with a nozzle sealing means 20 to block the outside air. According to the photosensitive liquid applying device described above, the photosensitive liquid can be uniformly applied while having a uniform viscosity on the entire surface of the wafer.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.
제2도는 본 발명의 실시예에 따른 감광액도포장치의 구조를 보여주고 있는 도면.2 is a view showing the structure of a photosensitive liquid applying apparatus according to an embodiment of the present invention.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950059279A KR970049044A (en) | 1995-12-27 | 1995-12-27 | Photoresist Coating Device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950059279A KR970049044A (en) | 1995-12-27 | 1995-12-27 | Photoresist Coating Device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970049044A true KR970049044A (en) | 1997-07-29 |
Family
ID=66620044
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950059279A KR970049044A (en) | 1995-12-27 | 1995-12-27 | Photoresist Coating Device |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970049044A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030000645A (en) * | 2001-06-26 | 2003-01-06 | 주식회사 실리콘 테크 | Nozzle driving method for photoresist dispense on semiconductor wafer |
-
1995
- 1995-12-27 KR KR1019950059279A patent/KR970049044A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20030000645A (en) * | 2001-06-26 | 2003-01-06 | 주식회사 실리콘 테크 | Nozzle driving method for photoresist dispense on semiconductor wafer |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
WITN | Withdrawal due to no request for examination |