KR960705742A - 석영유리 성형체 및 그 제조방법 - Google Patents
석영유리 성형체 및 그 제조방법Info
- Publication number
- KR960705742A KR960705742A KR1019960702414A KR19960702414A KR960705742A KR 960705742 A KR960705742 A KR 960705742A KR 1019960702414 A KR1019960702414 A KR 1019960702414A KR 19960702414 A KR19960702414 A KR 19960702414A KR 960705742 A KR960705742 A KR 960705742A
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- Prior art keywords
- base
- transparent
- molded body
- surface portion
- quartz glass
- Prior art date
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract 10
- 238000004519 manufacturing process Methods 0.000 title claims abstract 4
- 239000000463 material Substances 0.000 claims abstract 8
- 239000011148 porous material Substances 0.000 claims abstract 4
- 230000003595 spectral effect Effects 0.000 claims abstract 4
- 238000002834 transmittance Methods 0.000 claims abstract 4
- 238000010438 heat treatment Methods 0.000 claims abstract 3
- 239000000126 substance Substances 0.000 claims abstract 2
- 238000000034 method Methods 0.000 claims 11
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000001816 cooling Methods 0.000 claims 1
- 229910052906 cristobalite Inorganic materials 0.000 claims 1
- 238000010891 electric arc Methods 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 238000000227 grinding Methods 0.000 claims 1
- 238000000465 moulding Methods 0.000 claims 1
- 239000003345 natural gas Substances 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 239000000843 powder Substances 0.000 claims 1
- 238000005245 sintering Methods 0.000 claims 1
- 238000007569 slipcasting Methods 0.000 claims 1
- 230000006641 stabilisation Effects 0.000 claims 1
- 238000011105 stabilization Methods 0.000 claims 1
- 230000003746 surface roughness Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22C—FOUNDRY MOULDING
- B22C9/00—Moulds or cores; Moulding processes
- B22C9/12—Treating moulds or cores, e.g. drying, hardening
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/002—Crucibles or containers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/429—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to measurement of ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/80—Glass compositions containing bubbles or microbubbles, e.g. opaque quartz glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
- Y10T428/1317—Multilayer [continuous layer]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Dispersion Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Silicon Compounds (AREA)
- Producing Shaped Articles From Materials (AREA)
- Glass Compositions (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Optical Measuring Cells (AREA)
Abstract
투영 석영유리로되고 평탄하며 표면 미세거칠기가 8㎛ 이하인 최소 하나의 표면 부위를 갖는 석영유리 성형체가 제공된다. 구조가 간단하고 값싸게 제조가능하며 부가적인 성분을 별도 구입하거나 제작할 필요가 없는 이같은 형태의 성형체를 제조하기 위하여, 성형체를 단일 베이스로 구성하고, 그 베이스물질은 최소 99.9%의 화학적 순도를 갖고 홍연석함량이 1% 이하이며, 가스-불침투성 및 불투명이며; 공극을 포함하고, 벽두께가 1mm에서 λ=190~2650nm 범위의 파장에서 10% 미만의 거의 균일한 직접 분광 투과도를 가지며, 밀도가 최소 2.215g/㎤이다.
투명 표면부위는 상기 베이스 물질을 약 1650℃ 이상의 온도까지 가열하여 형성된다. 투명층의 두께는 최소 0.5mm이고 파장 범위 λ=600~2650nm 에서의 직접 분광투과도는 1mm층 두께에 대하여 최소 60%이다.
본 발명에는 상기와 같은 성형체를 제조하는 방법이 또한 제공된다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 플랜지의 표면에서 투명층을 형성함을 보여주는 도면, 제1도의 Ⅱ-Ⅱ선 단면도, 제3도는 경량 거울 블랭크의 종단면도, 제4A도는 투명 외층을 갖는 관의 개략도, 제4B도는 투명 내층을 갖는 관의 개략도, 제4C도는 전체가 투명한 벽을 갖는 관의 개략도, 제5도는 투명내층을 갖는 도가니의 측단면도.
Claims (23)
- 그 노출된 표면이 평탄하고 표면 미세거칠기가 8㎛ 미만인, 최소 하나의 투명유리로 된 표면 부위를 갖는 석영유리 성형체에 있어서, 상기 성형체는 베이스(base)로 구성되어 있으며, 그 베이스 물질은, 최소 99.9%의 화학적 순도를 갖고 홍연석(cristobalite)함량이 1% 이하이며; 가스-불침투성 및 불투명이며 공극을 함유하고; 1mm의 벽두께에서 λ=190 에서 λ=2650nm의 파장 범위에서 10% 미만의 거의 일정한 직접 분광 투과도(direct spectral transmission)를 가지며; 밀도가 최소 2.16g/㎤이며; 상기 투명한 표면 부위는 상기 베이스 물질을 1650℃ 이상의 온도로 열처리하여 형성되며, 그 투명층의 최소한 0.5mm 두께를 갖고, λ=600nm에서 λ=2650nm의 파장 범위에서의 직접 분광투과도가 1mm 두께에 대하여 최소한 60%인 것을 특징으로 하는 석영유리 성형체.
