KR970003394A - Natural oxide removal method on semiconductor wafer - Google Patents
Natural oxide removal method on semiconductor wafer Download PDFInfo
- Publication number
- KR970003394A KR970003394A KR1019950019139A KR19950019139A KR970003394A KR 970003394 A KR970003394 A KR 970003394A KR 1019950019139 A KR1019950019139 A KR 1019950019139A KR 19950019139 A KR19950019139 A KR 19950019139A KR 970003394 A KR970003394 A KR 970003394A
- Authority
- KR
- South Korea
- Prior art keywords
- oxide film
- natural oxide
- semiconductor wafer
- removal method
- oxide removal
- Prior art date
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- Drying Of Semiconductors (AREA)
- Weting (AREA)
Abstract
1. 청구 범위에 기재된 발명이 속한 기술분야1. TECHNICAL FIELD OF THE INVENTION
고집적 반도체 소자 제조 방법.Highly integrated semiconductor device manufacturing method.
2. 발명이 해결하려고 하는 기술적 과제2. The technical problem to be solved by the invention
폴리실리콘의 도핑을 실시한 후에 형성되는 자연 산화막을 제거하는 종래의 방법은 불산 용액을 이용하여 습식 식각을 실시하여 제거하였는데, 린스조건이나 단차 등의 영향으로 자연 산화막이 완전히 제거되지 않고 잔류하는 현상이 발생하며 이로 인해 후속 공정에서 소자 불량을 유발하는 문제점을 해결하고자 함.The conventional method of removing the natural oxide film formed after the polysilicon doping has been removed by wet etching using a hydrofluoric acid solution. To solve the problem that causes device defect in the subsequent process.
3. 발명의 해결방법의 요지3. Summary of Solution to Invention
자연산화막상에 얇은 산화막을 더 증착한 다음, 이 산화막을 자연 산화막과 함께 건식 식각하여 제거하므로써, 효과적으로 자연 산화막을 제거하는 방법을 제공하고자 함.By further depositing a thin oxide film on the natural oxide film and then dry etching the oxide film along with the natural oxide film to provide a method for effectively removing the natural oxide film.
4. 발명의 중요한 용도4. Important uses of the invention
고집적 반도체 소자의 제조에 이용됨.Used in the manufacture of highly integrated semiconductor devices.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2A도는 본 발명의 자연 산화막 제거 방법에 따른 공정도.Figure 2A is a process chart according to the natural oxide film removal method of the present invention.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950019139A KR970003394A (en) | 1995-06-30 | 1995-06-30 | Natural oxide removal method on semiconductor wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950019139A KR970003394A (en) | 1995-06-30 | 1995-06-30 | Natural oxide removal method on semiconductor wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970003394A true KR970003394A (en) | 1997-01-28 |
Family
ID=66526181
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950019139A KR970003394A (en) | 1995-06-30 | 1995-06-30 | Natural oxide removal method on semiconductor wafer |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970003394A (en) |
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1995
- 1995-06-30 KR KR1019950019139A patent/KR970003394A/en not_active Application Discontinuation
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