- 제1항에 있어서, 상기 성형체는 단일 베이스로 구성됨을 특징으로 하는 성형체.
- 제1항 또는 제2항에 있어서, 상기 베이스 물질의 공극중 최소 80%가 20㎛미만, 바람직하게는 10㎛미만의 최대 공극칫수를 가짐을 특징으로 하는 성형체.
- 제1항 내지 제3항중 어느 한 항에 있어서, 상기 베이스물질내의 공극함량은 단위 부피당 0.5~2.5% 범위임을 특징으로 하는 성형체.
- 제1항 내지 제4항중 어느 한 항에 있어서, 상기 투명한 표면부위를 플랜비의 표면을 형성함을 특징으로 하는 성형체.
- 제1항 내지 제4항중 어느 한 항에 있어서, 상기 베이스는 그 외부 및/또는 내부 표면의 최소 일부가 투명한 표면 부위를 형성하는 중공성분(hollow component)로써 설계됨을 특징으로 하는 성형체.
- 제6항에 있어서, 전체 외부 및/또는 내부 표면이 투명함을 특징으로 하는 성형체.
- 제1항 내지 제7항중 어느 한 항에 있어서, 상기 투명한 표면부위는 베이스의 전체 벽두께에 걸쳐서 투명함을 특징으로 하는 성형체.
- 제1항 내지 제4항중 어느 한 항에 있어서, 상기 베이스는 그 전체 내표면이 최소 1.0mm의 벽두께까지 투명한 도가니로써 설계됨을 특징으로 하는 성형체.
- 제1항 내지 제4항과 6 내지 8항 중 어느 한 항에 있어서, 상기 베이스는 용기의 성분으로 설계되고, 또한 상기 투명한 표면부위는 베이스의 전체 벽두께에 걸쳐 벽두께에 걸쳐 투명하여 조망창(viewing window)을 형성함을 특징으로 하는 성형체.
- 제1항 내지 제4항중 어느 한 항에 있어서, 상기 베이스는 경량 거울 블랭크(light-weigh mirror blank)와 같은 거울 블랭크의 성분으로 설계되며, 또는 상기 투명한 표면부위는 반사코팅이 제공되어지는 거울 블랭크의 표면을 형성함을 특징으로 하는 성형체.
- 제1항 내지 8항 및 10 또는 11항 중 어느 한 항에 있어서, 상기 투명표면 부위는 최소 1.0㎛의 두께를 가짐을 특징으로 하는 성형체.
- 투명 석영유리로된 최소 하나의 표면부위를 갖고 그 노출된 부위가 평탄하고 표면거칠기가 8㎛ 미만인, 석영유리 성형제 제조방법에 있어서, 최소 99.9% 순도의 석영유리를 입자크기가 70㎛미만이 되게 분쇄하여 파우더를 형성시키고; 그 파우로부터 슬립(slip)을 형성하고 연속유동유지하여 1~240시간에 걸쳐 안정화시킨 다음; 그 안정화된 슬립을 상기 베이스에 맞는 다공질 주형내에 장입하여 일정시간동안 방치하고; 그 주형으로부터 회수한 후 상기 베이스 블랭크를 건조하고 로내에서 5~60K/min 승온속도로 1350~1450℃ 범위의 소결온도까지 가열하 다음, 최소 40분간 1300℃ 이상의 온도에 노출시키고; 상기 소결된 베이스를 냉각시킴을 포함하는 슬립주입법(slip casting method)에 의해 베이스를 제조하며; 그후 상기 베이스를 형성하는 불투명한 다공질의 가스-불침투성인 베이스물질로된 표면 영역을 열원을 이용하여 투명표면부위의 두께가 최소 0.5mm 그리고 λ=60nm 에서 λ=2650nm 의 파장범위에서 직접분광투과도가 1nm 두께의 층에 대하여 최소 60%가 될때까지 1650~2000℃범위의 온도까지 국부적으로 가열하여 상기 다공질의 불투명 베이스 물질을 투명 석영유리로 변환시킴을 특징으로 하는 석영유리 성형체 제조방법.
- 제13항에 있어서, 상기 열원으로서는 천연가스나 산수소-산소(oxhydrogen-oxygen) 토치(torch), 플라스마 토치, 전기 아크 또는 CO2레이저 같은 레이저를 사용함을 특징으로 하는 방법.
- 제13항 또는 제14항에 있어서, 상기 열원과 상기 표면부위에 걸쳐 앞뒤로 이동함을 특징으로 하는 방법.
- 제15항에 있어서, 상기 열원은 표면부위에 걸쳐 앞뒤로 이동함을 특징으로 하는 방법.
- 제13항 내지 제16항 중 어느 한 항에 있어서, 상기 베이스는 플랜지로서 설계됨을 특징으로 하는 방법.
- 제13항 내지 제16항 중 어느 한 항에 있어서, 상기 베이스는 중공성분(hollow component)으로 설계되며, 그 외측 및/또는 내측표면의 최소 일부는 상기 열원으로 가열됨을 특징으로 하는 방법.
- 제5항 내지 제18항 중 어느 한 항에 있어서, 상기 중공성분은 그 외측 및/또는 내측 표면의 일부부위를 가열할 수 있도록 회전됨을 특징으로 하는 방법.
- 제18항 또는 제19항에 있어서, 전체 외측 및/또는 내측표면이 상기 열원으로 가열됨을 특징으로 하는 방법.
- 제13항 내지 제20항 중 어느 한 항에 있어서, 상기 베이스의 표면 부위 가열은 그 베이스의 전체 벽두께가 투명하게 될때까지 계속됨을 특징으로 하는 방법.
- 제13항 내지 제16항 중 어느 한 항에 있어서, 상기 베이스는 도가니로 설계되며, 투명층의 두께가 최소 1.0mm될때까지 그 전체 내표면을 가열함을 특징으로 하는 방법.
- 제13항 내지 제16항 중 어느 한 항에 있어서, 상기 베이스는 경량 거울 블랭크와 같은 거울 블랭크(mirror blank)로 설계되며, 상기 열원은 반사면으로서 사용된 그 거울블랭크의 표면위를 전후로 이동함을 특징으로 하는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEP4338807.8 | 1993-11-12 | ||
| DE4338807A DE4338807C1 (de) | 1993-11-12 | 1993-11-12 | Formkörper mit hohem Gehalt an Siliziumdioxid und Verfahren zur Herstellung solcher Formkörper |
| PCT/EP1994/003722 WO1995013248A1 (de) | 1993-11-12 | 1994-11-10 | Formkörper aus quarzglas und verfahren zur herstellung eines formkörpers aus quarzglas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR960705742A true KR960705742A (ko) | 1996-11-08 |
| KR100349412B1 KR100349412B1 (ko) | 2002-11-14 |
Family
ID=6502525
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019940029261A KR100321284B1 (ko) | 1993-11-12 | 1994-11-09 | 높은이산화규소함량을갖는형상체및상기형상체의제조방법 |
| KR1019960702414A KR100349412B1 (ko) | 1993-11-12 | 1994-11-10 | 석영유리성형체및그제조방법 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019940029261A KR100321284B1 (ko) | 1993-11-12 | 1994-11-09 | 높은이산화규소함량을갖는형상체및상기형상체의제조방법 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US5736206A (ko) |
| EP (1) | EP0653381B1 (ko) |
| JP (2) | JP3241046B2 (ko) |
| KR (2) | KR100321284B1 (ko) |
| CN (1) | CN1066696C (ko) |
| CA (1) | CA2135542C (ko) |
| DE (4) | DE4338807C1 (ko) |
| WO (1) | WO1995013248A1 (ko) |
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- 1994-08-31 EP EP94113614A patent/EP0653381B1/de not_active Expired - Lifetime
- 1994-09-29 DE DE4434858A patent/DE4434858C2/de not_active Expired - Lifetime
- 1994-10-13 DE DE59404672T patent/DE59404672D1/de not_active Expired - Lifetime
- 1994-11-09 KR KR1019940029261A patent/KR100321284B1/ko not_active IP Right Cessation
- 1994-11-10 JP JP51289695A patent/JP3241046B2/ja not_active Expired - Fee Related
- 1994-11-10 DE DE4440104A patent/DE4440104C2/de not_active Expired - Lifetime
- 1994-11-10 WO PCT/EP1994/003722 patent/WO1995013248A1/de active Application Filing
- 1994-11-10 CA CA002135542A patent/CA2135542C/en not_active Expired - Fee Related
- 1994-11-10 JP JP27653794A patent/JP3763420B2/ja not_active Expired - Lifetime
- 1994-11-10 KR KR1019960702414A patent/KR100349412B1/ko not_active IP Right Cessation
- 1994-11-10 US US08/640,759 patent/US5736206A/en not_active Expired - Lifetime
- 1994-11-11 CN CN94117916A patent/CN1066696C/zh not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE4440104A1 (de) | 1995-05-18 |
| EP0653381A1 (de) | 1995-05-17 |
| DE4338807C1 (de) | 1995-01-26 |
| KR950014027A (ko) | 1995-06-15 |
| CN1066696C (zh) | 2001-06-06 |
| DE4434858C2 (de) | 1997-05-22 |
| JPH07267724A (ja) | 1995-10-17 |
| JP3241046B2 (ja) | 2001-12-25 |
| JPH09506324A (ja) | 1997-06-24 |
| KR100321284B1 (ko) | 2002-06-28 |
| DE4434858A1 (de) | 1995-05-18 |
| US5736206A (en) | 1998-04-07 |
| JP3763420B2 (ja) | 2006-04-05 |
| KR100349412B1 (ko) | 2002-11-14 |
| CA2135542A1 (en) | 1995-05-13 |
| EP0653381B1 (de) | 1998-04-29 |
| WO1995013248A1 (de) | 1995-05-18 |
| CA2135542C (en) | 2007-10-23 |
| DE59404672D1 (de) | 1998-01-08 |
| DE4440104C2 (de) | 1996-04-25 |
| CN1105650A (zh) | 1995-07-26 |
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